Photoelectrochemical behavior of In2S3 formed on sintered In2O3 pellets

Microcrystals of In₂S₃ were formed on sintered In₂O₃ pellets by sulfurizing in H₂S atmosphere. The flat band potential of compound In₂S₃|In₂O₃ electrodes was evaluated as −1.0 V vs Ag|AgCl in 1 M KOH, 1 M Na₂S, 10⁻² M S. Significantly enhanced photocurrent was observed on compound In₂S₃|In₂O₃ electrodes with a lower degree of sulfurization to that of compound In₂S₃|In₂O₃ electrodes with higher degree of sulfurization. Photocurrent generation of compound In₂S₃|In₂O₃ electrodes was explained from the viewpoint of semiconductor sensitization.     

Plasma-assisted co-evaporation of β-indium sulfide thin films

This paper describes the development of plasma-assisted co-evaporation (PACE) for the formation of β-In₂S₃ thin films. Indium was supplied by conventional thermal evaporation, while the chalcogen gas precursor (H₂S) was activated using an inductively coupled plasma (ICP) source. Using a combination of optical emission spectroscopy and mass spectrometry it was shown that the ICP effectively dissociated H₂S, producing atomic sulfur. Transport modeling was used to quantify the flux distributions of the co-evaporated metal and the plasma-generated species impinging the substrate. Model predictions were validated by measurements of deposition rate and film properties. Substantial improvements in both materials utilization and substrate temperature reduction were realized with respect to conventional co-evaporation. β-In₂S₃ was formed as low as 100 °C and it was observed that quality was a strong function of S/In ratio. The grain size decreased and the optical band gap increased as the substrate temperature was reduced.     

Pyrite (FeS2) thin films prepared by spray method using FeSO4 and (NH4)2Sx

A simple spray method for the preparation of pyrite (FeS₂) thin films has been studied using FeSO₄ and (NH₄)₂S_x as precursors for Fe and S, respectively. Aqueous solutions of these precursors are sprayed alternately onto a substrate heated up to 120°C. Although Fe–S compounds including pyrite are formed on the substrate by the spraying, sulfurization of deposited films is needed to convert other phases such as FeS or marcasite into pyrite. A single-phase pyrite film is obtained after the sulfurization in a H₂S atmosphere at around 500°C for 30 min. All pyrite films prepared show p-type conduction. They have a carrier concentration (p) in the range 10¹⁶–10²⁰ cm⁻³ and a Hall mobility (μ_H) in the range 200–1 cm²/V s. The best electrical properties (p=7×10¹⁶ cm⁻³, μ_H=210 cm²/V s) for a pyrite film prepared here show the excellence of this method. The use of a lower concentration FeSO₄ solution is found to enhance grain growth of pyrite crystals and also to improve electrical properties of pyrite films.     

Preparation of In2O3:F thin films grown by spray pyrolysis technique

Transparent conducting fluorine doped indium oxide (In₂O₃:F) thin films have been deposited on Corning 7059 glass substrates by the spray pyrolysis technique. The structural, electrical, and optical properties of these films were investigated as a function of substrate temperature. The X-ray diffraction pattern of the films deposited at lower substrate temperature (T_s=300 °C) showed no peaks of In₂O₃:F. In the useful range for deposition (i.e. 425–600 °C), the orientation of the films was predominantly [400]. For the 4500 Å thick In₂O₃:F deposited with an F content of 10-wt%, the minimum sheet resistance was 120 Ω and average transmission in the visible wavelength rang (400–700 nm) was 88%.     

Photocurrent enhancement of wide bandgap Bi2O3 by Bi2S3 over layers

Sintered Bi₂O₃ pellets exhibited insulating properties at room temperature. Partial reduction of sintered Bi₂O₃ pellets increased the conductivity. Reduced Bi₂O₃ pellets exhibited n-type semiconductor properties. Microcrystals of Bi₂S₃ were formed on sintered Bi₂O₃ pellets by sulfurizing them in H₂S atmosphere. The direct band-gap and indirect band-gap of Bi₂S₃ were evaluated as 1.2 and 0.4 eV, respectively. A high incident photon to current conversion efficiency in the near IR region was observed on Bi₂S₃|Bi₂O₃ electrodes. Photocurrent generation of Bi₂S₃|Bi₂O₃ electrodes was explained from the viewpoint of semiconductor sensitization. The flat band potential of Bi₂S₃ was evaluated as −1.1 V vs. Ag|AgCl in aqueous polysulfide redox electrolyte (1 M OH⁻, 1 M S²⁻, 10⁻² M S).     

