The influence of reactor pressure on qualities of GaN layers grown by hydride vapor phase epitaxy

Influence of reactor pressure on the quality of GaN layers grown by hydride vapor phase epitaxy (HVPE) has been studied. With the reactor pressure decreasing from 7 to 5 × 10⁴ Pa, improvements in structural, optical, and electrical properties of the GaN films have been observed.An investigation of the surface morphology of the GaN films reveals that the improvements arise from the change of the growth mode from an island-like mode at high pressures to a step-flow one at low pressures. These results clearly indicate that the reactor pressure, similar to the growth temperature, is one of the important parameters to control the qualities of HVPE-GaN epilayers.     

Surface characterization of GaN and AlGaN layers grown by MOVPE

Surface properties of GaN and Al_0.17Ga_0.83N materials grown by metal organic vapor phase epitaxy (MOVPE) were systematically investigated by X-ray photoelectron spectroscopy (XPS). Air-exposed samples showed highly non-stoichiometric surfaces, which included a large amount of natural oxides. Deposition of Al on the air-exposed GaN surface caused interfacial reactions, resulting in the formation of oxide layers including Al₂O₃ and Ga oxide at the interface. A natural oxide layer of AlGaN surface possessed a complicated composition distribution in depth where the Al-oxide component was dominant on the topmost layer. Such natural oxide layers were found to be removed from GaN and AlGaN surfaces after the treatment in an NH₄OH solution at 50°C for 10 min, resulting in oxide-free and well-ordered surfaces.     

Microstructures of GaN thin films grown on graphene layers

Plan-view and cross-sectional transmission electron microscopy images show the microstructural properties of GaN thin films grown on graphene layers, including dislocation types and density, crystalline orientation and grain boundaries. The roles of ZnO nanowalls and GaN intermediate layers in the heteroepitaxial growth of GaN on graphene, revealed by cross-sectional transmission electron microscopy, are also discussed.     

Investigations of selectively grown GaN/InGaN epitaxial layers

We have studied GaN/InGaN heterostructures grown by selective area low pressure metalorganic vapor phase epitaxy (LP-MOVPE). A GaN layer already grown on the c-face of sapphire has been used as substrate, partly masked by SiO₂. In a second epitaxial step a GaN/InGaN single heterostructure and GaN/InGaN/GaN double heterostructures were grown on the unmasked rectangular fields. We obtained good selectivity for GaN and for InGaN. A larger growth rate as compared to planar epitaxy and strong growth enhancement at the edges was observed. Spatially resolved measurements of the luminescence show an increase in indium incorporation of about 80% at the edges. Besides the larger indium offering at the edges, this is due to an enhanced growth rate. Very smooth facets are obtained. The influence of pressure on the surface morphology and growth enhancement was investigated.     

ZnO nanostructures grown on epitaxial GaN

Presented is the growth of zinc oxide nanorod/nanowire arrays on gallium nitride epitaxial layers. A hierarchical zinc oxide morphology comprising of different scale zinc oxide nanostructures was observed. The first tier of the surface comprised of typical zinc oxide nanorods, with most bridging to adjacent nanorods. While the second tier comprised of smaller zinc oxide nanowires approximately 30 nm in width often growing atop the aforementioned bridges. Samples were analysed via scanning electron microscopy, as well as, cross-sectional and high resolution transmission electron microscopy to elucidate the detailed growth and structural elements of the heterostructure.     

Cubic GaN layers grown by metalorganic chemical vapor deposition on GaN templates obtained by nitridation of GaAs

Cubic gallium nitride epitaxial layers were grown by metalorganic chemical vapor deposition on GaN templates obtained by nitridation of GaAs substrates. The GaN structure can be peeled off the GaAs substrate and it can be handled separately. X-ray diffraction, Raman and photoluminescence measurements show that the epitaxial layers are cubic and monocrystalline.     

AFM studies of microindented GaN and InGaN

The microhardness characteristics of GaN and GaN/InGaN films epitaxially grown on (0001) sapphire have been investigated using Vickers and Knoop indenters. The variation of H_V and H_K follows a reverse type of indentation size effect (reverse ISE). The microhardness results have also been analyzed using Meyer's law, Hays-Kendall approach and Proportional specimen resistance (PSR) model. The effect of N⁺ implantation on the microhardness of GaN has also been studied. The implanted sample is more resistant to plastic penetration than the unimplanted one and it is found that implantation enhances the surface hardness. Detailed AFM studies around the indented regions of the GaN and GaN/InGaN give the nature and behavior of the deformation on the surface.     

