注入区势垒厚度对THz量子级联激光器光电特性的影响

为优化多量子阱结构THz量子级联激光器(QCL,qua ntum cascade laser)有源区的结 构设计,本文运用自洽数值求解与电路建模相结合的方法研究了器件有源层注入区势垒厚度 变化 对器件光电及温度特性的影响。首先采用自洽数值求解获得注入区势垒厚为3.0~6. 8nm器件非辐射 散射时间、自激发射弛豫时间以及电子逃逸时间等描述器件有源区输运特性的重要参量;然 后运用电路建 模方法基于三能级速率方程建立了器件的等效电路模型;最后运用电路仿真工具PSPICE对注 入区势垒厚 为3.0~6.8nm器件的光电特性进行了模拟分析,并讨论了器件有源层 注入区的势垒厚度参数变化对器件阈 值电流、输出光功率和输入阻抗等性能参数的影响,分析结果与已报道的理论和实验结果一 致,证明了 通过合理优化有源区的结构参数可以进一步提高器件性能。     

多量子阱半导体激光器的瞬态响应特性分析

根据光增益与载流子密度的对数关系,在受激发射速率中分别引入了增益饱和项和载流子复合项,通过适应于多量子阱激光器的速率方程,从理论上证明了短腔结构存在与阈值电流最小值对应的最佳阱数。给出了多量子阱激光器的瞬态呼应特性的直接仿真结果及相图,分析了注入电流、阱数和腔长对其激射阈值、开关延误时间、弛豫振荡频率和光输出等能量的影响。     

1.3 μm InGaAsSb/GaAsSb量子阱激光器有源区结构设计

为了研制满足光纤通讯需求的高性能半导体激光器,对压应变InGaAsSb/GaAsSb量子阱激光器有源区进行了研究。根据应变量子阱能带理论、固体模型理论和克龙尼克-潘纳模型,确定了激射波长与量子阱材料组分及阱宽的关系。基于Lastip软件建立了条宽为50 μm、腔长为800 μm的半导体激光器仿真模型,模拟器件的输出特性,讨论了量子阱个数对器件光电特性的影响。结果表明：当量子阱组分为In0.44Ga0.56As0.92Sb0.08/GaAs0.92Sb0.08、阱宽为9 nm、量子阱个数为2时,器件的性能达到最佳,阈值电流为48 mA,斜率效率为0.76 W/A。     

AlGaInAs/InP应变补偿多量子阱激光器

为了优化在长距离光纤通讯系统中采用的1.31μm波长的量子阱激光器,对AlGaInAs/InP材料的有源区应变补偿的量子阱激光器进行了设计研究。采用应变补偿的方法,根据克龙尼克-潘纳模型理论计算出量子阱的能带结构,设计出有源区由1.12%的压应变AlGaInAs阱层和0.4%的张应变AlGaInAs垒层构成。使用ALDS软件对所设计出的器件进行了建模仿真,对其进行了阈值分析和稳态分析。结果表明,在室温25℃下,该激光器具有9mA的低阈值电流和0.4W/A较高的单面斜率效率;在势垒层采用与势阱层应变相反的适当应变,可以降低生长过程中的平均应变量,保证有源区良好的生长,改善量子阱结构的能带结构,提高对载流子的限制能力,降低阈值电流,提高饱和功率,改善器件的性能。     

AlGaInP大功率半导体激光器的漏电分析

对于GaInP/AlGaInP量子阱激光器,在大电流注入或高温工作时有源区中注入的电子会越过势垒进入p型限制层成为漏电流,严重影响器件的正常工作.本文通过测试AlGaInP大功率压应变量子阱激光器的阈值电流和外微分量子效率随温度的变化,拟合出有源区电子的有效势垒高度,并与理论模拟结果进行了比较,讨论了p型限制层掺杂浓度的分布对势垒高度的影响.     

