溶胶-凝胶法制备宽带减反膜

为了克服单层减反射膜剩余反射高，色彩还原性能差的缺点，需要制备宽带减反膜。纳米多孔SiO2薄膜可以实现很好的宽带减反效果。本文用光学薄膜设计程序模拟了光学参数的变化对薄膜光学性能的影响，优化了薄膜的光学参数。实验上通过酸碱两步法和溶胶-凝胶技术制备了折射率梯度的纳米多孔SiO2宽带减反膜。采用椭偏仪、FE-SEM、紫外-可见分光光度计等方法研究薄膜的光学特性和表面形貌。结果表明实验制备的SiO2薄膜具有可控的纳米多孔结构，折射率在1．18～1．43之间可连续调节。形成的宽带减反膜在可见光区域的平均反射率仅为0．44％。     

ITO玻璃在线等离子体清洗的研究

通过在线等离子体清洗的玻璃基片表面沉积的ITO(或SiO2)膜,不仅具有优良的光电特性,而且提高了膜层在基片上的附着力.与未经在线等离子体清洗的基片沉积的ITO膜相比,膜层附着力提高了3.5倍.此项成果已在ITO膜透明导电玻璃连续生产线上得到应用.     

高透明低方阻ITO—Ag—ITO柔性镀膜技术

高透明低方阻ITO－Ag-ITO柔性薄膜具有广泛的用途，本文介绍了膜系设计，工艺参及控制，对设备结构也做了简要叙述，测试结果表明，ITO－Ag-ITO多层膜采用连续卷绕镀的方法生产，性能优异，工艺稳定，系统可靠。     

激光测距系统中光学屏蔽膜系的研究

针对激光测距系统中光咱成像受电磁波干扰影响测量质量的问题，本文分析了比较了金属光学薄膜与ITO薄膜的光学屏蔽特性。采用磁控反应溅射的方法在关键光学零件表面制备了ITO膜，经过性能测试表明：ITO膜可以满足现代激光测距的光路屏蔽要求。     

用电子束蒸发法低温无损情况下在有机柔性衬底上制作ITO膜及其性能研究

在有机材料柔性衬底上沉积ITO膜,需要在低温及无损伤(即避免离子轰击及热损伤等)情况下进行.为满足此要求,采用电子束蒸发法来实现在PI衬底上沉积ITO膜,对沉积参数如电子束特性、氧分压及衬底温度对薄膜质量的影响进行了研究;对薄膜结构、表面形貌、电学及光学特性进行了检测.最后,在PI衬底上获得高质量ITO膜,其可见光透过率超过90%,电阻率低于5×10-4 Ω*cm.     

ITO玻璃在线等离子体清洗的研究

通过在线等离子体清洗的玻璃基片表面沉积的ITO（或SiO2)膜，不仅具有优良的光电特性，而且提高了膜层在基片上的附着力。与未经在线等离子体清洗的基片沉积的ITO膜相比，膜层附着力提高了3．5倍。此项成果已在ITO膜透明导电玻璃连续生产线上得到应用。     

ITO／Al203复合透明导电膜的制备及光电性能

采用磁控溅射技术，在预先沉积有金属Al膜的玻璃衬底上制备了ITO薄膜。通过高温热处理，获得了透射率高、导电性能好的ITO/Al2O3复合透明导电膜。研究了不同Al薄膜厚度下ITO薄膜的晶体结构及其光、电性能，结果表明，当预沉积Al层厚度为40nm左右时，UTD的结晶质量得到提高，取向性能变好，电阻降低，而且在400-800mm范围内具有很高的可见光透过率。实验表明，通过改变预沉积Al膜的厚度，可以改变ITO薄膜最大透过率对应的波长，实现ITO预器件工作波长的匹配。     

偏压对ITO薄膜生长模式和光电性能的影响

为明确溅射偏压对ITO薄膜性质的影响,用射频磁控溅射法于室温在玻璃衬底制备出ITO透明导电薄膜,研究了不同偏压下ITO薄膜的生长模式、光学和电学性能.结果表明:随着偏压的增加,薄膜沉积模式经历了沉积、沉积和扩散、表面脱附3种方式;AFM和SEM显示,偏压为100 V时,膜层表面光洁、均匀,粗糙度最小,均方根粗糙度为1.61 nm;XRD分析表明偏压会影响与薄膜的择优取向,偏压为100 V时,薄膜晶粒取向为(222)面;薄膜偏压为120 V时,薄膜的光电性能最佳,电阻率最低为2.59×10-4Ω.cm,可见光区的平均透过率在85%以上;偏压的大小使薄膜的吸收边发生了"蓝移"或"红移".     

