沉积法制备纳米TiO_2薄膜

利用TiO2胶体在石英玻璃表面沉积制备TiO2薄膜,用分光光度计测量TiO2薄膜的吸光度,研究沉积时间、TiO2胶体浓度、镀膜次数对TiO2薄膜的沉积吸附过程和等效膜厚的影响,讨论纳米TiO2沉积吸附的类型。结果表明,最大等效膜厚随着TiO2胶体浓度的增大而增加;最佳镀膜次数与TiO2胶体浓度无关,随着沉积时间的延长而减少;用气体吸附的B.E.T.和Langmuir吸附理论分析的纳米TiO2在石英玻璃上的沉积过程与实验结果相符。     

TiO_2磁控溅射工艺参数对薄膜沉积速率的影响

为了经济、有效、准确地在线测量光学薄膜厚度,采用射频磁控反应溅射法在玻璃衬底上制备TiO2薄膜。用自制的简易监测系统对TiO2薄膜在生长过程中的沉积速率进行了即时测量,研究了射频功率、气体流量、工作气压等工艺参数对TiO2薄膜沉积速率的影响规律。结果表明:沉积速率监测系统对膜厚变化反应灵敏,能够实时监测薄膜生长速率;溅射过程中,射频功率、氧氩流量比和工作气压对薄膜沉积速率有较大的影响,射频功率从120 W增加到240 W,薄膜沉积速率增加;氧气流量从1 mL/min增加到5 mL/min,薄膜沉积速率先逐渐增大后减小,存在一个临界点;工作气压从0.3 Pa增加到0.8 Pa,薄膜沉积速率缓慢增加,但临界点后迅速下降。     

真空弧源沉积类金刚石薄膜及其性能研究

采用真空弧源沉积技术在钛合金及Si(100)表面合成DLC薄膜．通入不同的氩气．控制DLC薄膜中的SP3／SP2比值。研究表明，薄膜硬度可达96GPa．随着氩气流量的增加，薄膜的硬度先增加．后有明显降低。随着氩气流量的增加，类金刚石薄膜中．SP2键增加，SP3键减少，而血液相容性明显提高。DLC薄膜具有优异的耐磨性，摩擦系数低，与钛合金基体结合牢固。     

TiO2和SiO2薄膜应力在线测量与研究

研究了离子能量在薄膜制备过程中对TiO2和SiO2薄膜应力的影响。用电子束蒸发的方法制备TiO2和SiO2薄膜,使用实验室自行设计制作的基于哈特曼传感器的薄膜应力仪在线监测TiO2和SiO2薄膜应力随膜厚的变化。结果表明,离子辅助沉积的TiO2薄膜张应力值要比传统工艺低40 MPa,并且随着离子能量的增加,薄膜逐渐由张应力变为压应力,薄膜的最大折射率为2.56;而离子辅助的溅射效应在制备SiO2薄膜时比较明显,传统工艺制备的SiO2薄膜表现为压应力,而用离子辅助的方法制备的SiO2薄膜表现为张应力,并且随着离子能量的增加,薄膜变得疏松,折射率逐渐降低。     

沉积时间对磁控反应溅射制备TiO2薄膜性能的影响

应用直流磁控反应溅射法,在玻璃基体上制备了具有光催化活性的TiO2薄膜.TiO2薄膜的厚度随沉积时间的增加而均匀增长.基体温度则在溅射的最初1h很快上升到110℃,溅射7h基体温度不超过130℃.溅射2h得到的是非晶态TiO2薄膜,而溅射3～7h制备的薄膜为锐钛矿型结构.非晶态和小晶粒TiO2薄膜的紫外一可见透射光谱谱带边沿与结晶较好的TiO2薄膜相比有明显的蓝移,薄膜的透射率随沉积时间的增加而下降.钛以四价钛的形式存在于TiO2薄膜中.TiO2薄膜的光催化活性随沉积时间争薄膜厚度的增加而有较大提高.     

