镧、苯并三氮唑在黄铜钝化中的作用

为了进一步提高黄铜的耐蚀性,在其钝化液中加入镧盐和苯并三氮唑(BTAH)进行钝化。通过扫描电镜及X射线衍射分析了钝化膜的表面形貌、成分及结构;利用硝酸点滴及中性盐雾试验测试其耐蚀性,利用电化学极化曲线研究镧盐、BTAH单独及共同使用时对黄铜的缓蚀性能。结果表明:BTAH和镧盐具有良好的协同作用,钝化液中同时加入镧盐及BTAH所得复合钝化膜的耐硝酸点滴时间达21 s,耐中性盐雾12 h表面无明显变化;钝化液中镧盐及BTAH协同作用,使黄铜阳极腐蚀电流减小,腐蚀速度降低,使黄铜的耐蚀性能显著增强。     

高耐腐蚀性三价铬彩色钝化膜制备工艺优化及膜层性能研究

为进一步提高三价铬彩色钝化膜的性能,在无机钝化液中加入有机硅树脂,制备了一种新型高耐蚀性能三价铬彩色钝化液。该钝化液可以在镀锌板表面形成有机-无机复合钝化膜,通过红外光谱仪分析钝化膜结构,采用扫描电镜观察钝化膜微观形貌,用能谱仪分析钝化膜的微观组成,采用电化学试验、中性盐雾试验对钝化膜耐蚀性能进行表征。以正交试验对三价铬彩色钝化液组分进行了优选,以单因素试验研究了钝化温度、钝化液pH值、钝化时间等钝化条件对钝化膜耐腐蚀性能的影响。结果表明:最佳钝化液成分为硫酸铬10.00 g/L,硅树脂12.50 g/L,硝酸钠4.00 g/L,硝酸镍1.25 g/L,氯化钠2.00 g/L;最佳钝化条件为温度30℃,时间150 s,pH值1.8;以最优条件制得的钝化膜色彩鲜艳,耐蚀性能突出,耐中性盐雾腐蚀时间达196 h。     

双稀土处理液对H62黄铜成膜耐蚀性能的影响

为了提高H62黄铜合金的表面性能,通过正交试验获得了最佳锅、钵双稀土处理液配方。利用硝酸点滴、中性盐雾试验评价了H62黄铜合金钝化膜的耐蚀性能,通过电子探针(EPMA)观测了其表面形态结构及元素分布,利用电化学方法表征了 H62黄铜表面钝化膜在3.5%NaCl溶液中的缓蚀行为,采用XRD对H62黄铜表面钝化膜的成分进行了检测。结果表明:H62黄铜合金由镉、钵双稀土处理液钝化成膜的主要成分为Cu2O,CeO2,La(OH)3,Ce(OH)4;致密的钝化膜耐硝酸点滴时间达到21.98s,在3.5%NaCl溶液自腐蚀电位增加,腐蚀电流降低,腐蚀速度明显降低,耐蚀性能增加,耐中性盐雾性能明显优于鋪单一稀土处理液。     

铝合金环保型钝化及其与漆膜的配套性能

为了进一步提高三价铬钝化膜的耐蚀性及其与漆膜的配套性能,以2024铝合金为基材,筛选出钝化液中的配位剂和缓蚀剂,并确定其工艺条件,开发了一种性能优良的环保型三价铬钝化液。结果表明：经硅溶胶封闭处理后的三价铬钝化膜结构致密,电化学性能优良,耐中性盐雾试验可达168h,其耐蚀性与Alodine1200六价铬钝化工艺相当;与环氧底漆和聚氨酯面漆的配套性好。     

镀锌层钛溶胶钝化及其耐蚀性

为了进一步提高镀锌层的耐蚀性而又利于环保,配制了钛溶胶,并在镀锌层表面涂覆成膜。分析了钛溶胶钝化成膜机理,研究了钛酸四丁酯含量、钝化液pH值、钝化时间及钝化后热处理温度对钝化膜耐蚀性的影响,用扫描电镜(SEM)观察了钝化膜的微观形貌。结果表明:当钛酸四丁酯含量为12.5 mL/L,钝化液pH值1.3,钝化时间15 s,热处理温度40℃时,钝化膜具有较好的防护性能;镀锌层经钛溶胶钝化处理后,表面趋于致密,同时更加平整,有利于进一步提高镀锌层的防护性能。     

