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1.
The solid-state, cross-interaction between the Ni layer on the component side and the Cu pad on the printed circuit board (PCB) side in ball grid array (BGA) solder joints was investigated by employing Ni(15 μm)/Sn(65 μm)/Cu ternary diffusion couples. The ternary diffusion couples were prepared by sequentially electroplating Sn and Ni on a Cu foil and were aged isothermally at 150, 180, and 200°C. The growth of the intermetallic compound (IMC) layer on the Ni side was coupled with that on the Cu side by the mass flux across the Sn layer that was caused by the difference in the Ni content between the (Cu1−x Ni x )6Sn5 layer on the Ni side and the (Cu1−y Ni y )6Sn5 layer on the Cu side. As the consequence of the coupling, the growth rate of the (Cu1−x Ni x )6 Sn5 layer on the Ni side was rapidly accelerated by decreasing Sn layer thickness and increasing aging temperature. Owing to the cross-interaction with the top Ni layer, the growth rate of the (Cu1−y Ni y )6Sn5 layer on the Cu side was accelerated at 150°C and 180°C but was retarded at 200°C, while the growth rate of the Cu3Sn layer was always retarded. The growth kinetic model proposed in an attempt to interpret the experimental results was able to reproduce qualitatively all of the important experimental observations pertaining to the growth of the IMC layers in the Ni/Sn/Cu diffusion couple.  相似文献   

2.
The mutual interaction between Sn/Ni and Sn/Cu interfacial reactions in a Ni/Sn/Cu sandwich sample has been studied. The major interfacial reaction product on the Cu side was Cu6Sn5, while on the Ni side, a ternary (Cu,Ni)6Sn5 compound layer was formed. We found that the growth kinetics of the interfacial compound layers on both sides reached a steady state in the late reflow stage. The interfacial compound layer on the Cu side retained a constant thickness. On the other hand, the interfacial compound layer on the Ni side grew at a relatively fast rate, which was found to be linear with time. Our results indicate that the growth of the ternary (Cu,Ni)6Sn5 compound layer was controlled by the Cu dissolution flux at the solder/Cu6Sn5 compound interface. The dissolution constant of the Cu6Sn5 compound into the molten Sn was determined to be 0.13 μm/s. Institute of Materials Science and Engineering, National Central University.  相似文献   

3.
Both Au and Cu are so-called fast diffusers in Sn, and can diffuse very long distances in Sn in a relatively short time. In this study, the cross-interaction between Au and Cu across a layer of Sn was investigated through the use of the Au/Sn/Cu ternary diffusion couples. A 7-μm Au layer and a 100-μm Sn layer were electroplated over Cu foils to produce the Au/Sn/Cu diffusion couples. Aging at 200°C revealed that cross-interaction could occur in as short a time as 10 min. Evidence of this cross-interaction included the formation of (Cu1−xAux)6Sn5 on the Au side of the diffusion couples as well as on the Cu side. The reaction products on the Au side included the Au-Sn binary compounds. Between the Au-Sn compounds and the Sn was (Cu1−xAux)6Sn5. The reaction products on the Cu side initially was only (Cu1−xAux)6Sn5, but a layer of Aufree Cu3Sn eventually formed between (Cu1−xAux)6Sn5 and Cu. A detailed atomic flux analysis showed that the Cu flux through the Sn layer was about 2–3 times higher than the Au flux at any moment. The results of this study show that the cross-interaction of Au and Cu in solders is extremely rapid, and cannot be ignored in those solder joints that have both elements present.  相似文献   

