突破衍射极限的成像方法综述（英文）

"衍射极限"实际上不是一个真正的障碍,除非处理远场和定位精度。这种衍射障碍并不是坚不可摧的,可以利用一些智能技术来突破光学衍射极限。讨论了四种技术,近场扫描光学显微镜(NSOM)法,受激发射损耗(STED)显微镜法,光激活定位显微镜(PALM)法或随机光学重建显微镜(STORM)法和结构照明显微镜(SIM)法,并且介绍了各自的基本原则与优劣。NSOM利用纳米级探测器检测通过光纤的极小汇聚光斑,从而获得单个像素的分辨率;PALM和STORM利用荧光探针,实现暗场和荧光的转换,从而观察到极小的荧光团;SIM则是利用栅格图案与样品叠加成像来实现。其中,STORM具有相对较高的潜力,能够更为有效地突破衍射极限。     

扫描近场光学显微镜

本文简介近场光学的基本原理一非辐射场的探测与高分辨率的关系；近场光学显微镜的仪器发展。同时简要介绍近场光学显微镜在超高分辨率光学成象，纳米尺度光学微加工与光刻，高密度磁光存储，近场光谱等领域中的应用。     

现代显微成像技术综述

概述了光学宽视场显微镜、共聚焦显微镜、超分辨率显微镜中所应用的现代显微成像技术,对各种传统和先进的显微成像原理进行了总结。光学宽视场显微镜最常用的显微技术有明场成像、暗场成像、相衬成像、偏光成像、微分干涉(DIC)成像、调制对比成像和荧光成像。相衬成像中根据不同的成像结构还有切趾相衬成像。微分干涉除了传统的偏振光照明还有圆偏振光照明(C-DIC)和专用于塑料的微分干涉(PlasDIC)。共聚焦显微镜随着计算机技术和制造技术的发展而有了巨大的发展。除了传统的共聚焦荧光显微镜以外,还有连续反斯托克斯拉曼散射(CARS)共聚焦、多光子共聚焦和白光共聚焦。超分辨率显微镜中主要介绍了受激辐射淬灭(STED)技术和紧随基态淬灭显微技术的单分子返回(GSDIM)技术。     

微光学系统矢量衍射成像中畸变的衍射机理与计算

用瑞利—索末菲矢量衍射公式导出微光学系统矢量衍射像点光强分布的计算式,探讨矢量衍射成像中畸变的衍射机理与计算。模拟试验表明微光学系统矢量衍射成像不但要考虑横向场还要考虑纵向场,畸变校正要进行位置校正,光强也要做适当校正,有利于微光学成像系统的像差分析与处理。     

一种基于无衍射光栅的三角测量的定标方法

基于光栅的三角测量方法是将光栅投射到被测物体表面,CCD接受由于物体表面高度起伏产生的变形光栅像,根据光栅变形量与高度的关系,恢复被测物体的三维形貌。提出了一种基于无衍射光栅的三角测量的定标方法。该方法通过空间坐标变换,方便地求出摄像机的内外参数,从而获得被测物体的三维信息。     

用于中红外成像的锗衍射光具

探测器技术的进展和信号处理在电子技术的改进 ,已使红外成像系统的重量和体积得到减轻和减小。可是 ,光具的尺寸和重量却并未因上述变化而得到相应的改变。为了进行追赶 ,光具设计人员已开始转向用衍射光具来取代传统的红外成像透镜。在过去的几年中 ,科学们曾经演示过用于 3μm～ 5μm近红外至中红外成像的硅衍射光具。现在 ,日本防卫厅的研究人员已演示了一种用于中红外的锗衍射光学元件。这种衍射透镜可以取代前视红外系统成像光具中的硒化锌消色差透镜。日本研究人员设计的这种衍射光学元件可将多元件系统成像透镜部件中的色差减小到最…     

