硬质合金基体微织构对TiAlN涂层摩擦性能的影响

采用光纤激光在硬质合金表面进行了激光微织构工艺(不同微凹坑直径、深度及织构密度),利用PVD法对微织构后的硬质合金表面进行TiAlN涂层沉积。在不同速度下(0.02m/s和0.04m/s)进行了摩擦磨损实验,对比分析了不同织构的摩擦系数,利用扫描电镜研究了表面磨损形貌,电子天平测量磨损量,并进行了磨损机理分析。结果表明,基体微织构后涂层表面的摩擦系数比基体无织构的摩擦系数稳定,微织构直径对基体涂层的摩擦磨损性能影响较大。基体微织构后的涂层具有较好的减摩效果。     

硬质合金基底表面线缺陷对金刚石涂层膜基界面结合强度的影响

基于密度泛函理论的第一性原理平面波赝势方法,研究了不同硬质合金基底线缺陷率下的金刚石涂层膜基界面结合强度。通过建立[111]、[110]、[100]3种不同晶向的金刚石涂层膜基界面分子模型,研究了硬质合金基底线缺陷率对涂层膜基界面结合强度的影响以及[111]、[110]、[100]3种不同金刚石涂层晶向下的最优膜基界面结合强度。研究结果表明:硬质合金基底的表面能随着基底线缺陷率的增加而逐步增大;当线缺陷率ρ=12.5%时,基底表面能达到最大值;其后,随着基底线缺陷率继续增大,基底表面能逐渐呈减小趋势。进一步研究显示,不同晶向的金刚石涂层膜基界面的最优界面结合能的最优线缺陷率不同,[111]晶向和[110]晶向的金刚石涂层的最优基底线缺陷率均为6.25%,而[100]晶向金刚石涂层的最优基底线缺陷率则为0%。      

硬质合金上沉积金刚石膜的基体预处理方法进展

本文重点对近年硬质合金基体表面预处理方法及其对CVD金刚石膜沉积的影响进行了综述。按其原理来分,预处理方法可分为物理预处理法、化学预处理法以及中间层法。大量实验结果表明通过适当的预处理能有效消除或抑制基体中钴黏结相的负面影响,提高金刚石的形核密度以及膜基结合力,从而获得理想的薄膜质量。     

硬质合金基体金刚石薄膜摩擦学性能研究的进展

硬质合金基体表面沉积金刚石薄膜可以提高其硬度和耐磨性,延长其使用寿命,有效保护和节约钨、钴等稀有金属。作为一种多晶膜,金刚石薄膜的摩擦系数直接影响了其在摩擦学领域的应用。对近年来硬质合金基体表面CVD金刚石薄膜的摩擦磨损性能的研究状况进行了阐述,分析了CVD金刚石薄膜在摩擦实验过程中的摩擦磨损机制,并对金刚石薄膜在摩擦学领域中的应用研究进行了展望。     

Numerical and experimental studies on the grinding of cemented carbide with textured monolayer diamond wheels

Textured grinding wheels could provide more excellent grinding performances than conventional grinding wheels, which have been experimentally confirmed. However, for lack of in-depth understandings of the grains-workpiece micro contact and interactions, experimental methods can only obtain the macro grinding performances, and the key issues on textured grinding wheels cannot be experimentally explained. In this paper, the combination method of numerical analysis and experiment is proposed. The experiments are conducted to evaluate the machining performances of grinding wheels from a macro level. Meanwhile, numerical methods are used to analyze the distribution characteristics of undeformed chip thickness in micro cutting process. The effects of material removal rate, texture dimension (TD) and radial dressing of grinding wheels on the distribution characteristics of undeformed chip thickness are revealed. The strong correlations between the macro grinding performances and the distribution characteristics of undeformed chip thickness are proved, and what kind of distribution characteristics are beneficial to good grinding results can be discerned, which provides a theoretical basis for tool optimization. Then, optimization strategy and steps of grinding performances are proposed. A conventional grinding wheel with same geometric parameters and grain size is used as reference grinding wheel, and the distribution of undeformed chip thickness generated in stable wear stage by the reference grinding wheel is taken as optimization starting point. After optimization, a desired distribution of undeformed chip thickness can be obtained. Finally, grinding experiments are conducted to confirm the optimization effects. In this way, using the distribution characteristics of undeformed chip thickness as a pointer, the deeper understanding of key issues on textured grinding wheel will be reached.     