4.
The interfacial reactions between electroplated Ni-yCo alloy layers and Sn(Cu) solders at 250°C are studied. For pure Co layers, CoSn3 is the only interfacial compound phase formed at the Sn(Cu)/Co interfaces regardless of the Cu concentration. Also, the addition of Cu to Sn(Cu) solders has no obvious influence on the CoSn3 compound growth at the Sn(Cu)/Co interfaces. For Ni-63Co layers, (Co,Ni,Cu)Sn3 is the only interfacial compound phase formed at the Sn(Cu)/Ni-63Co interfaces. Unlike in the pure Co layer cases, the Cu additives in the Sn(Cu) solders clearly suppress the growth rate of the interfacial (Co,Ni,Cu)Sn3 compound layer. For Ni-20Co layers, the interfacial compound formation at the Sn(Cu)/Ni-20Co interfaces depends on the Cu content in the Sn(Cu) solders and the reflow time. In the case of high Cu content in the Sn(Cu) solders (Sn-0.7Cu and Sn-1.2Cu), an additional needle-like interfacial (Ni x ,Co y ,Cu1−xy )3Sn4 phase forms above the continuous (Ni x ,Cu y ,Co1−xy )Sn2 compound layer. The Ni content in the Ni-yCo layer can indeed reduce the interfacial compound formation at the Sn(Cu)/Ni-yCo interfaces. With pure Sn solders, the thickness of the compound layer monotonically decreases with the Ni content in the Ni-yCo layer. As for reactions with the Sn(Cu) solders, as the compound thickness decreases, the Ni content in the Ni-yCo layers increases.  相似文献   

5.
Zn additions to Cu under bump metallurgy (UBM) in solder joints were the subject of this study. An alternative design was implemented to fabricate pure Sn as the solder and Cu-xZn (x = 15 wt.% and 30 wt.%) as the UBM to form the reaction couple. As the Zn content increased from 15 wt.% to 30 wt.% in the Sn/Cu-Zn system, growth of both Cu3Sn and Cu6Sn5 was suppressed. In addition, no Kirkendall voids were observed at the interface in either Sn/Cu-Zn couple during heat treatment. After 40-day aging, different multilayered phases of [Cu6Sn5/Cu3Sn/Cu(Zn)] and [Cu6Sn5/Cu(Zn,Sn)/CuZn] formed at the interface of [Sn/Cu-15Zn] and [Sn/Cu-30Zn] couples, respectively. The growth mechanism of intermetallic compounds (IMCs) during aging is discussed on the basis of the composition variation in the joint assembly with the aid of electron-microscopic characterization and the Sn-Cu-Zn ternary phase diagram. According to these analyses of interfacial morphology and IMC formation in the Sn/Cu-Zn system, Cu-Zn is a potential UBM for retarding Cu pad consumption in solder joints.  相似文献   

6.
Solid-state interfacial reactions between Sn and Cu(Ni) alloys have been investigated at the temperature of 125°C. The following results were obtained. Firstly, the addition of 0.1 at.% Ni to Cu decreased the total thickness of the intermetallic compound (IMC) layer to about half of that observed in the␣binary Cu/Sn diffusion couple; the Ni addition decreased especially the thickness of Cu3Sn. Secondly, the addition of 1 to 2.5 at.% Ni to Cu further decreased the thickness of Cu3Sn, increased that of Cu6Sn5 (compared to that in the binary Cu/Sn couple) and produced significant amount of voids at the Cu/Cu3Sn interface. Thirdly, the addition of 5 at.% Ni to Cu increased the total thickness of the IMC layer to about two times that observed in the binary Cu/Sn diffusion couple and made the Cu3Sn disappear. Fourthly, in contrast to the previous case, the addition of 10 at.% Ni to Cu decreased the total IMC (Cu6Sn5) thickness again close to that of the Cu/Sn couple. With this Ni content no voids were detected. The results are rationalized with the help of␣the thermodynamics of the Sn-Cu-Ni system as well as with kinetic considerations.  相似文献   

