掺氮ZnSe外延层的光致发光研究

报导了掺氮ＺｎＳｅ外延层的光致发光,研究了与氮受主有关的发光峰随温度和激发强度的变化关系．１０Ｋ下施主－受主对发光峰随激发强度的增加向高能方向移动,且峰强呈现饱和趋势．在１０～３００Ｋ温度范围光致发光谱表明,随着温度增加,由于激子在受主束缚激子态和施主束缚激子态之间转移,施主束缚激子发光峰强度相对受主束缚激子发光峰强度增加     

纤锌矿应变GaN柱形量子点中离子受主束缚激子的带间光跃迁

在有效质量近似基础上,考虑强的内建电场效应,变分计算了纤锌矿结构的GaN柱形量子点中带电量为 的离子受主束缚激子(A?, X)的发光波长。结果表明,离子受主束缚激子发光波长强烈依赖于量子点的尺寸（高度和半径）、离子受主杂质的位置和垒中Al含量。随着量子点高度、半径及垒中Al含量的增加,离子受主束缚激子发光波长增大。随着离子受主杂质从量子点左边垒中沿z轴方向移至量子点左边界时,发光波长先增大,在量子点的左界面附近达到极大值;随着离子受主杂质在量子点内继续右移,发光波长减小,当杂质位于量子点的右边界附近时光跃迁波长达到极小值;进一步右移离子受主杂质至量子点的右边垒中时,发光波长增大。和自由激子光跃迁波长相比,当离子受主杂质位于量子点中心的左边时,杂质的引入使发光波长增大,当离子受主杂质位于量子点中心的右边时,杂质的引入使发光波长减小。     

Mg_xZn_(1-x)O单晶薄膜和MgZnO/ZnO异质结构的光学性质

报道了利用等离子辅助分子束外延技术,在蓝宝石c平面上外延生长的Mgx Zn1 - x O单晶薄膜以及Mg Zn O/Zn O异质结构的光学性质.室温下随着Mg浓度增加,合金薄膜样品的发光峰与吸收边均向高能侧移动.研究了样品紫外发光的起因,将Mgx Zn1 - x O合金薄膜的发光归结为束缚激子的复合.在Mg0 .0 8Zn0 .92 O/ Zn O样品中,观察到了分别来自于Zn O层和Mg Zn O盖层的发光和吸收,并将其归因于来自Zn O层的自由激子和Mg Zn O盖层的束缚激子发射     

MgxZn1-xO单晶薄膜和MgZnO/ZnO异质结构的光学性质

报道了利用等离子辅助分子束外延技术,在蓝宝石c平面上外延生长的MgxZn1-xO单晶薄膜以及MgZnO/ZnO异质结构的光学性质.室温下随着Mg浓度增加,合金薄膜样品的发光峰与吸收边均向高能侧移动.研究了样品紫外发光的起因,将MgxZn1-xO合金薄膜的发光归结为束缚激子的复合.在Mg0.08Zn0.92O/ZnO样品中,观察到了分别来自于ZnO层和MgZnO盖层的发光和吸收,并将其归因于来自ZnO层的自由激子和MgZnO盖层的束缚激子发射.     

纳米ZnO光学性质研究进展

介绍了纳米ZnO常见发光谱的发光机制。在室温光致发光谱(PL)中,一般在380 nm处出现紫外发光,也有报道在357和377 nm处的紫外发光,列举了几种不同的发光解释。对于深能级发光,一般在400～550 nm出现连续的发光带,也有观察到深能级的声子伴线和声子复制现象。在低温光致发光谱的紫外发射中,一般观察到由自由激子发射(FX)、中性施主束缚激子发射(D0X)、施主-受主对跃迁峰(DAP)、中性施主束缚激子对应的双电子卫星峰(TES)以及声子伴线。综述了纳米ZnO的喇曼光谱、透射光谱、电致发光谱(EL)的特征,最后展望了纳米ZnO的光学性能研究前景。     

CdTe单晶中主要中性受主束缚激子起因的研究

本文使用高纯度和高品位的单晶材料,通过Ｃｕ掺杂和退火实验,利用光致发光研究了ＣｄＴｅ发光光谱中１．５８９６ｅＶ处的主要中性受主束缚激子发光的起因．结果表明,该发光峰实际上是由能量极其相近的两个发光峰构成．它们具有两个起因,其中能量较低的一个是ＣｕＣｄ,另一个与Ｃｄ空位ＶＣｄ有关．     

ZnSe薄膜的激子光谱

采用分子束外延 (MBE)技术 ,在 Ga As(1 0 0 )衬底上生长了厚度从 0 .0 4 5到 1 .4μm的 Zn Se薄膜 .X射线衍射谱证实 ,随着薄膜厚度的增加 ,应变逐步弛豫 .测量了低温下样品的反射谱和光致发光谱 ,观察到轻重空穴的能级在不同应变下的分裂、移动和反转 ,以及激子极化激元 (Po-lariton)对反射谱的影响 .也观察到束缚激子发光随着薄膜厚度的变化规律 :束缚在中性受主杂质上的束缚激子发光 (I1峰 )随着薄膜厚度的增加逐渐变弱直至消失 ,而束缚在中性施主杂质上的束缚激子发光 (I2 峰 )则随着厚度增加逐渐增强 .     

