SiGe HBT的脉冲中子及γ辐射效应

测量了反应堆脉冲中子及γ辐照SiGe HBT典型电参数变化.在反应堆1×1013cm-2的脉冲中子注量和256.85Gy(Si)γ总剂量辐照后,SiGe HBT静态共射极直流增益减小了20%.辐照后基极电流、结漏电流增大,集电极电流、击穿电压减小.特征截止频率fT基本不变,fmax略有减小.初步分析了SiGe HBT反应堆脉冲中子及γ辐射的损伤机理.     

SiGe HBT的脉冲中子及γ辐射效应

测量了反应堆脉冲中子及γ辐照SiGe HBT典型电参数变化.在反应堆1×1013cm-2的脉冲中子注量和256.85Gy(Si)γ总剂量辐照后,SiGe HBT静态共射极直流增益减小了20%.辐照后基极电流、结漏电流增大,集电极电流、击穿电压减小.特征截止频率fT基本不变,fmax略有减小.初步分析了SiGe HBT反应堆脉冲中子及γ辐射的损伤机理.     

高能电子辐照对三结GaAs激光电池特性的影响

研究了能量为1 MeV的电子辐照对三结GaAs激光电池(LPC)性能的影响。不同剂量电子辐照后三结GaAs LPC光照下的I-V特性测试结果表明，三结GaAs LPC短路电流、开路电压和最大输出功率的衰减随电子辐照剂量的提高而增大。通过测量不同波长激光照射下三结GaAs LPC的宽电压范围I-V曲线，确定了各子电池对应的光生电流，结果显示各子电池光生电流衰减随辐照剂量增加而不同程度地增大，越靠近衬底的子电池电流衰退越严重。利用wxAMPS软件模拟了各子电池光生电流随缺陷密度的变化关系，结合实验和模拟结果得到了各子电池辐照后的缺陷密度及缺陷引入率，结果表明各子电池受电子辐照后的缺陷引入率大致相同，约为6.7。可通过优化各结子电池厚度达到提高三结GaAs LPC抗辐照性能的目的。     

AlGaAs/GaAs HBT电压比较器

本文对异质结双极晶体管(HBT)电压比较器进行了理论分析,设计并制作了国内第一个AlGaAs/GaAs HBT电压比较器电路。首先,分析了HBT的基本工作原理;然后比较详细地分析了ECL电压比较器的工作原理并进行了设计。随后介绍了HBT的E-M模型,提取了模型参数,并对电路进行了模拟;最后全面介绍了AlGaAs/GaAs HBT电压比较器的制作过程。测试结果表明,HBT器件直流电流增益大于100,f_T为15.2GHz,f_(max)为14.8GHz;电路具有取样和锁存能力,并具有电压比较器的初步功能。     

考虑载流子速度和耗尽层宽度随电压变化的VBIC模型

针对VBIC (vertical bipolar inter-company）模型对HBT多电压偏置下S参数拟合不够准确的问题,考虑了GaAs基HBT集电区载流子速度和耗尽层宽度随电压的变化关系,建立了随外加电压变化的集电区渡越时间方程. 将得到的渡越时间方程内嵌到VBIC模型中,改进的模型提高了GaAs基HBT多电压偏置下S参数的拟合精度,其在很宽的电压范围内均与实际测试结果符合良好.     

考虑载流子速度和耗尽层宽度随电压变化的VBIC模型

针对VBIC(vertical bipolar inter-company)模型对HBT多电压偏置下S参数拟合不够准确的问题,考虑了GaAs基HBT集电区载流子速度和耗尽层宽度随电压的变化关系,建立了随外加电压变化的集电区渡越时间方程.将得到的渡越时间方程内嵌到VBIC模型中,改进的模型提高了GaAs基HBT多电压偏置下s参数的拟合精度,其在很宽的电压范围内均与实际测试结果符合良好.     

