Formation of Single Tiers of Bridging Silicon Nanowires for Transistor Applications Using Vapor–Liquid–Solid Growth from Short Silicon‐on‐Insulator Sidewalls

Single tiers of silicon nanowires that bridge the gap between the short sidewalls of silicon‐on‐insulator (SOI) source/drain pads are formed. The formation of a single tier of bridging nanowires is enabled by the attachment of a single tier of Au catalyst nanoparticles to short SOI sidewalls and the subsequent growth of epitaxial nanowires via the vapor–liquid–solid (VLS) process. The growth of unobstructed nanowire material occurs due to the attachment of catalyst nanoparticles on silicon surfaces and the removal of catalyst nanoparticles from the SOI‐buried oxide (BOX). Three‐terminal current–voltage measurements of the structure using the substrate as a planar backgate after VLS nanowire growth reveal transistor behaviour characteristics.     

Growth and characterization of germanium nanowires by electron beam evaporation

Germanium nanowires were grown on Au coated Si substrates at 380 °C in a high vacuum (5 × 10^− 5 Torr) by e-beam evaporation of Germanium (Ge). The morphology observation by a field emission scanning electron microscope (FESEM) shows that the grown nanowires are randomly oriented with an average length and diameter of 600 nm and 120 nm respectively for a deposition time of 60 min. The nanowire growth rate was measured to be ∼ 10 nm/min. Transmission electron microscope (TEM) studies revealed that the Ge nanowires were single crystalline in nature and further energy dispersive X-ray analysis (EDAX) has shown that the tip of the grown nanowires was capped with Au nanoparticles, this shows that the growth of the Ge nanowires occurs by the vapour liquid solid (VLS) mechanism. HRTEM studies on the grown Ge nanowire show that they are single crystalline in nature and the growth direction was identified to be along [110].     

The influences of technological conditions and Au cluster islands on morphology of Ga<Subscript>2</Subscript>O<Subscript>3</Subscript> nanowires grown by VLS method on GaAs substrate

The synthesis of semiconductor nanowires is more and more interested to the applications for building blocks of the innovative nano-sized devices and circuits, but the research and fabrication of these nanowires are also holding a number of difficulties and challenges. Among many different kinds of semiconductor nanowires, Ga₂O₃ is increasingly grown for many promising applications in nano-device production, namely nanowire LED and Laser. So far there are many synthesizing methods of semiconductor nanowires, among them the vapor–liquid–solid (VLS) method is simple, cheap and popular. However, when we use the VLS method for nanowire growth, various technological problems exist. This paper aims at investigating some influences of the growth technological conditions and Au metal catalyst on the morphology of Ga₂O₃ nanowire grown by VLS on GaAs substrate. The main considering factors include the different growing temperatures and times, the effects of Au diffusion, Au droplets formation, Au cluster islands formation, and gas volume of the growing tube/ampoule at the 10⁻¹ torr low air pressure. The obtained experimental results regarding the structural properties of nanowires under these effects investigated by scanning electron microscopy, field emission scanning electron microscopy, high angle annular dark field and bright field, scanning transmission electron microscopy, energy-dispersive X-ray techniques, and focus ion beam are presented and discussed.     

Controlling heterojunction abruptness in VLS-grown semiconductor nanowires via in situ catalyst alloying

For advanced device applications, increasing the compositional abruptness of axial heterostructured and modulation doped nanowires is critical for optimizing performance. For nanowires grown from metal catalysts, the transition region width is dictated by the solute solubility within the catalyst. For example, as a result of the relatively high solubility of Si and Ge in liquid Au for vapor-liquid-solid (VLS) grown nanowires, the transition region width between an axial Si-Ge heterojunction is typically on the order of the nanowire diameter. When the solute solubility in the catalyst is lowered, the heterojunction width can be made sharper. Here we show for the first time the systematic increase in interface sharpness between axial Ge-Si heterojunction nanowires grown by the VLS growth method using a Au-Ga alloy catalyst. Through in situ tailoring of the catalyst composition using trimethylgallium, the Ge-Si heterojunction width is systematically controlled by tuning the semiconductor solubility within a metal Au-Ga alloy catalyst. The present approach of alloying to control solute solubilities in the liquid catalyst may be extended to increasing the sharpness of axial dopant profiles, for example, in Si-Ge pn-heterojunction nanowires which is important for such applications as nanowire tunnel field effect transistors or in Si pn-junction nanowires.     

