Diamond-like carbon overcoat for TFMH using filtered cathodic arc system with Ar-assisted arc discharge

The deposition system described for sub-30 Å and thicker carbon (ta-C) overcoat that includes two RF ion beam guns and Filtered Cathodic Arc (FCA) module mounted on a single vacuum chamber. The system is capable of flattening the Thin Film Magnetic Heads (TFMH) surface by ion beam etching; smoothing scratches, trenches, steps on boundaries of different materials, and enhancing the adhesion by ion assisted ion beam sputtering. It provides the highly controllable deposition of carbon using an FCA module with Ar-assisted arc discharge. Low-level particulates are achieved on the deposited film surface (< 5/cm² ). It was shown that crucial impact on filtering the particles with size < 1 μm has the electrostatic field distribution across the plasma guide that can be controlled by duct bias. Mechanical and electrical properties, optical and Raman spectra of ta-C films were investigated as a function of Ar flow in the arc discharge area. At Ar flow rates 0–12 sccm, stress of the films was varied in a range 2.9–7.5 GPa while hardness and Young's Modulus stayed in ranges of 45–60 GPa, and 230–300 GPa, respectively. Density of the obtained films was greater than 2.8 g/cm³. Optical absorption and electrical conductivity of ta-C films showed a significant rise while stress came down with Ar flow. Raman G-peak was higher for ta-C films with lower stress and shifted to lower energy. The low stress films versus high stress films showed a few orders reduced electrical resistance and anisotropy of specific resistance with respect to substrate plane: ρ_⊥ ≫ ρ_∥. In situ ellipsometric control of growing film thickness was implemented on the system. Run-to-run standard deviation was less than 1 Å for 20–25 Å thick films. High corrosion resistance of FCA coatings was exhibited. The impact of Ar gas–carbon plasma interaction on the deposition conditions and microstructure of ta-C films was discussed.     

Preparation of tetrahedral amorphous carbon films by filtered cathodic vacuum arc deposition

Tetrahedrally bonded amorphous carbon (ta-C) and nitrogen doped (ta-C:N) films were obtained at room temperature in a filtered cathodic vacuum arc (FCVA) system incorporating an off-plane double bend (S-bend) magnetic filter. The influence of the negative bias voltage applied to substrates (from −20 to −350 V) and the nitrogen background pressure (up to 10⁻³ Torr) on film properties was studied by scanning electron microscopy (SEM), electron energy loss spectroscopy (EELS), Raman spectroscopy, X-ray photoemission spectroscopy (XPS), secondary ion mass spectroscopy (SIMS) and X-ray reflectivity (XRR). The ta-C films showed sp³ fractions between 84% and 88%, and mass densities around 3.2 g/cm³ in the wide range of bias voltage studied. In contrast, the compressive stress showed a maximum value of 11 GPa for bias voltages around −90 V, whereas for lower and higher bias voltages the stress decreased to 6 GPa. As for the ta-C:N films grown at bias voltages below −200 V and with N contents up to 7%, it has been found that the N atoms were preferentially sp³ bonded to the carbon network with a reduction in stress below 8 GPa. Further increase in bias voltage or N content increased the sp² fraction, leading to a reduction in film density to 2.7 g/cm³.     

Deposition of iron containing amorphous carbon films by filtered cathodic vacuum arc technique

Iron containing amorphous carbon (a-C:Fe) films have been deposited with an Fe/graphite composite target with different Fe content by filtered cathodic vacuum arc (FCVA) technique. X-Ray induced photoelectron spectroscopy (XPS) was used to analyze the Fe content in the films. Micro-Raman spectroscopy was employed to characterize the structural changes of a-C:Fe films. The properties of the a-C:Fe films such as the intrinsic stress, morphology and roughness investigated by the profiler, atomic force microscope (AFM). The XPS results show that there exists small amount of oxygen in the form of FeO in the films and the Fe fraction in the films is always larger than that in the target. Compared with pure amorphous carbon films the intrinsic stress was effectively reduced by incorporating Fe into the films, and decreases with increasing Fe content. As increasing the Fe content, the clusters in the films become finer and the roughness increases The studies of Raman spectra show that the positions of G peak and D peak shift to low and high wavenumbers, respectively, and the ratio of the intensity of D and G peaks increases with an increase in Fe content, that suggests that the sp²-bonded carbon and the size of the sp²-bonded cluster increases with an increase in the Fe content.     