AlGaInP大功率半导体激光器的漏电分析

对于GaInP/AlGaInP量子阱激光器，在大电流注入或高温工作时有源区中注入的电子会越过势垒进入p型限制层成为漏电流，严重影响器件的正常工作. 本文通过测试AlGaInP大功率压应变量子阱激光器的阈值电流和外微分量子效率随温度的变化，拟合出有源区电子的有效势垒高度，并与理论模拟结果进行了比较，讨论了p型限制层掺杂浓度的分布对势垒高度的影响.     

2μm InGaAsSb/AlGaAsSb应变补偿量子阱结构的数值研究

为了降低2μm半导体激光器的阈值电流并提高器件的输出功率,设计了InGaAsSb/AlGaAsSb应变补偿量子阱结构,并利用SimLastip软件对器件进行了数值模拟.研究表明,在势垒中适当引入张应变可以改善量子阱的能带结构,提高对载流子的限制能力.当条宽为120 μm、腔长为1 000 μm时,采用应变补偿量子阱结构的激光器的阈值电流为91 mA,斜率效率为0.48 W/A.与压应变量子阱激光器相比,器件性能得到明显的改善.     

1.31μm InGaAsP/InGaAlAs TM偏振高速激光器的优化设计

报道了一种以InGaAsP(阱)/InGaAlAs(垒)量子阱为有源区的1.31μmTM偏振高速激光器。以1%张应变的In_(0.49)Ga_(0.51)As_(0.79)P_(0.21)作为阱层,0.5%压应变的InGaAlAs作为垒层,计算了由不同势垒带隙(1.309、1.232、1.177、1.136、1.040 eV)构成的五种多量子阱的发光特性,和由其构成的激光器的器件特性。数值模拟分析表明,采用适度小的势垒带隙,既能将载流子有效限制在有源区,又可以得到载流子在量子阱间的均匀分布,从而改善量子阱的发光特性和激光器的性能参数。该仿真对研制低阈值电流、高特征温度和大调制带宽的InGaAsP/InGaAlAs应变补偿量子阱激光器具有指导意义。     

基于对数关系的多量子阱VCSELs阈值特性研究

采用光增益与载流子浓度的对数关系，考虑到非辐射复合的影响，从理论上推导出多量子阱垂直腔面发射半导体激光器(VCSELs)的速率方程。讨论了阈值电流密度、最佳阱数等与器件参数(腔长和端面反射率)之间的依赖关系。为改善VCSELs阈值特性和优化器件结构提供了理论依据。     

InGaAs／AlGaAs单量子阱激光器低阈值激射

研制了InGaAs/AlGaAs SQW激光器,对其工作特性如阈值电流密度、激射波长、特征温度、远场分布等进行了研究. 用MOCVD方法生长制备了InGaAs/AlGaAs分别限制单量子阱结构材料,得出其各层组分和能带分布.首先在GaAs衬底上生长GaAs缓冲层和AlGaAs波导层,然后生长窄能带的AlGaAs量子阱势垒层,再继续生长InGaAs量子阱有源区.其后继续生长AlGaAs势垒层、高Al组分AlGaAs波导层和GaAs高掺杂欧姆接触层.我们发现在低温范围里(160 K～220 K)阈值电流密度随温度升高而减小,与普通量子阱激光器正相反,表现出负的特征温度.随着温度进一步提高,阈值电流密度表现出指数式增大.300 K下腔长2000 μm的激光器最低的阈值电流密度约为200 A/cm2.(OD7)     

p-GaN-i-GaN/AlGaN multiple-quantum well n-AlGaN back-illuminated ultraviolet detectors

