Bended probe diagnostics of the plasma characteristics within an ECR ion source with a rectangular waveguide

To reveal the argon plasma characteristics within the entire region of an electron cyclotron resonance(ECR) ion source, the plasma parameters were diagnosed using a bended Langmuir probe with the filament axis perpendicular to the diagnosing plane. Experiments indicate that,with a gas volume flow rate and incident microwave power of 4 sccm and 8.8 W, respectively,the gas was ionized to form plasma with a luminous ring. When the incident microwave power was above 27 W, the luminous ring was converted to a bright column, the dark area near its axis was narrowed, and the microwave power absorbing efficiency was increased. This indicates that there was a mode transition phenomenon in this ECR ion source when the microwave power increased. The diagnosis shows that, at an incident microwave power of 17.4 W, the diagnosed electron temperature and ion density were below 8 eV and 3?×?10~(17) m~(-3), respectively, while at incident microwave power levels of 30 W and 40 W, the maximum electron temperature and ion density were above 11 eV and 6.8?×?10~(17) m~(-3), respectively. Confined by magnetic mirrors, the higher density plasma region had a bow shape, which coincided with the magnetic field lines but deviated from the ECR layer.     

Measurement of Ion Parameters by Ion Sensitive Probe in ECR Plasma

Ion parameters in electron cyclotron resonance (ECR) microwave plasma were measured by ion sensitive probe and were compared with the electron parameters obtained by double Langmuir probe. The effects of gas pressure and microwave power on the ion temperature and density were analyzed. The spatial distribution of the ion parameters was also investigated by the ion sensitive probes with a tunable radial depth installed on different probe windows along the chamber axis. Results showed that the ion density measured by the ion sensitive probe was in good agreement with the electron density measured by the double Langmuir probe. The influence of gas pressure on the ion parameters was stronger than that of microwave power. With the increase in working pressure, the ion temperature decreased monotonously with a decreasing rate larger than that at higher pressure. The ion density first increased to a peak (42.3?1010cm-3) at 1 Pa and then decreased. The ion temperature and density increased little with the increase in the microwave power from 400 W to 800 W. The plasma far away from the resonant point is found to be radially uniform.     

Triple-probe Diagnostic Measurements in Plasma of GLAST Spherical Tokamak

Triple-probe has been developed and operated successfully to characterize ECRH-assisted argon as well as hydrogen microwave plasmas in GLAST Spherical Tokamak. This technique enables to determine transient plasma parameters such as floating potential, electron temperature and electron number density in rapidly time-varying plasmas. An effective electron heating mechanism is applied to produce microwave plasma by injecting radiofrequency (RF) radiation at a frequency of 2.45 GHz in the presence of resonant toroidal magnetic field. Plasma parameters and corresponding fluctuations are measured as a function of time in different gas fill pressures for various applied magnetic fields. The results demonstrate the dependence of plasma parameters such as V _f , T _e , n _e and their fluctuations on gas fill pressure during the pre-ionization phase of the GLAST operation. Plasma behavior is observed to be closely depending on the coupling of RF power during microwave discharge. Additionally, the hydrogen plasma shows pronounced fluctuations in comparison with argon plasma with some decrease in electron temperature and densities.     

高性能全永磁ECR离子源LAPECR2的研制

研制了一台体积和重量都较大、设计性能较高的全永磁电子回旋共振(Electron cyclotron resonance,ECR)离子源LAPECR2(Lanzhou all permanent magnetic ECRion source No.2 ).该离子源将用于中国科学院近代物理研究所320 kV高压平台,为其提供强流高电荷态离子束流.LAPECR2的研制采用全新的全永磁磁体结构设计,通过采用高性能的NdFeB永磁材料、优化的磁结构设计以及精确的计算,实测源体的磁场参数能达到高性能ECR离子源的设计要求.离子源采用较高频率的14.5 GHz微波馈入加热等离子体,波导直接馈入离子源以增强馈入微波的稳定性与效率.此外,还大量采用了一些有利于提高离子源高电荷态离子产额的关键技术,如铝内衬等离子体弧腔、负偏压盘、铝制等离子体电极、三电极引出系统、辅助掺气等.     

