多晶硅薄膜太阳能电池的衬底材料和制备工艺

研究了太阳能电池的发展历程,详细介绍了多晶硅薄膜太阳能电池的各种工艺,阐述了在实际研究过程中沉积大晶粒多晶硅薄膜的技术路线和工艺,并对多晶硅薄膜太阳能电池的研究趋势做了展望.     

陶瓷衬底多晶硅薄膜太阳能电池工艺

为了大幅度降低成本,真正实现太阳能电池的大规模应用,设计出一种新颖的薄膜电池,即在廉价的陶瓷衬底上沉积多晶硅薄膜制作的太阳电池.介绍了制作这一电池的完整工艺流程,摸索出合适的工艺参数,解决了在异质衬底上生长大晶粒多晶硅薄膜和表面电极引出的问题,实验取得了令人满意的结果.     

多晶硅薄膜太阳能电池硅基复合陶瓷衬底的设计与制备

采用复合陶瓷设计的概念,设计多晶硅薄膜太阳能电池用Si,SiC,C的复合陶瓷衬底.在气氛保护烧结炉中烧成,得到的复合陶瓷衬底和Si具有较好的热力学和晶体学匹配性,可以有效的避免在RTCVD工艺下高温沉积和冷却过程中出现的开裂现象,并能得到质量较好的多晶硅薄膜.同时,通过恰当设计Si,SiC和C各组分间的比例,还可以制备具有良好导电性能的陶瓷衬底,这对陶瓷衬底多晶硅薄膜太阳能电池的制备也有重要的意义.     

陶瓷衬底薄膜太阳能电池的制备

详细分析了陶瓷衬底多晶硅薄膜太阳能电池在制备过程中由于衬底的引入而导致一系列问题,比如衬底杂质含量过高、热膨胀系数等热力学参数和硅不匹配、沉积过程中杂质扩散以及晶体学参数不匹配导致沉积的硅薄膜晶粒不能长大等.针对衬底可能导致的不利因素给出了解决办法,同时进一步用实验验证了工艺的可行性.     

快速热化学沉积工艺条件对制备多晶硅薄膜的影响

选用Al2O3陶瓷作为衬底,采用快速热化学法沉积多晶硅薄膜.实验研究了温度对薄膜生长的影响,结果表明,硅层的沉积速率随着温度升高而加快,并逐渐趋向1个稳定值.晶粒尺寸也随着温度升高而增大,在温度达到1000℃后保持不变.在此硅薄膜上,采用磷扩散掺杂,制备出太阳能电池器件,并且分析了掺杂量对电池效果的影响.     

石英陶瓷坩埚对多晶硅铸锭质量的影响

分别从多晶硅铸锭利用率、少子寿命和外观质量三个方面对比分析了三个不同厂家的石英陶瓷坩埚对多晶硅铸锭质量的影响。对比分析各项指标后,判断b厂家的坩埚性能优异,得到的多晶硅铸锭质量最好,适合于大规模生产。     

化学气相沉积金刚石薄膜衬底的研究进展

讨论了化学气相沉积金刚石薄膜的各种衬底材料。气相合成金刚石衬底材料分为3类，第一类是能和碳形成碳化物的衬底；第2类是与碳不起反应（不形成碳化物）但能溶碳的衬底；第3类是既不与碳反应又不熔碳的衬底。第一种一般与金刚石薄膜有比较好的粘合性，后两种虽然使金刚石成核容易，但衬底材料与金刚石薄膜结合性较差。采用预处理是促进化学气相沉积金刚石薄膜与增强结合力非常有效的方法。     

衬底温度对脉冲激光沉积氧化锌薄膜性能的影响

采用脉冲激光沉积(PLD)技术,在Si(100)衬底上制备出高度c轴取向的ZnO薄膜。运用X射线衍射(XRD)、光致发光谱(PL)、拉曼光谱(Raman)对衬底温度在300⁷00℃条件下沉积的氧化锌薄膜进行表征,研究了衬底温度对氧化锌薄膜结构和发光特性的影响。实验表明,700℃条件下沉积的薄膜具有相对较好的结晶质量,其X射线衍射峰半高宽(FWHM)最窄,晶粒最大,近带边紫外发光峰与深能级发光峰的比值显著增强。     

衬底温度对CVD金刚石薄膜织构的影响

利用扫描电镜观察了CVD自支撑金刚石薄膜的表面形貌组织,利用X射线衍射技术检测了薄膜织构。研究表明,不同衬底温度条件下制备的金刚石薄膜形成不同的织构和表面形貌组织,衬底温度升高使生长速率参数α减小,金刚石晶体最快生长晶向由〈100〉晶向向〈011〉和〈111〉晶向转变,使得薄膜中{011}和{111}织构随温度提高不断...     

The Structure,Texture and Growth of Bronze Electrodeposits on Polycrystalline Substrates

A study of the electrodeposition of Cn-Sn bronzes from a cyanide-stannate bath under potentiostatic conditions at 65°C has been made. It has been shown that the results are in agreement with those obtained previously under galvanostatic conditions. The growth and textures of the deposited alloys were also investigated. Continuation of the structures of cube-textured copper cathodes was most pronounced at intermediate overpotentials i e 500–650 mV. Under these conditions the initial base-oriented growth gave way to fibrous structures with increasing deposit thickness. At low overpotentials (300 mV) metallographic evidence indicated considerable lateral growth in the deposits and the texture was found to be [111] whereas at high overpotentials (700–800 mV) growth was mainly outward and the texture was [110]. These results are in agreement with theoretical predictions concerning ‘free-growth’ textures and suggest that little adsorption takes place under these conditions. At intermediate potentials the [100] texture was found, often with a mixture of [221] or [211] and it is suggested that these intermediate textures are associated with adsorption processes. When the [100] texture was found a second [100] axis of the deposit crystals was aligned in a specific direction and it is believed that this may be due to the presence of an alloying element rather than to the direction of current flow.     