The spectral response of back-surface-illuminated p-GaN-i-GaN/AlGaN multiplequantum well (MQW)-n-AlGaN ultraviolet (UV) photodetector is reported. The structure was grown by molecular-beam epitaxy on a c-plane sapphire substrate. A MQW is introduced into the active region of the device to enhance the quantum efficiency caused by the high absorption coefficient of the two-dimensional (2-D) system. Another advantage of using MQW in the active region is the ability to tune the cutoff wavelength of the photodetector by adjusting the well width, well composition, and barrier height. The zero-bias peak responsivity was found to be 0.095 A/W at 330 nm, which corresponds to 36% quantum efficiency from as-grown p-i-n GaN/AlGaN MQW devices. An anomalous effect, occurring in responsivity as a negative photoresponse in the spectra peaked at 362 nm because of poor ohmic contact to p-type GaN, was also observed. Etching the sample in KOH for 30 sec before fabrication removed the surface contaminants and improved the surface smoothness of the as-grown sample, resulting in significant improvement in the device performance, giving a peak responsivity of 0.12 A/W. The device has a quantum efficiency of 45% at 330 nm without the anomalous negative photocurrent.     

MBE生长InGaAs／GaAs应变层单量子阱激光器结构材料的研究

采用ＶａｒｉａｎＧｅｎⅡＭＢＥ生长系统研究了ＩｎＧａＡｓ／ＧａＡｓ应变层单量子阶（ＳＳＱＷ）激光器结构材料。通过ＭＢＥ生长实验，探索了Ｉｎ＿ｘＧａ＿（１－ｘ）ｔＡｓ／ＧａＡｓＳＳＱＷ激光器发射波长（λ）与Ｉｎ组分（ｘ）和阱宽（Ｌ＿ｚ）的关系，并与理论计算作了比较，两者符合得很好。还研究了材料生长参数对器件性能的影响，主要包括：Ⅴ／Ⅲ束流比，量子阱结构的生长温度Ｔ＿ｇ（ＱＷ），生长速率和掺杂浓度对激光器波长、阈值电流密度、微分量子效率和器件串联电阻的影响。以此为基础，通过优化器件结构和ＭＢＥ生长条件，获得了性能优异的Ｉｎ＿（０．２）Ｇａ＿（０．８）Ａｓ／ＧａＡｓ应变层单量子阱激光器：其次长为９６３ｎｍ，阈值电流密度为１３５Ａ／ｃｍ￣２，微分量子效率为３５．１％。     

GaN基HEMT器件结构设计及其性能仿真北大核心

利用Silvaco TCAD器件模拟软件研究了AlGaN/GaN高电子迁移率晶体管(HEMT)器件势垒层的厚度、沟道宽长比和掺杂浓度对器件的转移特性和跨导曲线的影响。结果表明,器件势垒层厚度的变化可以调节器件的电流开关比和开启电压,实现由耗尽型器件向增强型器件的转变;沟道宽长比的改变可以调节器件的开启电压,并且随着沟道宽长比的增加,栅极电压控制量子阱中二维电子气的能力增强;势垒层适量掺杂提高了输出电流,并且使跨导的峰值增大,但过度掺杂会造成器件不易关断情况出现。     

The effect of varying barrier height on the operationalcharacteristics of 1.3-μm strained-layer MQW lasers

This paper presents an empirical study of the effects that barrier layer composition has on the operational characteristics of 1.3-μm-wavelength InGaAsP-InP multiquantum-well (MQW) strained-layer ridge-waveguide lasers. A systematic empirical investigation of how this design choice affects practical device operation was undertaken by examining threshold current, efficiency, and modal gain as a function of temperature in five different laser structures. The results of these studies indicate that small barrier heights improve device performance, despite the loss of electronic confinement in the shallow conduction band quantum wells. Indeed, it appears that carrier uniformity in the MQW structure may be improved by carrier redistribution due to thermal or tunneling effects, which in turn enhances the operation of the low barrier height structures     

A comparative study of temperature sensitivity of InGaAsP andAlGaAs MQW lasers using numerical simulations