Cu/TiO_2/ITO薄膜元件阻变性能与机理研究

以磁控溅射方法沉积TiO2薄膜和Cu上电极层,制备Cu/TiO2/ITO阻变存储器元件。采用原子力显微镜、X射线衍射仪、X射线光电子能谱仪对薄膜材料进行性能表征,测试结果表明:TiO2薄膜表面平整、致密;结构以非晶为主,仅有少量金红石相TiO2(110)面结晶;钛氧比为1:1.92(at%),说明薄膜内部存在少量氧空位。在阻变性能测试中,元件呈现双极阻变现象,阻变窗口值稳定,数据保持特性良好,但未出现Forming过程。通过对阻变元件I-V曲线线性拟合结果的分析,得出阻变机理由导电细丝理论和普尔-法兰克效应共同控制。进一步分析发现,被氧化的Cu离子在偏压作用下很容易在TiO2薄膜内迁移并形成直径较大且较为稳定的导电细丝。     

CeO2修饰的透明TiO2纳米管电极的电致变色器件

采用电化学沉积法在阳极氧化制备的TiO2纳米管阵列管壁上沉积一层CeO2纳米颗粒,再将CeO2修饰的透明TiO2纳米管阵列薄膜对电极与聚三甲基噻吩变色电极组装成透过型电致变色器件.实验结果表明:CeO2修饰的TiO2纳米管阵列薄膜仍保持良好的光透过性,其电荷存储能力比纯TiO2纳米管电极提高了30%.经CeO2修饰的TiO2纳米管改善了器件的性能,与对电极为单一TiO2纳米管阵列的器件相比,其对比度仍保持在38%左右,其褪色时间由1.3 s缩短为0.8 s.电致变色器件快速响应得益于纳米管与纳米颗粒组成的复合结构的高比表面积和快速的电荷传输过程.     

Ti和TiO2薄膜在血管支架表面附着状况的研究

采用非平衡磁控溅射法在316L不锈钢制成的血管支架表面制备Ti以及TiO2薄膜,初步研究了Ti薄膜厚度、TiO2薄膜沉积速率对薄膜在血管支架表面附着状况的影响.结果表明,支架表面较薄的Ti薄膜附着状况较厚的Ti薄膜好;低沉积速率制备的TiO2薄膜在支架表面附着状况好于高沉积速率制备的TiO2薄膜;对于Ti/TiO2复合薄膜,Ti层厚度过大不利于Ti/TiO2复合薄膜在支架表面附着.     

液相沉积法制备纳米TiO2薄膜及其光催化活性研究

采用液相沉积法,在ITO玻璃上直接沉积出具有光催化活性的纳米TiO2薄膜。用XRD、AFM、UV—Vis对TiO2薄膜的物相、形貌、透明性和厚度等进行表征,并研究了TiF6^2-水溶液的浓度、反应物TiF6^2-和H3BO3的摩尔比、沉积时间等对沉积TiO2薄膜的结构和性能的影响。此外,还用亚甲基蓝的降解评价了TiO2薄膜的光催化活性。     

纳米TiO2／Al2O3复合薄膜光催化特性研究

以电化学方法合成的Al2O3多孔膜为基体，采用交流电沉积的方法在膜孔中沉积纳米TiO2，制备出纳米TiO2／Al2O3复合薄膜。对TiO2／Al2O3复合薄膜的形貌、结构和组成进行了表征；对TiO2／Al2O3复合薄膜光催化甲基橙溶液进行了研究。结果表明Al2O3／TiO2复合薄膜呈现出较好的光催化活性，电沉积TiO2的时间、热处理温度、选择不同光源照射均对TiO2／Al2O3复合薄膜光催化活性有一定的影响。     

Repeatability of the composition of titanium oxide films produced by evaporation of ti 2 o 3

Congruent vaporization is a process that yields constant vapor species. Ti(2)O(3) was continuously electron-beam evaporated to produce titanium oxide thin films. Rutherford backscattering spectrometry was employed to study the evolution of the composition of these films. It seems that congruent vaporization can be established in a coating plant. TiO(2) films produced by conventional reactive deposition tend to contain mixtures of titanium oxides. Increasing the transmission of TiO(2) films becomes an issue of increasing the TiO(2) component in the films by adequate reactive evaporation.     