陶瓷基板化学镀铜预处理的研究

为提高封装基板铜导体层与陶瓷基板的结合强度，研究了在氧化铝和氮化铝的基板上进行化学镀铜，对表面进行粗化和改性，经过优化工艺条件后，氧化铝与镀层的结合强度可以达到27MPa，氮化铝与镀层的结合强度可以达到22MPa。     

Effect of Substrate Temperature on Cold-Gas-Sprayed Coatings on Ceramic Substrates

This study focuses on cold-gas-sprayed deposition of metallic coatings onto ceramic substrates for application in power electronics. In order to achieve the required surface activation for bonding, the substrate is heated during spraying. The effects of substrate temperature on bond strength and coating properties are investigated for cold-gas-sprayed coatings of copper and aluminum on Al₂O₃. It is found that the adhesion strengths of the cold-gas-sprayed coatings and that of the single-impacting particles increase with the increasing temperature and roughness of the substrate. Coatings sprayed on heated substrates show relatively low compressive stresses and low hardness, while their electrical conductivity reaches high values of over 90% IACS. Overall, a higher substrate temperature is found to improve the coating properties significantly.     

NiCrSiB Coatings Deposited by Plasma Transferred Arc on Different Steel Substrates

Colmonoy 6 (NiCrSiB) is a Ni-based alloy recognized for its superior mechanical properties, attributed to the presence of a dispersion of hard carbides and borides, which is strongly dependent on processing technique. This work gathered microstructure data from the literature and analyzed Colmonoy 6 coatings deposited by plasma transferred arc hardfacing. The aim of the study was to determine the influence of PTA deposition parameters and substrate chemical composition on NiCrSiB coating characteristics. Coatings were characterized in terms of their hardness, dilution, and microstructure, as well as mass loss during abrasive sliding wear tests. The results showed that coating performance is strongly dependent on the chemical composition of the substrate. Carbon steel substrate yielded coatings with greater wear resistance. Processing parameters also alter the performance of coatings, and the lower current and lower travel speed result in reduced mass loss.     

挤压对喷雾沉积ZA27-4%Si合金阻尼性能的影响

用喷雾沉积快速凝固技术制备了含硅 4 %的ZA2 7合金 ,并对其进行了热挤压。采用多功能内耗仪测试合金挤压前后的阻尼性能。结果表明 ,喷雾沉积ZA2 7 4 %Si合金挤压前后的阻尼性能随着温度升高而升高 ,随频率增大而减小 ,与应变振幅无关。与喷雾沉积态相比 ,挤压对合金室温阻尼影响不大 ,但在高于 5 0℃时可提高合金阻尼。如 10 5℃时 ,合金的阻尼可达 5 0 7× 10 - 2 ,比未挤压前相比提高了近 2 0 %。合金阻尼可用传统的界面阻尼理论和位错阻尼理论解释。     

采用热丝CVD法在多种基材上沉积金刚石薄膜

热丝法是一种比较成熟的气相合成金刚石膜的方法,其其它方法比较,热丝法在工艺参数对金刚石薄膜的结构和质量的影响、界面的形成、薄膜生长各阶段的特征等方面的基础研究及各种应用研究上有其特征的优越性。本文采用热丝法在ＳｉＣ昌须增强Ｓｉ３Ｎ４陶瓷、ＡＩＮ陶瓷、Ｓｉ单晶片、Ｍｏ片等基材上沉积出金刚薄膜,并通过ＴＥＭ和ＳＥＭ进行观察,分析和研究了影响金刚石薄膜沉积的因素．     

High Temperature Tribological Properties of Ti-GLC Films Deposited on Different Bearing Steel SubstratesEI北大核心CSCD

针对航空发动机主轴轴承服役工况恶劣和类石墨碳基薄膜在高温环境下的性能研究不足等问题,采用磁控溅射技术在不同轴承钢基体(M50 钢、M50NiL 钢和 W9Cr4V2Mo 钢)上沉积 Ti-GLC 薄膜,探究在不同温度下的摩擦学性能。采用 SEM、 Raman 分析薄膜的微观结构,采用纳米压痕仪、划痕仪等测试其力学性能,利用 MFT-5000 型多功能摩擦磨损试验机测试所镀薄膜在不同温度下(室温、200 ℃、250 ℃和 300 ℃)的摩擦学性能。结果表明：在三种不同轴承钢基体沉积的 Ti-GLC 薄膜,其硬度和弹性模量变化不大,结合力从大到小依次为 M50＞M50NiL＞W9Cr4V2Mo。随着温度的升高,三种钢基体沉积 Ti-GLC 薄膜的摩擦因数均逐渐增大,而磨损率则先减小后增大,且表现出不同的磨损形式。三种轴承钢基体沉积 Ti-GLC 薄膜的最佳工作温度区间为室温~200 ℃,M50 钢基体所镀薄膜具有更好的力学性能和摩擦学性能,其结合力达到 80 N 以上, 300 ℃时的平均摩擦因数为 0.125,磨损率仅为 3.05×10^?17 m³ /(N·m)。研究成果为类石墨碳基薄膜在高温环境下的实际应用奠定了理论基础。