Surface energy of metal containing amorphous carbon films deposited by filtered cathodic vacuum arc

Metal containing amorphous carbon (a-C:Me) films including a-C:Al, a-C:Ti, a-C:Ni, a-C:Si were prepared by the filtered cathodic vacuum arc (FCVA) technique with metal-carbon (5 at.% metal) composite targets. The substrate bias ranging from floating to 1000 V was applied. The wettability of the films was examined using the VCA Optima system from AST Products, Inc. Three types of liquid with different polarities were used to study the surface energy changes of the films. X-ray photoelectron spectroscopy (XPS) was used to analyze the composition and chemical state of the films. Atomic force microscopy (AFM) was employed to characterize the morphology and roughness of the films. The contact angle of the a-C:Me films remains relatively constant with different substrate bias. The Al containing films show the highest contact angle with water, which reaches as high as 101°. The Si containing films show the lowest contact angle approximately 64°. The contact angles of Ni and Ti containing films are approximately 80°, 97°, respectively. The harmonic-mean method was used to calculate the polar and depressive component of the surface energy. The absorption of oxygen on the surface plays an important role on the polar component of the a-C:Me films. The formation of AlO and TiO bonds is responsible for their lower polar component. The metal state Ni results in higher polar component. However, the SiO bond is contributed to the high polar component of a-C:Si films. As all films are atomic scale smooth, the RMS roughness is below 0.5 nm, the roughness does not have obvious effect on the surface energy.     

Nanoindentation-induced deformation behaviour of tetrahedral amorphous carbon coating deposited by filtered cathodic vacuum arc

The nanoindentation-induced deformation behaviour of a ta-C (tetrahedral amorphous carbon) coating deposited on to a silicon substrate by a filtered vacuum cathodic vapour arc technique was investigated. The 0.17-μm-thick ta-C coating was subjected to nanoindentation with a spherical indenter and the residual indents were examined by cross-sectional transmission electron microscopy. The hard (~ 30 GPa) ta-C coatings exhibited very little localized plastic compression, unlike the softer amorphous carbon coatings deposited by plasma-assisted chemical vapour deposition. However, neither through-thickness cracks nor delamination was observed in the coating for the loads studied. Rather, the silicon substrate exhibited plastic deformation for indentation loads as low as 10 mN and at higher loads it showed evidence of both phase transformation and cracking. These microstructural features were correlated to the observed discontinuities in the load-displacement curves. Further, it was observed that even a very thin coating can modify the primary deformation mechanism from phase transformation in uncoated Si to predominantly plastic deformation in the underlying substrate.     

Deposition of carbon nitride films by filtered cathodic vacuum arc combined with radio frequency ion beam source

Atomically smooth carbon nitride films were deposited by an off-plane double bend filtered cathodic vacuum arc (FCVA) technique. A radio frequency nitrogen ion source was used to supply active nitrogen species during the deposition of carbon nitride films. The films were characterized by atomic force microscopy (AFM), XPS and Raman spectroscopy. The internal stress was measured by the substrate bending method. The influence of nitrogen ion energy (0–1000 eV) on the composition, structure and properties of the carbon nitride films was studied. The nitrogen ion source greatly improves the incorporation of nitrogen in the films. The ratio of N/C atoms in the films increases to 0.40 with an increase in the ion beam energy to 100 eV. Further increase in the ion beam energy leads to a slight decrease in the N/C ratio. XPS results show that nitrogen atoms in the films are chemically bonded to carbon atoms as C---N, C=N, and CN bonds, but most of nitrogen atoms are bonded to sp² carbon. The increase in nitrogen ion energy leads to a decrease in the content of nitrogen atoms bonded to sp² carbon, and an increase in the content of nitrogen atoms bonded to sp³ and sp¹ carbon. Raman spectra indicate an increase in the sp² carbon phase in carbon nitride films with an increase in nitrogen ion energy. The increase in sp² carbon fraction is attributed to the decrease in internal stress with increasing nitrogen ion energy.     

Properties and tool performance of ta-C films deposited by double-bend filtered cathodic vacuum arc for micro drilling applications

This paper describes the results of the application of ta-C films to micro drilling operation for deep and small machining boreholes. Tetrahedral amorphous carbon (ta-C) films were successfully deposited on WC-Co substrates by a double-bend filtered cathodic vacuum arc (FCVA) system. The structure, mechanical and tribological properties of both pure ta-C and ta-C incorporated argon gas (ta-C:Ar-flow) films were systematically investigated. And then, high-speed through-hole drilling tests were performed on the PCB (printed circuit board) workpiece to investigate the machining performance of ta-C coated micro drills. The experimental results show that the ta-C:Ar-flow (2 sccm) coated micro drill has excellent microstructure, microhardness, and friction coefficient properties and represents the optimal coatings for micro drilling applications.     

