类石墨碳膜的制备及其与类金刚石碳膜的区分

类金刚石碳膜的碳键结构一般以sp3为主,用离子束辅助磁控溅射制备了以sp2为主的非晶碳膜,即类石墨碳膜。分析类石墨碳膜的成分、组织结构,并通过这些结果区分类石墨碳膜与类金刚石碳膜。采用卢瑟福背散射谱(RBS)、x射线衍射(XRD)、透射电镜(TEM)、x射线光电子谱(XPS)、四点探针法(FPM)分析了成分、组织结构及电阻率,结果表明:制备碳膜的晶体结构是非晶,碳键结构以sp2为主,电阻率在10-4~10-2??m之间。证明这种非晶碳膜不同于类金刚石碳膜(sp3为主)。     

IBED Si_3N_4和TiN薄膜的成份、结构与摩擦学性能

本文考察了工艺参数对离子束增强沉积（IBED）氮化硅、氮化钛薄膜的成分和微观组织的影响。测定了薄膜的硬度以及薄膜与基体之间结合力,分析了成分和结构与薄膜的硬度和结合力的关系。考察了在不同载荷和速度条件下St_3N_4、TiN薄膜和52100钢试样的摩擦系数和耐磨性。结果显示,与无膜的52100相比,IBEDSt_3N_4和IBEDTiN的耐磨性成倍提高。探讨了薄膜的磨损机理。     

离子束辅助沉积TiN膜的摩擦学特性

用ＸＰＳ，ＡＥＳ和ＸＲＤ分析厚约２μｍ离子束辅助沉积ＴｉＮ膜的成分和结构．实验表明：膜的表面成分主要是ＴｉＯ_２，膜内是轻微择优取向晶粒较细的ＴｉＮ．膜与衬底的界面存在混合区，用阶梯加载法测定润滑条件下ＧＣｒ１５钢与ＴｉＮ膜对磨时的临界载荷－速度关系．试验发现ＴｉＮ膜可显著扩大边界润滑区，承受较大载荷而不致发生擦伤．     

IBED Si3N4和TiN薄膜的成份、结构与摩擦学性能

本文考察了工艺参数对离子束增强沉积(IBED)氮化硅、氮化钛薄膜的成分和徽观组织的影响。测定了薄膜的硬度以及薄膜与基体之间结合力，分析了成分和结构与薄膜的硬度和结合力的关系。考察了在不同载荷和速度条件下Si3N4、TiN薄膜和52100钢试样的摩擦系数和耐磨性。结果显示，与无膜的52100相比，IBED Si3N4和IBED TiN的耐磨性成倍提高，探讨了薄膜的磨损机理。     

离子束辅助沉积对TiAlSiN薄膜性能的影响

分别利用真空电弧沉积技术与等离子体辅助真空电弧沉积技术在不锈钢片、高速钢片和单晶硅片上沉积TiAlSiN多元薄膜，通过X射线衍射和扫描电镜对采用两种方法制备的薄膜物相及表面形貌进行了分析比较，测定了高速钢片上薄膜的显微硬度，进行了耐磨性实验。结果表明，采用离子束辅助沉积制备的薄膜，有（200）面的择优取向，薄膜的表面形貌得到改善，硬度和耐磨性提高。     

沉积温度对钢球表面含氢碳薄膜结构和摩擦学性能的影响

目前,含有类富勒烯碳结构的氢化碳薄膜(FL-C:H)主要通过等离子体增强化学气相沉积技术(PECVD)在单晶硅表面制备。文中在碳薄膜PECVD沉积工艺之前,通过额外引入原位渗氮方法在钢球表面沉积过渡层以增强薄膜与基材结合力,从而成功制备了具有类富勒烯结构的含氢碳薄膜。通过改变钢球表面碳膜沉积时间(30、60、90、120、150和180 min)获得厚度不同、结构变化的碳膜,进而研究碳膜的结构演变与摩擦学性能之间的关系。结果表明:FL-C:H薄膜PECVD沉积工艺(采用了比额外引入的原位渗氮工艺更低的基底偏压)使钢基底温度随沉积时间增加而下降,导致薄膜结构转变。碳膜结构最初为类石墨结构,随着沉积时间的增长逐渐转变为类富勒烯结构;沉积时间为180 min的碳基薄膜具有超低摩擦因数(0.009)和超长磨损寿命(53 000个周期)。     