Supercritical Fluid–Liquid–Solid (SFLS) Synthesis of Si and Ge Nanowires Seeded by Colloidal Metal Nanocrystals

Semiconductor nanowires, 5 to 20 nm in diameter and micrometers in length, appear to be promising candidates for a variety of new technologies, including computing, memory, and sensor applications. Suitable for these applications, silicon (Si) and germanium (Ge) nanowires ranging from 4 to 30 nm in diameter and micrometers in length can be produced in high temperature supercritical fluids by thermally degrading organosilane or organogermane precursors in the presence of organic‐monolayer‐protected gold nanocrystals. Although gas phase vapor–liquid–solid (VLS) methods can be used to produce a variety of different nanowire materials, high temperature supercritical fluids provide wire size control through nanocrystal size selection prior to synthesis, and high product yields due to the high precursor solubility.     

Doping GaP Core–Shell Nanowire pn‐Junctions: A Study by Off‐Axis Electron Holography

The doping process in GaP core–shell nanowire pn‐junctions using different precursors is evaluated by mapping the nanowires' electrostatic potential distribution by means of off‐axis electron holography. Three precursors, triethyltin (TESn), ditertiarybutylselenide, and silane are investigated for n‐type doping of nanowire shells; among them, TESn is shown to be the most efficient precursor. Off‐axis electron holography reveals higher electrostatic potentials in the regions of nanowire cores grown by the vapor–liquid–solid (VLS) mechanism (axial growth) than the regions grown parasitically by the vapor–solid (VS) mechanism (radial growth), attributed to different incorporation efficiency between VLS and VS of unintentional p‐type carbon doping originating from the trimethylgallium precursor. This study shows that off‐axis electron holography of doped nanowires is unique in terms of the ability to map the electrostatic potential and thereby the active dopant distribution with high spatial resolution.     

Band-gap modulation in single-crystalline Si1-xGex nanowires

We report the energy band-gap modulation of single-crystalline Si1-xGex (0 相似文献   

Edge‐Epitaxial Growth of InSe Nanowires toward High‐Performance Photodetectors

Semiconducting nanowires offer many opportunities for electronic and optoelectronic device applications due to their unique geometries and physical properties. However, it is challenging to synthesize semiconducting nanowires directly on a SiO₂/Si substrate due to lattice mismatch. Here, a catalysis‐free approach is developed to achieve direct synthesis of long and straight InSe nanowires on SiO₂/Si substrates through edge‐homoepitaxial growth. Parallel InSe nanowires are achieved further on SiO₂/Si substrates through controlling growth conditions. The underlying growth mechanism is attributed to a selenium self‐driven vapor–liquid–solid process, which is distinct from the conventional metal‐catalytic vapor–liquid–solid method widely used for growing Si and III–V nanowires. Furthermore, it is demonstrated that the as‐grown InSe nanowire‐based visible light photodetector simultaneously possesses an extraordinary photoresponsivity of 271 A W^?1, ultrahigh detectivity of 1.57 × 10¹⁴ Jones, and a fast response speed of microsecond scale. The excellent performance of the photodetector indicates that as‐grown InSe nanowires are promising in future optoelectronic applications. More importantly, the proposed edge‐homoepitaxial approach may open up a novel avenue for direct synthesis of semiconducting nanowire arrays on SiO₂/Si substrates.     

