倒筒式射频溅射频偏压对Ba0.65Sr0.35TiO3热释电薄膜结构及性能的影响

采用倒筒式射频溅射方法,在Pt、Ti/SiO2/Si基片上制备了Ba0.65Sr0.35TiO3(简称BST)薄膜.研究了自偏压对BST薄膜结构及电学性能的影响.在较高自偏压下制备的BST薄膜具有高度的(100)择优取向,且结晶性好,表面平整,耐压能力强.在25℃时薄膜的热释电系数高达6.73×10-7C.cM-2.K-7.研究结果表明,利用倒筒式射频溅射方法适当提高自偏压,可以制备出热释电性能优良的BST薄膜.     

溶胶-凝胶法制备外延Ba1-xSrxTiO3薄膜及其结构与性能研究

应用溶胶-凝胶技术在Pt/MgO(100)衬底上成功地制备了Ba0.65Sr0.35TiO3外延薄膜.XRD和SEM分析结果表明该薄膜在O2气氛中650℃热处理1h后,其(001)面是沿着Pt(100)和MgO(100)面外延取向生长的;薄膜表面均匀致密,厚度为260nm,平均晶粒大小为48.5nm.当测试频率为10kHz时,BST薄膜的介电常数和损耗因子分别为480和0.02.介电常数-温度关系测试结果表明sol-gel工艺制备的Ba0.65Sr0.35TiO3薄膜其居里温度在35℃左右,且在该温度下Ba0.65Sr0.35TiO3薄膜存在扩散铁电相变特征.当外加偏置电压为3V时,BST薄膜的漏电流密度为1.5×10-7A/cm2.该薄膜可作为制备新型非制冷红外焦平面阵列和先进非制冷红外热像仪的优选材料.     

Dielectric Characteristics of Ba0.65Sr0.35TiO3 Thin Films Sol-Gel Method

Ferroelectric Ba0.65Sr0.35TiO3 （BST） thin films on the Pt/Ti/SiO2/Si substrate have been successfully prepared by sol-gel. Such films have approximately 300 nm thicknesses with a remnant polarization of about 2.95 μ℃/cm^2 and a coercive field of about 21.5 kV/cm. The investigations of X-ray diffraction and atomic force microscopy show that the BST films annealed at 650 ℃ exhibit a tetragonal structure and that the films dominantly consist of large column or grains of about 89 nm in diameter. The curves of the temperature dependence of dielectric coefficient in different frequencies display the curie transition at the temperature around 23 ℃. The dielectric loss tangent of BST thin fdms at 100 kHz is less than 0.04. As a result, the BST thin films are more applicable for fabrication of infrared detector compared with the BST thin films reported previously.     

微波烧结法制备Ba0.65Sr0.35TiO3热释电陶瓷

采用溶胶－凝胶工艺制备了（Ba,Sr)TiO3凝胶，并利用微波烧结技术对粉体进行了合成和烧结，获得了晶粒尺寸在1μm以内的Ba0.65Sr0.35TiO3热释电陶瓷。对样品的介电特性和热释电特性进行了测试，分析了微波烧结工艺对材料电性能的影响。实验结果表明：该工艺可将钙钛矿相的合成温度由1100℃降低至900℃，并在1310℃烧结25min获得细晶粒的Ba0.65Sr0.35TiO3，其热释电系数和介电常数与传统陶瓷相差不大，从而材料的热释电响应优值因子要比传统方法获得的样品提高了近1倍。     

(Ba0.5Sr0.5)TiO3/LaNiO3异质薄膜的介电调谐特性

用脉冲激光沉积工艺制备Ba0.5Sr0.5TiO3(简称BST)薄膜和Ba0.5Sr0.5TiO3/LaNiO3(简称BST/LNO)薄膜。在650℃原位退火10 min,获得了(100)和(110)择优取向生长的BST和BST/LNO薄膜,薄膜晶粒呈柱状结构,BST薄膜和BST/LNO异质结构薄膜的晶粒尺寸分别为150~200 nm和50~80 nm。在室温和1 MHz条件下,BST薄膜和BST/LNO异质结构薄膜的相对介电常数和介电调谐率分别达811和58.9%、986和60.1%;用LNO作底电极,可增益介电常数和介电调谐率。     

