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研究了多元纳米复合ZnO电压敏粉体在高温下的烧结行为.应用晶粒生长的动力学方程Gn-G0=K0texp(-Q/RT),确定了晶粒生长的动力学指数n和激活能Q.实验结果表明,随着烧结温度的提高和保温时间的延长,ZnO压敏陶瓷的晶粒不断长大,其动力学指数n=3.2,激活能Q=(185±28)kJ/mol. 相似文献
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纳米Y-TZP材料烧结过程晶粒生长的分析 总被引:16,自引:0,他引:16
分析了无压烧结、热压烧结及SPS烧结过程中晶粒生长的行为及表现活化能.结果表明:在1100~1300℃之间,纳米Y-TZP材料在以上几种烧结条件下的晶粒生长行为不同.无压烧结时晶粒生长较慢,而热压烧结和SPS烧结时晶粒生长较快.对晶粒生长的活化能分析可在一定程度上解释以上现象.分析结果显示:无压烧结的表观活化能为281kJ/mol与纳米Y-TZP材料的晶界扩散活化能相近;热压烧结过程中,由于外压对扩散的促进作用,活化能比无压烧结时略有降低;在SPS烧结过程中,由于外加的脉冲电流能使晶粒表面大大活化,所以活化能与无压烧结相比大幅度下降. 相似文献
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微波烧结氧化锌压敏电阻的致密化和晶粒生长 总被引:4,自引:0,他引:4
研究了微波烧结的ZnO压敏电阻的致密化和生长动力学, 微波烧结温度从900~1200℃, 保温时间从20min~2h. 研究表明, 微波烧结ZnO压敏电阻的物相组成和传统烧结的样品没有区别; 微波烧结有助于样品的致密化, 并降低致密化温度. 随着烧结温度的升高, 致密化和反致密化作用共同影响样品的密度, 其中Bi的挥发是主要影响因素. 微波烧结ZnO压敏电阻的晶粒生长动力学指数为2.9~3.4, 生长激活能为225kJ/mol, 传统烧结的ZnO压敏电阻的晶粒生长动力学指数为3.6~4.2, 生长激活能为363kJ/mol. 液相Bi2O3、尖晶石相和微波的“非热效应”是影响微波烧结ZnO压敏电阻陶瓷晶粒生长的主要因素. 相似文献
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氧化锌纳米晶体的生长及生长机理分析 总被引:1,自引:0,他引:1
采用沉淀法生长了不同粒径且性能良好的氧化锌纳米晶体,探讨了晶粒尺寸与煅烧温度的变化关系,研究了ZnO纳米晶体的生长机理.通过实验验证了在中间产物Zn(OH)2中加入NH4HCO3后,ZnO纳米晶体实现了局域生长,很好地阻碍了晶核的过度生长,从而使生成的ZnO纳米晶体保持很小的粒径.煅烧温度较低时,ZnO纳米晶体的生长模式为正常扩散生长,煅烧温度在800℃时,发生了竞争生长现象. 相似文献
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活性炭载体对TiO2/活性炭中二氧化钛晶粒生长及相变的影响 总被引:18,自引:0,他引:18
以活性炭为载体,采用溶胶-凝胶法制备了TiO2/活性炭(TiO2/AC)复合体,并利用SEM和XRD手段对复合体进行表征,通过Dt2=ktnexp(-E/RT)方程的计算,分析,研究活性炭对复合体中TiO2晶粒生长及其相变的影响.结果表明TiO2/AC复合体晶粒粒径增长的时间比TiO2本体短;TiO2/AC复合体纳米粒子平均尺寸为50nm比TiO2本体小;锐钛矿向金红石转变的相变温度和晶粒生长最快温度TiO2/AC复合体比TiO2本体高.锐钛矿和金红石晶粒生长的表观活化能TiO2/AC复合体分别为6.21±1.27和46.54±1.56kJ/mol,TiO2本体分别为5.764±1.02和36.4±1.14kJ/mol.在锐钛矿阶段和金红石阶段TiO2/AC复合体反应指数分别为0.19和0.35,而TiO2本体分别为0.13和0.26.原因是活性炭的强吸附力和非晶相层对TiO2晶粒生长的阻遏作用. 相似文献
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半导体ZnO单晶生长的技术进展 总被引:6,自引:0,他引:6
ZnO单晶是一种具有半导体、发光、压电、电光、闪烁等性能的多功能晶体材料。近年来,它在紫外光电器件和GaN衬底材料等方面的应用前景而使其成为新的研究热点。本文综述了ZnO单晶助熔剂法、水热法、气相法等生长技术的研究进展,结合ZnO单晶的化学结构,探讨了该晶体的结晶习性及生长技术发展方向。 相似文献
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Grain growth of ZnO during liquid-phase sintering of binary ZnO-V2O5 ceramics has been studied for V2O5 contents from 0.5 to 4 mol% and sintering from 900°C to 1200°C. The results are discussed and compared with previous studies in terms of the phenomenological kinetic grain growth expression:
G
n – G
o
n
= K
o
t exp(–Q/RT).Addition of V2O5 is found to decrease the ZnO grain growth exponent, n, as well as the apparent activation energy, Q. The activation analysis also reveals a change in the rate-controlling mechanism for ZnO grain growth. Following a low-V2O5-content (2 mol%) of nearly constant Q values of about 88 kJ/mol, further V2O5 additions cause an increase of the Q value to about 115 kJ/mol. Consistent with accepted models of liquid-phase sintering, it is concluded that the rate-controlling mechanism of ZnO grain growth during liquid-phase sintering in the presence of V2O5 changes from one of a phase-boundary reaction at low V2O5 levels to one of diffusion through the liquid phase at more than 2 mol% V2O5 levels. 相似文献
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ZnO宽带隙半导体及其基本特性 总被引:2,自引:0,他引:2
ZnO半导体是宽带隙半导体领域中继GaN和SiC之后的研究热点.同时,作为一种氧化物半导体,ZnO半导体在能带结构、晶格缺陷、抗辐照特性以及电学性质等方面具有特殊性,已有的研究中还存在一些不同的认识.本工作在阐述ZnO的晶体结构和基本性质基础之上,对其能带结构和缺陷特征、电子输运以及P型掺杂等主要的半导体特性研究现状进行了较为全面综述和分析.由于ZnO半导体具有高的激子束缚能、优良的电子输运性质、强抗辐照特性以及低成本和环境友好等显著特征,它是未来半导体光电子领域极具应用潜力的新一代宽带隙半导体材料,但是到目前为止,p型掺杂技术仍然是ZnO半导体器件面临的最大挑战. 相似文献