Improved CIGS thin-film solar cells by surface sulfurization using In2S3 and sulfur vapor

Surface sulfurization of Cu(In,Ga)Se₂ (CIGS) thin films was carried out using two alternative techniques that do not utilize toxic H₂S gas; a sequential evaporation of In₂S₃ after CIGS deposition and the annealing of CIGS thin films in sulfur vapor. A Cu(In,Ga) (S,Se)₂ thin layer was grown on the surface of the CIGS thin film after sulfurization using In₂S₃, whereas this layer was not observed for CIGS thin films after sulfurization using sulfur vapor, although a trace quantity of S was confirmed by AES analysis. In spite of the difference in the surface modification techniques, the cell performance and process yield of the ZnO:Al/CdS/CIGS/Mo/glass thin-film solar cells were remarkably improved by using both surface sulfurization techniques.     

Carbon-doped Sb2S3 thin films: Structural, optical and electrical properties

We report the modification of electrical properties of chemical-bath-deposited antimony sulphide (Sb₂S₃) thin films by thermal diffusion of carbon. Sb₂S₃ thin films were obtained from a chemical bath containing SbCl₃ and Na₂S₂O₃ salts at room temperature (27 °C) on glass substrates. A carbon thin film was deposited on Sb₂S₃ film by arc vacuum evaporation and the Sb₂S₃-C layer was subjected to heating at 300 °C in nitrogen atmosphere or in low vacuum for 30 min. The value of resistivity of Sb₂S₃ thin films was substantially reduced from 10⁸ Ω cm for undoped condition to 10² Ω cm for doped thin films. The doped films, Sb₂S₃:C, retained the orthogonal stibnite structure and the optical band gap energy in comparison with that of undoped Sb₂S₃ thin films. By varying the carbon content (wt%) the electrical resistivity of Sb₂S₃ can be controlled in order to make it suitable for various opto-electronic applications.     

Growth and properties of single-phase γ-In2Se3 thin films on (1 1 1) Si substrate by AP-MOCVD using H2Se precursor

A set of In₂Se₃ films was grown on (1 1 1) Si substrate with AlN buffer by metalorganic chemical vapor deposition (MOCVD) using H₂Se as the metalogramic precursors for Se. The In₂Se₃ films on (1 1 1) Si substrate were pinhole-free with homogeneous and lamellar structures. It was found that by properly controlling the substrate temperatures, single-phase γ-In₂Se₃ films with fairly good optical properties can be well fabricated. Photoluminescence spectra of single-phase γ-In₂Se₃ show exciton emissions at 2.140 eV at 10 K. The band gap of single-phase γ-In₂Se₃ at room temperature is estimated at 1.943 eV.     

Optical properties of sol–gel deposited Al2O3 films

Highly transparent, uniform and corrosion resistant Al₂O₃ films were prepared on stainless-steel and quartz substrates by the sol–gel process from stable coating solutions using aluminum-sec-butoxide, Al(OBu^s)₃ as precursor, acetylacetone, AcAcH as chelating agent and nitric acid, HNO₃, as catalyzer. Films up to 1000 nm thick were prepared by multiple spin coating deposition, and were characterized by X-ray diffractometry (XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), thermogravimetric analysis (TGA), differential scanning calorimetry (DSC), Fourier transform infrared spectroscopy (FTIR), optical spectroscopy and micro Vickers hardness test. XRD of the film heat treated at 400°C showed that they had an amorphous structure. XPS confirmed that they were stoichiometric Al₂O₃. The refractive index (n) and extinction coefficient (k) were found to be n=1.56±0.01 and k=0.003±0.0002 at 600 nm, respectively. The surface microhardness and corrosion resistance investigations showed that Al₂O₃ films improved the surface properties of stainless-steel substrates.     

Fabrication of CuInSe2 films and solar cells by the sequential evaporation of In2Se3 and Cu2Se binary compounds

Cu₂Se/In_xSe(x≈1) double layers were prepared by sequentially evaporating In₂Se₃ and Cu₂Se binary compounds at room temperature on glass or Mo-coated glass substrates and CuInSe₂ films were formed by annealing them in a Se atmosphere at 550°C in the same vacuum chamber. The In_xSe thickness was fixed at 1 μm and the Cu₂Se thickness was varied from 0.2 to 0.5 μm. The CuInSe₂ films were single phase and the compositions were Cu-rich when the Cu₂Se thickness was above 0.35 μm. And then, a thin CuIn₃Se₅ layer was formed on the top of the CuInSe₂ film by co-evaporating In₂Se₃ and Se at 550°C. When the thickness of CuIn₃Se₅ layer was about 150 nm, the CuInSe₂ cell showed the active area efficiency of 5.4% with V_oc=286 mV, J_sc=36 mA/cm² and FF=0.52. As the CuIn₃Se₅ thickness increased further, the efficiency decreased.     

