一种用于CTCP技术的新型脉冲等离子体光源

继续沿用传统PS版的计算机直接制版技术(CTCP)对于我国的印刷包装行业具有特殊重要的意义。亟待解决的问题是实现光源对PS版的脉冲式曝光。本文报道了一套采用正弦脉冲高频电源激励的新型氮气等离子体光源,首次获得了光源的准脉冲输出,并成功的对一种超感度PS版进行了曝光。光谱分析表明氮气等离子体光源的光谱结构较碘镓灯更适于传统PS版曝光。进一步从电源电压、工作气压等方面探讨了光源的最佳运行参数,随着电源功率的增大和光源结构参数的优化,可望得到更大的光输出功率。本文对实现CTCP技术的脉冲式曝光具有一定的参考价值。     

空心阴极N2等离子体放电光源实现普通PS版感光

本文利用直流空心阴极放电方式产生了一种新型氮气等离子体蓝紫光源,实现了针对传统的预涂感光版(PS版)的感光,当N2气压70 Pa、放电电压580 V、电流1.8 A时,产生的蓝紫光功率密度为0.46 mW/cm2.本文进一步从曝光前后颜色密度值变化、感光材料红外分析方面,对PS版的曝光效果做了详细的测量.     

用于CTCP技术的射频无电极放电氮气等离子体光源研究

本文报道了一种利用射频无极放电激励的氮气等离子体新型光源,成功地对“星光”PS版进行了曝光,光谱分析表明氮气射频放电光源的光谱结构较碘镓灯更适于传统PS版曝光。为此,进一步从射频功率、工作气压等方面探讨了光源的最佳运行参数,得到在230Pa、160W采用两个传输透镜聚焦后获得的光源功率密度是2.23mW/cm2。最后给出了运用此光源对PS版的曝光结果。     

普通PS版感光特性的研究

计算机直接制版技术(CTP)是当前印刷技术领域研究的热点问题之一,采用传统PS版的计算机直接制版(CTCP)由于继续沿用传统的预涂感光版(PS版),在印刷适性、耐印力、印品分辨率等方面具有明显的优势,同时成本低,市场量大。但人们对PS版感光材料曝光特性的研究相对较少,本文给出了1种超感度重氮盐PS版的最低曝光能量同波长之间的关系,在波长405nm处所需的临界曝光能量仅为10.35m J/cm2。从曝光前后颜色密度值变化、感光材料红外分析方面,对PS版的曝光效果做了详细的测量。     

中国印刷制版胶片的市场现状

CTP技术在全球的迅猛普及,传统的从底片影像晒到PS版上的制版工艺正逐步被激光直接制版所代替,印刷胶片的需求量大幅度下降,Kodak、Agfa等公司纷纷停止和压缩印刷胶片的生产。但我国CTP技术的推广到目前为止,力度还不够,现多数印刷厂仍采用激光照排+PS版的制版工艺。所以这几年,我国印刷胶片的需求量不但未下降,还逐年增加。本文较详细地介绍了我国印刷制版胶片的市场现状和目前在市场销售的激光照排片的质量情况和感光性能。     

胶印PS版与感光胶浅析

胶版印刷在整个印刷领域中占据了主导地位。胶版印刷采用的预制感光版(PS版)已成为胶印的主要版材。目前。我国PS版的年生产能力已达3500万m2,仅从数量上看已经供大于求,但是存在品种少的缺憾。提高PS版质量,增加PS版品种的工作重点之一是改进感光胶质量。本文还简要介绍了计算机直接制版技术(CTP),并指出CTP非银盐版材和热敏版材将是今后CTP版材的发展方向。     

我国CTP技术应用的现状和前景

代表当今印刷制版业潮流的CTP技术的应用,在欧、美等地区发达国家得到快速普及。我国CTP技术的应用随着我国经济的发展,越来越被印刷制版界所接受,到目前为止,我国有400多台CTP机投入使用。随着CTP技术的进一步完善、成熟,CTP机价格的下调、国产CTP版材的大量投放市场,我国将有更多的印刷制版厂应用CTP技术。     