7.
Long-term, solid-state intermetallic compound (IMC) layer growth was examined in 95.5Sn-3.9Ag-0.6Cu (wt.%)/copper (Cu) couples. Aging temperatures and times ranged from 70°C to 205°C and from 1 day to 400 days, respectively. The IMC layer thicknesses and compositions were compared to those investigated in 96.5Sn-3.5Ag/Cu, 95.5Sn-0.5Ag-4.0Cu/Cu, and 100Sn/Cu couples. The nominal Cu3Sn and Cu6Sn5 stoichiometries were observed. The Cu3Sn layer accounted for 0.4–0.6 of the total IMC layer thickness. The 95.5Sn-3.9Ag-0.6Cu/Cu couples exhibited porosity development at the Cu3Sn/Cu interface and in the Cu3Sn layer as well as localized “plumes” of accelerated Cu3Sn growth into the Cu substrate when aged at 205°C and t>150 days. An excess of 3–5at.%Cu in the near-interface solder field likely contributed to IMC layer growth. The growth kinetics of the IMC layer in 95.5Sn-3.9Ag-0.6Cu/Cu couples were described by the equation x=xo+Atnexp [−ΔH/RT]. The time exponents, n, were 0.56±0.06, 0.54±0.07, and 0.58±0.07 for the Cu3Sn layer, the Cu6Sn5, and the total layer, respectively, indicating a diffusion-based mechanism. The apparent-activation energies (ΔH) were Cu3Sn layer: 50±6 kJ/mol; Cu6Sn5 layer: 44±4 kJ/mol; and total layer: 50±4 kJ/mol, which suggested a fast-diffusion path along grain boundaries. The kinetics of Cu3Sn growth were sensitive to the Pb-free solder composition while those of Cu6Sn5 layer growth were not so.  相似文献   

8.
Electromigration-induced failures in integrated circuits have been intensively studied recently; however, electromigration effects upon interfacial reactions have not been addressed. These electromigration effects in the Sn/Cu and Sn/Ni systems were investigated in this study by analyzing their reaction couples annealed at 200°C with and without the passage of electric current. The intermetallics formed were ε-(Cu3Sn) and η-(Cu6Sn5) phases in the Sn/Cu couples and Ni3Sn4 phase in the Sn/Ni couples. The same intermetallics were formed in the two types of couples with and without the passage of electric current. The thickness of the reaction layers was about the same in the two types of couples of the Sn/Cu system. In the Sn/Ni system, the growth of the intermetallic compound was enhanced when the flow direction of electrons and that of diffusion of Sn were the same. But the effect became inhibiting if the directions of these two were opposite. Theoretical calculation indicated that in the Sn/Ni system, the electromigration effect was significant and was 28% of the chemical potential effect for the Sn element flux when the Ni3Sn4 layer was 10 μm thick. For the Sn and Cu fluxes in the Sn/Cu reaction couples, similar calculations showed that the electromigration effects were only 2 and 4% of the chemical potential effects, respectively. These calculated results were in good agreement with the experimental observations that in the Sn/Cu system the electric current effects were insignificant upon the interfacial reactions.  相似文献   

9.
To simulate the growth of Ni3Sn4 phase layers in Sn-based solder joints with Ni substrates during solid-state aging, Sn/(Cu1−x Ni x )6Sn5/Ni and Sn/Ni diffusion couples were aged isothermally at 180°C and 200°C, and the growth kinetics of the (Ni,Cu)3Sn4 and Ni3Sn4 layers in the respective couples were monitored during the isothermal aging. Once the (Ni,Cu)3Sn4 layer was formed at the (Cu,Ni)6Sn5/Ni interface, it grew unexpectedly fast with concurrent growth of voids formed in the Sn layer during prolonged aging at both temperatures. The results obtained from the various types of diffusion couples revealed that the voids formed in the Sn layer were Kirkendall voids, due to the (Ni,Cu)3Sn4 layer growing predominantly at the (Ni,Cu)3Sn4/Ni interface by fast diffusion of Sn across the (Ni,Cu)3Sn4 layer. It is proposed that the accelerated growth of the (Ni,Cu)3Sn4 and Ni3Sn4 layers after the formation of voids in the Sn layer is due to the relaxation of vacancy oversaturation and the enhanced annihilation rate of incoming vacancies in the presence of the voids in the Sn layer.  相似文献   

