Al_2O_3陶瓷基片上Ba_(0.7)Sr_(0.3)TiO_3薄膜可调介电性能的研究

采用磁控溅射方法在Al2O3陶瓷基片上溅射生长Ba0.7Sr0.3TiO3(BST)薄膜,使用光刻工艺制作平板结构的BST薄膜可变电容。研究了溅射条件对BST薄膜可调介电性能和介电损耗的影响。结果表明,在溅射气压为4Pa、O2∶Ar比为30∶70、基片温度800℃下制备的BST薄膜具有较高的介电调谐率(约52%)和较低的损耗(约0.8%),BST薄膜可变电容的品质因素随频率升高而降低,在1~100MHz频率范围内品质因素从125下降为42。     

Zr4+B位置换对(Pb0.5Ca0.5)(Fe(0.5)Nb0.5)O3

研究了Zr4+离子B位置换改性对(Pb0.5Ca0.5)(Fe0.5Nb0.5)O3陶瓷微波介电性能.实验结果表明,(Pb0.5Ca0.5)(Fe0.5Nb0.5)O3(PCFNZ)陶瓷样品呈现单一斜方钙钛矿相结构.随Zr(4+)离子的置换量增加,PCFNZ陶瓷体系的Qr值和晶粒尺寸逐渐减小;介电常数εr随着置换量增加...     

LiCo0.5Ni0.5 O2的恒流充放电容量模型研究

为研究LiCo0.5Ni0.5O2的充放电容量和电流间模型,用高温固相反应合成了性能优良的LiCo0.5Ni0.5 O2,用一维扩散控制方程Q=Qm-(I2/3·D)·I描述了LiNi0.5Co0.5O2的充放电容量与电流的关系,并用该模型计算了最大可逆容量和扩散系数.恒电流充放电过程的扩散系数和最大可逆容量随循环次数的增加而降低,且与循环次数间存在对数线性关系.     

PbSc0.5Ta0.5O3热释电材料及其红外探测器列阵

热释电红外探测器具有探测波长范围广、室温工作、无需致冷等优点。近年来，工作于介电方式下的PbSc0.5Ta0.5O3(PST)热释电材料由于具有热释电系数大，热释电探测优值高等特点，成为热释电应用研究的热点之一。本文综述了目前PST热释电陶瓷材料的介电，热释电性能及其探测器列阵的发展。由于小型化的要求，PST薄膜亦倍受关注，因此本文还对目前PST热释电薄膜的制备方法，薄膜的热释电、介电性能及薄膜型探测器结构和发展进行了概述。     

Ni0.5Zn0.5Fe2O4粉末化学镀铜前后的电磁性能

本文用溶胶-凝胶自燃烧法制备了Ni0.5Zn0.5Fe2O4粉末颗粒,以甲醛为还原剂在Ni0.5Zn05Fe2O4颗粒表面进行了化学镀铜,制备了Cu/Ni0.5Zn0.5Fe2O4复合粉体.用扫描电镜(SEM)、能谱仪(EDS)和X射线衍射仪(XRD)对镀铜前的Ni0.5Zn0.5Fe2O4颗粒以及镀铜后的复合纳米颗粒进行了表征.对镀铜前的Ni0.5Zn0.5Fe2O4粉体和不同镀铜量的Cu/Ni0.5Zn0.5Fe2O4复合粉体进行了电磁性能的研究,结果表明镀铜后镍锌铁氧体的吸波性能明显提高,增重量为65%的Cu/Ni0.5Zn0.5Fe2O4复合粉体在频率为11GHz处反射率可达-12dB左右.     

脉冲激光沉积Ba0.5Sr0.5TiO3、Pb0.5Ba0.5TiO3和Pb0.5Sr0.5TiO3薄膜及其介电性质

采用脉冲激光沉积法,在Pt／Ti／SiO2／Si基底上分剐制备厚度为350nm的Ba0.5Sr0.5TiO3(BST)、Pb0.5Ba0.5TiO3(PBT)和Pb0.5Sr0.5TiO3(PST)薄膜并研究了它们的介电性质。XRD显示,在相同的制备条件下三者具有不同的择优取向,PST具有(110)择优取向,PBT具有(111)择优取向,而BST则是混合取向。SEM显示三者样品表面均匀致密,颗粒尺寸大约在50nm至150nm之间。PST与BST、PBT相比有更高的介电常数,在频率为10kHz时,分别为874、334和355,而损耗都较低,分别为0．0378、0．0316和0．0423,同时PST漏电流也是最小的。测量薄膜的C-V特性扣铁电性能表明室温下BST呈现的是顺电相,PST和PBT则呈铁电相。本文也测量了薄膜在不同频率下的介电温度特性,BST、PBT和PST均表现出频率弥散现象,即随着频率的降低．居里温度降低而介电常数会升高。并测得BST和PST的居里温度分剐为-75和150℃。而PBT的居里温度在250℃以上。本文研究表明：与BST相比较,PBT的介电常数与之相近,漏电流较大;而PST具有高介电常数,较小的漏电流和较大的电容-电压调谐度,在相关半导体器件中的应用将有很大的潜力。     

