固态照明用蓝光LED和LD辐射量子效率与电流密度的比较研究

比较了蓝光LED和LD的辐射量子效率随电流密度变化的趋势.LED在低电流密度时具有很高的辐射量子效率,并且在电流密度为24.4 A/cm2时达到了峰值效率,随着电流密度的增大,其量子效率会急剧下降;LD在电流密度低于出光阈值时辐射量子效率为零,待达到出光阈值后迅速上升并在电流密度为4.85×103 A/cm2时超越LED.分析表明,LED效率骤减是由于自身的发光机理限制了辐射速率的提升;LD受激辐射发光机理恰好弥补了LED的不足,其辐射量子效率受非辐射复合速率的影响较小.结果表明,LD具有高电流密度下高辐射量子效率的特性.     

InGaN/GaN超晶格垒层用于InGaN发光二极管发光增强研究

设计了InGaN/GaN超晶格垒层替代p-GaN和n-GaN附近传统GaN垒层的InGaN/GaN多量子阱(MQW)发光二极管(LEDs)结构。通过数值方法模拟出两种LED结构的光功率-电压(L-V)曲线、电致发光(EL)谱、能带图、电子浓度分布和辐射复合速率。结果表明InGaN/GaN超晶格替代n-GaN附近GaN垒层的LED结构比替代p-GaN附近GaN垒层的LED显示出更高的发光强度。这种发光增强的原因是InGaN/GaN超晶格替代n-GaN附近GaN垒层可以提高电子注入效率和辐射复合速率。     

基于非辐射复合缺陷测量的GaN基LED老化性能研究

外延晶格失配等引入的非辐射复合缺陷是影响GaN基LED性能的重要因素。对不同LED样品老化1 600h前后的I-V特性、理想因子以及量子效率、发光特性进行了测量研究,并结合非辐射复合缺陷的定量测量,分析验证了非辐射复合缺陷对LED老化性能的影响。结果表明,非辐射复合缺陷是造成GaN基LED老化过程中隧穿电流增大、I-V特性偏离理想模型、理想因子增大以及光输出非线性化等现象的根本因素。在此基础上建立了非辐射复合缺陷浓度与LED老化性能之间的关系模型,提出了一种基于非辐射复合缺陷浓度及其恶化系数的GaN基LED老化性能评测方法。     

发光二极管电子辐照效应的研究

研究电子辐照对发光二极管（Light emitting diode,LED）性能的影响。利用电子加速器提供的电子束模拟空间电子辐射环境,试验时电子的能量是1.0 MeV,辐射最大剂量为1106 rad（Si）。辐照期间,采用异位测试的方法进行光学量和电学量的测量,并进行辐射后退火效应的研究。结果表明:随着辐照剂量的增加,LED的输出光功率近似线性衰减,其正向压降V增大,且不同的试验条件对LED性能损伤的程度不同。此外,辐射停止后的一段时间,器件的性能有所恢复,并趋于稳定。同时利用电子辐照机理对试验结果进行理论分析和讨论。     

用于制备硅LED的太阳能电池技术

集成电路工艺发展使得芯片内部的互连成为芯片延时的主要问题.制备出高光效的硅LED已经成为OEIC发展的瓶颈.硅是间接带隙半导体,而且载流子寿命较长.所以使用硅材料制备发光器件是长久以来特别引人关注而又较难解决的问题.采取降低非辐射复合速率,增加辐射复合的机会可以实现硅LED的发光.介绍了用于制备硅LED的太阳能电池技术原理和主要方法,以及采用这一原理实现PERL硅电池和区熔硅衬底非晶硅电池用于制备LED的技术.     

