Refractive Index Dynamics and Linewidth Enhancement Factor in $p$-Doped InAs–GaAs Quantum-Dot Amplifiers

Using a pump-probe differential transmission experiment in heterodyne detection, we measured the refractive index dynamics at the ground-state excitonic transition in electrically pumped InAs/GaAs quantum-dot amplifiers emitting near 1.3 $mu{hbox {m}}$ at room temperature. We compare three samples differing only in the level of $p$-doping, and interpret the measured index changes taking into account the gain dynamics in these devices. We find that in absorption, the excess hole density due to $p$-doping accelerates the recovery and reduces the refractive index change, since filling of the hole states by $p$ -doping shifts the induced changes in the hole population toward high energy states. Conversely, in gain, the reduced electron reservoir in the excited states in $p$ -doped devices results in slower gain recovery dynamics and in larger refractive index changes compared to undoped devices operating at the same modal gain. The linewidth enhancement factor inferred from these measurements shows that $p$-doping is effective in reducing this parameter mainly due to the larger differential gain in $p$-doped devices in the gain regime.      

Cyclic Codes and Sequences From Generalized Coulter–Matthews Function

In this paper, we will study the exponential sum $sum_{xin {BBF}_q}chi(alpha x^{(p^k+1)/2}+beta x)$ that is related to the generalized Coulter–Matthews function $x^{(p^k+1)/2}$ with $k/{rm gcd}(m,k)$ odd. As applications, we obtain the following: the correlation distribution of a $p$-ary $m$-sequence and a decimated $m$-sequence of degree ${p^k+1 over 2}$;      

Wafer-Level Packaged Light-Emitting Diodes Using Photodielectric Resin

A large area $(hbox{1600} muhbox{m} times hbox{800} muhbox{m})$ high-brightness light-emitting diode (HB LED) employing rearranged metal pads and multipassivation layers is presented. To enlarge the active layer with a smaller mesa area and improve package productivity using large bonding pads, two electrodes were used to fabricate the LED; a primary electrode was in contact with the $n$, $p$-GaN as a conventional LED, and the second electrode was connected to the primary electrode with a passivation layer having photodielectric resin interposed between them. The LED was directly bonded to the metal-core printed circuit board without wire bonding or epoxy molding. The resultant HB LED has a low forward voltage ( $sim$3.2 V at 350 mA) due to the optimized $n$, $p$ -contact scheme, and an optical power of 75 mW with no encapsulation.      

$hbox{TiN/ZrO}_{2}$/Ti/Al Metal–Insulator–Metal Capacitors With Subnanometer CET Using ALD-Deposited $hbox{ZrO}_{2}$ for DRAM Applications

We provide the first report of the structural and electrical properties of $hbox{TiN/ZrO}_{2}$/Ti/Al metal–insulator–metal capacitor structures, where the $hbox{ZrO}_{2}$ thin film (7–8 nm) is deposited by ALD using the new zirconium precursor ZrD-04, also known as Bis(methylcyclopentadienyl) methoxymethyl. Measured capacitance–voltage ($C$– $V$) and current–voltage ( $I$–$V$) characteristics are reported for premetallization rapid thermal annealing (RTP) in $hbox{N}_{2}$ for 60 s at 400 $^{circ}hbox{C}$, 500 $^{circ}hbox{C}$, or 600 $^{ circ}hbox{C}$. For the RTP at 400 $^{circ}hbox{C}$ , we find very low leakage current densities on the order of nanoamperes per square centimeter at a gate voltage of 1 V and low capacitance equivalent thickness values of $sim$ 0.9 nm at a gate voltage of 0 V. The dielectric constant of $ hbox{ZrO}_{2}$ is 31 $pm$ 2 after RTP treatment at 400 $^{circ}hbox{C}$.      

An Analytical Method to Extract the Physical Parameters of a Solar Cell From Four Points on the Illuminated $J{-}V$ Curve

For a variety of solar cells, it is shown that the single exponential $J{-}V$ model parameters, namely—ideality factor $eta$ , parasitic series resistance $R_{s}$, parasitic shunt resistance $R_{rm sh}$, dark current $J_{0}$, and photogenerated current $J_{rm ph}$ can be extracted simultaneously from just four simple measurements of the bias points corresponding to $V_{rm oc}$, $sim!hbox{0.6}V_{rm oc}$, $J_{rm sc}$, and $sim! hbox{0.6}J_{rm sc}$ on the illuminated $J{-}V$ curve, using closed-form expressions. The extraction method avoids the measurements of the peak power point and any $dJ/dV$ (i.e., slope). The method is based on the power law $J{-}V$ model proposed recently by us.      