Formation of Nano-Crystalline Phase in Hydrogenated Amorphous Silicon Thin Film by Plasma Focus Ion Beam Irradiation

A 3.3 kJ Mather type dense plasma focus device is used to generate a pulsed argon ion beam of 100 KeV in this work. Hydrogenated amorphous silicon (a-Si:H) film prepared by plasma enhanced chemical vapor deposition (PECVD) on c-Si substrate was irradiated with the argon ion beam produced by this dense plasma focus device. The effects of exposure to a single, 5 and 10 shots of dense plasma focus argon ion beam irradiation on the surface morphology, crystallinity and chemical bonding properties of the a-Si:H films were studied using Field Emission Scanning Electron Microscope (FESEM), X-ray Diffraction (XRD), Raman scattering and Fourier Transform Infrared (FTIR) spectroscopy, respectively. Formation of nano-crystalline silicon phase along with increase in structural order and hydrogen content in the film structure has been observed when the a-Si:H film was irradiated with a single shot of dense plasma focus argon ion beam. Exposure to 5 and 10 shots of the dense plasma focus argon ion beam irradiation reduced the hydrogen content resulting in a decrease in crystallinity and structural order in the film structure.     

基于单一气源的PECVD方法制备SiC薄膜及其微观结构研究

为制备出满足惯性约束聚变（ICF）实验要求的SiC薄膜,本文采用等离子体增强化学气相沉积（PECVD）法,以四甲基硅（TMS）作为唯一反应气源,在不同工作压强下制备SiC薄膜。利用扫描电子显微镜、表面轮廓仪、原子力显微镜、精密电子天平、X射线光电子能谱、傅里叶变换红外光谱对薄膜进行表征与分析。结果表明：SiC薄膜的成分与工作压强密切相关,随着工作压强的增加,薄膜中Si含量整体呈下降趋势;随着工作压强的增加,薄膜沉积速率先增大后减少,密度先减小后增大;与其他制备工艺相比,采用单一气源制备SiC薄膜,其表面粗糙度极低（1.25～1.85 nm）,薄膜粗糙度随工作压强的增加呈先增大后减小的趋势。     

Reactive DC Magnetron Sputter Deposited Titanium-Copper-Nitrogen Nano-Composite Thin Films with an Argon/Nitrogen Gas Mixture

A sintered Ti13Cu87 target was sputtered by reactive direct current (DC) magnetron sputtering with a gas mixture of argon/nitrogen for different sputtering powers. Titanium-copper-nitrogen thin films were deposited on Si (111), glass slide and potassium bromide (KBr) substrates. Phase analysis and structural properties of titanium-copper-nitrogen thin films were studied by X-ray diffraction (XRD). The chemical bonding was characterized by Fourier transform infrared (FTIR) spectroscopy. The results from XRD show that the observed phases are nano-crystallite cubic anti rhenium oxide (anti ReO3) structures of titanium doped Cu3N (Ti:Cu3N) and nano-crystallite face centered cubic (fcc) structures of copper. Scanning electron microscopy and energy dispersive X-ray spectroscopy (SEM/EDX) were used to determine the film morphology and atomic titanium/copper ratio, respectively. The films possess continuous and agglomerated structure with an atomic titanium/copper ratio ( 0.07) below that of the original target ( 0.15). The transmittance spectra of the composite films were measured in the range of 360 to 1100 nm. Film thickness, refractive index and extinction coefficient were extracted from the measured transmittance using a reverse engineering method. In the visible range, the higher absorption coefficient of the films prepared at lower sputtering power indicates more nitrification in comparison to those prepared at higher sputtering power. This is consistent with the formation of larger Ti:Cu3N crystallites at lower sputtering power. The deposition rate vs. sputtering power shows an abrupt transition from metallic mode to poisoned mode. A complicated behavior of the films’ resistivity upon sputtering power is shown.     