探索MOCVD法制备TiO2薄膜的最佳反应条件

用低压金属有机化合物化学气相沉积 (MOCVD法 ),以四异丙纯钛 (TTIP)为源物质,高纯氮气作为载气,氧气为反应气体,制备出了 TiO2薄膜。分析出了沉积温度、氧气流量等因素对沉积速率的影响。发现在不同反应条件下 TiO2薄膜生长行为受动力学控制或受扩散控制,为制备优质 TiO2薄膜提供了依据。     

可逆光致变色的Ag@TiO2纳米复合膜（英文）

为了防止活性等离子体对下层银膜的破坏,采用多晶TiO2半导体烧结靶,使用射频磁控溅射方法在纯氩等离子气氛中制备了大面积均匀的TiO2、Ag@TiO2薄膜。为了了解其结构与电子和光学特性间的相互作用,对TiO2和TiO2/Ag/TiO2样品的制备参数(如射频功率、总压和直流电压的共同影响)进行了研究。采用掠入射X射线衍射、紫外可见吸收、拉曼光谱等技术研究了根据其结构调整光学性能的可能性。结果显示,沉积的TiO2薄膜具有与在氩气和氧气混合气氛中沉积所得薄膜相似的形貌、电子和光学特性、能隙带宽和晶相;且所制备的Ag@TiO2薄膜银具有可逆的光致变色特性,可作为智能窗、多波长光存储器和可擦写高密度电子纸使用。     

Effects of substrate temperature on the microstructure and photocatalytic reactivity of TiO2 films

Transmission electronic microscopy is used to study the structure, morphology and orientation of thin TiO2 films prepared by reactive magnetron sputtering on glass slides at different substrate temperatures (100 to 400 °C). The TiO2 films are used to purify a dye in waste water. The microstructure and photocatalytic reactivity of TiO2 films have been shown to be functions of deposition temperature. In the temperature range examined, all film samples have a porous nanostructure and the dimension of particles grown with increasing deposition temperature. Films are amorphous at temperatures of 100 °C and only anatase phase forms at 200 °C and above. Films deposited between 200 to 300 °C show a preferred orientation, while films at 400 °C change into complete random orientation. Deposition at 250 °C yields high efficiency in photocatalytic degradation owing to the high degree of preferred orientation and nanocrystalline/nanoporous anatase phase. © 1998 Kluwer Academic Publishers     

Properties of TiO2 Thin Films Prepared by Magnetron Sputtering

With rapid progressive application of TiO2 thin films,magnetron sputtering becomes a very interesting method to prepare such multi-functional thin films.This paper focuses on influences of various deposition processes and deposition rate on the structures and properties of TiO2 thin films.Anatase,rtile or amorphous TiO2 films with various crystalline structures and different photocatalytic,optical and electrical properties can be produced by varying sputtering gases,substrate temperature,annealing process,deposition rate and the characteristics of magnetron sputtering.This may in turn affect the function of TiO2 films in many applications.Furthermore,TiO2-based composites films can overcome many limitations and improve the properties of TiO2 films.     

Photocatalytic degradation of methyl orange: influence of H2O2 in the TiO2-based system

The purpose of this study was to investigate the photocatalytic oxidation of a reactive azo dye. The photocatalytic activity of the TiO2 was studied using a reactor equipped with UV-A sources, with maximum emission at 365 nm. The photocatalytic activity of the TiO2 powder (99.9% anatase) and thin films has been measured through the decomposition of methyl orange solutions. The thin film was prepared by doctor blade and spray pyrolysis deposition (SPD). The TiO2 suspensions were prepared at 1 g/L concentration, and the initial methyl orange concentration was fixed at 7.8125 mg/L. The influence of the TiO2 (powder or thin films) and/or O2 and H2O2 on the photobleaching rate, was tested under different experiments, at pH = 5. Thin films (doctor blade) of TiO2 formed of mezo-sized aggregates formed of nanosized anatase crystallites show better photobleaching efficiency than thin film (SPD) due to their large internal surface. The rate is even higher in H2O2 compared to oxygen environment.     