ITO/Al2O3复合透明导电膜的制备及光电性能

采用磁控溅射技术 ,在预先沉积有金属Al膜的玻璃衬底上制备了ITO薄膜。通过高温热处理 ,获得了透射率高、导电性能好的ITO/Al2 O3 复合透明导电膜。研究了不同Al薄膜厚度下ITO薄膜的晶体结构及其光、电性能 ,结果表明 ,当预沉积Al层厚度为 4 0nm左右时 ,ITO的结晶质量得到提高 ,取向性能变好 ,电阻降低 ,而且在 4 0 0 - 80 0nm范围内具有很高的可见光透过率。实验表明 ,通过改变预沉积Al膜的厚度 ,可以改变ITO薄膜最大透过率对应的波长 ,实现ITO预器件工作波长的匹配     

阳光控制膜玻璃的光学特性及膜系设计

通过对阳光控制膜玻璃膜层结构的分析，指出三层膜各自所起的作用具有很明显的相对独立性，因而在进行膜层材料选择及工艺参数确定时，可分别独立地加以处理。对几种常用金属薄膜和金属氧化物薄膜的理化性能与工艺可行性进行了比较，用分光光度计测试了幕墙玻璃单层膜及三层膜在可见光区的反射和透射特性，通过具体的实验数据表明了各层膜对幕墙玻璃光学性能的影响。     

醇硅比对太阳能玻璃用多孔SiO2减反膜性能的影响

采用溶胶-凝胶工艺在碱催化条件下制备了多孔结构的纳米SiO2薄膜,研究了不同醇硅比对溶胶体系的粒度分布、薄膜折射率以及透过率的影响。用纳米粒度分析仪测试了溶胶的颗粒分布,用紫外-可见-近红外分光光度计、椭偏仪、原子力显微镜(AFM)、扫描电子显微镜(SEM)测试了薄膜的光学性能、折射率、膜厚和显微形貌等。结果表明:随着醇硅比的增大,溶胶体系粘度下降,凝胶时间延长,颗粒度下降,折射率有升高的趋势;制备的增透玻璃膜层折射率为1.24,可见光透过率达到98.22%。     

Organic photodiodes on flexible substrates

The fabrication of organic photodiodes on solution cast indium tin oxide (ITO) bottom electrodes on flexible substrates is described. ITO coatings with a sheet resistance of 2 to 3 kΩ/sq are produced by gravure printing process on PEN (polyethylene 2,6-naphthalate) films. The ITO films are directly used as transparent bottom electrodes for organic photodiodes (OPD). Furthermore, first experiments to integrate one of these OPDs in an all-organic opto-chemical sensor are successfully demonstrated. The implementation of OPDs as detectors in applications such as integrated sensors demands a fabrication of these devices on flexible substrates. For these applications the OPDs on printed ITO on PEN are especially suitable.     

ITO deposited by pyrosol for photovoltaic applications

The goal of this work is to investigate morphology, electrical and optical properties of indium-tin-oxide (ITO) deposited by pyrosol on glass and Si substrates at different temperatures and to implement such layers for the processing of Si-based solar cells. The influence of the methanol/H₂O ratio on general properties of ITO was investigated. Atomic force microscopy (AFM), scanning electron microscopy (SEM), transmission spectra, ellipsometry and resistivity measurements were used for the analysis. It is shown that properties of ITO layers depend dramatically on the substrate used. It is shown that the resistivity of ITO layers deposited on a glass substrate is higher up to 2.5 times, compared to that of ITO layers deposited on a Si substrate at the same conditions, but in both cases decreases if the deposition temperature increases. Moreover, ITO layers deposited on a glass substrate are more flat and their refractive indexes are always lower for all deposition temperatures. An increase of the H₂O concentration in a film-forming solution leads to a decrease of the ITO film resistivity and to a slight increase of the roughness. An application of pyrosol deposited ITO films as the top transparent electrodes for the (p⁺nn⁺)Si and heterojunction ITO/n-Si solar cells is demonstrated.     

CN<em>x/TiN多层复合涂层抗水蚀性能的研究

采用多弧-磁控溅射镀膜机在不锈钢2Cr13衬底上沉积CN_<em>x/TiN多层复合涂层。利用光电子能谱仪(XPS)和透射电子衍射(TED)对涂层的组成和结构进行分析。利用自行研制的高压水蚀试验装置对不锈钢、高铬铸铁、司太立合金以及CN_<em>x/TiN多层复合涂层的抗水蚀性能进行对比试验,最后对涂层的水蚀失效机理进行了探讨。试验结果表明:CN_<em>x/TiN多层复合涂层具有较高的硬度、附着力、抗热冲击性能以及优异的抗水蚀性能,是一种优良的汽轮机末级叶片抗水蚀用涂层。     

