激光辐照下金纳米缺陷诱导光学玻璃损伤特性

采用离子束溅射的方式,在K9玻璃基片表面引入金纳米杂质缺陷,通过原子力显微镜(AFM)测得金纳米尺寸直径在50~100 nm之间。采用不同能量密度的激光对样品进行点阵式的单脉冲辐照(1-on-1)并且对损伤阈值及典型损伤形貌进行了实验及理论分析。损伤阈值采用零几率处的损伤密度。结果表明:引入金纳米杂质缺陷后其抗激光损伤阈值由裸基片的26.6 J/cm2下降为15.5 J/cm2。通过微分干涉显微镜,随着激光能量的增加,损伤呈爆炸坑形貌,主要呈现纵向加剧损伤。金纳米杂质缺陷在K9玻璃基片上形成了强吸收中心(引入金纳米杂质K9玻璃基片的弱吸收(47.33 ppm,1 ppm=10-6)是裸K9玻璃基片(3.57 ppm)的13倍)造成局部高温,这是造成损伤的诱因。通过计算,金纳米杂质对K9玻璃基片的作用包括两部分:当激光辐照在K9玻璃基片上,首先是热应力引起玻璃的破裂;随后杂质汽化产生的蒸汽压加剧材料的破坏,引起局部炸裂。     

大功率半导体激光加工光致等离子体折射效应

为了研究大功率半导体激光加工过程中,光致等离子体对激光光束显著的屏蔽作用,以波长为976nm、光斑尺寸为0.5mm1mm、最大功率为4kW的半导体激光加工系统为实验基础,采用了与实际相符的光致等离子体电子密度数学模型和几何光学ABCD矩阵算法,从吸收和折射两方面对光致等离子体的屏蔽作用进行了理论分析和实验研究,得到了在光致等离子体电子密度ne1.01018/cm3的条件下,光致等离子体的折射效应才是引起半导体激光光束屏蔽的主要原因这一结果。结果表明,光致等离子体改变了聚焦光束的形态,使其焦点下移、光斑变大、能量密度变小,其效果类似于一个非线性梯度折射率的负透镜。     

Nonuniform Layer Model of a Millimeter-Wave Phase Shifter

The electromagnetic wave propagation of millimeter waves in dielectric waveguides with thin surface plasma layers is characterized. The phase and attenuation of a 94-GHz wave are computed for various surface plasma layer thicknesses as a function of earner density levels. The electron/hole pairs generated in the vicinity of the dielectric waveguide surface by photo excitation are assumed to have an exponential profile due to either carrier diffusion or the exponential absorption of the optical field. Field computations made for a uniform plasma layer are compared with those of the nonuniform plasma to illustrate the effects of the exponential tails of the carrier profiles on both the phase and attenuation of the millimeter wave. The thin plasma layers slightly affect the field profile of the transverse electric modes (fields polarized parallel to the plasma layer). The transverse magnetic fields are highly distorted at plasma densities greater than 10/sup 16/ cm/sup -3/.     

Effects of F- ions and F2 molecules on theoscillation process of a discharge-pumped ArF excimer laser

Time-resolved number densities of the fluorine negative ion in a discharge-pumped ArF excimer laser are measured by a dye laser absorption method. The peak density of F^- is 0.93 ×10 ¹⁵ cm^-3 at a total gas pressure of 2.5 atm, a gas mixture ratio of F₂-Ar-He=0.2-10.0-89.8, and a charging voltage of 28 kV for a 68-nF storage capacitor bank. The dependences of the peak F^- density and the ArF laser output power on the F ₂ gas fraction in F₂-Ar-He mixture are investigated. The effects of F^- ions and F₂ molecules on the ArF laser oscillation process are discussed by considering the F₂ mixture-ratio dependences of particle densities, laser output power, mean electron energy, and laser power extraction efficiency. With increasing F₂ mixing ratio, the ArF* excimer formation first increases as F^- increases, but in F₂-rich conditions the laser power decreases because of the laser photon absorption due to F^- ions and quenching of ArF* with F₂ molecules     