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采用配位均匀共沉淀法成功制备出了粒径20~50nm的Ag/ZnO纳米复合材料,用TG-DTA、XRD、IR及TEM等技术对前驱物及不同温度下焙烧前驱物所得的产品进行了表征分析.结果表明,当前驱物的焙烧温度为300℃时,粒子呈球形,粒径小,且其粒径随前驱物焙烧温度的升高而增大.对Ag/ZnO晶粒生长动力学的研究发现,在较低温度范围内,晶粒生长速度较快,其晶粒生长动力学指数为1.32. 相似文献
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In this work, nano-sized ZnO particles were prepared by a direct precipitation method with Zn(NO3)2·6H2O and NH3·H2O as raw materials, and the impact of the synthesis process was studied. The optimal thermal calcined temperature of precursor precipitates of ZnO was obtained from the differential thermal analysis (DTA) and the thermal gravimetric analysis (TGA) curves. The purity, microstructure, morphology of the calcined ZnO powders were studied by X-ray diffraction (XRD), energy dispersive X-ray spectrum (EDS), scanning electron microscopy (SEM), and transmission electron microscopy (TEM). The synthesized ZnO powders had a wurtzite structure with high purity. The final products were of flower-like shape and the nanorods which consisted of the flower-like ZnO bunches were 20–100 nm in diameter and 0.5–1 μm in length. The effect of process conditions on the morphology of ZnO was discussed. 相似文献
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The zinc oxide varistor with a low threshold voltage and large grain size was derived with ZnO crystalline seeds from a molten salt process The chemical composition and I-V characteristics of single grains and single grain boundaries were determined by means of energy dispersive spectrum (EDS) and microcontact measurement respectively. Temperatu re dependence of dielectric loss at various frequencies and voltage dependence of capacitance were carefully measured. Based on these experimental data. the barrier heights of giain boundaries are estimated to be 0.2. 0.5 and 0.6 eV respectively corresponding to thick, th in and direct contact grain boundaries. In addition. a computerized electrical circuit simufation is employed in simulating I-V characteristics of single grain boundary within ZnO varistor. By adjustjng parameters of resistor and diode, a general agreement between the measured data and simulated curves is achieved 相似文献
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《Materials Science & Technology》2013,29(11):1136-1144
AbstractThe processes and mechanisms controlling grain growth in crystalline solids are reviewed. The driving forces governing the overall process are considered, and a distinction is made between normal and anomalous grain growth. The influence of solutes and dispersions (soluble and insoluble, coherent and incoherent) is discussed. Recent experimental studies of grain growth in model and commercial materials are surveyed.MST/1297 相似文献
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Gang JI Shishen YAN Yanxue CHEN Qiang CAO Wei XIA Yihua LIU Liangmo MEI Ze ZHANG 《材料科学技术学报》2008,24(3):415-418
2x (FeNi/CoZnO)/ZnO/(CoZnO/Co) x2 spin-inJection devices were prepared by sputtering and photo-lithography. In the devices, two composite magnetic layers 2x(FeNi/CoZnO) and (CoZnO/Co)x2 with different coercivities were used to fabricate the ZnO-based semiconductor spin valve. Since the CoZnO ferromagnetic semiconductor layers touched the ZnO space layer directly, the significant spin injection from CoZnO into ZnO was observed by measuring the magnetoresistance of the spin-injection devices. The magnetoresistance reduced linearly with increasing temperature, from 1.12% at 90 K to 0.35% at room temperature. 相似文献