Degradation of AlGaAs/GaAs HBTs induced by hot carriers

In AlGaAs/GaAs HBTs, the instability of the surface states of the extrinsic base, which is revealed by mesa-etching and passivated by Si₃N₄, affects reliability. In this study the reverse constant current stress in an avalanche regime is applied across the emitter–base junction in order to test the stability of the heterojunction and the surface state of the extrinsic base. It has been identified that the surface of the extrinsic base is vulnerable to hot carriers. A new degradation mechanism is suggested and verified by numerical simulation. In addition, a way to improve the reliability is proposed based on the experimental results.     

GaAs/AlGaAs and InGaAs/AlGaAs MODFET inverter simulations

Although MODFET's have exhibited the fastest switching speed for any digital circuit technology, there is as yet no clear consensus on optimal inverter design rules. We therefore have developed a comprehensive MODFET device model that accurately accounts for such high gate bias effects as transconductance degradation and increased gate capacitance. The device model, which agrees with experimental devices fabricated in this laboratory, is used in the simulation of direct-coupled FET logic (DCFL) inverters with saturated resistor loads. Based on simulation results, the importance of large driver threshold voltage not only for small propagation delay times but for wide logic swings and noise margins is demonstrated. Furthermore, minimum delay times are found to occur at small supply voltages as seen experimentally. Both of these results are attributed to the reduction of detrimental high gate bias effects. The major effect of reducing the gate length on delay time is to decrease the load capacitance of the gate. Using 0.25-µm gates, delay times of 5 and 3.6 ps at 300 and 77 K, respectively, are predicted. Finally, the recently introduced In-GaAs/AlGaAs MODFET's are shown to have switching speeds superior to those of conventional GaAs/AlGaAs MODFET's.     

Ultra-submicrometer-gate AlGaAs/GaAs HEMTs

Ultra-submicrometer-gate AlGaAs/GaAs high-electron-mobility transistors (HEMTs) that have gate lengths ranging from 25 to 85 nm and were fabricated using electron-beam lithographic techniques on epitaxial wafers grown by molecular beam epitaxy are discussed. These devices show that velocity overshoot and short-gate geometry effects play an important role for the gate lengths less than 100 nm. The maximum intrinsic transconductance is 215 mS/mm, and the effective saturated electron velocity reaches 3×10⁷ cm/s for a 30-nm HEMT     

超亚微米栅AlGaAs/GaAs HEMT

在分子束外延生长的外延晶片上,用电子束刻蚀技术制作了超亚微米栅AlGaAs/GaAs高电子迁移率晶体管(HEMT),其栅长分布为25～85nm。该器件表明,速度过冲和短栅几何效应对栅长小于100nm的器件起着重要的作用。栅长为30nm的HEMT的最大本征跨导为215mS/mm,有效饱和电子速度可达3×10~7cm/s。     

单量子阱GaAs/AlGaAs半导体激光器

本文介绍了用分子束外延法制作的梯度折射率分别限制式单量子阱GaAs/AlGaAs半导体激光器。该器件具有较低的阈值电流密度和单模运转特性,连续输出功率可达55mw。     

Selfaligned AlGaAs/GaAs HBT grown by MOMBE

The very low parasitic resistance n-p-n GaAs/AlGaAs heterojunction bipolar transistors (HBT) grown by metal organic molecular beam epitaxy (MOMBE) using all gaseous source dopants are reported. The carbon and tin dopants were introduced through the uses of trimethygallium (TMGa) and tetraethyltin (TESn). To achieve the low parasitics, the graded InGaAs emitter cap layer was doped with tin to 5*10/sup 19/ cm/sup -3/ and the doping level in the subcollector was 3*10/sup 18/ cm/sup -3/. The emitter and collector sheet resistances were 25 Omega / Square Operator and 10 Omega / Square Operator , respectively. The 800 AA thick base layer was carbon doped to a level of 7*10/sup 19/ cm/sup -3/. The base contact resistance and sheet resistance were 0.1 Omega mm and 180 Omega / Square Operator , respectively. With a thin AlGaAs surface passivation layer for the emitter-base junction, the common emitter DC current gain was maintained up to 25, even for 2*5 mu m/sup 2/ emitter size devices. The unity short circuit current gain cutoff frequency f/sub T/, and maximum oscillation frequency f/sub max/, were 48 and 63 GHz, respectively.<>     