Photon Acceleration of Laser-plasma Based on Compton Scattering

The one-dimensional electron density disturbance is studied by using the inelastic collision model of the relativity electron and photon group, the relativity theory, the momentum equation and the continuity equation, which is generated by a driving laser pulse and scattered laser pulse propagating through a tenuous plasma, and the electron density disturbance is closely associated with the incident laser and scattering laser. The electron plasma wave（EPW）is formed by the propagation of the electron density disturbance. Owing to the action of EPW, the increasing of the frequency of the photons in the incident laser pulses that there is a distance with the driving laser pulses is studied by using optical metric. The results show that it is possible that the photon will gain higher energy from the EPW when photon number is decreased and one-photon Compton scattering enters, the photon will be accelerated.     

Energy loading effects in the scaling of atomic xenon lasers

The intrinsic power efficiency of the atomic xenon (5d→6p) infrared (1.73-3.65-μm) laser is sensitive to the rate of pumping due to electron collision mixing of the laser levels. Long-duration pumping at moderate power deposition may therefore result in higher energy efficiencies than pumping at higher powers. The consequences of high energy deposition (hundreds of joules per atmosphere) during long pumping pulses (hundreds of microseconds) on the intrinsic power and energy efficiency and optimum power deposition of the atomic xenon laser are examined. The dominant effect of high energy loading, gas heating, causes an increase in the electron collision mixing of the laser levels. The optimum power deposition for a given gas density therefore shifts to lower values with increasing gas temperature     

Transient plasma shielding effects during pulsed laser ablation of materials

The absorption of laser energy by the plasma during pulsed laser deposition of thin films has been analyzed theoretically. The amount of laser energy absorbed in the plasma termed as the “plasma shielding factor” is a function of the incident laser wavelength, and time dependent plasma dimensions and electron density. Due to time varying parameters, a quantitative analysis of the plasma absorption is difficult. A model which takes into account the absorption of laser energy by the plasma has been developed. In this model, the time-dependent plasma dimension is replaced by the time dependent ablation depth. Using simulated absorption coefficient values, the ablation characteristics of silicon and high T_c superconductors are computed and compared with experimental results. The plasma shielding factor was found to vary approximately linearly with absorbed laser energy. The calculations also showed that the plasma shielding was strongly dependent on the laser fluence but varies very weakly with the simulated plasma absorption coefficient values. Experimental results on plume shielding showed good agreement with the calculations.     

25-W CW high-brightness tapered semiconductor laser-array

High-power high-brightness laser diode arrays comprising 25 tapered laser oscillators have been fabricated. The devices, based on recently developed low-modal gain epitaxial layer-structures, deliver a maximum output power of more than 25-W continuous-wave. A high beam quality uniformity is achieved with an average beam quality factor of M ²=2.6 for each individual emitter. Compared to conventional broad-area laser diode arrays the brightness of each emitter is improved by more than an order of magnitude in the slow-axis direction. These arrays have the potential to produce optical power densities as high as 1 MW/cm²     

激光等离子体的非线性逆轫致吸收

:在激光与等离子体相互作用且激光的功率密度很高时 ,激光的强电场将使电子的热速度分布发生扭曲 ,从而改变了碰撞频率并导致吸收系数与激光强度相关 ,即出现非线性吸收。当激光强度较高时 ,非线性逆轫致吸收是对等离子体的加热起重要作用的机制。本文通过量子力学方法得出了非线性逆轫致吸收系数的公式 ,并对非线性逆轫致吸收系数进行了讨论。     

Noise in free-electron laser amplifier

The equations of the free-electron laser amplifier are generalized to include higher order modes. The density and velocity fluctuations in the entering electron beam cause noise excitation in the amplifier. The electron beam fluctuations have been studied extensively, both theoretically and experimentally, in traveling wave tubes, and hence the well-tested formalism developed for this purpose is conveniently applied to the present problem. It is found that the fluctuations put a severe constraint on the achievable exponential gain in a proposed Raman-type free-electron laser operating at optical frequencies. A1/lambda^{3}scaling law is derived.     