Ba0.6Sr0.4TiO3薄膜的耐压特性研究

采用射频磁控溅射法制备了Ba0.6Sr0.4TiO3(BST)薄膜,研究了基片、退火温度及膜厚对薄膜耐压特性的影响。结果显示,铝酸镧(LaAlO3)基片上制备的BST薄膜表面较平整,有较好的耐压;随着退火温度从750℃提高到850℃,BST薄膜晶粒长大,电击穿概率有所增加,750℃是一个较合理的退火温度。在优化的工艺条件下,BST薄膜耐压可达125V/μm。     

磁控溅射法制备BST铁电薄膜的实验研究

采用射频磁控溅射法在Si和Pt/TiOx/SiO2/Si衬底上沉积了(Ba0.65Sr0.35)TiO3铁电薄膜,研究了BST铁电薄膜微观结构和介电性能。实验结果表明:衬底温度在550℃,工作气压为2.0 Pa的溅射条件下沉积的BST薄膜,经750℃退火处理30 min后,形成了完整的钙钛矿相;与Si衬底相比,在Pt衬底上制备的BST薄膜晶粒更均匀、表面平整无裂纹。在室温、频率为100 kHz条件下薄膜的介电常数ε=353.8,介电损耗tanδ=0.012 8。介电温谱结果表明制备的(Ba0.65Sr0.35)TiO3铁电薄膜居里温度在5.0℃左右。     

CeO_2缓冲层对蓝宝石基Ba_(0.6)Sr_(0.4)TiO_3薄膜结构和介电性能的影响

利用磁控溅射法制备Ce O_2缓冲层,通过脉冲激光沉积法制备Ba_(0.6)Sr_(0.4)TiO_3(BST)薄膜,在Al_2O_3(11—02)蓝宝石基片上构架了Pt/BST/Ce O_2/Al_2O_3和Pt/BST/Al_2O_3叉指电容器,对比研究了Ce O_2缓冲层对BST薄膜结构和叉指电容器介电性能的影响。通过X射线衍射仪、原子力显微镜和LCR表分别对叉指电容器的结构、表面形貌和介电性能进行了表征。实验发现,直接沉积在蓝宝石上的BST薄膜为多晶结构,生长在Ce O_2缓冲层上的BST为(001)取向的高质量外延薄膜。生长在Ce O_2缓冲层上的BST薄膜相对于没有缓冲层的BST薄膜具有更小的晶粒和均方根粗糙度。在40 V偏置电压下,Pt/BST/Al_2O_3和Pt/BST/Ce O_2/Al_2O_3叉指电容器的调谐率分别是13.2%和25.8%;最小介电损耗为0.021和0.014。结果表明Ce O_2缓冲层对生长在蓝宝石基片上的BST薄膜结构和介电性能具有重要影响。     

外延Ba1-xSrxTiO3薄膜的Sol-Gel法制备及其电性能研究

以Ba(CH3COO)2,Sr(CH3COO)2和Ti(OC4H9)4为原料，以乙二醇甲醚为溶剂，冰乙酸为催化剂，应用溶胶－凝胶技术在Pt/MgO(100)衬底上成功地制备了外延生长B 0.65S0.35TiO3薄膜，XRD和SEM分析结果表明，该薄膜在O2气氛中650℃热处理1h后，其（001）面是沿着Pt(100)和MgO(100)面外延取向生长的，其平均晶粒大小为48．5nm，电性能测试结果表明，当测试频率为10kHz时，其介电常数和损耗因子分别为480和0．02，电滞回线测试结果表明，外延生长Ba0.65Sr0.35TiO3薄膜的剩余极化为2．8μC/cm^2其矫顽场为52kV/cm。     

溶胶–凝胶法制备BST薄膜的结晶特性研究

采用改进的溶胶–凝胶(sol-gel)工艺配制了(Ba0.65,Sr0.35)TiO3(BST)溶胶。利用旋转涂覆工艺将BST溶胶涂覆在SiO2/Si衬底上,在不同的热处理条件下制备出BST薄膜。XRD分析结果表明:制得的BST薄膜形成了单一钙钛矿结构;AFM测试结果表明,BST薄膜表面平整致密,无裂纹。表面均方根粗糙度为3~6nm,晶粒大小分布均匀,直径约为40~100nm。随着热处理温度的提高,BST薄膜的晶粒变大,表面粗糙度变大。     