AlGaAs/GaAs/AlGaAs DHBT's for high-temperature stable circuits

High-temperature devices are required for a large number of industrial applications. In order to demonstrate the feasibility of a high temperature operating circuit on GaAs an operational amplifier was designed and fabricated. A corresponding technology for transistors and circuits for operation up to 300°C with AlGaAs/GaAs/AlGaAs DHBT's is presented. For the amplifier circuit an open loop gain of 49.5 dB at room temperature and 35.8 dB at 200°C was measured, which is in good agreement with the circuit simulation. High temperature stability has been proven by a storage test at 400°C over 1000 h for the ohmic contact metallization and 200 h for the transistors     

AlGaAs/GaAs/AlGaAs渐变异质结光致发光仿真研究

分析了AlGaAs/GaAs/AlGaAs渐变异质结的光致发光特性。根据理论及仿真结果,确定了GaAs发光的最优能带结构为双异质结P-AlGaAs/P-GaAs/P-AlGaAs或者N-AlGaAs/N-GaAs/ N-AlGaAs,并且异质结两边能带渐变。基于所选结构,研究了能带渐变及层宽对发光效率的影响。研究结果表明,外体区吸收层的能带渐变,且外体区激发层的能带不变,发光区域的载流子最多,发光能量值最大。激励光源的波长不同,各层有不同的最优宽度,为器件的整体优化提供了依据。AlGaAs/GaAs/AlGaAs渐变异质结的光致发光研究为高效率器件如太阳电池、发光二极管等的实用化设计、研制提供了有价值的参考。     

Light emission in AlGaAs/GaAs HEMTs and GaAs MESFETs induced by hotcarriers

Light emission in submicrometer gate AlGaAs/GaAs HEMTs and GaAs MESFETs has been observed at high drain bias values (>4.0 V). The spectral distribution of the emitted photons in the 1.7-2.9-eV range does not correspond to a simple Maxwellian distribution function of the electron energies in the channel. Light emission is observed in correspondence with nonnegligible gate and substrate hole currents, due to the collection of holes generated by impact ionization     

Degradation Behavior of 850 nm AlGaAs/GaAs Oxide VCSELs Suffered from Electrostatic Discharge

The effect of forward and reverse electrostatic discharge (ESD) on the electro‐optical characteristics of oxide vertical‐cavity surface‐emitting lasers is investigated using a human body model for the purpose of understanding degradation behavior. Forward ESD‐induced degradation is complicated, showing three degradation phases depending on ESD voltage, while reverse ESD‐induced degradation is relatively simple, exhibiting two phases of degradation divided by a sudden distinctive change in electro‐optical characteristics. We demonstrate that the increase in the threshold current is mainly due to the increase in leakage current, nonradiative recombination current, and optical loss. The decrease in the slope efficiency is mainly due to the increase in optical loss.     

Electron mobility in a AlGaAs/GaAs/AlGaAs quantum well

An oscillatory dependence of the electron mobility on the quantum well (QW) thickness in a AlGaAs/GaAs/AlGaAs heterostructure with double-sided modulation doping has been observed experimentally. A steep decrease in mobility with increasing electron concentration in the QW is established. The conditions for an increase in mobility on introducing a thin barrier into the QW are determined. The first experimental observation of an increase in mobility by a factor of 1.3 in a QW of thickness L=26 nm upon introducing a thin (1–1.5 nm) AlAs barrier is reported.     