Directed synthesis of germanium oxide nanowires by vapor-liquid-solid oxidation

We report on the directed synthesis of germanium oxide (GeO(x)) nanowires (NWs) by locally catalyzed thermal oxidation of aligned arrays of gold catalyst-tipped germanium NWs. During oxygen anneals conducted above the Au-Ge binary eutectic temperature (T?>?361?°C), one-dimensional oxidation of as-grown Ge NWs occurs by diffusion of Ge through the Au-Ge catalyst droplet, in the presence of an oxygen containing ambient. Elongated GeO(x) wires grow from the liquid catalyst tip, consuming the adjoining Ge NWs as they grow. The oxide NWs' diameter is dictated by the catalyst diameter and their alignment generally parallels that of the growth direction of the initial Ge NWs. Growth rate comparisons reveal a substantial oxidation rate enhancement in the presence of the Au catalyst. Statistical analysis of GeO(x) nanowire growth by ex?situ transmission electron microscopy and scanning electron microscopy suggests a transition from an initial, diameter-dependent kinetic regime, to diameter-independent wire growth. This behavior suggests the existence of an incubation time for GeO(x) NW nucleation at the start of vapor-liquid-solid oxidation.     

Germanium nanowires with 3-nm-diameter prepared by low temperature vapour-liquid-solid chemical vapour deposition

We report the growth of germanium nanowires (Ge NWs) with single-step temperature method via vapour-liquid-solid (VLS) mechanism in the low pressure chemical vapour deposition (CVD) reactor at 300 degrees C, 280 degrees C, and 260 degrees C. The catalyst used in our experiment was Au nanoparticles with equivalent thicknesses of 0.1 nm (average diameter approximately 3 nm), 0.3 nm (average diameter approximately 4 nm), 1 nm (average diameter approximately 6 nm), and 3 nm (average diameter approximately 14 nm). The Gibbs-Thomson effect was used to explain our experimental results. The Ge NWs grown at 300 degrees C tend to have tapered structure while the Ge NWs grown at 280 degrees C and 260 degrees C tend to have straight structure. Tapering was caused by the uncatalysed deposition of Ge atoms via CVD mechanism on the sidewalls of nanowire and significantly minimised at lower temperature. We observed that the growth at lower temperature yielded Ge NWs with smaller diameter and also observed that the diameter and length of Ge NWs increases with the size of Au nanoparticles for all growth temperatures. For the same size of Au nanoparticles, Ge NWs tend to be longer with a decrease in temperature. The Ge NWs grown at 260 degrees C from 0.1-nm-thick Au had diameter as small as approximately 3 nm, offering an opportunity to fabricate high-performance p-type ballistic Ge NW transistor, to realise nanowire solar cell with higher efficiency, and also to observe the quantum confinement effect.     

Growth of germanium nanowires on silicon(111) substrates by molecular beam epitaxy

Heteroepitaxial growth of Ge nanowires was carried out on Si(111) substrates by MBE. Au seeds were used as precursor for the VLS growth of the nanowires. Even if the Au droplets do not act as catalyst for the dissociation of gas, they are local preferential areas where the energetic barrier of Ge nucleation is lowered compare to the remaining non activated surface. Two sets of Au seeds were used as precursors for the VLS process. The first set have an average diameter of 125 nm and the second of 25 nm. In-situ RHEED monitoring showed a Au wetting layer between these seeds before the nanowires growth as well as at the end of the Ge nanowires growth. It means that the wetting layer acted as a surfactant from the Si(111) surface to the Ge grown layer between the nanowires. Analysis of SEM images brought the fact that the diffusion of gold from the droplets on the surface and the sidewalls of the nanowires via the Ostwald ripening is a key parameter of the growth of the nanowires.     