10.
The effects of Zn (1 wt.%, 3 wt.%, and 7 wt.%) additions to Sn-3.5Ag solder and various reaction times on the interfacial reactions between Sn-3.5Ag-xZn solders and Cu substrates a during liquid-state aging were investigated in this study. The composition and morphological evolution of interfacial intermetallic compounds (IMCs) changed significantly with the Zn concentration and reaction time. For the Sn-3.5Ag-1Zn/Cu couple, CuZn and Cu6Sn5 phases formed at the interface. With increasing aging time, the Cu6Sn5 IMC layer grew thicker, while the CuZn IMC layer drifted into the solder and decomposed gradually. Cu5Zn8 and Ag5Zn8 phases formed at the interfaces of Sn-3.5Ag-3Zn/Cu and Sn-3.5Ag-7Zn/Cu couples. With increasing reaction time, the Cu5Zn8 layer grew and Cu atoms diffused from the substrate to the solder, which transformed the Ag5Zn8 to (Cu,Ag)5Zn8. The Cu6Sn5 layer that formed between the Cu5Zn8 layer and Cu was much thinner at the Sn-3.5Ag-7Zn/Cu interface than at the Sn-3.5Ag-3Zn/Cu interface. Additionally, we measured the thickness of interfacial IMC layers and found that 3 wt.% Zn addition to the solder was the most effective for suppressing IMC growth at the interfaces.  相似文献   

11.
The Ni/solder/Cu material sequence is one of the most common material sequences in the solder joints of electronic packages. In this study, the Ni/Sn/Cu ternary diffusion couples were used to investigate the solder volume effect on the cross-interaction between Ni and Cu. Experimentally, a pure Sn layer with the thickness of 100–400 μm was electroplated over Cu foils. A pure Ni layer (20 μm) was then deposited over the as-deposited Sn surface. The diffusion couples were aged at 160°C for different periods of time. With this technique, the diffusion couples were assembled without experiencing any high temperature process, such as reflow, which would have accelerated the interaction and caused difficulties in analysis. This study revealed that the cross-interaction could occur in as short as 30 min. A detailed atomic flux analysis showed that the Cu flux through the Sn layer was about 25–40 times higher than the Ni flux. Moreover, it was found that (Cu1−x Ni x )6Sn5 on the Ni side reduced the consumption rate of the Ni layer, and the cross-interaction also reduced the Cu3Sn thickness on the Cu side.  相似文献   

12.
In flip chip applications, Cu pillars with solder caps are regarded as next-generation electronic interconnection technology, because of high input/output density. However, because of diffusion and reaction of Sn and Cu during the high-temperature reflow process, intermetallic compounds (IMC) are formed, and grow, at the interface between the cap and the pillar. Understanding the growth behavior of interfacial IMC is critical in the design of solder interconnections, because excessive growth of IMC can reduce the reliability of connections. In this study, the growth of IMC during thermal cycling, an accelerated method of testing the service environment of electronic devices, was studied by use of focused ion beam–scanning electron microscopy. Under alternating high and low-temperature extremes, growth of Cu6Sn5 (η-phase) and Cu3Sn (ε-phase) IMC was imaged and measured as a function of the number of cycles. The total IMC layer grew significantly thicker but became more uniform during thermal cycling. The Cu3Sn layer was initially thinner than the Cu6Sn5 layer but outgrew the Cu6Sn5 layer after 1000 cycles. It was found that, with limited Cu and Sn diffusion, consumption of Cu6Sn5 for growth of the Cu3Sn layer can result in a thinner Cu6Sn5 layer after thermal cycling.  相似文献   

13.
The microstructure of the eutectic SnBi/Cu interface was investigated by transmission electron microscopy to study the growth mechanisms of the intermetallic compounds (IMCs). Although the growth kinetics of the total IMC layer were similar, the individual Cu3Sn layer grew faster on polycrystalline Cu than on single-crystal substrates. It was found that, on polycrystalline Cu, newly formed Cu3Sn grains with a smaller grain size nucleated and grew at both the Cu/Cu3Sn and Cu3Sn/Cu6Sn5 interfaces during reflow and solid-state aging. The consumption of Cu6Sn5 to form Cu3Sn was faster at the Cu3Sn/Cu6Sn5 interface. While on single-crystal Cu new Cu3Sn grains nucleated only at the Cu/Cu3Sn interface, the directional growth of the initial columnar Cu3Sn controlled the advance of the Cu3Sn/Cu6Sn5 interface.  相似文献   