高耐蚀镀锌钝化工艺

通过在钝化液中加入硅溶胶，产生一种性能优异的钝化液。它钝化的镀锌件具有高耐蚀耐热性。研究了钝化液成分，钝化工艺和镀层表面状态对钝化膜耐蚀性的影响，并测试了钝化膜的性能。     

单晶硅的电化学钝化

常温下,用电化学氧化法在单晶硅表面形成 SiO_2钝化膜,钝化液可为有机溶液或纯水,控制电压能调节钝化膜厚度。测试并比较了钝化膜的基本性能。     

镀锌板常温三价铬黑色钝化膜的制备及其耐蚀性能

为了提高镀锌板的耐蚀性,以有机硫化物为发黑剂,研制了一种性能稳定的三价铬黑色钝化液,并用该钝化液在常温下对镀锌板进行钝化处理.通过扫描电镜(SEM)观察、醋酸铅点滴试验、Tafel极化曲线和交流阻抗谱测试等方法分析了钝化膜的外观形貌、元素组成及耐蚀性能.结果表明:钝化膜主要含有Zn,Cr,O等元素;钝化膜封闭后乌黑油亮,具有良好的装饰性能,且附着力合格;镀锌板经钝化后,耐醋酸铅点滴时间约为71 s,能有效地阻滞腐蚀的阳极过程,使自腐蚀电位由-1.283 V升高到-1.054 V,正移了近230 mV;自腐蚀电流密度由12.240μA/cm2减小到了2.866 μA/cm2,显著提高了镀锌板的耐蚀性.     

锌镀层彩色低铬钝化

提出了一种快速彩色低铬钝化新工艺。研究表明，锌镀层经钝化后，中性盐雾试验出现白锈时间是未钝化的５０倍。文中还对锌镀层铬酸盐膜的形成机制及防护机理进行了探讨。     

一种耐蚀性能较好的锡青铜钝化工艺

为提高锡青铜钝化膜层的耐蚀性,在传统铜合金钝化液体系的基础上,利用正交试验法对钝化液组分进行了优化,并研究了工艺参数对钝化膜外观和耐蚀性的影响.所得最佳工艺条件为:150 g/L重铬酸钾,15 mL/L硫酸,1 g/L氯化钠,室温,时间10～15 s.结果表明,采用该工艺能获得外观艳丽、光亮,颜色均匀,附着力好的膜层,其点滴试验耐蚀性大于30 s.     

一种增强镀锌黑色钝化膜附着力的改良工艺

度针对镀锌层黑色钝化膜干燥之前柔软易脱落等问题，提出了一种基于硫酸盐－磷酸盐型的银盐黑色钝化工艺，采用单因素试验对黑色钝化溶液组成，操作条件进行了优化，并用SEM、NSS等方法评价了黑色钝化膜的性能，研究结果表明，改良后的黑色钝化工艺完全能够满足镀锌件（特别是滚镀件）黑色钝化的实际生产需要。     

Role of passivating oxide film in the corrosive wear of Al-7%Si alloy

The present work examines how passivating oxide film affects the corrosive wear rate of Al-7%Si alloy in H₂SO₄ solution at room temperature. As the applied potential (relative to a saturated calomel electrode (SCE)) increases to 1.08 V_SCE on an Al-7%Si alloy specimen, the corrosive wear rate increases and then decreases for polarization to higher anodic potentials. The corrosive wear rate W_cw consists of three factors, namely pure mechanical wear loss W_mech, weight loss W_diss caused by the corrosion reaction, and an acceleratory-deceleratory contribution W_acc due to the presence of passivating oxide film. The acceleratory and deceleratory contributions W_acc arising from compositional change of the passivating oxide film indicate the microcutting and microploughing mechanisms respectively of abrasive wear. The increased W_acc by application of 1.08 V_SCE is discussed from the viewpoints of hydration and severe abrading wear action of the passivating oxide film on the Al-7%Si alloy specimen.     