Preferential Interface Nucleation: An Expansion of the VLS Growth Mechanism for Nanowires

A review and expansion of the fundamental processes of the vapor–liquid–solid (VLS) growth mechanism for nanowires is presented. Although the focus is on nanowires, most of the concepts may be applicable to whiskers, nanotubes, and other unidirectional growth. Important concepts in the VLS mechanism such as preferred deposition, supersaturation, and nucleation are examined. Nanowire growth is feasible using a wide range of apparatuses, material systems, and growth conditions. For nanowire growth the unidirectional growth rate must be much higher than growth rates of other surfaces and interfaces. It is concluded that a general, system independent mechanism should describe why nanowires grow faster than the surrounding surfaces. This mechanism is based on preferential nucleation at the interface between a mediating material called the collector and a crystalline solid. The growth conditions used mean the probability of nucleation is low on most of the surfaces and interfaces. Nucleation at the collector‐crystal interface is however different and of special significance is the edge of the collector‐crystal interface where all three phases meet. Differences in nucleation due to different crystallographic interfaces can occur even in two phase systems. We briefly describe how these differences in nucleation may account for nanowire growth without a collector. Identifying the mechanism of nanowire growth by naming the three phases involved began with the naming of the VLS mechanism. Unfortunately this trend does not emphasize the important concepts of the mechanism and is only relevant to one three phase system. We therefore suggest the generally applicable term preferential interface nucleation as a replacement for these different names focusing on a unifying mechanism in nanowire growth.     

Simultaneous growth mechanisms for Cu-seeded InP nanowires

We report on epitaxial growth of InP nanowires (NWs) from Cu seed particles by metal-organic vapor phase epitaxy (MOVPE). Vertically-aligned straight nanowires can be achieved in a limited temperature range between 340 °C and 370 °C as reported earlier. In this paper we present the effect of the V/III ratio on nanowire morphology, growth rate, and particle configuration at a growth temperature of 350 °C. Two regimes can be observed in the investigated range of molar fractions. At high V/III ratios nanowires grow from a solid Cu₂In particle. At low V/III ratios, nanowire growth from two particle types occurs simultaneously: Growth from solid Cu₂In particles, and significantly faster growth from In-rich particles. We discuss a possible growth mechanism relying on a dynamic interplay between vapor-liquid-solid (VLS) and vapor-solid-solid (VSS) growth. Our results bring us one step closer to the replacement of Au as seed particle material as well as towards a deeper understanding of particle-assisted nanowire growth.      

Ultrafast growth of single-crystalline Si nanowires

Silicon nanowires (SiNWs) have been catalytically synthesized by heat treatment of Si nanopowder at 980 °C. The SiNWs comprise crystalline Si nanoparticles interconnected with metal catalyst. The formation mechanism of nanowires generally depends on the presence of Fe catalysts in the synthesis process of solid–liquid–solid (SLS). Although gas phase of vapor–liquid–solid (VLS) method can be used to produce various of different nanowire materials, growth model based on the SLS mechanism by heat treatment is more ascendant for providing ultrafast growth of single-crystalline Si nanowires and controlling the diameter of them easily. The growth of single-crystalline SiNWs and morphology were discussed.     

Effect of atmosphere on growth of single crystal zinc oxide nanowires

Single crystal zinc oxide (ZnO) nanowires were prepared by using enhanced two-step vapor–liquid–solid (VLS) growth mechanism. The experimental results indicate that the growth rate and morphologies of the nanowires depends on the carrier gas ambient during the thermal reaction process. The ZnO nanowire grown with N₂, not only has the smaller diameter of about 30 nm but also exhibits a higher growth rate and larger number of density of nanowires per unit area than those grown with Ar. The photoluminescence measurements show that the ZnO nanowires grown with N₂ have a stronger ultraviolet emission than those grown with Ar.     