掺施主和受主的GaP:N发光的热猝灭

对GaP:N(Te,Zn)中束缚激子发光热猝灭的测量和分析表明,中性Te原子以“俄歇阻断”作用,在NN对发光猝灭温度相对于不掺施主和受主的GaP:N有所降低方面起了关键的影响。掺Te后孤立N发光峰的猝灭温度提高,则是由于增加了N原子上电子分布的几率。这支持了N束缚激子的Hopfield-Thomas-Lyneh模型。受主Zn的作用是使自由激子发光随温度升高而缓慢增强,对A峰猝灭的减缓可能也有贡献。     

ZnSe薄膜的激子光谱

采用分子束外延(MBE)技术,在GaAs(100)衬底上生长了厚度从O.045到1.4μm的ZnSe薄膜.X射线衍射谱证实,随着薄膜厚度的增加,应变逐步弛豫.测量了低温下样品的反射谱和光致发光谱,观察到轻重空穴的能级在不同应变下的分裂、移动和反转,以及激子极化激元(Polariton)对反射谱的影响.也观察到束缚激子发光随着薄膜厚度的变化规律:束缚在中性受主杂质上的束缚激子发光(I1峰)随着薄膜厚度的增加逐渐变弱直至消失,而束缚在中性施主杂质上的束缚激子发光(I2峰)则随着厚度增加逐渐增强.     

高激发功率GaP：N发光谱的影响

讨论了掺氮磷化镓（GaP:N）荧光光谱的峰值强度（孤立氮等电子中心束缚激子发光峰A、最邻近N－N对束缚激子发光峰NH1和次邻近N－N对束缚激子发光峰NN3）随激发强度的变化规律,并在发光跃迁动力学方程中计入了由于高激发密度引起的样品温度升高,而导致孤立氮A的能级NA和最邻近N－N对NH1的能级的热激发的增强,得到了R（即最近N-N对（NH1）束缚激子发光峰与孤立N等电子中心束缚激子发光峰的强度比INN1／IA）与掺N浓度和激光发光强的变化关系。利用实验数据进行拟合,得到了更好的拟合结果,并讨论了用此法计算GaP:N样品中氮浓度时应注意的一些问题。     

Photoluminescence measurements on undoped CdZnTe grown by the high-pressure bridgman method

The low temperature photoluminescence of Cd_0.91Zn_0.09Te grown by the high-pressure Bridgman (HPB) method exhibits a neutral donor bound exciton emission (D⁰X) at 1.65603 eV with its excited state (D⁰X^*) at 1.65798 eV and neutral acceptor bound exciton emissions (A⁰X) at 1.64566 eV and 1.65201 eV. Assuming a direct generation and subsequent relaxation of excitons at the D⁰X^* state, we demonstrate that the temporal evolution of the above emission bands is well reproduced by a set of rate equations. The resultant radiative-lifetime of 1.4 ns for the D⁰X and 1.5 and 2.0 ns for the A⁰Xs are compared with various CdZnTe's (CZTs) grown by the other methods to demonstrate the particular nature of the HPB CZT.     

Annealing effects of a high-quality ZnTe substrate

The sharp photoluminescence (PL) and optical-reflection spectra in the bandedge region of the high-quality nondoped ZnTe substrate (100) were observed at 4.2 K. Free exciton, associated with lower and upper polaritons (EX^L and EX^U) at 2.382 eV and 2.381 eV, respectively, were clearly observed. This meant that this substrate was high quality. The intensity of a bound exciton peak (2.375 eV), which is caused by a Zn vacancy, of a neutral acceptor decreased with an increase of the Zn vapor pressures.     

非掺杂n型氮化镓外延层的光致发光

研究了热处理对非掺杂 n型氮化镓外延层光致发光谱的影响和光谱中各发光带强度与温度之间的关系 .热处理后 ,光谱中的带边峰和黄光峰的强度较热处理前都有明显降低 .黄光峰强度随温度升高的衰减速度要比带边峰慢得多 .由这些实验结果得出结论 :光谱中的带边峰是由自由激子和束缚在一浅施主能级的束缚激子的谱线重合而成 ,这个浅施主能级很有可能是由氮空位产生 ;黄色荧光的机制应为自由电子或施主能级向深受主能级的跃迁 ,并且黄色荧光肯定和氮化镓中的一内部缺陷产生的深受主能级有关 ,该内部缺陷很有可能是镓空位 .     