化学脱钴对硬质合金沉积金刚石薄膜的影响

采用HFCVD系统,以CH4和H2为反应气体,分别在YG3、YG6、YG10、YG13硬质合金上沉积了金刚石薄膜,研究了化学脱钴处理对不同钴含量硬质合金沉积金刚石薄膜的影响.通过对105个样品的实验结果进行统计分析发现,YG3所得金刚石薄膜样品具有足够结合强度的比例为89%;而YG6、YG10 和YG13所得样品的相应值分别为24%、7%和0%.相反,YG3、YG6、YG10 和YG13所得金刚石薄膜严重破坏的比例分别为0%、64%、72%和79%.研究表明,化学腐蚀脱钴处理能够解决金刚石涂层形核率低的问题,但难以解决高钴硬质合金的附着性差的问题.     

孕镶金刚石硬质合金基底上沉积金刚石涂层工艺研究

为提高金刚石涂层和基底的结合力,采用化学气相沉积方法在普通硬质合金和孕镶金刚石硬质合金基底上分别沉积金刚石涂层,并通过扫描电镜、拉曼光谱和压痕分析对比研究其结合性能。结果表明:在孕镶金刚石硬质合金基底上可以实现金刚石的同质与异质外延生长;在孕镶金刚石硬质合金基底上沉积的金刚石形核率高,晶形大小均匀,涂层表面平整;孕镶金刚石基底金刚石涂层的结合力优于硬质合金基底金刚石涂层膜基界面的结合力。在孕镶金刚石硬质合金基底上沉积金刚石膜可扩大金刚石涂层的应用范围。      

表面毛化WC-Co硬质合金与铝的真空扩散连接

采用机械方法对WC-Co硬质合金表面进行焊前毛化加工,然后采用BNi2钎料对毛化后的硬质合金表面进行预涂覆处理,最终利用毛化凸台在铝中的压入及界面元素的扩散反应实现WC-Co硬质合金与铝的真空扩散连接. 结果表明,接头界面结构为:Al/Al₃Ni+Al₃Ni₂+Al₅Co₂/Co-Ni(s.s)/W-Co-Ni/WC-Co. 随着预涂覆温度的升高,W-Co-Ni化合物相的体积增大,界面由平齐向不规则演变;随着扩散温度的提高,Al₃Ni+Al₃Ni₂+Al₅Co₂层厚度增加. 当工艺参数增加时,接头抗剪强度呈现出先升高后降低的变化趋势,特别是当预涂覆温度为1 050 ℃,扩散连接温度为575 ℃,保温时间为90 min时,接头室温抗剪强度达到最大值51 MPa,明显高于未毛化接头的抗剪强度.     

硼掺杂梯度对硬质合金金刚石涂层的影响

为提高硬质合金刀具上金刚石涂层的结合性能,采用热丝化学气相沉积法在YG 8硬质合金基体上沉积高、低梯度硼掺杂微米金刚石（high gradient boron-doped micron crystal diamond, HGBMCD;low gradient boron-doped micron crystal diamond, LGBMCD）涂层和无硼掺杂的微米金刚石（micrometer crystal diamond, MCD）涂层,探究沉积过程中硼掺杂浓度的梯度大小对金刚石涂层的形核和生长性能的影响。结果表明:随着硼的掺入,金刚石的形核密度增大,生长6 h后的金刚石晶粒更均匀细小,其中LGBMCD的晶粒尺寸大部分在2～3 μm;而石墨相在梯度硼掺杂金刚石涂层中的生长会被抑制,HGBMCD中I_Dia/I_G高达14.65,残余应力仅为–0.255 GPa,且Co₂B、CoB等硼钴化合物含量随硼掺杂梯度的减小而增大;金刚石涂层的残余应力因硼的掺入逐渐从压应力转变成拉应力,残余应力大小先减小后增大;洛氏压痕显示,随着硼的掺入,金刚石涂层的结合性能提高,LGBMCD的结合性能最好,在1 470 N下可达到HF2级。因此,适当的硼掺杂梯度有利于提高金刚石涂层的质量和结合性能。      