(1-x)CaTiO_3/xNi_(0.5)Zn_(0.5)Fe_2O_4复合材料的制备及其性能

采用固相反应法合成了(1-x)CaTiO3/xNi0.5Zn0.5Fe2O4(0≤x≤1.0)复合材料,并研究了复合材料的物相、微观结构、介电性能和磁性能。结果表明:样品中仅含有钙钛矿型CaTiO3和尖晶石型Ni0.5Zn0.5Fe2O4。1260℃保温3h,样品相对密度达到98.91%,颗粒尺寸约为2μm。样品介电常数随Ni0.5Zn0.5Fe2O4含量(x)增加而增大。当x=0.7、测试频率为103 Hz时,样品介电常数(εr)和介电损耗(tanδ)分别为2629.18和1.74。(1-x)CaTiO3/xNi0.5Zn0.5Fe2O4复合材料显示磁性。其中x=0.7时,样品饱和磁化强度(Ms)达到49.07A·m2/kg;这归因于Ni0.5Zn0.5Fe2O4具有优异的磁性能。     

La0.5Sr0.5CoO3-δ薄膜的制备及其电学性能

采用离子束溅射法在氧化钇稳定的氧化锆（YSZ）和SiO2衬底上溅射＜薄膜，测试了不同工艺制备的La0.5Sr0.5CoO3-δ薄膜样品的XRD谱和电导率。分析了薄膜表面微结构以及电学性能。结果表明：在YSZ衬底上生长的La0.5Sr0.5CoO3-δ薄膜随着热处理温度的升高取向增强，当薄膜经过750℃热处理后结晶度最好；各样品直流电导率在低温段的Arrhenius曲线近似为直线，表明材料的导电行为符合小极化子导电机制；交流电导率在低频段（＜100kHz）电导率主要是靠晶界导电贡献的，而在高频区（＞100kHz），样品对交流电响应更加明显，电导率主要是靠晶粒导电贡献的。     

新型溶胶-凝胶工艺制备La0.5Ca0.5MnO3薄膜及性能分析

鉴于以醇盐为原料溶胶-凝胶制备La0.5Ca0.5MnO3薄膜工艺中存在诸多苛刻因素,本文以无机盐为原料采用溶胶-凝胶工艺在SiO2/Si(100)衬底上制备了La0.5Ca0.5MnO3薄膜.并用XRD、SEM和TEM等分析手段对薄膜进行了表征,通过不同磁场下电阻-温度(R-T)曲线,研究了样品的磁电阻(CMR)效应...     

CaRuO3电极对(Ba,Sr)TiO3薄膜的介电特性的影响

在Pt(111)/Ti/SiO2/Si(100)衬底上,用脉冲激光沉积工艺分别制备出了(110)外延取向生长的(Ba0.65Sr0.35)TiO3/CaRuO3(BST/CRO)异质结构薄膜;BST/CRO异质结构薄膜由纳米晶团簇组成,最大的团簇晶粒达500 nm,平均晶粒尺寸在60～80 nm,薄膜厚度为650 nm.BST/CRO异质结薄膜均为表面平滑和致密结构.BST/CRO异质结薄膜的介电常数和介电调谐率分别高达851和78.1%.与纯BST薄膜比较,用CRO作电极,增益介电常数与介电调谐率.     

The properties of Ba0.5Sr0.5TiO3 thin film prepared by RF magnetron sputtering from powder target

The Ba_0.5Sr_0.5TiO₃ (BST) thin film with the thickness of 400 nm deposited from powder target is prepared by the radio-frequency magnetron sputtering technique. The deposition rate of BST film is estimated to be 45 nm/min, which is very fast for ferroelectric materials. The dielectric properties of the as-prepared BST thin film are demonstrated. High dielectric tunability up to 42.7% and low dielectric loss small to 0.01 are achieved at a low applied voltage of 5 V. The results demonstrate that the RF magnetron sputtering from powder target is a versatile, novel technique for the deposition of high-quality ferroelectric thin films.     

