共查询到19条相似文献,搜索用时 86 毫秒
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一、电子束焊接原理与特点电子束焊接是利用汇聚的高速电子流轰击工件接缝处所产生的热能 ,使金属融合的一种焊接方法。电子束是从电子枪中产生的。通常电子是以热发射的方式从发射体 (阴极 )逸出。在 2 5~ 30 0kV电压的作用下 ,电子被加速到 0 .3~ 0 .7倍的光速 ,具有极大的动能。经电子枪中静电透镜和电磁透镜的作用 ,电子汇聚成能量密度很高的电子束。这种电子束撞击到工件表面 ,电子巨大的动能就转变为热能 ,使金属迅速融化和蒸发。在高压金属蒸汽的作用下融化的金属被排开。电子束就能继续撞击深处的固态金属 ,很快在被焊工件上钻… 相似文献
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小林 《世界制造技术与装备市场》1996,(1):60-60
Michigan公司把原先用电子束(EB)焊接生产汽车、宇航和医疗器械用零件的有些部位,现在已改用激光焊接。虽然,电子束焊接的质量最好,但Special WeldingServices(SWS)公司所用的激光焊接其效率要比电子束焊接高出2~3倍,其焊接质量也类似电子束的焊接质量,且正常生产时间可达95%。 EB焊接在真空中进行,故焊接污染不大,零件变形最小,同时有大的焊接深宽比。可惜的是这一过程耗时太多,还要求在铅衬的小室内工作,以防发出的射线影响四周。而且,真空室的大小,限制了所能焊接的零件尺寸。 SWS的总裁Jay Morley说:“我们看到了对EB焊接质量所唤起的要求,但是,这种技术的成本和处理时间对任何产量的成本都过高。” 相似文献
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电子束焊接在齿轮加工中的应用 总被引:1,自引:0,他引:1
对电子束焊接的特点、工艺要求进行了简述,并通过实例说明这种焊接方法在齿轮加工中的应用场合,采用电子束焊接时各齿轮组件的加工工艺要求及工艺过程。实验结果表明,该工艺扩大了设备的加工能力,提高了设备的利用率。 相似文献
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ZD系列电子束焊接技术及应用 总被引:1,自引:0,他引:1
国内电子束加工技术近年来得到了快速发展,并广泛地应用于制造工业中,特别是在武器装备制造方面.文章介绍了ZD系列电子束焊接设备和工艺技术的发展情况及其应用. 相似文献
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近几年 ,我厂开发出日本五十铃系列MSA、MSB数种汽车变速器及TCM叉车变速器 ,其产品的技术水平在国内处于领先地位。在齿轴零件的制造过程中 ,有些零件考虑其结构及加工工艺性 ,大胆采用了国内先进的电子束焊接技术 ,应用效果较为显著 ,既提高了产品质量 ,又降低了生产成本。 一、设备概况1.我厂现采用的电子束焊机是北京中科电气高技术公司生产的低真空齿轮焊接专用设备 ,型号为EBW— 4GC ,焊接具有可靠的自动运行程序系统 ,操作方便、焊缝质量优良、重复精度高。2 .设备的电子束加工原理 ,是由灼热阴极所发射的电子流在… 相似文献
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Ming-Der Jean Jen-Ting Wang 《The International Journal of Advanced Manufacturing Technology》2006,28(9):882-889
This paper presents the application of principal components analysis for Taguchi orthogonal experiments to develop a robust
electron beam welding treatment (EBWT) process with high efficiency multiple performance characteristics (MPCs). In this study,
the principal components analysis (PCA) design incorporating the correlation matrix of tested trials is employed. In the first
step, the MPCs are reduced to two independent components using PCA. Both components accounted for 98.8% of the total variance.
The first principal component (PC), which refers to the integrated hardening capability index of the EBWT process, accounts
for 70.7% of the total variation. The remaining 28.1% were contributed by the second PC, which can be interpreted as the penetration
capability index. In the second step, we identify the most important PC loading vectors using PCA, and estimate the importance
of the PCs. By using PCA, relationships between different MPCs can be investigated and the most important factors for the
variance of the EBWT process can be identified.
The experimental results show that redundant information could be eliminated by using principal components in conjunction
with Taguchi’s orthogonal array experiments. This proposed approach is simple, effective, and efficient for developing a robust
and high-efficiency EBWT process of high quality. In this study, the MPCs in the EBWT process are successfully optimized . 相似文献
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Since the end of the last millennium, the focused ion beam scanning electron microscopy (FIB‐SEM) has progressively found use in biological research. This instrument is a scanning electron microscope (SEM) with an attached gallium ion column and the 2 beams, electrons and ions (FIB) are focused on one coincident point. The main application is the acquisition of three‐dimensional data, FIB‐SEM tomography. With the ion beam, some nanometres of the surface are removed and the remaining block‐face is imaged with the electron beam in a repetitive manner. The instrument can also be used to cut open biological structures to get access to internal structures or to prepare thin lamella for imaging by (cryo‐) transmission electron microscopy. Here, we will present an overview of the development of FIB‐SEM and discuss a few points about sample preparation and imaging. 相似文献
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Eisaku Oho Toshihide Sasaki Koichi Adachi Koichi Kanaya 《Microscopy research and technique》1985,2(5):463-469
The present report illustrates a computerized method for precise measurement of the diameter of an electron beam. The value of this measurement extends beyond simply providing an accurate estimate of resolution. Other salient areas which will benefit include quantitative X-ray microanalysis, energy loss spectroscopy, diffraction studies, and electron beam lithography. The biological sciences as well as the material sciences will gain enormously from improved accuracy in measurement (control) of beam diameter. It is anticipated that most or all of the mathematical manipulations outlined in this paper will be incorporated into digital electronic packages which will perform the functions automatically for setting the electron beam diameter to the scientist's choice. The purpose of the present report is to indicate some of the principles involved so that as electron microscopy becomes more computerized and automated, the user will have some understanding of what the electronics are doing rather than simply depressing a button or two and ignoring the power of what resides within the walls of the instrument. The performance of a scanning electron microscope (SEM) and a scanning transmission electron microscope (STEM) is roughly determined by the incident electron probe beam size (diameter) involving a sufficient electron current. In the present paper, the diameter of an ultrafine electron beam is measured indirectly from the information given by the blurring of an edge in a STEM or a SEM image of a crystalline specimen with fine, sharp edges. The obtained data were processed by digital image processing methods which give an accurate value of the beam diameter. For confirming the validity of this method, a suitable simulation based on the convolution theorem was performed. By using this measurement, we could measure the diameter of an ultrafine electron beam down to 2 nm, which could not be measured easily by previous techniques. 相似文献
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