14.
This study investigates the effects of various reaction times and Cu contents on the interfacial reactions between Sn-9Zn-xCu alloys and Ni substrates. After aging at 255°C for 1 h to 3 h, the Ni5Zn21 and Cu5Zn8 phases formed at the interface of Sn-9Zn/Ni and Sn-9Zn-1wt.%Cu/Ni couples, respectively. The (Ni,Zn)3Sn4 phase was found in the Sn-9Zn-4wt.%Cu/Ni couple, and the (Cu,Ni)6Sn5 and Cu6Sn5 phases formed, respectively, in the Sn-9Zn-7wt.%Cu/Ni and Sn-9Zn-10wt.%Cu/Ni couples. As the reaction time was increased from 5 h to 24 h, the (Cu5Zn8 + Ni5Zn21) phases replaced the Cu5Zn8 phase to form in the Sn-9Zn-1wt.%Cu/Ni couple; the (Ni,Zn)3Sn4 phase formed in the Sn-9Zn-4wt.%Cu/Ni couple, and (CuZn + Cu6Sn5) formed in the Sn-9Zn-10wt.%Cu alloys. Experimental results indicate that intermetallic compound (IMC) formation in Sn-9Zn-xCu/Ni couples changes dramatically with reaction time and Cu content. The Sn-Zn-Ni, Sn-Cu-Ni, and Sn-Zn-Cu ternary isothermal sections greatly help us to understand the IMC evolutions in the Sn-9Zn-xCu/Ni couples.  相似文献   

15.
In the current study, the interfacial microstructures of Sn-Ag/Cu-X alloy (X = Ag, Sn or Zn) couples were investigated. The experimental results confirm that addition of Ag or Zn can effectively suppress the growth of the Cu3Sn layer, while addition of Sn accelerates the growth of the Cu3Sn layer. Meanwhile, the formation of voids is effectively suppressed by alloying the Cu substrate. The disappearance of voids and the absence of the Cu3Sn layer were well explained in terms of the phase diagram and the diffusion flux: the Cu3Sn phase is a nonequilibrium phase based on the Sn-Cu-Zn ternary phase diagram, since a high-Zn region is formed at the Cu6Sn5/Cu-Zn alloy interface; in addition, the high Sn diffusion flux in the Cu6Sn5 can suppress the growth of Cu3Sn and the formation of voids.  相似文献   

16.
Nanotribological characteristics, including the coefficient of friction, wear coefficient, and wear resistance, of Cu6Sn5, Cu3Sn, and Ni3Sn4 intermetallic compounds developed by the annealing of Sn–Cu or Sn–Ni diffusion couples were investigated in this work. The scratch test conditions combined a constant normal load of 10 mN, 20 mN, or 30 mN and a scratch rate of 0.1 μm/s, 1 μm/s, or 10 μm/s. Experimental results indicated that, as the normal load increases, the pile-up grows taller and the scratch deepens, leading to a greater coefficient of friction and wear coefficient, and reduced wear resistance. Moreover, the scratch rate does not have a significant effect on the nanotribological characteristics except for those of Cu6Sn5 and Cu3Sn under a normal load of 10 mN. Though the hardness of Cu6Sn5, Cu3Sn, and Ni3Sn4 is similar, Ni3Sn4 appears to be more prone to wear damage.  相似文献   

17.
The in situ intermetallic compound (IMC) growth in Cu pillar/Sn bumps was investigated by isothermal annealing at 120°C, 150°C, and 180°C using an in situ scanning electron microscope. Only the Cu6Sn5 phase formed at the interface between the Cu pillar and Sn during the reflow process. The Cu3Sn phase formed and grew at the interfaces between the Cu pillar and Cu6Sn5 with increased annealing time. Total (Cu6Sn5 + Cu3Sn) IMC thickness increased linearly with the square root of annealing time. The growth slopes of total IMC decreased after 240 h at 150°C and 60 h at 180°C, due to the fact that the Cu6Sn5 phase transforms to the Cu3Sn phase when all of the remaining Sn phase in the Cu pillar bump is completely exhausted. The complete consumption time of the Sn phase at 180°C was shorter than that at 150°C. The apparent activation energy for total IMC growth was determined to be 0.57 eV.  相似文献   