Enhanced tribological performances of nanocrystalline diamond film

Diamond films are well known for their outstanding properties such as high hardness, possible low coefficient of friction, high thermal conductivity, excellent biocompatibility and electrical insulation. Diamond films with nanocrystalline grains (grain sizes between 3 and 15 nm) offer further advantages of low compressive stress, low surface roughness, and high amount of surface atoms in relation to volume leading to enhanced surface properties. In view of these, the present investigation is undertaken to explore the possibility of using nanocrystalline diamond (NCD) films in advanced automotive equipment. Accordingly NCD-films have been deposited using a modified hot-filament technique. Tribological behaviour of these films has been evaluated by means of a reciprocating model tribometer with different lubricant qualities. The worn surfaces were examined using scanning electron microscopy (SEM) and 3D white light confocal microscopy. The results show the influences of coating qualities and test conditions on the tribological response. Comparable friction coefficient can be found with high treated and low treated lubricants. These films exhibited negligible wear for the range of load tested.     

硬质合金粉末表面电泳沉积制备金刚石涂层

采用电泳沉积法在硬质合金粉末表面涂覆金刚石涂层,分析硬质合金含量和MgCl₂·6H₂O含量对涂层沉积效果的影响,并对制备的涂层粉末进行性能表征。结果表明:电泳沉积法可实现硬质合金粉末表面涂覆金刚石涂层;硬质合金粉末为28.0 g,金刚石粉末为4.0 g,MgCl₂·6H₂O为1.0 g时,制备的金刚石涂层均匀且致密度好。      

Effect of deposition temperature on properties of boron-doped diamond films on tungsten carbide substrate

Boron-doped diamond (BDD) films were deposited on the tungsten carbide substrates at different substrate temperatures ranging from 450 to 850 °C by hot filament chemical vapor deposition (HFCVD) method. The effect of deposition temperature on the properties of the boron-doped diamond films on tungsten carbide substrate was investigated. It is found that boron doping obviously enhances the growth rate of diamond films. A relatively high growth rate of 544 nm/h was obtained for the BDD film deposited on the tungsten carbide at 650 °C. The added boron-containing precursor gas apparently reduced activation energy of film growth to be 53.1 kJ/mol, thus accelerated the rate of deposition chemical reaction. Moreover, Raman and XRD analysis showed that heavy boron doping (750 and 850 °C) deteriorated the diamond crystallinity and produced a high defect density in the BDD films. Overall, 600–700 °C is found to be an optimum substrate temperature range for depositing BDD films on tungsten carbide substrate.     

细晶粒硬质合金预处理工艺优化及金刚石涂层性能研究

为了进一步拓展金刚石涂层刀具的产业化应用,提升金刚石涂层刀具的结合力性能,本文开展了细晶粒钨钴类硬质合金的化学预处理研究,考察了三步法预处理工艺对不同晶粒度基体形貌和成分的影响,实现了金刚石涂层与基体的高结合强度。利用扫描电子显微镜和EDS能谱仪对预处理后基体的表面形貌和钴含量以及涂层形貌进行分析,采用拉曼光谱、X 射线衍射光谱对涂层物相结构进行分析表征,并利用固体颗粒冲刷评价金刚石涂层的抗冲刷性能。结果表明:酸处理对Co的去除起着重要作用,WC晶粒越小所需酸处理的时间越长,碱处理对WC的刻蚀能力表现出先增大后减小的趋势,在3min时达到最大Co暴露量。由此分别确定了WC-6%Co(0.2,0.4,1.0 μm)基体三步法最佳工艺,三步法预处理后的基体均获得均匀致密,晶粒取向为(111)面,抗冲刷性能优异,膜基结合性能好的金刚石涂层。     

基体梯度结构对TiN涂层硬质合金力学和切削性能的影晌

研究基体梯度结构对TiN涂层硬质合金力学和切削性能的影响;采用阴极弧蒸发涂层工艺分别在均质和梯度硬质合金基体上制备TiN涂层:运用金相观察、扫描电镜分析、三点抗弯强度测试、显微硬度测试和切削性能测试,研究基体梯度结构对TiN涂层硬质合金组织结构、力学性能和切削性能的影响.结果表明:基体结构梯度化后,TiN涂层表面形貌由平整状变为网状结构,显微硬度提高19%,抗弯强度提高6.1%;基体结构梯度化后,涂层硬质合金的结构发生变化、力学性能得到提高,涂层刀片的抗冲击性能和切削性能分别提高10%和15%左右.     