SiGe HBT 60Co γ射线辐照效应及退火特性

研究了国产SiGe异质结双极晶体管(HBT)60Co γ射线100Gy(Si)～10kGy(Si)总剂量辐照后的辐照效应及辐照后的退火特性.测试了辐照及退火后的直流电参数.实验结果显示,辐照后基极电流(Ib)明显增大,而集电极电流(Ic)基本不变,表明Ib的增加是电流增益退化的主要原因.退火结果表现为电流增益(β=Ic/Ib)继续衰降,表明SiGe HBT具有"后损伤"效应.对其机理进行了探讨,结果表明其主要原因是室温退火中界面态继续增长引起的.     

SiGe HBT60Coγ射线辐照效应及退火特性

研究了国产SiGe异质结双极晶体管(HBT)60Co γ射线100Gy(Si)～10kGy(Si)总剂量辐照后的辐照效应及辐照后的退火特性.测试了辐照及退火后的直流电参数.实验结果显示,辐照后基极电流(Ib)明显增大,而集电极电流(Ic)基本不变,表明Ib的增加是电流增益退化的主要原因.退火结果表现为电流增益(β=Ic/Ib)继续衰降,表明SiGe HBT具有"后损伤"效应.对其机理进行了探讨,结果表明其主要原因是室温退火中界面态继续增长引起的.     

TCD132D线阵CCD总剂量效应的实验分析

研究了60Coγ辐照TCD132D线阵CCD的总剂量效应实验结果;分析了CCD受总剂量效应影响后暗信号和饱和输出电压的典型波形;得出了CCD分别在不加偏置电压、加偏置电压加驱动信号和加偏置电压不加驱动信号三种工作状态下,受60Coγ辐照后暗信号电压和饱和输出电压随总剂量累积的变化规律,并进行了损伤机理分析。     

C波段3.5W/mm,PAE＞40%的InGaP/GaAs HBT功率管

通过优化InGaP/GaAs异质结双极晶体管(HBT)的材料结构和器件结构,采用BE金属自对准、发射极镇流和电镀空气桥等工艺技术,研制了C波段InGaP/GaAs HBT功率管.其击穿电压BVCBO大于31V,BVCEO大于21V;在5.4GHz时连续波(CW)饱和输出功率达到1.4W,功率密度达到3.5W/mm,功率附加效率(PAE)大于40%.     

Breakdown behavior of GaAs/AlGaAs HBTs

Avalanche breakdown behavior at the collector junction of the GaAs/AlGaAs HBT (heterojunction bipolar transistor) has been studied. Junction breakdown characteristics displaying hard breakdown, soft breakdown, and negative resistance breakdown behavior were observed and are interpreted by analysis of localized microplasma effects, uniform microplasma-free behavior, and associated current gain measurements. Light emission from the collector-base junction of the GaAs/AlGaAs HBT was observed and used to investigate breakdown uniformity. Using a simple punchthrough breakdown model, the theoretical breakdown curves at different collector doping concentrations and thicknesses were computed and found to be in agreement with maximum breakdown voltages measured from devices displaying the most uniform junction breakdown. The serious current gain degradation of GaAs/AlGaAs HBTs at low current densities was analyzed in connection with the measurement of a large collector-emitter breakdown voltage. The unexpected functional relationship between the collector-emitter breakdown voltage and collector-base breakdown voltage is explained by the absence of a hole-feedback effect for devices not exhibiting transistor action     

高性能六边形发射极InGaP/GaAs异质结双极型晶体管

六边形发射极的自对准InGaP/GaAs异质结具有优异的直流和微波性能.采用发射极面积为2μm×10μm的异质结双极型晶体管,VCE偏移电压小于150mV,膝点电压为0.5V(IC=16mA),BVCEO大于9V,BVCBO大于14V,特征频率高达92GHz,最高振荡频率达到105GHz.这些优异的性能预示着InGaP/GaAs HBT在超高速数字电路和微波功率放大领域具有广阔的应用前景.     