Enhanced removal of X-ray-induced carbon contamination using radio-frequency Ar/H_2 plasma

Removal of X-ray-induced carbon contamination on beamline optics was studied using radio-frequency plasma with an argon/hydrogen(Ar/H_2) mixture. Experiments demonstrated that the carbon removal rate with Ar/H_2 plasma was higher than that with pure hydrogen or argon. The possible mechanism for this enhanced removal was discussed. The key working parameters for Ar/H_2 plasma removal were determined, including the optimal vacuum pressure, gas mixing ratio, and source power. The optimal process was performed on a carbon-coated multilayer, and the reflectivity was recovered.     

Analysis of X-ray spectra in 14.5-GHz ECR ion source for optimizing operation conditions

An electron cyclotron resonance (ECR) ion source operating at 14.5 GHz was developed for the generation of charged ions at the Korea Atomic Energy Research Institute (KAERI). Experiments were carried out to study the plasma inside the ECR ion source by analyzing the X-ray spectra generated by it. The X-ray energy distribution and electron energy inside the plasma chamber are influenced by the status of the heated plasma. That status depends on various operation parameters such as microwave power, injected gas-pressure, and solenoid and trim coil currents. X-ray spectra were recorded to find the correlation between the plasma and the X-rays for variations in the operation parameters. A standard NaI(Tl) detector was used for that purpose. The X-ray energy distribution was studied in the range of 100–500 W for radiofrequency power. The influence of the injected gas pressure and the mirror ratio in the emission of X-rays were analyzed.     

Nonequilibrium Atmospheric Pressure Ar/O2 Plasma Jet: Properties and Application to Surface Cleaning

In this study an atmospheric pressure Ar/O_2 plasma jet is generated to study the effects of applied voltage and gas flux rate to the behavior of discharge and the metal surface cleaning.The increase in applied voltage leads to increases of the root mean square(rms) current,the input power and the gas temperature.Furthermore,the optical emission spectra show that the emission intensities of metastable argon and atomic oxygen increase with increasing applied voltage.However,the increase in gas flux rate leads to a reduction of the rms current,the input power and the gas temperature.Furthermore,the emission intensities of metastable argon and atomic oxygen decrease when gas flux rate increases.Contact angles are measured to estimate the cleaning performance,and the results show that the increase of applied voltage can improve the cleaning performance.Nevertheless,the increase of gas flux rate cannot improve the cleaning performance.Contact angles are compared for different input powers and gas flux rates to search for a better understanding of the major mechanism for surface cleaning by plasma jets.     

Practical Optimization of AECS PF-2 Plasma Focus Device for Argon Soft X-ray Operation

For operation of the plasma focus in argon, a focus pinch compression temperature range of 1.4–5 keV (16.3 × 10⁶–58.14 × 10⁶ K) is found to be suitable for good yield of argon soft X-rays (SXR) Ysxr. This is based on reported temperature measurements of argon plasmas working at regime for X-ray output. Using this temperature window, numerical experiments have been investigated on AECS PF-2 plasma focus device with argon filling gas. The model was applied to characterize the 2.8 kJ plasma focus AECS PF-2. The optimum Ysxr was found to be 0.0035 J. Thus, we expect to increase the argon Ysxr of AECS PF-2, without changing the capacitor bank, merely by changing the electrode configuration and operating pressure. The Lee model code was also used to run numerical experiments on AECS PF-2 with argon gas for optimizing soft X-ray yield with reducing L₀, varying z₀ and ‘a’. From these numerical experiments we expect to increase the argon Ysxr of AECS PF-2 with reducing L₀, from the present computed 0.0035 J at L₀ = 270 nH to maximum value of near 0.082 J, with the corresponding efficiency is about 0.03%, at an achievable L₀ = 10 nH.     