镀锌层无铬钝化工艺研究

开发了一种无铬无毒的环保型镀锌层钝化工艺，通过试验研究了钝化液成分和工艺条件对钝化膜的影响情况。钢铁件在锌酸盐或酸性镀锌15μm后，采用此工艺钝化，得到的钝化膜抗白锈试验24h，中性盐雾试验72h达到5级（符合国家标准），钝化液排放达到环保要求。     

Properties of dye-sensitized solar cells with TiO2 passivating layers prepared by electron-beam evaporation

The aim of this work is to prevent back transfer of electrons due to direct contact between the electrolyte and the FTO glass substrate using a TiO2 passivating layer. The TiO2 passivating layer was deposited on FTO glass by e-beam evaporation. The TiO2 film was prepared with different deposition rates. The specific surface area was reduced with increasing deposition rate. The nanoporous TiO2 upper layer was coated by screen-printing on the TiO2 passivating layer prepared by e-beam evaporation. The optical transmittance and absorbance of the TiO2 films depend on the morphology of the TiO2 passivating layer. The dye-sensitized solar cells influenced the surface morphology of the TiO2 passivating layer. The dye-sensitized solar cell using the TiO2 passivating layer recorded a maximum conversion efficiency of 4.93% due to effective prevention of the electron recombination to the electrolyte.     

SIMS / XPS studies of the passive film on nickel

Passive films were formed on nickel in borate buffer solution (pH 8.4) at various anodic potentials. XPS and SIMS techniques were used to determine the passivating species present on the surface film. It is shown that the film formed at low passivating potentials consists of Ni (OH)₂ and NiO, and the film formed preceding oxygen evolution consists mainly of Ni₂O₃.     

热浸镀锌层有机物-无机物复合钝化工艺优选及其性能

为了进一步提高热浸镀锌层钝化膜的耐蚀性能,针对目前无铬钝化多为独立体系的有机物钝化或无机物钝化的情况,运用有机物与无机物进行复合钝化。通过正交试验法确立了热浸镀锌层无色钝化工艺,采用单因素变量法、点滴试验、中性盐雾腐蚀试验及电化学测试技术,研究了复合钝化工艺参数对钝化膜外观和耐蚀性的影响。结果表明:最佳复合钝化工艺为40 g/L丙烯酸树脂,20 g/L硝酸钠,40 g/L硅酸钠,15 m L/L过氧化氢;p H值11,钝化时间30 s,温度30℃,恒温烘干;钝化膜的耐蚀性能接近于三价铬钝化。     

镀锌层表面KH-560硅烷膜耐蚀性能研究

利用正交实验研究了硅烷偶联剂在镀锌板上的钝化工艺,采用KH-560对热镀锌板进行钝化处理.比较钝化膜与空白试样在5%NaCl溶液中的极化曲线、电化学交流阻抗谱,并通过盐水浸泡实验进一步验证了硅烷膜的耐蚀性能.结果表明:经硅烷钝化处理后的镀锌板,其腐蚀电流密度下降,极化电阻升高,硅烷膜抑制了镀锌板的腐蚀过程,其耐蚀性能优于空白试样,接近铬酸盐钝化膜的耐蚀性.     

1,3-二氧五环对锂电极的钝化作用

首次利用1,3-二氧五环(DOL)对金属锂电极进行预处理,以使该电极钝化,提高其界面稳定性.电化学阻抗谱(EIS)分析表明,当金属锂电极长时间浸泡在电解液中时,经过DOL预处理的锂电极与未经处理的锂电极相比,具有更低、更稳定界面阻抗.同时,扫描电子显微镜(SEM)观察也证明,在长时间浸泡后,经过预处理的锂电极表面要比未经处理的锂电极表面,更加平整,并有更少的锂枝晶出现.显然,DOL预处理对锂电极具有很好的钝化作用.进而,由于预处理在锂电极表面生成稳定的界面膜所具有的钝化作用,经过该处理的锂电极在连续的充放电循环中,显示出更高的循环效率.     

Recombination properties of silicon passivated with rare-earth oxide films

The recombination properties of silicon passivated with films of rare-earth oxides were investigated. The films were obtained by thermal resistive sputtering of a rare-earth metal followed by thermal oxidation of the obtained layer in air at 400 °C. It was established that the effective nonequilibrium charge-carrier lifetime measured by photoconductivity relaxation is 2–3 times higher after deposition of the rare-earth oxide film. Surface recombination rates at the silicon-rare-earth oxide interface were determined to be 290–730 cm/s for different rare-earth oxides. The combination of high optical transmittance of the experimental materials and low recombination losses in silicon coated with a rare-earth oxide film makes it possible to recommend rare-earth oxide films as optical antireflection and passivating coatings for silicon photoelectric devices. Pis’ma Zh. Tekh. Fiz. 24, 16–21 (April 12, 1998)