表面累积层对N型Hg_(1-x)Cd_xTe输运特性及复合特性的影响

通过测量经紫外辐照的样品的磁输运特性和复合特性,研究N~+表面累积层对钝化N-Hg_(0.78)Cd_(0.22)Te的影响。紫外辐射使N~+表面层减少,从而使样品的电阻增大,这一现象与钝化氧化层俘获电子有关。观察到紫外辐照可使样品的载流子寿命减小约90%。假设紫外辐射降低了由N~+表面层引起的内建电势,可解释较快的电子-空穴复合速率。被激发成准平带或弱耗尽状态的晶体的电子-空穴复合时间常数较小。N-Hg_(1-x)Cd_xTe表面层状态确定了光电导器件的最终设计。     

移去电子阻挡层对双蓝光波长LED性能的影响

采用数值分析方法进行模拟分析In Ga N/Ga N混合多量子阱中移去p-Al Ga N电子阻挡层对Ga N基双蓝光波长发光二极管(LED)性能的影响。结果发现,与传统的具有p-Al Ga N电子阻挡层的双蓝光波长LED相比,移去电子阻挡层能有效地改善电子和空穴在混合多量子阱活性层中的分布均匀性,实现电子空穴在各个量子阱中的均衡辐射。在小电流驱动时,移去电子阻挡层器件的发光功率要明显优于具有电子阻挡层的器件;而在大电流驱动时,电子阻挡层能有效地减少电子溢流,改善器件的发光效率。     

基于p-型氮化硼材料的深紫外LED设计

本文通过在发光二极管(light emitting diode,LED) 的p掺杂区域引入六方氮化硼(hexagonal boron nitride,h-BN) 结构,以提升深紫外(deep ultraviolet,DUV) LED的空穴浓度。通过COMSOL有限元软件对LED器件量子阱区域建模,结果表明:1) 掺入h-BN后,p区域空穴浓度提升了约一个数量级,发射率和内量子效率(inernal quantum efficiency,IQE) 得到了显著提升; 2) 随着h-BN厚度的增加,p区空穴浓度显著提升;3)h-BN相对于AlGaN材料带隙上移的特性,有效地阻挡了电子泄露,使量子阱区域电子和空穴复合进一步增强,有效改善了DUV LED的发光效率。本文提出的设计结构为实验制备高量子效率的DUV LED器件提供了解决方案。     

GaN基LED光电器件的磊层研究与设计

介绍了一种缓解GaN基LED效率下降的器件设计方法,重点研究了采用新方法光电器件中载流子的分布。根据与传统GaN器件的对比,可以发现LED效率提高的原因是空穴的浓度分布的更加均匀。     

表面复合及背景辐射对0.1eVHgCdTe光导器件性能的影响

讨论了影响0.1eVHgCdTe光导器件性能的因素,除考虑表面复合和背景辐射外,还考虑了器件不同厚度对其性能的影响,从过剩载流子的连续性方程,采用在厚度方向上载流子浓度取平均的方法,推导了量子效率的普遍表达式,求解了由带间俄歇过程所限制的少数载流子寿命、电子和空穴浓度以及量子效率间的自洽关系,讨论了器件的性能。得出结论:(1)当背景辐射通量φ_B>10~(16)cm~(-2)s~(-1)时,随着φ_B的增大,器件响应率R_λ、探测率D_λ及少     

抛物线型衬底InGaN/GaN发光二极管的模拟研究

针对发射到衬底中的光子,提出了一种具有抛物线型衬底结构的InGaN/GaN发光二极管,并对平面衬底和抛物线型衬底InGaN/GaN发光二极管的光子运动轨迹、发射功率角度分布和外量子效率进行了模拟计算.结果表明:相对于平面衬底发光二极管,抛物线型衬底发光二极管可以充分利用发射到衬底中的光子,使其正向光子发射功率增加12.6倍,外量子效率提高1.22倍,同时具有发射准平行光的功能.     