The structure of GaN layers grown on SiC and sapphire by molecular beam epitaxy

A comparative study of the defects at the interfaces and inside the layers was carried out in GaN/AlN epitaxial layers on SiC and sapphire. Whereas surface cleaning of the sapphire substrates is rather standardised now, the SiC substrates cleaning is still to optimise conditions, as the high densities of defects inside the epitaxial layers cannot be explained solely by the 3.54% lattice mismatch. The investigated specimens were grown by molecular beam epitaxy (MBE), either assisted by electron cyclotron resonance or an NH₃ gas source system to provide atomic nitrogen. Assuming that MBE is a growth technique more or less close to equilibrium, the observed defects are interpreted and a growth mechanism, for GaN layers on the stepped (0001) SiC and sapphire surfaces, is proposed.     

Preparation of Porous GaN Buffer and Its Influence on the Residual Stress of GaN Epilayers Grown by Hydride Vapor Phase Epitaxy

The preparation of porous structure on the molecular beam epitaxy （MBE）-grown mixed-polarity GaN epilayers was reported by using the wet chemical etching method. The effect of this porous structure on the residual stress of subsequent-growth GaN epilayers was studied by Raman and photoluminescence （PL） spectrum. Substantial decrease in the biaxial stresse can be achieved by employing the porous buffers in the hydride vapour phase epitaxy （HVPE） epilayer growth.     

Characterization of GaN epitaxial layers on SiC substrates with AlxGa1−xN buffer layers

High quality GaN epitaxial layers were obtained with Al_xGa_1−xN buffer layers on 6H–SiC substrates. The low-pressure metalorganic chemical vapor deposition (LP-MOCVD) method was used. The 500 Å thick buffer layers of Al_xGa_1−xN (0≤x≤1) were deposited on SiC substrates at 1025°C. The FWHM of GaN (0004) X-ray curves are 2–3 arcmin, which vary with the Al content in Al_xGa_1−xN buffer layers. An optimum Al content is found to be 0.18. The best GaN epitaxial film has the mobility and carrier concentration about 564 cm² V⁻¹ s⁻¹ and 1.6×10¹⁷ cm⁻³ at 300 K. The splitting diffraction angle between GaN and Al_xGa_1−xN were also analyzed from X-ray diffraction curves.     

氢化气相外延氮化镓生长中气氛的作用研究

报告了氢化物气相外延技术中，在载气氮气氛中加入氢气对材料表面形貌及材料性质的影响。实验发现生长气氛中氛的存在会显著改进材料的质量，这种作用被归之于氢气氛下氮气在气相中的反应下降以及生长表面较低的氮的活动能力。     

Defect structure originating from threading dislocations within the GaN film grown on a convex patterned sapphire substrate

We investigated defect structures in the GaN film grown on a convex patterned sapphire substrate (CPSS) to determine the origin of structural improvement by transmission electron microscopy (TEM) and laser confocal scanning microscopy (LCSM). From the TEM results, we found that most of the threading dislocations (TDs) in the trench region of the CPSS were bent by lateral growth mode. Also the staircase-like TDs were observed near the curved slant region of the convex pattern; they converged at the top of the convex patterned region by staircase-upward propagation. This scenario seems to effectively prevent TDs from vertical propagation in the trench region. The photoluminescence mapping and spectra obtained by LCSM are consistent with these results from TEM observations. The generation of staircase-like TDs relates to the formation of a terraced surface during the growth, and suggests a probable mechanism that changes the propagation direction of TDs via the curved surface of the CPSS. The lateral growth and staircase-upward propagation of TDs are major factors on structural improvement of the GaN film grown on CPSS.     

GaN纳米棒的合成与表征

利用化学气相沉淀法（CVD）以Ga2O3和NH3为原料在沉积有乙酸镍的硅衬底上合成出了GaN纳米棒,纳米棒直径在50-200nm，长度在2-10μm，表面比较光滑,利用场发射扫描电镜（FESEM），X射线衍射仪（XRD），能量散射谱（EDS）对样品进行了成分和结构分析，表明GaN纳米棒是单晶的纤锌矿结构，同时对其生长机理进行了探讨。     

Electric force microscopy study of the surface electrostatic property of rubbed polyimide alignment layers

Two polyimides were synthesized for use as alignment layers. The pretilt angles of the liquid crystals, 4-cyano-4′-n-pentylbiphenyl, on the two polyimides were measured by the crystal rotation method. The relative surface atomic concentrations of F/C (%) were measured by X-ray photoelectron spectroscopy. Electric force microscopy was utilized to investigate the surface electrostatic property of the two thin polyimide alignment layers before and after rubbing. All results demonstrate that rubbing causes trifluoromethyl moieties to migrate towards the surface, absorb negative charges and orient along the rubbing direction. Thus, it is proposed that distributions of functional groups on the surface of the polyimide after rubbing are anisotropic and the van der Waals forces between the polar groups and liquid crystal molecules play an important role in the uniform orientation of the liquid crystal molecules.     