国内印刷版材的现状及发展方向

综述了进入 2 1世纪以来 ,我国印刷胶片、预涂感光版 (PS版 )、计算机直接制版 (CTP)等版材现状和未来发展方向 ,旨在对我国版材的研制及发展有所启发     

影响感光制版曝光的因素

阐述了在建陶产品如印花砖的丝网感光制版中影响模版质量的有关因素。在丝网印刷感光制版的各种因素中，涉及到网版的因素最多，而其中一半的因素与曝光有关。网版质量与曝光时间有着密切的关系，而曝光 时间则受多种因素的影响，其主要有四个方面：网版、丝网、光源和曝光时间、感光胶的湿度。     

计算机直接制版版材的现状与前景

1 前言 　　CTP是当今印刷界最热门的话题.CTP是Computer to plate的缩写,中文全称计算机直接制版. CTP技术最早出现于80年代,这个时期是直接制版技术的初期阶段,无论是技术、设备方面,还是制版质量方面,都很不成熟.到90年代,设备制造厂商与印刷厂、感光材料生产厂密切合作,加速了CTP技术的研究开发步伐,使CTP技术日臻成熟,达到了工业化应用的程度.在Dru-pa95展览会上展出了42种CTP系统,立即在在全球掀起了CTP浪潮.到Drupa 2000展览会,有关CTP的参展商就有近70家,几乎所有的感光材料与印刷材料大制造公司都展出了CTP系统与版材.     

Fused hollow cathode cold atmospheric plasma source for gas treatment

A new type of the cold atmospheric plasma source for catalytic plasma treatment of gas is presented. The fused hollow cathode (FHC) source is based on simultaneous radio frequency (rf) generation of hollow cathode discharges in an integrated, open structure, with flowing gas. The resulting FHC discharge is very stable, homogeneous, luminous, volume filling, without streamers. The power consumption is very low, of the order of tenths of Watt per cm² of the electrode structure area. Experiments for the hollow electrode integrated open structure up to 20 cm² were performed. The concept of the source is extremely suitable for scaling up for different gas throughputs. The FHC source represents a new non-equilibrium atmospheric plasma source suitable for transformation of gas. Moreover, its design offers both catalytic reactions in the bulk of plasma and at solid surfaces composing the open structure.     

Plasma-assisted rapid sintering of nanotitania powders

In this work, Plasma-Assisted Rapid Sintering (PARS), a pulsed DC plasma system in a hollow cathode regime, is presented as a novel technology to sinter nanoceramics. Nano-TiO₂ powders are used as proof of concept and submitted to thermal treatment using several PARS conditions and sintering schedules. PARS heating process induced solely by the hollow cathode effect is consistent and affordable, providing a homogeneous temperature distribution to the compact. Furthermore, the heating rate and the maximum temperature are easily tunable by the discharge current applied in the plasma source and can go safely from room to maximum temperature in a matter of seconds with heating speed comparable with other reported rapid sintering techniques. Using 1-min of non-isothermal PARS cycles up to 1000 °C, porous nanostructured samples were obtained; reaching 80 % relative density while the grains remained at the nanoscale. Adding dwell times, the relative density was increased up to 96 % using a temperature plateau for up to 10 min, but the TiO₂ grains grow intensively when temperatures exceeded 1000 °C. The results indicate that the developed process is a promising new alternative technology for sintering nanoceramics.     

Influence of cathode temperature on gas discharge and growth of diamond films in DC-PCVD processing

In this paper, a novel direct current glow discharge plasma chemical vapor deposition (DC-PCVD) process, i.e., hot cathode DC-PCVD, is employed to deposit diamond films on molybdenum substrate. Compared with the conventional DC-PCVD method, the hot cathode DC-PCVD process is distinctive for its hot cathode with the temperature ranging from 700 to 1600 °C. Detailed experiments and analyses showed that the cathode temperature plays a key role in the stabilization of gas discharge and growth of diamond films.     

CTP数码印刷版材的技术现状和发展

综合介绍了CTP数码印刷版材的技术现状 ,产品种类和国内外CTP印刷版材的主要生产厂商 ,并重点论述了紫激光CTP技术和CTcP传统印版直接制版的新发展。     

Application of diamond film to cold cathode fluorescent lamps for LCD backlighting

A cold cathode fluorescent lamp (CCFL) is a gas discharge light source widely used for liquid crystal display (LCD) backlighting. We proposed applying diamond as a new cathode material to reduce the power consumption of the CCFL. In this work, we show stable and low (less than 50% of metal) cathode-fall voltage for a glass discharge tube.