We used numerical simulation to compare the temperature sensitivity of an InGaAsP MQW laser emitting at 1.55 μm and an AlGaAs MQW laser at 0.82 μm. By artificially changing the InGaAsP laser gradually into a structure similar to the AlGaAs laser, we gained quantitative insight into how each material or structural parameter causes the relatively low T₀ of the InGaAsP MQW laser. Using a typical MQW structure we demonstrated the relative importance of parameters involving Auger recombination, current leakage over the quantum barrier, optical confinement and band offset. We found that if these parameters were made the same as the AlGaAs laser, the T₀ of the InGaAsP laser was even better than that of the AlGaAs laser. Our numerical simulation confirmed that the Auger recombination is the main cause of low T₀ in MQW InGaAsP lasers. We also discovered that thermal current leakage over the barrier and Auger recombinations are correlated with each other and both factors must be improved to increase the T₀ of InGaAsP lasers to that of AlGaAs lasers     

Critical layer thickness of strained-layer InGaAs/GaAs multiple quantum wells determined by double-crystal x-ray diffraction

Double-crystal x-ray diffraction (DCXD) is shown to reveal the onset of relaxation in strained-layer InGaAs/GaAs multiple quantum well (MQW) structures. The MQW structures contain 10 nm thick In_0.16Ga_0.84As quantum wells and 55 nm thick GaAs barrier layers. As the number of periods in the structure was increased from to 3 to 15, the x-ray rocking curves were characterized by increasing distortion of superlattice interference fringes, broadening of superlattice peaks, and reduction in peak intensity. The x-ray diffraction data are correlated with an asymmetric crosshatched surface pattern as observed under Nomarski contrast microscopy. By using DCXD and Nomarski microscopy, the onset of strain relaxation in InGaAs/GaAs MQW structures was established for samples with various GaAs barrier layer thicknesses. For MQW structures in which the thickness of the barrier layers is the same or greater than that of the strained quantum wells, the critical layer thickness can be calculated according to the Matthews and Blakeslee force-balance model with dislocation formation by the single-kink mechanism.     

Room-temperature operation of MBE-grown InGaP/InGaAlP MQW visible laser diodes

Room-temperature pulsed operation has been achieved, for the first time, in InGaP/InGaAlP multiquantum-well (MQW) laser diodes grown by molecular beam epitaxy (MBE). This MQW laser is composed of 10 nm-thick InGaP well layers and 5 nm-thick InGaAlP barrier layers. The lasing wavelength was 658 nm. The threshold current density and T0 value were 7.6 kA/cm2 and 115 K, respectively.     

Analysis and application of theoretical gain curves to the design of multi-quantum-well lasers

Gain/current curves for a single quantum well are calculated. The optimum well number, cavity length, threshold current, and current density of multi-quantum-well (MQW) lasers are derived in terms of this gain curve. The limiting performance of MQW lasers is found to be better than that of graded refractive index (GRIN) lasers, assuming comparable efficiencies and spontaneous emission linewidths. The optimum threshold current for an MQW laser with a 7 μm cavity and 90 percent facet reflectivity issim50 muA/μm.     

High-extinction-ratio MQW electroabsorption-modulator integratedDFB laser fabricated by in-plane bandgap energy control technique

The local bandgap energy of an InGaAs/InGaAsP multiple quantum well (MQW) structure was precisely adjusted by in-plane Eg control in one-step selective area metalorganic chemical vapor deposition (MOCVD) growth. The technique was then applied to an MQW electroabsorption-modulator integrated distributed feedback (DFB) laser. Experimental results showed superior device characteristics, such as a high extinction ratio of 25 dB and low threshold current of 15 mA     

全固源分子束外延InAsP/InGaAsP多量子阱1.55μm激光器

利用新型全固源分子束外延技术 ,对 1 .5 5 μm波段的 In As P/ In Ga As P应变多量子阱结构的生长进行了研究。实验表明 ,较低的生长温度或较大的 / 束流比有利于提高应变多量子阱材料的结构质量 ,而生长温度对材料的光学特性有较大的影响。在此基础上生长了分别限制多量子阱激光器结构 ,制作的氧化物条形宽接触激光器实现了室温脉冲工作 ,激射波长为 1 5 63 nm,阈值电流密度为 1 .4k A/ cm2 。这是国际上首次基于全固源分子束外延的 1 .5 5 μm波段 In As P/ In Ga As P多量子阱激光器的报道