Effect of hydrogen on SiC-C films with AES and XPS analyses

SiC-C films with different content of SiC were deposited with r. f. magnetron sputtering followed by argon ion bombardment. These films were then permeated by hydrogen gas under the pressure of 3.23 × 107 Pa for 3h at 500K. AES and XPS were used to analyze chemical bonding states of C and Si in the SiC-C films as well as contaminating oxygen before and after hydrogen gas permeation in order to study the effect of hydrogen on them. Related mechanism was discussed in this paper.     

Infrared and Optical Properties of Amorphous Fluorinated Hydrocarbon Films Deposited with the Method of ECR Plasma

Using CH4 and CF4 precursor gases, amorphous fluorinated hydrocarbon (a-C:F:H) films were prepared with the method of microwave electronic cyclotron resonant (ECR) plasma chemical vapor deposition. Deposition rate of the film firstly increases and then decreases with variable flow ratios R {[CF4]/([CF4] + [CH4]} due to the competition between deposition and etching process. Results from Fourier-transform infrared transmission spectroscopy of these films show that C-F bond configuration in a-C:F:H films evolves with the variable gas flow ratios R. The locations of the C-F peaks in IR spectra shift to higher frequency with the increase of R, and finally the structure in films with R >75% takes on a PTFE-like structure, which mainly consists of -CF2- chain. The change of optical band gap Eg deduced by a Tauc plot with R is also discussed.     

Development of a silver ion source using nanosecond pulses of a Nd:YAG laser at different wavelengths

A silver ion source was designed by focusing the fundamental and harmonics of Q-switched Nd:YAG laser pulses onto a silver target and simultaneously applying an electric potential in an argon environment. The silver ions were detected at a distance of 2 cm from the target surface using a Faraday cup ion probe after letting them pass through a retarding mesh grid (copper electrode). We aim to produce and characterize the silver ions generated by the laser radiation of different wavelengths and pulse energy, ambient gas pressure and the electrode spacing under applied electric field. In addition to this, the effect of laser radiation on plasma under vacuum and at different argon gas pressures was investigated. The velocity distribution function of the plasma emitted from the silver target was investigated under argon discharge. These measurements demonstrated clearly that the velocity distribution function and current signals depend on laser power, laser wavelength and argon pressure. We observed a ten fold increase in the plume current with increase in the applied voltage and ion velocity in the presence of a laser field. The surface morphology of the laser irradiated samples was investigated using reflection optical microscopy.     

Ionization process and distinctive characteristic of atmospheric pressure cold plasma jet driven resonantly by microwave pulses

In the present study, a coaxial transmission line resonator is constructed, which is always capable of generating cold microwave plasma jet plumes in ambient air in spite of using argon, nitrogen, or even air, respectively. Although the different kinds of working gas induce the different discharge performance, their ionization processes all indicate that the ionization enhancement has taken place twice in each pulsed periods, and the electron densities measured by the method of microwave Rayleigh scattering are higher than the amplitude order of 10¹⁸ m⁻³. The tail region of plasma jets all contain a large number of active particles, like NO, O, emitted photons, etc, but without O3. The formation mechanism and the distinctive characteristics are attributed to the resonance excitation of the locally enhanced electric fields, the ionization wave propulsion, and the temporal and spatial distribution of different particles in the pulsed microwave plasma jets. The parameters of plasma jet could be modulated by adjusting microwave power, modulation pulse parameters (modulation frequency and duty ratio), gas type and its flow rate, according to the requirements of application scenarios.     