超强激光与等离子体相互作用中的自生磁场及三维模拟

用3维粒子模拟程序对超热电子在等离子体靶表面中向前传输时所激发的电流密度,电场和磁场的发展过程进行模拟研究。数值模拟表明,在线性强激光作用下,由于电子初始时刻的无规则热运动,在等离子体临界表面上激发不稳定性,而不稳定性随时间发展和激光功率的进一步深入到等离子体内部,最终使等离子体表面处激发饱和自生磁场,饱和自生磁场对激光有质动力推开电子时所形成的高能电子运动产生抑制作用.通过该研究寻找相对论效应条件下的自生磁场,并为进一步开拓其在高能离子束的应用提供理论和技术上的指导。     

A helium plasma simulator

The results of an investigation of the plasma parameters generated by a large V-groove cathode discharge are presented. Stable plasmas with electron densities up to 2×10¹²cm^-3have been obtained in a 30-cm diameter chamber. The electron temperature is about 1200°K and is independent of discharge current and gas pressure over the range, 0.3 to 0.9 torr. The discharge operates in much the same fashion as a conventional brush cathode discharge but with lower operating voltage for equal current densities. It is shown that the plasma is beam generated and the dominant electron loss mechanism in the steady state is electron-ion recombination. However, although most electrons are lost by recombination, diffusion losses still play a strong role in determining the electron density profile. Some measurements of primary electrons in a helium negative glow are presented. The measured flux of the high energy electrons is an exponential function of pd/V²where p is the helium pressure, d is the distance from the edge of the cathode fall and V is the discharge voltage. Some data on microwave noise radiation near the plasma frequency are also presented. In particular, the noise radiation near the cathode is shown to be proportional to the flux of high energy electrons near this electrode. Data are shown which correlate the high energy flux and the peak noise radiation.     

飞秒激光致双液滴光学击穿和等离子体分布研究

为了研究超短激光脉冲与双液滴相互作用过程中的光学击穿和等离子体分布,基于麦克斯韦方程组和电离速率方程,构建了飞秒激光与双液滴的瞬态耦合模型,使用有限元分析方法,对飞秒激光辐照微米量级双液滴的自由电子密度和光场分布进行了计算,得到了双液滴结构对液滴光学击穿和等离子体变化的影响。结果表明,第2个液滴的击穿阈值约为同等条件下单液滴击穿阈值的35%;等离子体的形态和击穿点的位置随双液滴间距发生变化,且在聚焦区域产生纳米等离子体射流;第2个液滴对激光能量的吸收随着双液滴间距的增加而减少;当分别使用满足击穿阈值的光强入射,双液滴吸收的能量约为单液滴的3%;第2个液滴对激光能量的吸收随光强增大而增大,能量吸收比例最终趋于0.01,仅为单液滴的1.5%。该研究为激光诱导水击穿和激光在大气中的传输提供了一定的参考。     

Laser photoelectron sources of high apparent brightness

By focusing an ultraviolet laser beam to a small spot on an appropriately shaped cathode, one can obtain photoelectron beams of 10⁶A . cm^-1. sr^-1brightness. Such a continuous electron source may be useful in electron beam lithography and other applications. Calculations of current densities, brightness, and emitter temperature rises are presented.     