非掺杂n型氮化镓外延层的光致发光

研究了热处理对非掺杂n型氮化镓外延层光致发光谱的影响和光谱中各发光带强度与温度之间的关系．热处理后,光谱中的带边峰和黄光峰的强度较热处理前都有明显降低．黄光峰强度随温度升高的衰减速度要比带边峰慢得多．由这些实验结果得出结论：光谱中的带边峰是由自由激子和束缚在一浅施主能级的束缚激子的谱线重合而成,这个浅施主能级很有可能是由氮空位产生;黄色荧光的机制应为自由电子或施主能级向深受主能级的跃迁,并且黄色荧光肯定和氮化镓中的一内部缺陷产生的深受主能级有关,该内部缺陷很有可能是镓空位．     

Low-Temperature Photoluminescence Study of CdTe:In Crystals Annealed in Molten Bismuth

We used a low-temperature photoluminescence (PL) technique to investigate CdTe:In crystals after annealing in molten bismuth (Bi). The two annealed samples showed different resistivities after the treatment. For both samples, we observed very strong emissions in the excitonic spectral region and revealed fine structures of exciton emissions in the PL spectrum. In the sample with high resistivity, we found one ionized donor-bound exciton peak, (D⁺,X), that we ascribed to incorporated Bi atoms occupying Cd sites in the CdTe. The temperature dependence of the (D⁺,X) peak emission had an associated activation energy of 3.59 meV for the exciton bound to this ionized donor. Meanwhile, a donor–acceptor pair peak at 1.5315 eV, which was absent from the PL of the low-resistivity sample, suggested the likelihood of some Bi atoms occupying Te sites in the high-resistivity sample. Our findings highlight the need for detailed investigation of annealing conditions to ensure precise control of the electrical properties of the material during annealing in molten Bi.     

Electrical and optical properties of lodine doped CdZnTe layers grown by metalorganic vapor phase epitaxy

Electrical and photoluminescence properties of iodine doped CdZnTe (CZT) layers grown by metalorganic vapor phase epitaxy have been studied. Doped layers showed an n-type conductivity from the Zn composition x=0 (CdTe) to 0.07. Above x=0.07, resistivities of doped layers increased steeply up to 10⁶ Ω-cm. Resistivities of doped CZT layers were higher than those of undoped layers above x=0.6. Photoluminescence intensity of doped layers increased compared to undoped layers. Doped CdTe and ZnTe layers showed neutral donor bound exciton emission lines at the exciton related region. Also, these layers showed an increase in emission intensity at the donor acceptor pair recombination bands. Sharp emission lines were observed in doped CZT layers at around 1.49 eV. These emission lines were considered to be originated from GaAs substrates which were optically excited by the intense emission from doped CZT layers.     

Preparation of ZnO:N films by radical beam gettering epitaxy

ZnO:N epitaxial films are obtained by radical beam gettering epitaxy. The properties of the films are studied using X-ray diffraction, atomic-force microscopy, secondary-ion mass spectroscopy, and photoluminescence. A narrow (002) peak is observed in the X-ray diffraction spectra, which indicates that the ZnO:N films are oriented along the c axis. Secondary-ion mass spectroscopy indicates that N is present in the ZnO films. In the low-energy luminescence spectrum of the ZnO:N films, a peak at 3.31 eV is observed. This peak is presumably attributed to the exciton bound at the neutral acceptor N_O. The postannealing of the ZnO:N films was carried out in atomic oxygen. The nature of the donor-acceptor (3.23 eV) and green (2.56 eV) luminescence bands is discussed.     

Exciton localisation at impurity pairs in zinc telluride and indium phosphide

We report undulation spectra in acceptor doped ZnTe and InP. The strong increase in exciton localisation energy in the presence of a second neutral acceptor produces a perturbation in transition energy much larger than that from the background electric field due to compensated acceptors. We suggest that the undulations arise from fluctuations in the intensity of luminescence at relatively close pairs due to quasi-regular smooth variations in the envelope of the density of available pair states as a function of pair separation and therefore transition energy. The form of the intensity distribution in the low temperature spectra and its dramatic evolution with temperature can be explained by phonon-assisted tunneling transfer. Anti-Stokes phonon assisted tunneling between well localised exciton states at close acceptor pairs and extended states at acceptors in average concentration environments above the threshold for Anderson delocalisation is responsible for the change in spectral form at higher temperature.