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1.
丁扣宝  黄大海 《电子学报》2013,41(5):1016-1018
 提出了一种新的集成电路ESD防护器件的TLP仿真方法,该方法类似于实际的TLP测量过程,在器件结构上施加一系列电流脉冲,获得相应的电压-时间曲线。分别截取每个电流脉冲及其电压响应70%~90%部分的平均值,取得的每一对电压和电流平均值作为I-V曲线上的一点,从而得到电流-电压特性曲线。在此基础上,不仅可得到触发电压Vt1和维持电压Vh,而且可以获取二次击穿电流It2。对LSCR的仿真结果表明仿真结果与测试结果符合的很好。  相似文献   

2.
ESD设计是SOI电路设计技术的主要挑战之一,文章介绍了基于部分耗尽0.6μm SOI工艺所制备的常规SOI NMOS器件的ESD性能,以及采用改进方法后的SOI NMOS器件的优良ESD性能。通过采用100ns脉冲宽度的TLP设备对所设计的SOI NMOS器件的ESD性能进行分析,结果表明:SOI NMOS器件不适合...  相似文献   

3.
随着芯片集成度的不断提高,内部互连导线间距越来越小,器件更易在静电作用下受到损害。为提高印制电路板(PCB)在实际应用中抗静电放电(ESD)和电磁脉冲(EMP)的能力,制作了一种高分子电压诱导变阻膜,将其嵌入PCB中形成脉冲吸收网络,使全板具备抗瞬变脉冲能力,实现对ESD和EMP的全系统防护。ESD防护实测结果表明,对比普通PCB,全抗脉冲PCB对静电脉冲有更快的响应速度和更高的释放效率;传输线脉冲(TLP)测试结果表明,采用电压诱导变阻膜的PCB中每一点都具有过电压脉冲吸收能力,电流泄放能力可达50 A以上。  相似文献   

4.
比较了传输线脉冲(TLP)波形和人体金属模型(HMM)波形作为静电放电(ESD)防护器件测试注入波形时的测试精确度,强调了在动态测试中使用TLP的优势。从微观机理角度分析,计算了载流子输运方程与电流连续性方程,提出了聚合物材料ESD抑制器的防护性能表征参量。设计和搭建了等效ESD测试系统模型,通过TLP方法研究了膜状ESD抑制器的防护性能。结果表明,膜状聚合物ESD抑制器有良好的静态、动态防护特性,同时薄型覆膜结构更适合有高频多点防护需求的电路设计。  相似文献   

5.
研究了基于0.18μm部分耗尽型绝缘体上硅(PDSOI)工艺的静电放电(ESD)防护NMOS器件的高温特性。借助传输线脉冲(TLP)测试系统对该ESD防护器件在30~195℃内的ESD防护特性进行了测试。讨论了温度对ESD特征参数的影响,发现随着温度升高,该ESD防护器件的一次击穿电压和维持电压均降低约11%,失效电流也降低近9.1%,并通过对器件体电阻、源-体结开启电压、沟道电流、寄生双极结型晶体管(BJT)的增益以及电流热效应的分析,解释了ESD特征参数发生上述变化的原因。研究结果为应用于高温电路的ESD防护器件的设计与开发提供了有效参考。  相似文献   

6.
基于0.18μm Bipolar CMOS-DMOS(BCD)工艺,研究讨论了双向可控硅静电防护器件中p型井(PW)位置对器件维持电压以及鲁棒性的静电性能影响,可用于高压静电放电(ESD)保护。利用二维器件仿真平台和传输线脉冲测试系统(TLP),预测和验证了PW的尺寸在高压工艺下对双向对称可控硅性能的影响。测量结果表明,在不增加器件面积的情况下,通过高压对称DDSCR器件PW层次的左侧边界位置缩进,所得的DDSCR_PW器件的正向维持电压(Vh)虽然从30.15 V降低到15.63 V,反向维持电压从26.15 V降低到16.85 V,但与高压对称DDSCR器件相比,高压对称DDSCR_PW器件具有提升失效电流的优点,其正向失效电流从6.68 A增加到18.22 A,反向失效电流从7.07 A增加到9.92A,论文阐述了产生此现象的原因。  相似文献   

7.
集成电路ESD设计验证技术   总被引:1,自引:0,他引:1  
传输线脉冲(TLP)测试是当前电路设计工程师研究ESD保护器件特性和进行ESD加固设计的有力工具.分析了ESD应力作用下MOSFET的工作原理,指出精确测试保护器件或电路在ESD大电流应力下的I-V特性曲线,提取特征参数,将有利于ESD加固设计的一次成功;通过对典型TLP测试波形的分析,将TLP试验与器件的大电流响应建立联系;最后对扩散电阻和nMOSFET的TLP典型I-V特性进行了分析,并给出了实际的设计参数.  相似文献   