Effect of interlayers on the structure and properties of TiAlN based coatings on WC-Co cemented carbide substrate

Two interlayers (Ti and Cr) have been evaluated with respect to their influence on the structure and growth of TiAlN based coatings on WC-Co cemented carbide by a non-commercial hybrid PVD (physical vapor deposition) coater by Sichuan University in China. The structure and the growth morphology were characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM). The diffusion of interlayer was tested by Energy Diffraction Spectrum (EDS). Nanoindentation techniques and Rockwell HRC indentations were carried out to investigate the mechanical properties. The results show that the structure and the growth style change in the coatings on Cr interlayer, and this can be explained by thermodynamic theories. Cr interlayer exhibits a better diffusion compared with Ti interlayer, partly resulting in the transition from columnar crystal to equiaxed crystal. Columnar crystals disappear with the addition of Si, too. Due to the diffusion of Cr interlayer and the growth style changes in the coating, a transition zone is formed, and it is estimated to improve the adhesion. Good adhesion occurs in the coating with Cr interlayer. The hardness of TiAlN on Cr interlayer increases, and the Ti/(Ti,Si,Al)N coating shows the hardness as high as 40.0Gpa.     

织构金属衬底上CSD-SrTiO3薄膜的制备

涂层导体是发展77 K液氮温区强磁场下电力应用的实用化关键材料。由于缓冲层层数增加会导致控制生长、微观组织和界面结构的难度增大,所以简化缓冲层结构对涂层导体制备工艺的简化和成本的降低非常重要。本研究探索了低成本的化学溶液沉积(CSD)技术制备SrTiO_3(STO)缓冲层过程中前驱液热分解行为以及薄膜制备工艺路线对薄膜外延生长的影响,通过选取恰当的前驱液以及引入籽晶层沉积的方法最终获得了具有良好c轴织构且表面光滑的STO薄膜。     

Study on morphologies and structures of diamond films synthesized on cemented carbide substrates

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热震作用对硬质合金力学性能的影响及其失效机理

研究热震作用对3540和3475硬质合金抗弯强度、断裂韧性以及硬度的影响.结果表明,硬质合金抗弯强度和断裂韧性随热震次数呈先升后降变化,硬度随热震次数增加略有下降.这是由于淬火抑制了fcc γ→hcp γ相变,粘结相的固溶强化,γ相平均自由程λγ增大以及热震热应力的共同作用的结果.3540和3475合金热震后断面的粗糙度降低,孔洞增多,沿晶断裂比例增加.热震后合金表面发生氧化,形成疏松的氧化层,3540合金抗氧化能力比3475合金高.同时,还观察到游离碳聚集区的碳元素发生扩散,留下大量孔洞,在WC/Co界面处形成大量小裂纹.     

铸铁结合剂金刚石砂轮ELID磨削硬质合金的性能研究

硬质合金具有硬度高、强度好、耐腐蚀和耐磨损的特点,采用传统方法难以满足精密及超精密加工的技术要求.本文采用不同粒度的铸铁结合剂金刚石砂轮ELID镜面磨削硬质合金,得到了不同加工效率以及不同加工表面质量的硬质合金磨削效果,揭示了不同粒度砂轮其磨削性能变化的规律与作用.实验结果表明:在相同的进给量下,粗粒度砂轮的磨削效率较高,能更好地控制工件的尺寸精度.细粒度砂轮则磨削效率较低,但能获得优良的加工表面质量.砂轮表面的氧化膜在磨削过程中扮演非常重要的角色,磨粒的粒径与砂轮表面氧化膜厚度的比值大小决定了砂轮的磨削性能.氧化膜的形成又受到电解参数的影响,可以通过对电解参数的调节实现高效率高精度的ELID磨削.