Cathodoluminescence of fluorine doped amorphous carbon nanoparticles deposited by a filtered cathodic arc plasma system

The fluorine doped amorphous carbon nanoparticles (a-C:F NPs) films with sizes 50-100 nm were deposited on polyethylene terephthalate in an atmosphere of CF₄ by a 90°-bend magnetic filtered cathodic arc plasma system. The surface morphology of a-C:F NPs films was observed by field emission scanning electron microscope and atomic force microscope. The microstructure and chemical bonding nature of the a-C:F NPs films were investigated by Raman, X-ray diffraction and X-ray photoelectron spectroscopy. This work presents cathodoluminescence (CL) spectra of a-C:F NPs films obtained at 1.9-2.4 eV and verifies luminescence from a-C:F NPs films in the visible region. The incorporation of fluorine into the carbon network results in orange emission (∼2.03 eV) due to the transitions between fluorine-related electron levels and σ* states, and the red emission (∼1.97 eV) results from the recombination of carriers in the valence π and conduction π* states. The peak at ∼2.10 eV may result from the defects of the structures in a-C:F NPs films.     

Cathodoluminescence of the a-C:N films deposited by a filtered cathodic arc plasma system

Amorphous carbon nitride (a-C:N) films were successfully synthesized on silicon using a 90°-bend magnetic filtered cathodic arc plasma (FCAP) system. ESCA analysis demonstrated that the N/C ratios reached 1.08. Many investigations on photoluminescence (PL) spectra of diamondlike carbon films have been performed, but cathodoluminescence (CL) spectra have seldom been discussed. This work investigated a-C:N films using the CL spectra at 300 K. This work presents CL spectra of a-C:N films obtained at 1.5–3.5 eV and verifies luminescence from the a-C:N films in the visible region. The most prominent luminescence in the CL spectra from the a-C:N films has two peaks centered ∼2.67 eV (blue light) and ∼1.91 eV (red light), but the a-C film yielded only the band at ∼1.91 eV. These optical emissions are intrinsic and extrinsic to the a-C:N film and are sensitive to the content of nitrogen.     

Electrical properties of a-C: Mo films produced by dual-cathode filtered cathodic arc plasma deposition

Molybdenum-containing amorphous carbon (a-C:Mo) thin films were prepared using a dual-cathode filtered cathodic arc plasma source with a molybdenum and a carbon (graphite) cathode. The Mo content in the films was controlled by varying the deposition pulse ratio of Mo and C. Film sheet resistance was measured in situ at process temperature, which was close to room temperature, as well as ex situ as a function of temperature (300–515 K) in ambient air. Film resistivity and electrical activation energy were derived for different Mo and C ratios and substrate bias. Film thickness was in the range 8–28 nm. Film resistivity varied from 3.55 × 10^− 4 Ω m to 2.27 × 10^− 6 Ω m when the Mo/C pulse ratio was increased from 0.05 to 0.4, with no substrate bias applied. With carbon-selective bias, the film resistivity was in the range of 4.59 × 10^− 2 and 4.05 Ω m at a Mo/C pulse ratio of 0.05. The electrical activation energy decreased from 3.80 × 10^− 2 to 3.36 × 10^− 4 eV when the Mo/C pulse ratio was increased in the absence of bias, and from 0.19 to 0.14 eV for carbon-selective bias conditions. The resistivity of the film shifts systematically with the amounts of Mo and upon application of substrate bias voltage. The intensity ratio of the Raman D-peak and G-peak (I_D/I_G) correlated with the pre-exponential factor (σ₀) which included charge carrier density and density of states.     

Preparation of granular activated carbon from oil palm shell by microwave-induced chemical activation: Optimisation using surface response methodology

In this study, waste palm shell was used to produce activated carbon (AC) using microwave radiation and zinc chloride as a chemical agent. The operating parameters of the preparation process were optimised by a combination of response surface methodology (RSM) and central composite design (CCD). The influence of the four major parameters, namely, microwave power, activation time, chemical impregnation ratio and particle size, on methylene blue (MB) adsorption capacity and AC yield were investigated. Based on the analysis of variance, microwave power and microwave radiation time were identified as the most influential factors for AC yield and MB adsorption capacity, respectively. The optimum preparation conditions are a microwave power of 1200 W, an activation time of 15 min, a ZnCl₂ impregnation ratio of 1.65 (g Zn/g precursor) and a particle size of 2 mm. The prepared AC under the optimised condition had a BET surface area (S_BET) of 1253.5 m²/g with a total pore volume (V_tot) of 0.83 cm³/g, which 56% of it was contributed to the micropore volume (V_mic).