A new InP-InGaAs HBT with a superlattice-collector structure

The dc characteristics of an interesting InP-InGaAs heterojunction bipolar transistor (HBT) with a superlattice (SL) structure incorporated in the base-collector (B-C) junction are demonstrated. In the SL structure, holes injected from the collector collide with holes confined in the SL and impact them out of the SL across the valence-band discontinuities. With a collector-emitter (C-E) voltage V/sub CE/ less than the C-E breakdown voltage BV/sub CE0/, the current gain can be increased at base-current inputs because the released holes from the SL inject into the base to cause the emitter-base junction operating under more forward-biased condition. An ac current gain up to 204 is obtained. At base-emitter voltage V/sub BE/ inputs, the released holes travel to the base terminal to decrease the base current. The studied HBT exhibits common-emitter current gains exceeding 47 at low current levels and useful gains spreading over seven orders of magnitude of collector current.     

GaInP/GaAs collector-up tunneling-collector heterojunction bipolar transistors (C-up TC-HBTs): optimization of fabrication process and epitaxial layer structure for high-efficiency high-power amplifiers

This paper describes a novel heterojunction bipolar transistor (HBT) structure, the collector-up tunneling-collector HBT (C-up TC-HBT), that minimizes the offset voltage V/sub CE,sat/ and the knee voltage V/sub k/. In this device, a thin GaInP layer is used as a tunnel barrier at the base-collector (BC) junction to suppress hole injection into the collector, which results in small V/sub CE,sat/. Collector-up configuration is used because of the observed asymmetry of the band discontinuity between GaInP and GaAs depending on growth direction. To minimize V/sub k/, we optimized the epitaxial layer structure as well as the conditions of ion implantation into the extrinsic emitter and post-implantation annealing. The best results were obtained when a 5-nm-thick 5/spl times/10/sup 17/-cm/sup -3/-doped GaInP tunnel barrier with a 20-nm-thick undoped GaAs spacer was used at the BC junction, and when 2/spl times/10/sup 12/-cm/sup -2/ 50-keV B implantation was employed followed by 10-min annealing at 390/spl deg/C. Fabricated 40/spl times/40-/spl mu/m/sup 2/ C-up TC-HBTs showed almost zero V/sub CE,sat/ (<10 mV) and a very small V/sub k/ of 0.29 V at a collector current density of 4 kA/cm/sub 2/, which are much lower than those of a typical GaInP/GaAs HBT. The results indicate that the C-up TC-HBT's are attractive candidates for high-efficiency high power amplifiers.     

Characterization and modeling of bias-stressed InGaP/GaAs collector-up tunneling-collector HBTs fabricated with boron-ion implantation

To characterize and model the degradation of collector-up (C-up) heterojunction bipolar transistors (HBTs), we bias stress InGaP/GaAs C-up tunneling-collector HBTs (TC-HBTs) fabricated under various conditions for etching the collector mesas and of implanting boron ions into the extrinsic emitter. Contrary to the previous reports on reduction in collector current I/sub C/ of bias-stressed emitter-up HBTs fabricated with ion implantation, no I/sub C/ Gummel shift is observed in the case of C-up TC-HBTs, probably due to the lower damage resulting from the lower ion dosage. On the other hand, the base current of the bias-stressed C-up TC-HBTs increases with the decrease of the ion dose and with the increase of the collector mesa undercut under the collector electrode that is also used as an implant mask. We attribute the increased base current to the increased carrier recombination at the extrinsic base surface. Making the area of the emitter-base junction smaller than that of the base-collector junction-using electron-cyclotron resonance plasma etching together with lateral spreading of heavily implanted boron ions-results in a stable current gain even after a 1030-h testing at a junction temperature of 210/spl deg/C and a collector current density of 40/sup 2/kA/cm.     