8.
ESDALCXX-1U2系YIIESD保护二极管产品比上一代缩小67%,能够承受最严格的IEC61000-4—2标准的ESD测试脉冲,低钳位电压特性有助于提高对调制解调器等低压芯片的保护性能。新系列包括ESDALC3V91U2、ESDALC6V1—1U2和IESDALC14V2—1U2三款产品,击穿电压分别为3.9V、6.1V和14.2V。三款产品均可承受IEC61000424级标准的脉冲峰压的多次冲击,该标准规定接触放电脉冲和电涌分别为8kV和30A。ESDALCxx—1U2的其他优点包括低泄漏电流和低器件电容,低泄漏电流可以使电池耗电量达到最小化,6pF或12pF的电容可最大限度降低对信号速度的影响。  相似文献   

9.
在CMOS集成电路设计中,工艺尺寸不断减小、栅氧厚度不断变薄,对ESD提出更高的要求。尤其在射频集成电路中,ESD的寄生电容对射频性能将产生不可忽略的影响。基于二极管正向偏置对ESD电流的泄放能力,通过引入电感和电容对ESD脉冲的精确模拟,通过设计有效的有源RC电源钳位电路,考虑到版图电阻电容寄生对ESD的射频性能的影响,提出3种版图设计,对各种版图进行了仿真,分析ESD和射频性能,提出了最优的版图,满足射频集成电路应用的ESD保护电路。  相似文献   

10.
静电释放(ESD)是指电荷在两个电势不等的物体之间转移的物理现象,它存在于人们日常工作生活的任意环节。随着集成电路特征尺寸不断减小、集成度不断增高,芯片对ESD也变得越来越敏感。为了用尽可能小的版图面积来实现ESD防护,利用晶闸管结构(SCR)来实现集成电路的ESD防护已成为当下的研究热点。但传统SCR的维持电压和维持电流都很低,若直接将其应用于电源ESD防护则会导致严重的闩锁效应(latch-up)。基于高维持电流设计窗口,提出一种可用于15 V电路的抗闩锁SCR器件,并通过混合仿真验证了该器件的有效性。  相似文献   

11.
DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.  相似文献   

12.
From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.  相似文献   

13.
The relation between the power of the Brillouin signal and the strain is one of the bases of the distributed fiber sensors of temperature and strain. The coefficient of the Bfillouin gain can be changed by the temperature and the strain that will affect the power of the Brillouin scattering. The relation between the change of the Brillouin gain coefficient and the strain is thought to be linear by many researchers. However, it is not always linear based on the theoretical analysis and numerical simulation. Therefore, errors will be caused if the relation between the change of the Brillouin gain coefficient and the strain is regarded as to be linear approximately for measuring the temperature and the strain. For this reason, the influence of the parameters on the Brillouin gain coefficient is proposed through theoretical analysis and numerical simulation.  相似文献   

14.
The parallel thinning algorithm with two subiterations is improved in this paper. By analyzing the notions of connected components and passes, a conclusion is drawn that the number of passes and the number of eight-connected components are equal. Then the expression of the number of eight-connected components is obtained which replaces the old one in the algorithm. And a reserving condition is proposed by experiments, which alleviates the excess deletion where a diagonal line and a beeline intersect. The experimental results demonstrate that the thinned curve is almost located in the middle of the original curve connectivelv with single pixel width and the processing speed is high.  相似文献   

15.
Today, micro-system technology and the development of new MEMS (Micro-Electro-Mechanical Systems) are emerging rapidly. In order for this development to become a success in the long run, measurement systems have to ensure product quality. Most often, MEMS have to be tested by means of functionality or destructive tests. One reason for this is that there are no suitable systems or sensing probes available which can be used for the measurement of quasi inaccessible features like small holes or cavities. We present a measurement system that could be used for these kinds of measurements. The system combines a fiber optical, miniaturized sensing probe with low-coherence interferometry, so that absolute distance measurements with nanometer accuracy are possible.  相似文献   

16.
Waveguide multilayer optical card (WMOC) is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling & processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic (VB) language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.  相似文献   

17.
This paper presents a new method to increase the waveguide coupling efficiency in hybrid silicon lasers. We find that the propagation constant of the InGaAsP emitting layer can be equal to that of the Si resonant layer through improving the design size of the InP waveguide. The coupling power achieves 42% of the total power in the hybrid lasers when the thickness of the bonding layer is 100 nm. Our result is very close to 50% of the total power reported by Intel when the thickness of the thin bonding layer is less than 5 nm. Therefore, our invariable coupling power technique is simpler than Intel's.  相似文献   

18.
The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.  相似文献   

19.
Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.  相似文献   

20.
An insert layer structure organic electroluminescent device(OLED) based on a new luminescent material (Zn(salen)) is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn(salen)/Liq/LiF/A1/CuPc/NPD/Zn(salen)/Liq/LiF/A1. Effective insert electrode layers comprising LiF(1nm)/Al(5 nm) are used as a single semitransparent mirror, and bilayer cathode LiF(1 nm)/A1(100 nm) is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.  相似文献   

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