Dielectric Characteristics of Ba_(0.65)Sr_(0.35)TiO_3 Thin Films by Sol-Gel Method

Ferroelectric Ba0.65Sr0.35TiO3(BST) thin films on the Pt/Ti/SiO2/Si substrate have been successfully prepared by sol-gel. Such films have approximately 300 nm thicknesses with a remnant polarization of about 2.95 μC/cm2 and a coercive field of about 21.5 kV/cm. The investigations of X-ray diffraction and atomic force microscopy show that the BST films annealed at 650 °C exhibit a tetragonal structure and that the films dominantly consist of large column or grains of about 89 nm in diameter. The curves of the temperature dependence of dielectric coefficient in different frequencies display the curie transition at the temperature around 23 °C. The dielectric loss tangent of BST thin films at 100 kHz is less than 0.04. As a result,the BST thin films are more applicable for fabrication of infrared detector compared with the BST thin films reported previously.     

（Ba1—xPbx）TiO3纳米粉料合成的研究

以硝钡，硝酸铅，钛酸丁酯和草酸为原料，采用化学共沉淀法成功地制备了（Ba1-xPbx)TiO3纳米（X＝0．1、0．2……，1．0）系列纳米材料，并通过XRD、FTIR、DTA等方法对纳米粉料的结构进行了表征。用SEM对粉料做了显微分析，粉料粒径约为50nm左右。颗粒呈球形或椭球形，分散性好、活性高为制作PTC陶瓷提供了优质的基料。     

Ba0.7Sr0.3TiO3热释电陶瓷材料研究

采用Pechini法制备了100 nm的Ba0.7Sr0.3TiO3纳米粉体,并用凝胶注模成型工艺制备不同Mn含量的BST陶瓷。研究表明,在Mn掺杂量为0.5%(摩尔分数),烧结温度为1 280℃时制备的样品,其热释电性能较好,在居里温度附近,30～40℃时,其平均热释电系数为450μC.m–2.K–1,对应平均探测率优值为5.6μC.m–3.K–1,1kHz频率条件下tanδ低于0.5%,εr为3 500左右(室温20℃,外加偏压200 V/mm)。     

水基前驱体法制备BST铁电薄膜的研究

Ba1-SrxTiO3(BST)薄膜具有非线性强、漏电流小、不易疲劳等特点,在高密度动态随机存储器的应用,受到x了极大关注。以水基溶液为前驱体,调整Ti(OC4H9)4与H2O的配比以改变溶胶的黏度,并采用旋涂法制备了BST铁电薄膜。对水基BST前驱体溶液进行了DSC/TG和XRD分析。实验表明,采用较高浓度的水基前驱体,有利于薄膜的形成和均匀性。薄膜的相结构研究表明,随着退火温度的上升,BST薄膜的结晶度上升,而晶粒尺寸随之略有下降。     

Ba过量对(Ba0.8Pb0.2)TiO3系陶瓷PTC性能的影响

借SEM、XRD、R-t,αR及Vb等测试手段,研究了Ba过量对(Ba0.8Pb0.2)TiO3系陶瓷的微结构及PTC性能的影响。结果表明,当Ba过量5.0%(摩尔分数)时,能使晶粒细化,致密度良好,PTC性能得到显著改善:升阻比为4.2,αR为28.9%/℃,Vb≥520 V.mm–1。而Ba过量大于或小于5.0%都会对性能产生恶化作用。通过XRD发现,Ba过量形成的第二相Ba2TiO4及钡空位浓度的减小,是引起变化的重要因素。     

Fabrication and properties of multilayer Sr0.7Ba0.3TiO3 ceramic varistors

The fabrication and properties of the multilayer Sr_0.7Ba_0.3TiO₃ ceramic varistors made from low-fire Sr_0.7Ba_0.3TiO₃-based ceramic materials doped with small amounts of additives such as Nb₂O₅ and Li₂CO₃ are described. After being sintered at 1100° C in a reducing atmosphere and annealed at 900° C in air, the varistors exhibited the following characteristics: varistor voltage V_1mA, 10 v; nonlinear coefficientα, 15. The varistor voltage was almost unchanged against a supplied surge energy of 300 J/cm³. The varistors had excellent capacitor characteristics. The capacitance and loss factor were 80 nF and 2%, respectively.