Equivalent Circuit Model for the Gate Leakage Current in Broken Down $hbox{HfO}_{2}/hbox{TaN/TiN}$ Gate Stacks

We propose an equivalent circuit model for the post-breakdown (BD) current–voltage ( $I$–$V$) characteristics in $hbox{HfO}_{2}/hbox{TaN/TiN}$ gate stacks in n-MOSFETs. The model consists of two opposite-biased diodes with series resistances and a shunt leakage path. The circuit admits analytical solution using the Lambert $W$-function and is tested for both negative and positive gate biases in the voltage range of $-$1.5 to $+$1.5 V. We also show the versatility of the proposed approach to deal with the post-BD $I$– $V$ when source and drain contacts are grounded or floating and analyze the obtained results in terms of the charge available for conduction.      

Linear Systems, Sparse Solutions, and Sudoku

In this paper, we show that Sudoku puzzles can be formulated and solved as a sparse linear system of equations. We begin by showing that the Sudoku ruleset can be expressed as an underdetermined linear system: ${mmb{Ax}}={mmb b}$, where ${mmb A}$ is of size $mtimes n$ and $n>m$. We then prove that the Sudoku solution is the sparsest solution of ${mmb{Ax}}={mmb b}$, which can be obtained by $l_{0}$ norm minimization, i.e. $minlimits_{mmb x}Vert{mmb x}Vert_{0}$ s.t. ${mmb{Ax}}={mmb b}$. Instead of this minimization problem, inspired by the sparse representation literature, we solve the much simpler linear programming problem of minimizing the $l_{1}$ norm of ${mmb x}$, i.e. $minlimits_{mmb x}Vert{mmb x}Vert_{1}$ s.t. ${mmb{Ax}}={mmb b}$, and show numerically that this approach solves representative Sudoku puzzles.      

Performance Improvement of N-Type $hbox{TiO}_{x}$ Active-Channel TFTs Grown by Low-Temperature Plasma-Enhanced ALD

We report on performance improvement of $n$-type oxide–semiconductor thin-film transistors (TFTs) based on $hbox{TiO}_{x}$ active channels grown at 250 $^{circ}hbox{C}$ by plasma-enhanced atomic layer deposition. TFTs with as-grown $hbox{TiO}_{x}$ films exhibited the saturation mobility $(mu_{rm sat})$ as high as 3.2 $hbox{cm}^{2}/hbox{V}cdothbox{s}$ but suffered from the low on–off ratio $(I_{rm ON}/I_{rm OFF})$ of $hbox{2.0} times hbox{10}^{2}$. $hbox{N}_{2}hbox{O}$ plasma treatment was then attempted to improve $I_{rm ON}/I_{rm OFF}$. Upon treatment, the $hbox{TiO}_{x}$ TFTs exhibited $I_{rm ON}/I_{rm OFF}$ of $hbox{4.7} times hbox{10}^{5}$ and $mu_{rm sat}$ of 1.64 $hbox{cm}^{2}/hbox{V}cdothbox{s}$, showing a much improved performance balance and, thus, demonstrating their potentials for a wide variety of applications such as backplane technology in active-matrix displays and radio-frequency identification tags.      

Effect of Supply Voltage Harmonics on IRP-Based Switching Compensator Control

The instantaneous reactive power (IRP) $p$– $q$ theory is one of the major theoretical tools for the development of algorithms for generating reference signals for control of switching compensators, commonly known as active harmonic or power filters. This paper presents results of study on how the supply voltage harmonics affect the reference signal that is generated using the IRP approach. According to this approach, the compensator should also compensate, apart from the IRP, the alternating component of the instantaneous active power of the load. The paper, however, demonstrates that in the presence of the supply voltage harmonics, an ideal, unity-power-factor load has an instantaneous active power with a nonzero alternating component. According to the IRP-based approach, it should be compensated, and this requires that a distorted current be injected into the distribution system. Thus, the conclusion of the IRP $p$–$q$ theory that the instantaneous active power of ideally compensated loads should be constant is generally not true. The Currents’ Physical Components (CPC) power theory is the main theoretical tool for the presented analysis.      