Characteristics of Green Light-Emitting Diodes Using an InGaN:Mg/GaN:Mg Superlattice as p-Type Hole Injection and Contact Layers

Mg-doped InGaN/GaN p-type short-period superlattices (SPSLs) are developed for hole injection and contact layers of green light-emitting diodes (LEDs). V-defect-related pits, which are commonly found in an InGaN bulk layer, can be eliminated in an InGaN/GaN superlattice with thickness and average composition comparable to those of the bulk InGaN layer. Mg-doped InGaN/GaN SPSLs show significantly improved electrical properties with resistivity as low as ∼0.35 ohm-cm, which is lower than that of GaN:Mg and InGaN:Mg bulk layers grown under optimized growth conditions. Green LEDs employing Mg-doped InGaN/GaN SPSLs for hole injection and contact layers have significantly lower reverse leakage current, which is considered to be attributed to improved surface morphology. The peak electroluminescence intensity of LEDs with a SPSL is compared to that with InGaN:Mg bulk hole injection and contact layers.     

Tunnel injection and power efficiency of InGaN/GaN light-emitting diodes

The results of studying the influence of the finite tunneling transparency of injection barriers in light-emitting diodes with InGaN/GaN quantum wells on the dependences of the current, capacitance, and quantum efficiency on the p-n junction voltage and temperature are presented. It is shown that defectassisted hopping tunneling is the main transport mechanism through the space charge region (SCR) and makes it possible to lower the injection barrier. It is shown that, in the case of high hopping conductivity through the injection barrier, the tunnel-injection current into InGaN band-tail states is limited only by carrier diffusion from neutral regions and is characterized by a close-to-unity ideality factor, which provides the highest quantum and power efficiencies. An increase in the hopping conductivity through the space charge region with increasing frequency, forward bias, or temperature has a decisive effect on the capacitance-voltage characteristics and temperature dependences of the high-frequency capacitance and quantum efficiency. An increase in the density of InGaN/GaN band-tail states and in the hopping conductivity of injection barriers is necessary to provide the high-level tunnel injection and close-to-unity power efficiency of high-power light-emitting diodes.     

Growth of InGaN and double heterojunction structure with InGaN back barrier

We study the growth of an InGaN and AIGaN/GaN/InGaN/GaN double heterojunction structure by metalorganic chemical vapor deposition (MOCVD).It is found that the crystal quality of the InGaN back barrier layer significantly affects the electronic property of the AIGaN/GaN/InGaN/GaN double heterojunction.A high crystal quality InGaN layer is obtained by optimizing the growth pressure and temperature.Due to the InGaN layer polarization field opposite to that in the AIGaN layer,an additional potential barrier is formed between the GaN and the InGaN layer,which enhances carrier confinement of the 2DEG and reduces the buffer leakage current of devices.The double heterojunction high-electron-mobility transistors with an InGaN back barrier yield a drain induced barrier lowering of 1.5 mⅤ/Ⅴ and the off-sate source-drain leakage current is as low as 2.6μA/mm at VDs = 10 Ⅴ.     

Frequency and temperature dependences of capacitance-voltage characteristics of InGaN/GaN light-emitting structures with multiple quantum wells

A frequency dependence of capacitance-voltage (C–V) characteristics in multiple quantum well InGaN/GaN heterostructures in the range of 60 Hz-5 MHz is investigated at temperatures from 77 to 300 K. It is found that temperature lowering and test frequency increase lead to the similar changes in obtained apparent carrier distributions. It is shown that commonly used conditions for capacitance-voltage profiling of InGaN/GaN LEDs correspond to an intermediate case between low- and high-frequency capacitance approximations. At all temperatures investigated, the edge low-frequency capacitance-voltage profiles are experimentally reached and found to be identical. The process of attainment of equilibrium of the charges in the active region is most likely determined by tunneling of the carriers through the barriers.     

Exciton states in wurtzite and zinc-blende InGaN/GaN coupled quantum dots

Based on the effective-mass approximation, exciton states in wurtzite (WZ) and zinc-blende (ZB) InGaN/GaN coupled quantum dots (QDs) are studied by means of a variational method. Numerical results show clearly that both the sizes and In content of QDs have a significant influence on exciton states in WZ and ZB InGaN/GaN coupled QDs. Moreover, the ground-state exciton binding energy decreases when the interdot barrier layer thickness increases in the WZ InGaN/GaN coupled QDs. However, the ground-state exciton binding energy has a minimum if the interdot barrier layer thickness increases in the ZB InGaN/GaN coupled QDs.     