Saturation studies of the E-beam sustained discharge atomic xenonlaser

In an electron beam sustained discharge xenon laser the discharge energy deposition has been varied in order to investigate the saturation effect on the xenon laser. The current density of the electron beam is varied separately in the range of 0.1-2.7 A/cm² to obtain optimized discharge excitation conditions as a function of electron beam current density and gas pressure. An optimal fractional ionization f=3.5-4×10^-5 is found, independent of the electron beam parameters. The synergy of electron beam and discharge excitation has resulted in a maximum specific energy of 15 J/l at a total gas pressure of 9 bar     

激光深熔焊接阈值表征及特性

采用CO2和Nd∶YAG激光器焊接A3钢,结合高速摄像和光谱分析,研究激光深熔焊接阈值的表征及特性。结果表明,以激光功率与光斑直径之比作为深熔焊接阈值的表征参量,深熔焊接阈值与光斑大小无关;而临界功率密度随光斑尺寸不同而变化。YAG激光焊接模式转变阈值明显大于材料蒸发的阈值,在模式转变前的热导焊接阶段,金属材料已出现显著蒸发,而焊接模式转变后,蒸气羽辉的光谱保持不变。CO2激光焊接模式转变前,金属仅发生微弱的蒸发。深熔焊接时,蒸发显著加强,且蒸气部分电离。分析表明,CO2激光焊接时,蒸气电离形成等离子体,增加金属对激光的吸收,促进深熔焊接过程的建立。     

Modeling the plasma kinetics in a kinetically enhanced copper vaporlaser utilizing HCl+H2 admixtures

A detailed computer model has been used to simulate the plasma kinetics and lasing characteristics in a kinetically enhanced copper vapor laser (KE-CVL) which utilizes Ne-H₂-HCl buffer gas mixtures. The model reproduces key features of the observed operating characteristics of the KE-CVL-in particular, relating to the electrical characteristics of the plasma tube, time evolution of Cu 4s²S _1/2 ground state density, and formation of the laser output. It is shown that the principal role of the HCl additive is to increase the electron loss rate during the interpulse period via dissociative attachment reactions between free electrons and vibrationally excited HCl (ν=1,2) molecules. This leads to a reduction of the prepulse electron density establishing more favorable prepulse conditions for laser action during the subsequent excitation phase. In the KE-CVL, the plasma skin effect governing the development of the radial electric field is greatly reduced compared to conventional CVL's, altering the spatio-temporal evolution of the optical gain and laser field intensities to substantially enhance high-beam-quality output. Comparisons between model results and experimental data for the decay rate of the Cu 4s^{2 2}D_3/2 metastable lower laser level in the early afterglow suggest that there may be an additional de-excitation mechanism for the ²D_3/2,5/2 levels in the KE-CVL plasma which has yet to be identified     

激光场中慢电子与正电子素碰撞的单光子吸收

正电子素(positrontum,e~+e~-)在空间物理与辐射化学中具有重大的意义~[1]。最近人们已     

位相扰动下“热像”规律研究

研究了具有位相扰动的激光束经过非线性介质后的传输情况,用数值模拟的方法着重研究了入射光强(这里以能量来反映)、调制深度、调制宽度等与热像的关系.研究结果表明,在某些条件下,即通常所说的共轭像面处,和振幅调制一样也可以看到明显的热像,但很多情况下其它一些地方峰值很强(例如棒后dO/2处),成为最值得关注的位置.光束演化(光场分布)对位相调制的深度反应较为敏感,某些深度的调制会有更大的危害性.另外,调制宽度、入射光强等对热像形成也有一定的影响.     

Acoustic waves and heating due to molecular energy transfer in an electric discharge CO laser

This paper summarizes analytical studies and the interpretation of experimental results for the compression and rarefaction waves generated in the cavity of a pulsed CO electric discharge laser. A one-dimensional analysis of acoustic waves is applied to a transversely excited laser. The influences of heating in the cathode fall, heat transfer to the cathode, flow through both the anode and cathode, and bulk heating of the plasma are included. The analysis is used to relate the bulk heating rate to observable features of the pressure and density waves. Data obtained from interferograms and reported elsewhere are used to infer the bulk heating rates in a pulsed CO laser. Results are presented for CO/Ar, CO/N2, and N2plasmas. Comparison of the data with recent theoretical results for the heating due to electron/ neutral collisions and the anharmonic defect associated withV-Venergy transfer shows substantial differences at lower values of total energy deposition. The change of heating WithE/Nis in fairly good agreement with predicted values.