Floating zone growth of β-Ga2O3: a new window material for optoelectronic device applications

β-Ga₂O₃ is a transparent oxide and intrinsically an insulator. Doping allows the variation of the conductivity for both p- and n-type over a wide range. There are a number of potential applications in optoelectronics such as insulating or conductive window material, or as a substrate. Consequently, the influence of doping on the electrical and optical properties is an issue of crucial importance for pushing this material forward to applications. We report on the successful growth of undoped, Ge- and Ti-doped β-Ga₂O₃ single crystals by the floating zone technique. Both electrical and optical properties were characterized.     

A comparative study of CuInSe2 and CuIn3Se5 films using transmission electron microscopy, optical absorption and Rutherford backscattering spectrometry

CuInSe₂ and CuIn₃Se₅ films were grown by stepwise flash evaporation onto glass and Si substrates held at different temperatures. Transmission electron microscopy (TEM) studies revealed that the films grown above 370 K were polycrystalline, with CuInSe₂ films exhibiting larger average grain size than CuIn₃Se₅. Optical absorption studies yielded band gaps of 0.97±0.02 and 1.26±0.02 eV for CuInSe₂ and CuIn₃Se₅, respectively. Rutherford backscattering spectrometry (RBS) study of the films on Si showed that CuInSe₂/Si structures included an inhomogeneous interface region consisting of Cu and Si, whereas CuIn₃Se₅/Si structures presented sharp interface.     

ZnO-doped BaZr0.85Y0.15O3−δ proton-conducting electrolytes: Characterization and fabrication of thin films

ZnO-doped BaZr_0.85Y_0.15O_3−δ perovskite oxide sintered at 1500 °C has bulk conductivity of the order of 10⁻² S cm⁻¹ above 650 °C, which makes it an attractive proton-conducting electrolyte for intermediate-temperature solid oxide fuel cells. The structure, morphology and electrical conductivity of the electrolyte vary with sintering temperature. Optimal electrochemical performance is achieved when the sintering temperature is about 1500 °C. Cathode-supported electrolyte assemblies were prepared using spin coating technique. Thin film electrolytes were shown to be dense using SEM and EDX analyses.     

p-Type CuSbS2 thin films by thermal diffusion of copper into Sb2S3

We report the preparation of copper antimony sulfide (CuSbS₂) thin films by heating Sb₂S₃/Cu multilayer in vacuum. Sb₂S₃ thin film was prepared from a chemical bath containing SbCl₃ and Na₂S₂O₃ salts at room temperature (27 °C) on well cleaned glass substrates. A copper thin film was deposited on Sb₂S₃ film by thermal evaporation and Sb₂S₃/Cu layers were subjected to annealing at different conditions. Structure, morphology, optical and electrical properties of the thin films formed by varying Cu layer thickness and heating conditions were analyzed using different characterization techniques. XRD analysis showed that the thin films formed at 300 and 380 °C consist of CuSbS₂ with chalcostibite structure. These thin films showed p-type conductivity and the conductivity value increased with increase in copper content. The optical band gap of CuSbS₂ was evaluated as nearly 1.5 eV.     

Effect of the sintering temperature on the photocatalytic activity of ZnO+Zn2TiO4 thin films

ZnO+Zn₂TiO₄ thin films were obtained by the sol–gel method, the precursor solutions were prepared using two Ti/Zn ratios: 0.49 and 0.69. The films were deposited on glass slide substrates and sintered at temperatures in the 200–600 °C range in increments of 50 °C, with the goal of studying the dependence of the photocatalytic activity (PA) on the annealing temperature. The films were characterized by X-ray diffraction and UV–Vis spectroscopy. The PA was evaluated by measuring the UV–Vis absorption spectra of the methylene blue in aqueous solution before and after photobleaching, using the Lambert–Beer's principle. The higher photocatalytic activities were obtained from the films with sintering temperature around 450 °C, for both Ti/Zn ratios studied.     