2 MHz AO $Q$ -switched ${rm TEM}_{00}$ Grazing Incidence Laser With 3 at.% Neodymium Doped Nd:YVO$_{4}$

We present a detailed experimental and theoretical study of the ultrahigh repetition rate AO $Q$ -switched ${rm TEM}_{00}$ grazing incidence laser. Up to 2.1 MHz $Q$-switching with ${rm TEM}_{00}$ output of 8.6 W and 2.2 MHz $Q$ -switching with multimode output of 10 W were achieved by using an acousto-optics $Q$ -switched grazing-incidence laser with optimum grazing-incidence angle and cavity configuration. The crystal was 3 at.% neodymium doped Nd:YVO$_{4}$ slab. The pulse duration at 2 MHz repetition rate was about 31 ns. The instabilities of pulse energy at 2 MHz repetition rate were less than ${pm}6.7hbox{%}$ with ${rm TEM}_{00}$ operation and ${pm}3.3hbox{%}$ with multimode operation respectively. The modeling of high repetition rate $Q$-switched operation is presented based on the rate equation, and with the solution of the modeling, higher pump power, smaller section area of laser mode, and larger stimulated emission cross section of the gain medium are beneficial to the $Q$-switched operation with ultrahigh repetition rate, which is in consistent with the experimental results.      

Q-Band pHEMT and mHEMT Subharmonic Gilbert Upconversion Mixers

This letter makes a comparison between Q-band 0.15 $mu{rm m}$ pseudomorphic high electron mobility transistor (pHEMT) and metamorphic high electron mobility transistor (mHEMT) stacked-LO subharmonic upconversion mixers in terms of gain, isolation and linearity. In general, a 0.15 $mu{rm m}$ mHEMT device has a higher transconductance and cutoff frequency than a 0.15 $mu{rm m}$ pHEMT does. Thus, the conversion gain of the mHEMT is higher than that of the pHEMT in the active Gilbert mixer design. The Q-band stacked-LO subharmonic upconversion mixers using the pHEMT and mHEMT technologies have conversion gain of $-$7.1 dB and $-$0.2 dB, respectively. The pHEMT upconversion mixer has an ${rm OIP}_{3}$ of $-$12 dBm and an ${rm OP}_{1 {rm dB}}$ of $-$24 dBm, while the mHEMT one shows a 4 dB improvement on linearity for the difference between the ${rm OIP}_{3}$ and ${rm OP}_{1 {rm dB}}$. Both the chip sizes are the same at 1.3 mm $times$ 0.9 mm.      

Anisotropic Transient and Stationary Electron Velocity in Bulk Wurtzite GaN

The theoretical calculation of transient electron velocity overshoot in wurtzite $c$-axis GaN indicates a higher transient overshoot peak for transport in the basal plane ( $Gammahbox{-}M$ and $Gamma hbox{-}K$) than along the growth direction ($Gammahbox{-}A$ ). Characteristic rise times for the transient overshoot peak are found to be shorter for transport along the $c$-axis. Stationary electron velocity is significantly larger for transport oriented in the basal plane than along the $c$ -axis. No significant anisotropy is observed, however, in either the transient or steady-state electron velocity as a function of field orientation within the basal plane itself. The higher peak transient and stationary velocities in the basal plane are directly attributable to the anisotropy of the electronic dispersion, which exhibits lower effective mass along the $Gammahbox{-}M$ and $Gammahbox{-}K$ directions and greater nonparabolicity along the $Gammahbox{-}A$ direction.      

Fabrication of a Blue $Mtimes N$ Pixel Organic Light-Emitting Diode Video Display Incorporating a Thermally Stable Emitter

A 7$times$ 11 pixel blue OLED display was fabricated using a patterned indium–tin–oxide (ITO) substrate. The fabrication process for an $M times N$ pixel organic light-emitting diode (OLED) video display including an electrical insulating layer and a physical pixel separator layer is presented. An efficient and thermally stable blue fluorescent organic material, ${hbox{6}},{hbox{6}}^{prime}$ -bis((2-$p$ -biphenyl)-4-phenylquinoline) (B2PPQ), was used in combination with an evaporated hole-transport small molecule with a high ionization potential.      

Temperature Characteristics of Gain Profiles in 1.3-$ muhbox{m} p$-Doped and Undoped InAs/GaAs Quantum-Dot Lasers

The modal gain and differential gain of 1.3-$muhbox{m}break p$ -doped and undoped InAs/GaAs quantum-dot (QD) lasers have been investigated as a function of injection current under different operation temperatures. The results show that $p$ -doping improves the modal and differential gains in QD lasers at high temperatures. Exponential decrease in the differential gain profiles were observed in both types of lasers from 20 $^{circ}hbox{C}$ to 80 $^{circ}hbox{C}$. Theoretical calculations based on the rate equation model for the undoped QD laser gain at different temperatures are presented.      