Selective growth of Ge nanowires by low-temperature thermal evaporation

High-quality single-crystalline Ge nanowires with electrical properties comparable to those of bulk Ge have been synthesized by vapor-liquid-solid growth using Au growth seeds on SiO(2)/Si(100) substrates and evaporation from solid Ge powder in a low-temperature process at crucible temperatures down to 700?°C. High nanowire growth rates at these low source temperatures have been identified as being due to sublimation of GeO from substantial amounts of GeO(2) on the powder. The Ge nanowire synthesis from GeO is highly selective at our substrate temperatures (420-500?°C), i.e., occurs only on Au vapor-liquid-solid growth seeds. For growth of nanowires of 10-20?μm length on Au particles, an upper bound of 0.5?nm Ge deposition was determined in areas of bare SiO(2)/Si substrate without Au nanoparticles.     

One-dimensional growth induced by thermal stress

Amorphous SiO_x nanowires grown on the surface of big Ag particles were synthesized by evaporation of a mixture of SiO and Ag₂O. The morphologies at different growth stages hint at a special kind of growth mechanism different from the classical vapor–liquid–solid (V–L–S) mechanism and oxygen assistant mechanism. A layer of SiO_x wraps the Ag particles in the cooling process. The SiO_x nanowire growth is induced by the thermal stress accumulated in the interface of the outer SiO_x layer and Ag particles for different shrinking coefficients. When the thermal stress accumulates to a certain degree, the SiO_x layer chaps and peels off from the Ag particles to form SiO_x nanowires.     

Coexistence of Vapor–Liquid–Solid and Vapor–Solid–Solid Growth Modes in Pd‐Assisted InAs Nanowires

During the growth of InAs nanowires from Pd catalyst particles on InAs(111)A substrates, two distinct classes of nanowires are observed with smooth or zigzagged sidewalls. It is shown that this is related to a bimodal distribution of the wire‐tip diameter: above a critical diameter wires grow with smooth sidewalls, and below with zigzagged morphology. Transmission electron microscopy analysis shows that the catalyst particles at the tip of zigzagged wires are smooth and have a higher aspect ratio than those at the tip of smooth wires. Zigzagged wires grow from liquid particles in the vapor–liquid–solid (VLS) mode whereas the smooth ones grow from solid particles in the vapor–solid–solid (VSS) mode.     

Gold‐Catalyzed Vapor–Liquid–Solid Germanium‐Nanowire Nucleation on Porous Silicon

Nanoporous Si(111) substrates are used to study the effects of Au catalyst coarsening on the nucleation of vapor–liquid–solid‐synthesized epitaxial Ge nanowires (NWs) at temperatures less than 400 °C. Porous Si substrates, with greater effective interparticle separations for Au surface diffusion than nonporous Si, inhibit catalyst coarsening and agglomeration prior to NW nucleation. This greatly reduces the variation in wire diameter and length and increases the yield compared to nucleation on identically prepared nonporous Si substrates.     

Growing Oxide Nanowires and Nanowire Networks by Solid State Contact Diffusion into Solution‐Processed Thin Films

New techniques to directly grow metal oxide nanowire networks without the need for initial nanoparticle seed deposition or postsynthesis nanowire casting will bridge the gap between bottom‐up formation and top‐down processing for many electronic, photonic, energy storage, and conversion technologies. Whether etched top‐down, or grown from catalyst nanoparticles bottom‐up, nanowire growth relies on heterogeneous material seeds. Converting surface oxide films, ubiquitous in the microelectronics industry, to nanowires and nanowire networks by the incorporation of extra species through interdiffusion can provide an alternative deposition method. It is shown that solution‐processed thin films of oxides can be converted and recrystallized into nanowires and networks of nanowires by solid‐state interdiffusion of ionic species from a mechanically contacted donor substrate. NaVO₃ nanowire networks on smooth Si/SiO₂ and granular fluorine‐doped tin oxide surfaces can be formed by low‐temperature annealing of a Na diffusion species‐containing donor glass to a solution‐processed V₂O₅ thin film, where recrystallization drives nanowire growth according to the crystal habit of the new oxide phase. This technique illustrates a new method for the direct formation of complex metal oxide nanowires on technologically relevant substrates, from smooth semiconductors, to transparent conducting materials and interdigitated device structures.