Visible InGaN/GaN Quantum-Dot Materials and Devices

General properties of III-V nitride-based quantum dots (QDs) are presented, with a special emphasis on InGaN/GaN QDs for visible optoelectronic devices. Stranski-Krastanov GaN/AlN dots are first discussed as a prototypical system. It is shown that the optical transition energies are governed by a giant quantum-confined Stark effect, which is the consequence of the presence of a large built-in internal electric field of several MV/cm. Then we move to InGaN/GaN QDs, reviewing the different fabrication approaches and their main optical properties. In particular, we focus on InGaN dots that are formed spontaneously by In composition fluctuations in InGaN quantum wells. Finally, some advantages and limitations of nitride laser diodes with active regions based on InGaN QDs are discussed, pointing out the requirements on dot uniformity and density in order to be able to exploit the expected quantum confinement effects in future devices.     

Study of dual-blue light-emitting diodes with asymmetric AlGaN graded barriers

A dual-blue light-emitting diode （LED） with asymmetric A1GaN composition-graded barriers but without an AlGaN electron blocking layer （EBL） is analyzed numerically. Its spectral stability and efficiency droop are improved compared with those of the conventional InGaN/GaN quantum well （QW） dual-blue LEDs based on stacking structure of two In0.18Ga0.szN/GaN QWs and two In0.12Ga0.88N/GaN QWs on the same sapphire substrate. The improvement can be attributed to the markedly enhanced injection of holes into the dual-blue active regions and effective reduction of leakage current.     

Improvement of the efficiency droop of GaN-LEDs using an AlGaN/GaN superlattice insertion layer

With an n-AlGaN(4 nm)/GaN(4 nm) superlattice(SL) inserted between an n-GaN and an InGaN/GaN multiquantum well active layer,the efficiency droop of GaN-based LEDs has been improved.When the injection current is lower than 100 mA,the lumen efficiency of the LED with an n-AlGaN/GaN SL is relatively small compared to that without an n-AlGaN/GaN SL.However,as the injection current increases more than 100 mA,the lumen efficiency of the LED with an n-AlGaN/GaN SL surpasses that of an LED without an n-AlGaN/GaN SL. The wall plug efficiency of an LED has the same trend as lumen efficiency.The improvement of the efficiency droop of LEDs with n-AlGaN/GaN SLs can be attributed to a decrease in electron leakage due to the enhanced current spreading ability and electron blocking effect at high current densities.The reverse current of LEDs at -5 V reverse voltage decreases from 0.2568029 to 0.0070543μA,and the electro-static discharge(ESD) pass yield of an LED at human body mode(HBM)-ESD impulses of 2000 V increases from 60%to 90%.     

InGaN/GaN和InGaN/AlGaN多量子阱中应变对光致发光特性的影响

对蓝宝石衬底上的InGaN/GaN和InGaN/AlGaN多量子阱结构和经激光剥离去除衬底的InGaN/GaN和InGaN/AlGaN多量子阱结构薄膜样品,进行了光致发光谱、高分辨XRD和喇曼光谱测量.PL测量结果表明,相对于带有蓝宝石衬底的样品,InGaN/GaN多量子阱薄膜样品的PL谱峰值波长发生较小的蓝移,而InGaN/AlGaN多量子阱薄膜样品的PL谱峰值波长发生明显的红移;喇曼光谱的结果表明,激光剥离前后E2模的峰值从569.1减少到567.5cm-1.这说明激光剥离去除衬底使得外延层整体的压应力得到部分释放,但InGaN/GaN与InGaN/AlGaN多量子阱结构中阱层InGaN的应力发生了不同的变化.XRD的结果证实了这一结论.