A 125–1250 MHz Process-Independent Adaptive Bandwidth Spread Spectrum Clock Generator With Digital Controlled Self-Calibration

A process-independent adaptive bandwidth spread-spectrum clock generator (SSCG) with digitally controlled self-calibration techniques is proposed. By adaptively calibrating the VCO gain ($K_v$) and charge-pump (CP) current over C ($I_{CP}/C$), the SSCG can realize not only adaptive bandwidth but also process independence at each operating frequency. The innovative point is the adaptive bandwidth control using $K_v$ and $I_{CP}/C$ calibration. This control enabled a test chip to keep a sharp triangular SSC profile while operating over a wide frequency range (125 to 1250 $~$MHz). The variations of VCO gain and CP current are reduced to one third those of the conventional architecture. At 1250 $~$Mbps (625$~$MHz) the reduction of spectrum peak amplitude is 18.6$~$dB which is 2.3$~$dB better than the reduction obtained without calibration.      

Characterization and Modeling of RF-Performance $(f_{T})$ Fluctuation in MOSFETs

The fluctuation of RF performance (particularly for $f_{T}$ : cutoff frequency) in the transistors fabricated by 90-nm CMOS technology has been investigated. The modeling for $f_{T}$ fluctuation is well fitted with the measurement data within approximately 1% error. Low-$V_{t}$ transistors (fabricated by lower doping concentration in the channel) show higher $f_{T}$ fluctuation than normal transistors. Such a higher $f_{T}$ fluctuation results from $C_{rm gg}$ (total gate capacitance) variation rather than $g_{m}$ variation. More detailed analysis shows that $C_{rm gs} + C_{rm gb}$ (charges in the channel and the bulk) are predominant factors over $C_{rm gd}$ (charges in LDD/halo region) to determine $C_{rm gg}$ fluctuation.      

Operation of a 25-Gb/s Direct Modulation Ridge Waveguide MQW-DFB Laser up to 85 $^{circ}$ C

We demonstrated a 25-Gb/s direct modulation up to 85 $^{circ}$C with a 1.3- $mu$m InGaAlAs ridge-waveguide multiple-quantum-well distributed-feedback laser. The dependence of the relaxation oscillation frequency on current was 3.3 GHz/mA$^{1 / 2}$, and this is the highest value ever reported for 200-$mu$m-long lasers in the 1.3-$mu$m wavelength region. The $alpha$ parameter was around 2.7 at 25 $^{circ}$C, and an error-free operation after a 10-km single-mode fiber transmission was obtained up to 85 $^{circ}$C.      

Pulsed $I_{d}$– $V_{g}$ Methodology and Its Application to Electron-Trapping Characterization and Defect Density Profiling

The pulsed current–voltage ($I$– $V$) measurement technique with pulse times ranging from $sim$17 ns to $sim$ 6 ms was employed to study the effect of fast transient charging on the threshold voltage shift $Delta V_{t}$ of MOSFETs. The extracted $Delta V_{t}$ values are found to be strongly dependent on the band bending of the dielectric stack defined by the high-$kappa$ and interfacial layer dielectric constants and thicknesses, as well as applied voltages. Various hafnium-based gate stacks were found to exhibit a similar trap density profile.      

High-Density and Low-Leakage-Current MIM Capacitor Using Stacked $hbox{TiO}_{2}/hbox{ZrO}_{2}$ Insulators

We have fabricated high-$kappa hbox{Ni}/hbox{TiO}_{2}/hbox{ZrO}_{2}/ hbox{TiN}$ metal–insulator–metal (MIM) capacitors. A low leakage current of $hbox{8} times hbox{10}^{-8} hbox{A/cm}^{2}$ at 125 $^{circ}hbox{C}$ was obtained with a high 38- $hbox{fF}/muhbox{m}^{2}$ capacitance density and better than the $hbox{ZrO}_{2}$ MIM capacitors. The excellent device performance is due to the lower electric field in 9.5-nm-thick $hbox{TiO}_{2}/ hbox{ZrO}_{2}$ devices to decrease the leakage current and to a higher $kappa$ value of 58 for $ hbox{TiO}_{2}$ as compared with that of $hbox{ZrO}_{2}$ to preserve the high capacitance density.      

10-GHz and 20-GHz Channel Spacing High-Resolution AWGs on InP

This letter reports on 10-GHz and 20-GHz channel-spacing arrayed waveguide gratings (AWGs) based on InP technology. The dimensions of the AWGs are 6.8$,times,$8.2 mm$^{2}$ and 5.0$,times,$6.0 mm$^{2}$, respectively, and the devices show crosstalk levels of $-$12 dB for the 10-GHz and $-$17 dB for the 20-GHz AWG without any compensation for the phase errors in the arrayed waveguides. The root-mean-square phase errors for the center arrayed waveguides were characterized by using an optical vector network analyzer, and are 18 $^{circ}$ for the 10-GHz AWG and 28$^{circ}$ for the 10-GHz AWG.