共查询到19条相似文献,搜索用时 105 毫秒
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本文试图以图文相结合的方式,尽可能将艰深的银盐片成像原理以通俗易懂的方式讲述清楚,以期读者能对银盐片成像原理有一个清晰的认识。 相似文献
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文章讨论了温度、湿度对底片胀缩的影响,并结合底片胀缩、单片胀缩的情况探讨了高层数印制板生产对位精度的控制方法。 相似文献
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《电子工业专用设备》2019,(2):50-54
根据UVW平台的结构,使用数学工具MathCAD对其运动进行了对位运动的代数分析,以A、B点在固定坐标系中位置推导出UVW平台3个轴运动值的方程,最后以代数和数值两种演算方式证明驱动关系的正确。 相似文献
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液晶分子取向技术研究 总被引:2,自引:1,他引:2
综述目前液晶显示器(LCD)工业生产中广泛使用的液晶分子取向技术。主要讨论摩擦技术、非摩擦技术和PI取向膜的性能。对这些技术的发展状况、特点与局限性以及今后的发展趋势进行了较为详尽的论述。 相似文献
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为了实现TFT LCD高PPI产品的高分辨率,高开口率,低功耗全面提升,分析了不同因素的影响程度,加强了对取向膜印刷品质的管控。同时对涉及该过程相关因素进行研究分析。对取向膜画面品质相关的产线印刷和干燥条件、APR版制作工艺、取向膜膜厚变化、APR版线数开口率进行优化测试,找到了可以提高取向膜画面品质的方法。实验结果表明:通过对取向膜印刷和干燥条件优化,确定了TN产品画面品质提升的产线管控方案;在APR版制作过程中引用扩散保护膜,ADS产品Particle类不良降低2%,Scratch类不良降低1%;对取向膜膜厚提升,ADS产品的段差和残像得到改善,对比度提升30~120,Zara Particle不良降低30%;通过对APR版的网点,开口率优化:400L,30%,普通曝光的APR版更新为600L,20%,高PPI有机膜类产品的Sand Mura发生率降低为0%。可以满足高PPI产品对取向膜印刷稳定的管控要求,适应高分辨率、高开口率、低功耗等要求。 相似文献
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基于最大化对齐度的多模态图像自动配准 总被引:25,自引:3,他引:25
该文讨论图像配准的广义定义并提出一种新的图像配准准则对齐度。对齐度能够正确地反映两幅不同灰度属性的图像是否配准,并且将图像配准归结为对齐度的最大化。新准则可以用来配准多模态图像包括灰度属性差异很大的图像。该文应用多分辨率方法和Powell方向族搜索法来最大化对齐度。因此,用该方法可以自动地处理图像配准问题,不需要定义地标点或特征点。多模态医学图像和遥感图像的自动配准的例子说明了该文方法的有效性。 相似文献
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In this paper, the technique of dual-edge phase-alignment and its effects on ring oscillators are presented. This technique provides resetting of the built-up jitter at both rising and falling edges of a clean aligning signal named as the reference. Using signals and systems theory, the effect of the technique on the spurs due to the aligning reference signal is completely analyzed. We show that adding properly the dual-edge aligning feature to phase-aligned ring oscillators cause the spurs in the neighborhood of the carrier to disappear. First, the validity of the results obtained from the derived analytical equations is verified through simulations using MATLAB. Then a complete circuit considering realistic models for its components is simulated in TSMC RF CMOS 0.18um process using ADS for further validation. 相似文献
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本文介绍了一种应用于高性能数字信号处理器BWDSP100的指令缓存器。该指令缓存器支持超长指令字,共有三级缓冲,每级缓冲包含16个指令槽。该指令缓存器可高效完成指令执行行的提取、拼接及废弃等操作,可有效提高DSP的指令执行效率。 相似文献
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Jinyou Shao Yucheng Ding Yiping Tang Hongzhong Liu Bingheng Lu Dongyin Cui 《Microelectronic Engineering》2008,85(1):168-174
As a low-cost and high-efficiency alternative to conventional photolithography, imprint lithography has been paid serious attention for it can realize the pattern transfer easily and repeatedly. Even so, there is still a long way to go before this technique can be used to manufacture ICs since the layer-to-layer alignment is a main obstacle. In this paper, the pattern distortion and position shift induced by loading force and friction force are investigated and an optimized process is proposed to realize high precision overlay, in which an optimal loading force and a load release and an alignment error pre-compensation (LRAEPC) method are adopted. The optimal loading force is acquired by comparing the variety trends of the residual layer and position shift with the loading force. Using the optimal loading force, transferred patterns with proper resist thickness and the minimal distortion are achieved. In LRAEPC method, load release is used to correct the pattern distortion and to alleviate the position shift. To avoid subsequent position adjustment in the fluid after load release, the pre-compensation alignment is performed before the mold is in contact with the wafer. This process does not locate correct alignment position and there is an alignment compensation value determined by the statistical data of alignment position shift after load release. Using this pre-compensation alignment method, the correct alignment can be obtained after load release. 相似文献
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干扰对齐是将来自其他发射机的干扰信号对准到同一信号子空间,从而减少对期望信号的干扰的一种传输技术,近年来得到了广泛的关注.本文为K用户多输入多输出(MIMO)干扰信道系统提出了一种协作干扰对齐优化算法.通过对信道的奇异值分解,基于矩阵弦距离,不仅选出一组最好的特征子信道来传输信号,而且还选取一组有利于有用信号远离干扰信号的预编码矩阵,这样,可以最大化减少干扰对有用信号的影响.另外,本文还根据得出的预编码矩阵来计算和优化干扰抑制矩阵.本文算法在没有用迭代的基础上来计算预编码矩阵和干扰抑制矩阵,这样不仅使整个系统的复杂度大大降低,进一步,仿真结果显示容量和能量效率较其他算法有明显改进,这也正是最近受到广泛瞩目的绿色通信所要求的. 相似文献