Effects of annealing on the optical, structural, and chemical properties of TiO2 and MgF2 thin films prepared by plasma ion-assisted deposition

Effects of thermal annealing at 400 degrees C on the optical, structural, and chemical properties of TiO2 single-layer, MgF2 single-layer, and TiO2/MgF2 narrow-bandpass filters deposited by conventional electron-beam evaporation (CE) and plasma ion-assisted deposition (PIAD) were investigated. In the case of TiO2 films, the results show that the annealing of both CE and PIAD TiO2 films increases the refractive index slightly and the extinction coefficient and surface roughness greatly. Annealing decreases the thickness of CE TiO2 films drastically, whereas it does not vary that of PIAD TiO2 films. For PIAD MgF2 films, annealing increases the refractive index and decreases the extinction coefficient drastically. An x-ray photoelectron spectroscopy analysis suggests that an increase in the refractive index and a decrease in the extinction coefficient for PIAD MgF2 films after annealing may be related to the enhanced concentration of MgO in the annealed PIAD MgF2 films and the changes in the chemical bonding states of Mg 2p, F 1s, and O is. It is found that (TiO2/MgF2) multilayer filters, consisting of PIAD TiO2 and CE MgF2 films, are as deposited without microcracks and are also thermally stable after annealing.     

纳米结构316L不锈钢基掺钽TiO_2薄膜生物活性研究

采用射频磁控溅射技术在表面微结构纳米化316L不锈钢和粗晶粒316L不锈钢基体上制备掺钽TiO2薄膜。采用扫描电镜和X射线衍射仪分析薄膜形貌和晶体结构,用体外模拟人体体液浸泡实验研究薄膜的生物活性。结果表明:表面微结构纳米化的316L不锈钢具有强烈诱导掺钽TiO2薄膜形核效应;316L不锈钢表面微结构纳米化能显著提高自身及其表层掺钽TiO2薄膜的生物活性;316L不锈钢表面纳米化后,其表层掺钽TiO2薄膜诱导的羟基磷灰石形貌由原先的球状变为多孔网状结构。     

Enhancement of crystallinity and optical properties of bilayer TiO2/ZnO thin films prepared by atomic layer deposition

Bilayer and multilayer thin films are becoming increasingly important in the development of faster, smaller and more efficient electronic and optoelectronic devices. One of the motivations of applying bilayer or multilayer structures is to modify the optical properties of materials. Atomic layer deposition (ALD) is a variant of Chemical Vapour Deposition that can produce uniform and conformal thin films with well controlled nanostructures. In this study, we have demonstrated new findings of the use of ALD fabricated bilayer TiO2/ZnO thin films with enhanced crystallinity and optical properties. TiO2 films have been deposited at 300 degrees C for 1000 (51 nm in thickness) or 3000 (161 nm in thickness) deposition cycles onto glass and Si substrates. ZnO films are subsequently deposited on the TiO2 layers at 280 degrees C for 500 deposition cycles (55 nm). The crystallinity and optical properties of the TiO2/ZnO thin films have been analysed by X-ray diffraction, photoluminescence, UV-Vis spectroscopy, Atomic Force Microscopy and Scanning Electron Microscopy. XRD diffraction pattern confirmed the presence of ZnO with wutrtize crystal structure and TiO2 with anatase structure. It shows that the crystallinity of the TiO2 films has been improved with the deposition of ZnO. The intensity of UV luminescence has increased by almost 30% for TiO2/ZnO bilayer as compared to the single layer TiO2. The possible mechanism for the enhancement of the optical properties of bilayer TiO2/ZnO thin films will be discussed.     

Photocatalytic TiO(2) deposition by chemical vapor deposition

Dip-coating, spray-coating or spin-coating methods for crystalline thin film deposition require post-annealing process at high temperature. Since chemical vapor deposition (CVD) process is capable of depositing high-quality thin films without post-annealing process for crystallization, CVD method was employed for the deposition of TiO(2) films on window glass substrates. Post-annealing at high temperature required for other deposition methods causes sodium ion diffusion into TiO(2) film from window glass, resulting in the degradation of photocatalytic efficiency. Anatase-structured TiO(2) thin films were deposited on window glass by CVD, and the photocatalytic dissociation rates of benzene with CVD-grown TiO(2) under UV exposure were characterized. As the TiO(2) film deposition temperature was increased, the (112)-preferred orientations were observed in the film. The (112)-preferred orientation of TiO(2) thin film resulted in a columnar structure with a larger surface area for benzene dissociation. Obviously, benzene dissociation rate was maximum when the degree of the (112) preferential orientation was maximum. It is clear that the thin film TiO(2) should be controlled to exhibit the preferred orientation for the optimum photocatalytic reaction rate. CVD method is an alternative for the deposition of photocatalytic TiO(2).