The effect of Bi1.5Zn0.5Nb0.5Ti1.5O7 cover layer on the dielectric and tunable properties of Ba0.6Sr0.4TiO3/Bi1.5Zn0.5Nb0.5Ti1.5O7 bilayered thin films

Bi_1.5Zn_0.5Nb_0.5Ti_1.5O₇ (BZNT) thin films with different thicknesses as cover layers were deposited on the Ba_0.6Sr_0.4TiO₃ (BST) thin films on the Pt/Ti/SiO₂/Si substrates by radio frequency magnetron sputtering method. The microstructure, surface morphology, dielectric and tunable properties of BST/BZNT heterogeneous bilayered films were investigated as a function of the thickness of BZNT films and the effect of BZNT films on the asymmetric electrical properties of BST/BZNT bilayered films was discussed. It was found that BZNT cover layer significantly improved the leakage current and the dielectric loss, and the dielectric constant and tunability of BST/BZNT bilayered thin films simultaneously decreased with the increasing thickness of BZNT films. The BST/BZNT bilayered thin film with a 50 nm BZNT cover layer gave the largest figure of merit (FOM) of 33.48 with the upper tunability of 55.38%. The asymmetric electrical behavior of BST/BZNT bilayered films is probably related to an internal electric field caused by built-in voltages at Pt/BST and BZNT/Au interfaces.     

Thickness-ratio-dependent dielectric properties of Bi1.5Zn1.0Nb1.5O7/Ba0.5Sr0.5TiO3 bilayered thin films

Bi_1.5Zn_1.0Nb_1.5O₇ (BZN)/Ba_0.5Sr_0.5TiO₃ (BST) thin films were prepared on Pt/Ti-coated sapphire substrates by radio frequency magnetron sputtering. The specific relationship between the dielectric properties and the thickness ratio of the BZN thickness to the BST thickness was investigated. The presence of BZN films effectively reduced the dielectric loss of the thin films. The thickness-ratio-dependent dielectric constant and dielectric loss behaviors were in good accordance with the simulation results based on the series connection theory. The optimum thickness ratio was determined to be around 0.5, exhibiting a maximum commutation quality factor of about 16,000. The built-in electric field at the region near the BZN–BST interface may be responsible for the asymmetric characteristic of the electric-field-dependent dielectric properties of the BZN/BST thin films.     

直流反应溅射TiO2薄膜的制备及其性能研究

采用直流反应磁控溅射的方法,溅射高纯钛靶在ITO石英衬底上制备了TiO2薄膜.用XRD、Raman光谱、AFM和紫外-可见光分光光度计分别测试了TiO2薄膜的结构、表面形貌和紫外-可见光透射谱,研究了工艺因素中溅射气压、氧氩比和退火温度对薄膜结构的影响.采用C(胶)/TiO2/ITO三层结构研究了锐钛矿TiO2薄膜的紫外光响应.实验结果表明较低的溅射气压、合适的氧氩比和较高的退火温度有利于锐钛矿TiO2薄膜的结晶.在2 V的偏压下,锐钛矿TiO2薄膜的紫外光响应上升迟豫时间约为3 s,稳定光电流可达到2.1 mA,对紫外光的灵敏性和稳定的光响应表明TiO2薄膜有可能成为一种新的紫外光探测器材料.     

Preparation,microstructure and dielectric properties of Ba0.5Sr0.5TiO3 thin films grown on Pt/Ti/SiO2/Si substrates by pulsed laser deposition

Barium strontium titanate Ba_0.5Sr_0.5TiO₃ (BST) thin films have been deposited on Pt/Ti/SiO₂/Si substrates by a pulsed laser deposition method. The low-frequency dielectric responses of the BST films, grown at different substrate temperatures (T_s), were measured as functions of frequency in the frequency range from 1 kHz to 1 MHz. With increase of T_s, the grain size of BST thin films became larger and the crystallinity was greatly improved, and then the dielectric permittivity increased, while the dielectric dispersion rose drastically. The origin of the large dielectric relaxation is believed to result from the aggravation of oxygen diffusion at the BST/Pt interface for the BST thin films grown at comparatively higher temperatures. This concept could be further explained by considering the influence of post-annealing in oxygen ambient on the dielectric properties of BST thin films. Our results reveal that the dielectric properties are strongly dependent on the processing conditions and the microstructure of thin films.     