On the processing-structure-property relationship of ITO layers deposited on crystalline and amorphous Si

Indium-tin-oxide (ITO) antireflection coatings were deposited on crystalline Si (c-Si), amorphous hydrogenated Si (a-Si:H) and glass substrates at room temperature (RT), 160 °C and 230 °C by magnetron sputtering. The films were characterised using atomic force microscopy, transmission electron microscopy, angle resolved X-ray photoelectron spectroscopy, combined with resistance and transmittance measurements. The conductivity and refractive index as well as the morphology of the ITO films showed a significant dependence on the processing conditions. The films deposited on the two different Si substrates at higher temperatures have rougher surfaces compared to the RT ones due to the development of crystallinity and growth of columnar grains.     

Strain dependence electrical resistance and cohesive strength of ITO thin films deposited on electroactive polymer

Transparent, conducting, indium tin oxide (ITO) films have been deposited, by pulsed dc magnetron sputtering, on glass and electroactive polymer (poly(vinylidene fluoride)—PVDF) substrates. Samples have been prepared at room temperature by varying the oxygen partial pressure. Electrical resistivity around 8.4 × 10^− 4 Ω cm has been obtained for films deposited on glass, while a resistivity of 1.7 × 10^− 3 Ω cm has been attained in similar coatings on PVDF. Fragmentation tests were performed on PVDF substrates with thicknesses of 28 μm and 110 μm coated with 40 nm ITO layer. The coating's fragmentation process was analyzed and the crack onset strain and cohesive strength of ITO layers were evaluated.     

ITO coated quartz fibers for heat radiative applications

Radiation heat transfer through fibrous materials is very strong at high temperatures (up to 1000 °C). Indium tin oxide (ITO) thin films were sol-gel deposited onto the surfaces of fibers to reduce the radiation heat transfer as radiation reflective coatings. SEM, XRD and FT-IR techniques were used to characterize the microstructure and performance of films. Results show that ITO thin film is uniformly deposited on fibers with a thickness of about 200 nm and can be used to apply a radiative reflective coating. Moreover, the efficiency of radiation reflective properties of films is improved as the annealing temperature increases. Results prove that ITO film is an excellent candidate to reduce the radiation heat transfer as radiation reflective coatings on fibrous materials.     

Annealing of sputter-deposited nanocrystalline Cr-Ta coatings in a low-oxygen-containing atmosphere

As a protective hard coating on glass molding dies, Cr-Ta coatings were fabricated on binderless tungsten carbide substrates with a Ti interlayer by RF magnetron sputtering. The nanocrystalline Cr-Ta coatings were deposited at 550 °C, which revealed one nanocrystalline phase for the Ta-rich coating and two nanocrystalline phases for the Cr-rich coating. Annealing treatment was conducted at 600 °C in a 12 ppm O₂-N₂ atmosphere to evaluate the coating performance in a realistic glass molding environment. Both Auger electron spectroscopy and X-ray photoelectron spectroscopy depth profiles verified the outward diffusion of Cr, which formed a protective coating for the Cr-rich coatings. A scale of Cr₂O₃ and a Cr-depleted transition zone near the surface were identified by conducting a transmission electron microscopy investigation on the annealed Cr_0.71Ta_0.29 coating. The Cr-rich coating absorbed a smaller amount of oxygen, exhibited greater hardness, and maintained nanoscale surface roughness after annealing in the glass molding atmosphere, thus making it an appropriate protective coating for the die material.     

Sol-Gel Derived Hydroxylapatite Coatings for Biomedical Applications

This paper presents the preliminary findings of a novel coating technique for the deposition of hydroxylapatite coatings on ceramic substrates. Through the use of sol-gel methods crystalline coatings of hydroxylapatite on substrates of vycor glass, polycrystal line alumina and single crystal magnesia have been successfully produced. The production of sol-gel solutions, coatings and their analysis was examined by X-ray diffraction, scanning electron microscopy and atomic force microscopy. Results thus far indicate that high quality hydroxylapatite coatings can be produced on ceramic substrates, with coatings deposited in this manner offering a number of benefits over other coating methods.     

柔性透明导电薄膜及其制备技术

在柔性衬底上制作的器件具有重量轻、柔软等优点,所以柔性透明导电薄膜成为当前的研究热点.柔性衬底存在不耐高温的缺点,从而限制了柔性透明导电薄膜的性能.总结了近年来对柔性衬底材料处理的方法,并介绍了柔性透明导电ITO薄膜和ZAO薄膜,分析了它们的研究现状,同时讨论了柔性薄膜的制备方法,最后对柔性透明TCO领域未来的研究和应用工作进行了展望.