On abnormal behaviors of ion beam extracted from electron cyclotron resonance ion thruster driven by rod antenna in cross magnetic field

In a 2.45 GHz electron cyclotron resonance(ECR) ion thruster powered with rod antenna under a cross magnetic field, abnormal behaviours such as sudden drop of ion beam current(Ib) and larger increasing-rate of Ibin the high microwave power(Pw) discharges at high gas flow rates were observed. A differential method was proposed to reveal the changes in the radial profiles of gray values extracted from the end-view discharge images. The increasing-rate of Ibwith respect to Pwwas used to evaluate efficiencies of ion production and transport. Analyses indicate that discharges are dominantly sustained by ordinary wave via electron heating in the electron plasma resonance layer that can shift along the rod-antenna, and extraordinary wave can only ignite a discharge in the ECR layer in the low gas flow rate regime. In terms of the confinement region defined by the magnetic field lines intercepting with the screen grid, the confinement region of the optimized 2.45 GHz cross magnetic field takes the shape of hourglass, enabling the high increasing-rate of I_b with respect to P_w in high power discharges at high gas flow rates.Correlated with the accompanied bright boundary layer appearing in the differentiated image, the sudden drop of I_b in the low gas flow rate regime is attributed to the discharge ignited by the enhanced extraordinary wave in the ECR layer neighbouring the narrowest confinement region,where the produced ions can promptly enter the loss region.     

射频等离子体法在单晶硅衬底上形成的非晶碳膜及其性质

由离子和离子束技术形成的非晶碳膜具有良好的电绝缘性、对红外及可见光透明、硬度大、耐腐蚀等优良性质,可望在半导体器件、激光器件、太阳电池和材料保护等方面得到应用而受到重视。近年来很多作者先后报道了用未经质量分析的低能碳离子束直接沉积、离子束溅射沉积、离子镀、射频辉光放电离化碳氢化合物的等离子体沉积、经质量分析的低能碳离子束沉积等方法在单晶硅、玻璃、不锈钢等不同衬底上形成非晶碳膜的结果。碳膜的物理性质与沉积条件有密切关系,根据物理性质非晶碳膜大致可以分为三类,即导电、不透明的类石墨膜;绝缘、透明、质软的类聚合物膜;透明、绝缘、硬度大的类金刚石膜。     

Development of Sensors for On-Line Monitoring of Nonmetallic Impurities in Liquid Sodium

Sensors for on-line monitoring of hydrogen and carbon in sodium and hydrogen in argon cover gas circuits over sodium have been developed. The performance of these sensors in fast breeder test reactor (FBTR) and large sodium facilities is evaluated. A sensor for monitoring oxygen in sodium is under development. The in-sodium electrochemical hydrogen sensors are found to detect about 10 ppb increase in hydrogen concentration over a background of 50 ppb. The cover gas hydrogen monitoring sensor system is found to sense hydrogen down to 2 vppm in argon over sodium systems. Electrochemical carbon sensors are capable of detecting down to 1 ppm of carbon in sodium.     

基于脉冲步进调制技术的ECRH全固态阳极高压电源控制系统设计

电子回旋共振管是产生高功率毫米微波的真空电子器件,在可控热核聚变研究、雷达等领域中有重要的应用。针对可控热核聚变研究中1 MW/105 GHz回旋管加热系统阳极电源幅度可调且调制的要求,使用高频开关电源技术和脉冲步进调制技术（PSM）研制了全固态阳极高压电源。重点阐述了阳极高压电源实现稳压、调制、前沿时间可调功能的软件控制算法,并通过实验对设计进行了验证。该阳极高压电源具有单脉冲、多脉冲调制和六电平预置波形等3种模式输出功能;输出参数达到35 kV/200 mA,波形前沿3 ms内可调,最大调制频率为1 kHz,调节精度在100 V以内。设计的控制方法也可应用于其他大功率微波源。     

紧凑型强流ECR源

建立了１台紧凑型强流ＥＣＲ源。共振磁场由１个小电磁线圈及软铁回路产生,磁场可调,能保证放电处于最佳条件。研究了气压,微波功率及共振场对放电的影响。在５５０Ｗ的放电功率下,从直径４ｍｍ引出孔引出了３５ｍＡ的Ｈ＾＋离子束,引出Ｈ＾＋离子的质子比超过９０％,从源中还引出了７ｍＡＯ＾＋、８ｍＡＮ＾＋、１２ｍＡ Ａｒ＾＋的束流。