显微红外光学成像系统的设计

红外热成像技术是现代影像学中的一门新兴技术。它与x射线、B超、CT、核磁共振等显像技术的成像原理不同,它不主动发射任何射线,只是被动接受热源所发射出的红外线,经过处理后得到热源的影像。该技术的最大特点是不用接触待测物体。因此,对于一些高危行业,如核工业中元器件的检测将变得非常容易。本文所叙述的就是利用红外热像技术与显微技术的结合,制作一种红外显微镜。红外显微镜可以将出现故障的大规模集成电路板中数以万计的微小元器件的影像传输到计算机中,经过计算机的分析,可以很容易地分析出具体故障所在。因此,大范同电子元器件故障的快速检测将变得简单、快捷。     

上海华建的极限突破

<正>2010年上半年,经过了金融危机的洗礼,上海华东建筑机械厂有限公司借助国家4万亿元投资机遇,迅速扭转不利局面,实现了以主导产品混凝土搅拌运输车为首的生产和销售量大突破。公司综合产值5.6亿元,同比增长75%;经营销售额5.8亿元,同比增长61.1%。     

近红外显微成像技术

以烟草混合样品为例简要介绍近红外显微成像技术和近红外显微镜的使用,介绍与之相关的实现化学成分鉴别的图像处理方法及图像显示方式。     

The scanning optical microscope (Extracts on near-field microscopy)—from a 1975 report

The following consists of extracts concerning near-field microscopy from a Progress Report prepared in April 1975 as Oxford University Engineering Laboratory Report No. 1883/77, describing work initiated by the late Professor R. Kompfner. Preliminary experimental work on near-field microscopy is outlined, and a theory for contrast formation is presented.     

The fourier optics of near-field microscopy

Many different optical schemes for achieving super-resolution by probing a near field have been proposed and one of the most important of these is the use of a tapered optical fibre probe. Plain optical fibre probes have also been used for microscopy. The Fourier optics behind these various methods are considered, contrast mechanisms discussed, and the concept of the transfer function for an evanescent field developed.     

Nano-slit probes for near-field optical microscopy fabricated by focused ion beams

The near-field probes described in this paper are based on metallized non-contact atomic force microscope cantilevers made of silicon. For application in high-resolution near-field optical/infrared microscopy, we use aperture probes with the aperture being fabricated by focused ion beams. This technique allows us to create apertures of sub-wavelength dimensions with different geometries. In this paper we present the use of slit-shaped apertures which show a polarization-dependent transmission efficiency and a lateral resolution of < 100 nm at a wavelength of 1064 nm. As a test sample to characterize the near-field probes we investigated gold/palladium structures, deposited on an ultrathin chromium sublayer on a silicon wafer, in constant-height mode.     

Femtosecond near-field scanning optical microscopy study of molecular thin films

A near-field scanning optical microscope has been combined with a two-colour time-resolved pump-probe measurement system. It has a noise-equivalent transmittance change of 5.0 × 10⁻⁵ for a probe pulse with an intensity of 30 nW. The system has been used for evaluating molecular thin films that have a domain structure, particularly for observing a gate action of the single domains. The results include key features to understand an origin of the domains and suggest that the film composition is uniform over a distance of several micrometres.     

Photonic nanopatterns of gold nanostructures indicate the excitation of surface plasmon modes of a wavelength of 50–100 nm by scanning near-field optical microscopy

Scanning near‐field optical microscopy images of metal nanostructures taken with the tetrahedral tip (T‐tip) show a distribution of dark and bright spots at distances in the order of 25–50 nm. The images are interpreted as photonic nanopatterns defined as calculated scanning near‐field optical microscopy images using a dipole serving as a light‐emitting scanning near‐field optical microscopy probe. Changing from a positive to a negative value of the dielectric function of a sample leads to the partition of one spot into several spots in the photonic nanopatterns, indicating the excitation of surface plasmons of a wavelength in the order of 50–100 nm in metal nanostructures.