AlGaAs/GaAs JFETs by organo-metallic and molecular beam epitaxy

Normally-off and normally-on AlGaAs/GaAs heterojunction gate GaAs FETs (HJFETs) for high-speed logic applications have been fabricated with molecular beam epitaxy (MBE) and organometallic vapour phase epitaxy (OM-VPE). The best normally-off devices used MBE n-GaAs active layers and OM-VPE gate layers of p+-AlGaAs and p+-GaAs. Saturation currents followed a square law and current scaling constants were the highest on record for HJFETs, greater than 50 ?A/?m-V2.     

AlGaAs/GaAs emitter-down HBT fabricated by MBE overgrowth

A planar emitter-down AlGaAs/GaAs heterojunction bipolar transistor (HBT) has been fabricated by a molecular beam epitaxy overgrowth of the n-GaAs collector on top of the base layer after the base layer was formed by beryllium implantation and rapid thermal annealing. The emitter down transistors fabricated by this process had DC current gains of 20, and ring oscillators gave a maximum switching speed of 250 ps/gate.<>     

Ion-implanted GaAs/AlGaAs heterojunction FET's grown by MOCVD

The successful fabrication of an ion-implanted GaAs/AlGaAs heterojunction FET device is discussed. Half-micrometer gate-length FET devices are fabricated by ion implantation into GaAs/AlGa heterostructures grown by metalorganic chemical vapor deposition (MOCVD) on 3-in-diameter GaAs substrates. The FET device exhibits a maximum extrinsic transconductance of 280 mS/mm with reduced transconductance variation over 2 V of gate bias. Excellent microwave performance is achieved with an f_t of 40 GHz, which is comparable to results obtained from 0.25-μm gate GaAs MESFETs. The effects of ion implantation on the heterojunction and corresponding device characteristics are also discussed     

AlGaAs/GaAs superlattice solar cells

A theoretical model is performed to study the viability of the AlGaAs/GaAs superlattice solar cell (SLSC). Using the Transfer Matrix Method, the conditions for resonant tunneling are established for a particular SL geometry with variably spaced quantum wells. The effective density of states and the absorption coefficient are calculated to determinate the J–V characteristic. Radiative, non‐radiative, and interface recombination were evaluated from a modeled SLSC, and their values were compared with a multiple quantum well solar cell of the same aluminum composition. A discussion about the conditions, where SLSC performance overcomes that of a multiple quantum well solar cell, is addressed. Copyright © 2011 John Wiley & Sons, Ltd.     

AlGaAs/GaAs HBT linearity characteristics

Communication systems require linear power amplifiers with high efficiency and very low intermodulation distortion. AlGaAs/GaAs heterojunction bipolar transistors (HBT's) were found to have very low intermodulation distortion in power operation. Two-tone tests were carried out on both common-emitter (CE) and common-base (CB) power HBT's. At 7 GHz, the CE HBT showed -20 dBc IM₃ (third-order intermodulation ratio) and 12% power added efficiency (PAE) per tone at the 1 dB gain compression point; IM₃ dropped to -30 dBc at 1.5 dB output power backoff. The CE HBT has lower intermodulation distortion than CB HBT. Load pull data were collected to aid the understanding of the intermodulation. Parameters of the Gummel-Poon model (as used in SPICE) were derived for HBT's based on dc data and small-signal S parameters at various bias points. The accuracy and validity of the model were confirmed by comparison to experimental two-tone results. SPICE predicts that the emitter and base resistances linearize the HBT and reduce the third-order intermodulation distortion. The excellent third-order intermodulation performance of the CE HBT makes it a very attractive choice for linear power amplifiers     

GaAs/AlGaAs量子级联激光器

利用分子束外延方法生长了激射波长约为9μm的GaAs/Al0.45Ga0.55As量子级联激光器.条宽35μm,腔长2mm的器件准连续激射温度最高达120K,81K下未经收集效率修正的峰值功率超过70mW.     

GaAs/AlGaAs量子级联激光器

利用分子束外延方法生长了激射波长约为9μm的GaAs/Al0.45Ga0.55As量子级联激光器.条宽35μm，腔长2mm的器件准连续激射温度最高达120K，81K下未经收集效率修正的峰值功率超过70mW．