18.
Solidification and interfacial reactions in Sn-57 wt.%Bi-(Co)/Cu couples are investigated. The addition of 0.05 wt.% Co and 0.5 wt.% Co and changes between 2 g and 20 mg solder sizes have no significant effects on the undercooling of Sn-57 wt.%Bi solders. Both η-Cu6Sn5 and ε-Cu3Sn phases are formed in Sn-57 wt.%Bi/Cu couples reacted at 80°C, 100°C, and 100°C, whereas only η-Cu6Sn5 is formed at 160°C. The formation of ε-Cu3Sn is suppressed and only η-Cu6Sn5 is found in the couple with 0.05 wt.% Co and 0.5 wt.% Co addition in Sn-57 wt.%Bi solder. Both the growth rate of η-Cu6Sn5 and the dissolution rate of the Cu substrate increase with Co addition. The morphology of η-Cu6Sn5 is also altered with Co addition, becoming a porous structure with solder trapped in the voids.  相似文献   

19.
Isothermal solidification of conventional Cu/Sn diffusional couples was performed to form thin (30 μm) joints consisting of Cu-Sn intermetallics. During initial stages of isothermal solidification, both Cu6Sn5 and Cu3Sn phases grow, even though the former is the dominant. After consumption of all available Sn, the Cu3Sn phase grows reactively at the expense of Cu and Cu6Sn5. Finally, we obtain solder joints that consist of only Cu3Sn. Indentation fracture-toughness measurements show that Cu3Sn is superior to Cu6Sn5. Furthermore, indentations of Cu3Sn exhibit the presence of shear bands, which are not observed in Cu6Sn5, implying that the former is more ductile than the latter. Ductile intermetallic-based joints formed by isothermal solidification are promising candidates to form thin (as thin as 5–10 μm or less) solder joints, as they are thermally and thermodynamically stable compared to conventional solder joints. Excess copper in the interconnect provides ductility to the interconnect.  相似文献   

20.
The Cu/SnAg double-bump structure is a promising candidate for fine-pitch flip-chip applications. In this study, the interfacial reactions of Cu (60 μm)/SnAg (20 μm) double-bump flip chip assemblies with a 100 μm pitch were investigated. Two types of thermal treatments, multiple reflows and thermal aging, were performed to evaluate the thermal reliability of Cu/SnAg flip-chip assemblies on organic printed circuit boards (PCBs). After these thermal treatments, the resulting intermetallic compounds (IMCs) were identified with scanning electron microscopy (SEM), and the contact resistance was measured using a daisy-chain and a four-point Kelvin structure. Several types of intermetallic compounds form at the Cu column/SnAg solder interface and the SnAg solder/Ni pad interface. In the case of flip-chip samples reflowed at 250°C and 280°C, Cu6Sn5 and (Cu, Ni)6Sn5 IMCs were found at the Cu/SnAg and SnAg/Ni interfaces, respectively. In addition, an abnormal Ag3Sn phase was detected inside the SnAg solder. However, no changes were found in the electrical contact resistance in spite of severe IMC formation in the SnAg solder after five reflows. In thermally aged flip-chip samples, Cu6Sn5 and Cu3Sn IMCs were found at the Cu/SnAg interface, and (Cu, Ni)6Sn5 IMCs were found at the SnAg/Ni interface. However, Ag3Sn IMCs were not observed, even for longer aging times and higher temperatures. The growth of Cu3Sn IMCs at the Cu/SnAg interface was found to lead to the formation of Kirkendall voids inside the Cu3Sn IMCs and linked voids within the Cu3Sn/Cu column interfaces. These voids became more evident when the aging time and temperature increased. The contact resistance was found to be nearly unchanged after 2000 h at 125°C, but increases slightly at 150°C, and a number of Cu/SnAg joints failed after 2000 h. This failure was caused by a reduction in the contact area due to the formation of Kirkendall and linked voids at the Cu column/Cu3Sn IMC interface.  相似文献   

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