AlGaAs/GaAs double-heterostructure-emitter bipolar transistor(DHEBT)

An AlGaAs/GaAs double-heterostructure-emitter bipolar transistor (DHEBT) fabricated by molecular beam epitaxy (MBE) is presented. The use of a structure symmetrical with respect to the base layer results in bidirectional transistor and switching behavior. Due to a significant area difference between emitter-base and base-collector junction, an asymmetrical property is observed. With an emitter edge-thinning design, the transistor performance may be further improved. A common-emitter current gain of up to 140 with a negligible collector-emitter offset voltage (~40 mV) is achieved. A bidirectional S-shaped negative-differential-resistance (NDA) phenomenon occurs at high V _CE bias voltage. The temperature dependence of the NDR is investigated. A three-terminal-controlled switching device is found to perform well when the control current is introduced into the base electrode     

DC and microwave noise transient behavior of InP/InGaAs doubleheterojunction bipolar transistor (DHBT) with polyimide passivation

DC and microwave noise transient behavior of InP/InGaAs double heterojunction bipolar transistor (DHBT) with polyimide passivation is reported in this paper for the first time. The base transient current is believed to be due to the change of surface potential near the base-emitter junction perimeter at the polyimide/emitter interface resulting from a decrease in the amount of trapped electrons in the polyimide. We also find that the surface potential on the sidewall of collector-emitter affected by the charge trapping and detrapping in polyimide may induce a parasitic polyimide field effect transistor along the surface of the base-collector junction which results in an excess collector transient current. These base and collector current transients result in associated transient of broadband shot noise. The time dependence of microwave noise figures due to the excess transients is also investigated. The better understanding of the mechanisms of the noise transient behavior of the InP HBT device is very useful to improve the device and circuit reliability     

Small offset-voltage In0.49Ga0.51P/GaAsdouble-barrier bipolar transistor

In_0.49Ga_0.51P/GaAs double-barrier bipolar transistors (DBBTs) grown by gas-source molecular beam epitaxy (GSMBE) have been fabricated and measured. This structure has two InGaP barrier layers (100 Å in thickness): one is inserted between the emitter-base (e-b) junction and the other between the base-collector (b-c) junction. An offset voltage of 26 mV and a differential current gain of 120 at room temperature were obtained with a heavily doped p⁺ (2×10¹⁹ cm^-3) base (500 Å in thickness). The small offset voltage was attributed to the similar structure of the e-b and b-c junctions and to the suppression of the hole injection current into the collector by the InGaP hole barrier at the b-c junction     

Observation of resonant tunneling at room temperature inGaInP/GaAs/GaInP double-heterojunction bipolar transistor

Negative differential resistance (NDR) has been observed at room temperature in GaInP/GaAs double-heterojunction bipolar transistors (DHBTs). Both the common-emitter and common-base current-voltage characteristics and their magnetic field dependence have been studied to confirm that the observed NDR is due to resonant tunneling. The collector-base voltages at which the collector current resonances occur are calculated and are consistent with the measured values. The devices exhibit an offset voltage of 57 mV and saturation voltage of ⩽ 2-V, both of which are the lowest reported values for GaInP/GaAs DHBTs. The collector-base breakdown voltage in these DHBTs is 31 V, and its variation with junction temperature is measured and described     

A compact model for SiGe HBT on thin-film SOI

Heterojunction bipolar transistor (HBT) fabrication on thin-film silicon-on-insulator (SOI) has been recently demonstrated. Due to the space volume constraint (thin film) for the device fabrication, the HBT structure is different from bulk HBT. In fact, compared to a bulk device, the buried layer has been suppressed and a lateral collector contact configuration is introduced. This device features a vertical expansion followed by a lateral expansion of the base-collector space charge region. This nonconventional charge behavior induces a kink in the base-collector junction capacitance characteristics, and as a consequence a modified Early effect. Furthermore, the low current transit time is modified compared to a bulk HBT. In this paper, all these effects are analyzed and a compact model for SOI-HBT is proposed. The model is validated on real SOI-HBTs with different collector doping levels.