(Pb_(0.5)Sr_(0.5))TiO_3薄膜的表面化学态研究

用溶胶-凝胶法制备(Pb_(0.5)Sr_(0.5))TiO_3(简称PST)前驱体溶液,以三水醋酸铅、醋酸锶、钛酸丁酯为原料,乙二醇甲醚、去离子水、乙酰丙酮做溶剂,通过旋涂工艺在Pt/Ti/SiO_2/Si(100)基片上沉积PST薄膜.薄膜经320～380℃热分解,再经650℃退火30min,得到晶化好的薄膜样品,X射线衍射结果表明PST薄膜为钙钛矿立方相结构,其晶格常数为a=0.3919nm.用原子力显微镜观测其表面形貌,薄膜平均晶粒尺寸为300nm.用XPS测量了650℃退火PST薄膜样品的表面化学态,结果表明表面富铅,接近表面区域的原子比率Pb∶Sr∶Ti∶O是0.52∶0.50∶1.0∶3.02,接近(Pb_(0.5)Sr_(0.5))TiO_3的理想配比.     

The effects of oxygen partial pressure on BST thin films deposited on multilayered bottom electrodes

Ba_0.5Sr_0.5TiO₃ (BST) thin films have been deposited by r.f. magnetron sputtering on silicon and platinum-coated silicon substrates with different buffer and barrier layers. BST films deposited on Si/SiO₂/SiN/Pt and Si/SiO₂/Ti/TiN/Pt multilayer bottom electrode have been used for the fabrication of capacitors. XRD and SEM studies were carried out for the films. It was found that the crystallinity of the BST thin film was dependent upon oxygen partial pressure in the sputtering gas. The role of multilayered bottom electrode on the electrical properties of Ba_0.5Sr_0.5TiO₃ films has been also investigated. The dielectric properties of BST films were measured. The results show that the films exhibit pure perovskite phase and their grain sizes are about 80–90 nm. The dielectric properties of the BST thin film on Si/SiO₂/Ti/TiN/Pt electrode was superior to that of the film grown on Si/SiO₂/SiN/Pt electrode.     

Influence of bismuth on properties and microstructures of Sr0.5Ba0.5−xBixTiO3 thin films

The influence of bismuth (Bi) on the dielectric and ferroelectric properties of Sr_0.5Ba_0.5−xBi_xTiO₃ (BST, 0 ≤ x ≤ 0.030 mol) thin films was studied. The results showed that the dielectric constant (ε_r) and dielectric loss (tan δ) decreased, and temperature, T_m, for maximum and ε_r (Curie temperature), moved to lower temperature with increasing Bi content. The P_r, P_s and E_c were 0.22 μC/cm², 0.32 μC/cm² and 60 kV/cm, respectively for Sr_0.5Ba_0.485Bi_0.015TiO₃ thin films measured at 100 Hz, 20 V. The microstructure of BST thinfilms was studied by XRD and TEM. Tetragonal perovskite grains existed in BST thin films, but the grain size decreased with increasing doping ratio in BST. The characteristic absorption band for octahedron [TiO₂] (471.65 cm⁻¹) was shifted to lower wave number.     

The influence of YSZ interlayer on microstructures and dielectric properties of BST thin films prepared by RF magnetron sputtering

(Ba_{1 − x} Sr _x )TiO₃ (BST) thin films were deposited on Pt/Ti/SiO₂/Si and YSZ/Pt/Ti/SiO₂/Si substrates by radio frequency (RF) magnetron sputtering. The influence of YSZ interlayer on microstructures and dielectric properties of BST thin films were investigated by X-ray diffraction, atomic force microscopy, scanning electron microscopy and dielectric frequency spectra. It was found that the preferred orientation of BST thin films could be tailored by insertion of YSZ interlayer and adjusting the thickness of YSZ interlayer. The BST thin films deposited on YSZ interlayer exhibited a more compact and uniform grain structure than that deposited directly on Pt electrode. Dielectric measurement revealed that the BST thin films deposited on 10 nm YSZ interlayer have the largest dielectric constant and a low dielectric loss tangent. The enhanced dielectric behavior is mainly attributed to the YSZ interlayer which serves as an excellent seeding layer to enhance the crystallization of subsequent BST films layer, and a smaller thermal stress field built up at the interface between YSZ interlayer and BST film layer.