Electrochromic properties of heat-treated thin films of CeO2–TiO2–ZrO2 prepared by sol–gel route

CeO₂–TiO₂–ZrO₂ thin films were prepared using the sol–gel process and deposited on glass and ITO-coated glass substrates via dip-coating technique. The samples were heat treated between 100 and 500 °C. The heat treatment effects on the electrochromic performances of the films were determined by means of cyclic voltammetry measurements. The structural behavior of the film was characterized by atomic force microscopy and X-ray diffraction. Refractive index, extinction coefficient, and thickness of the films were determined in the 350–1000 nm wavelength, using nkd spectrophotometry analysis.Heat treatment temperature affects the electrochromic, optical, and structural properties of the film. The charge density of the samples increased from 8.8 to 14.8 mC/cm², with increasing heat-treatment temperatures from 100 to 500 °C. It was determined that the highest ratio between anodic and cathodic charge takes place with increase of temperature up to 500 °C.     

Oxidative photoelectrochemical technology with Ti/TiO2 anodes

Rutile and anatase TiO₂ films have been grown on Ti plates by thermal (500–800°C) and anodic oxidation followed by thermal annealing (400–500°C), respectively. The photoelectrochemical efficiency of these photoanodes, evaluated by current density measurements in the photooxidation of 4-methoxybenzyl alcohol in deaerated CH₃CN, has been determined. The photocurrent efficiency increases with the thickness of the TiO₂ rutile film up to 1 μm (the most efficient thickness). At the wavelengths furnished by the irradiation apparatus similar thicknesses of anatase and rutile films show nearly the same efficiencies. Anodic bias produces similar relative increases of current intensity in both crystalline forms.     

Effect of Ga incorporation in sequentially prepared CuInS2 thin film absorbers

Thin film CuInS₂:Ga solar cell absorber films were prepared by sequential evaporation of Cu–In–Ga precursors and sulfurization in sulfur vapor. The depth distribution of Ga was found to be highly inhomogeneous caused by CuGaS₂ phase segregation at the back contact. Depending on overall Ga content and sulfurization temperature a quaternary CuGa_xIn_1−xS₂ compound formed exhibiting a shift in absorber lattice constant and band gap. Micro Raman measurements showed that crystal quality was also affected by Ga. Open-circuit voltages well above 800 mV were achieved while sustaining high fill factors of 71%.     

Visible light-induced hydrogen over CuFeO2 via S2O3 oxidation

The properties of CuFeO₂ have been studied according to the catalytic hydrogen production upon visible light. CuFeO₂ with a low band gap E_g, a good chemical stability and a suitable flat band potential appears as a suitable candidate. The potential of photoelectrons allows favorably a thermodynamically H₂-evolution from alkaline thiosulfate S₂O₃²⁻ solution. There is a major difference between pure and loaded oxide with some metal catalysts. Our best results have been obtained with unloaded CuFeO₂ at 50 °C and pH 13.60. Thiosulfate S₂O₃²⁻ ions can be oxidized to sulfite SO₃²⁻ and subsequently to sulfate SO₄²⁻ and the electronic exchange occurs via mediation of surface states. The quite high H₂-formation at the beginning shows a tendency towards saturation, it competes with SO₃²⁻ produced by parallel oxidation of S₂O₃²⁻.     

Electrochemical deposition of Zn3P2 thin film semiconductors on tin oxide substrates

Zn₃P₂ semiconductor thin films were prepared by electrodeposition technique form aqueous solutions. The deposition mechanism was investigated by cyclic voltammetry technique. Crystal structure, morphology and composition of as deposited and annealed Zn₃P₂ thin films grown on SnO₂/glass substrates were determined by X-ray diffraction, scanning electron microscopy, and energy dispersive X-ray analysis. X-ray diffraction data indicated the formation of Zn₃P₂ as the predominant phase for both as-deposited and annealed films. The compositions of the deposited films were controlled by the bath temperature, deposition potential and Zn/P ratio in the solution.The dark current–voltage measurements of SnO₂/Zn₃P₂/C devices indicated a rectifying behavior and a reverse saturation current density of 1.7×10⁻⁷ A/cm², which is in good accordance with that obtained from films prepared using vacuum technique. Also, the capacitance–voltage measurements showed that the number of interface states and the built in potential are in the order of 5×10⁻⁹ cm⁻³ and 0.85 V, respectively. These preliminary results for Zn₃P₂ thin films reveal that, this semiconductor material can be used for solar cell applications.