Broad band photoluminescence studies of diamond layers grown by hot-filament CVD

Photoluminescence and Raman spectroscopy were employed to investigate the broad band luminescence in thin diamond films grown on a silicon substrate by the HF CVD technique. The broad band luminescence with a maximum emission at 1.8–2 eV observed for CVD diamonds is characteristic for amorphous carbon with sp²-hybridized carbon bonds. As was shown by the Raman spectroscopy our diamond layer contained certain amounts of amorphous carbon phase and diamond nanocrystals which were the source of an additional energy state within the diamond energy gap. The experimental results precluded the possibility of broad band luminescence being due to the electron–lattice interaction. The amorphous carbon and diamond nanocrystals admixture in polycrystalline diamond layer introduced a defect state in the energy gap not in the form of point defects but rather in the form of a line or extended defects. In consequence these extended defects were responsible for the broad PL spectrum in the CVD diamond films.     

Morphology of strained and relaxed SiGe layers grown on high-index Si substrates

We have investigated the surface morphology of strained and relaxed SiGe layers grown on Si substrates with surface normals rotated off of the [001] axis towards [111] by 0, 13, and 25°. Atomic force microscopy has revealed surface corrugations in thin layers prior to plastic relaxation on each of the surfaces due to the initial deposition of the strained films. Thicker partially relaxed layers have previously been shown to contain networks of misfit dislocations which create patterns that are unique to each substrate orientation. We find on these relaxed layers that the surface corrugations are well aligned with the dislocation networks forming a modified crosshatch pattern on the off-axis substrates. More strikingly, though, we find that these corrugations are comprised of smaller nanostructured features which are also unique to each surface. Topographs of the unrelaxed surfaces show no such organization indicating a correspondence between the misfit dislocations and the surface corrugations.     

Fabrication and characterisation of p-type GaN metal-semiconductor-metal ultraviolet photoconductors grown by MBE

We have fabricated interdigital metal-semiconductor-metal ultraviolet photoconductors using p-type GaN grown by MBE. The material had a hole concentration of 10¹⁸ cm⁻³ and a mobility of 5 cm² V⁻¹ s⁻¹. The spectral response of the detectors has been measured and it shows a peak at 364.2 nm (3.402 eV) possibly caused by excitonic effects. The transient response of the photodetector cannot be described by a single time constant. The rise and fall times of the photoresponse are different indicating that the theory usually applied to GaN photoconductors is not valid.     

The role of trimethylgallium flow during nucleation layer deposition in the optimization of epitaxial GaN films

The effects of the trimethylgallium flow (14–55 μmol/min) during the deposition of the GaN nucleation layer on the structure and electronic properties of GaN epilayers were examined. X-ray and mobility studies indicate that GaN epilayers, grown using non-optimal trimethylgallium (TMG) flow, result in wide FWHM peak and low electron mobility. On the contrary, an optimal TMG flow during the nucleation layer growth leads to films with superior structural and electronic properties. Atomic force microscopy (AFM) was used to systematically investigate the morphological evolution of as-grown nucleation layers, and the nucleation layers were heated to 1000°C under different TMG flows.     

Effect of nitridation on crystallinity of GaN grown on GaAs by MBE

GaN films are grown on [0 0 1] GaAs substrates by plasma-assisted molecular beam epitaxy using a three-step process that consists of a substrate nitridation, deposition of a low-temperature buffer layer, and a high-temperature overgrowth. Films are evaluated by X-ray diffraction and the dependence of crystalline quality on the nitridation temperature is studied. It is demonstrated that nitridation has to be performed at low-temperature to achieve c-oriented α-GaN. Higher nitridation temperature promotes formation of mis-oriented domains and β-GaN inclusions     

掺Si对MOCVD生长的GaN单晶膜的黄带发射及生长速率的影响

对ＭＯＣＶＤ生长ＧａＮ：Ｓｉ薄膜进行了研究,研究表明随ＳｉＨ４／ＴＭＧａ流量比增大,ＧａＮ：Ｓｉ单晶膜的电子浓度增大,迁移率下降,Ｘ射线双晶衍射峰半高宽增加,同时这发射强度得到了大大的提高,并报导了随ＳｉＨ４／ＴＭＧａ流量比增大,ＧａＮ：Ｓｉ的生长速率降低的现象,研究结果还表明,预反应对ＧａＮ：Ｓｉ单晶膜黄带发射影响很大,预反应的减小可以使黄带受到抑制。