离子束辅助磁控溅射沉积TiN薄膜的研究

利用三离子束辅助沉积设备，以离子束辅助沉积、磁控溅射和离子束辅助磁控溅射几种工艺在GCr15基体上沉积TiN薄膜。实验结果表明：离子束辅助磁控溅射有效地提高了薄膜的硬度、耐磨性和耐蚀性，改善了膜基结合力。     

钛合金表面离子束增强沉积的Cr和CrMo合金膜层及其性能

利用多功能离子束增强沉积(IBED)设备，在Ti6Al4V钛合金表面制备Cr和CrMo合金膜层，以提高钛合金表面的耐磨性能。利用X射线衍射仪、扫描电子显微镜、辉光放电光谱仪和显微硬度计分析和测试了IBED膜层的结构、形态、成分分布、硬度和膜基结合强度的大小。利用球一盘磨损试验机和电化学综合测试仪研究了IBED膜层的摩擦学性能和电化学腐蚀特性。结果表明，利用IBED方法可以在难镀材料钛合金表面制备膜基结合强度高、结晶致密和晶粒尺寸达纳米级的高硬度Cr膜和CrMo合金膜层，显著提高了钛合金表面的抗磨性能，且膜层本身有很好的耐Cl^-介质环境电化学腐蚀性能，与钛合金基体之间有很好的接触腐蚀相容性。     

离子束增强沉积工艺对镀层表面粗糙度的影响

研究了不同界面共混工艺对精密轴承镀层表面粗糙度的影响。结果表明 ,用氮离子进行界面反冲共混 ,在动态反冲共混过程中 ,随着氮离子能量的增高 ,氮离子选择溅射和界面碳富集造成界面上沉积的镀层表面粗糙度相应增大 ,而对于在工件表面预先沉积一层纯钛的静态反冲共混工艺 ,镀层具有较低的表面粗糙度。当氮离子能量为 40keV时 ,静态反冲共混界面具有高的镀膜基体结合力。     

线性离子束制备DLC薄膜的结构和性能

为研究线性离子束技术在不同基体材料上沉积DLC薄膜的结构和性能,分别在YG6硬质合金、SKD11不锈钢和T7451铝合金表面沉积DLC(类金刚石)薄膜,并采用Cr作为过渡层,缓解膜基不匹配性。通过原子力显微镜、台阶仪和Raman光谱研究薄膜的表面形貌和微观结构;利用划痕仪和摩擦磨损试验机对薄膜膜基结合强度及耐磨性进行测试。结果表明:采用该技术制备的DLC薄膜均匀光滑,表面粗糙度Ra仅为5.5nm;DLC/Cr/SKD11膜系的ID/IG值低于DLC/Cr/YG6膜系和DLC/Cr/T7451膜系,说明沉积于SKD11表面的DLC含有较多的sp3 C;DLC/Cr/SKD11和DLC/Cr/T7451膜系膜基结合强度为42.2N和23.2N,而DLC/Cr/YG6膜系在120N载荷范围内未有明显破损脱落,结合强度最好;DLC/Cr/YG6膜系摩擦因数(0.09)小于DLC/Cr/SKD11膜系(0.14)和DLC/Cr/T7451膜系(0.32),说明其具有较好耐磨性能。由此看出,不同基体上制备的DLC薄膜结构不同,结合强度和耐磨性也有所差别。     

Microstructure and Tribological Behavior of Cr-Cu-N Coatings Deposited by Ion Beam Assisted Magnetron Sputtering

Cr-Cu-N coatings with copper content from 0 at%to 6.8 at%were deposited on silicon and M2 steel by ion beam assisted magnetron sputtering.The microstructure and composition of the coatings were characterized using SEM,GDOES,XRD and XPS.The mechanical properties of the coatings were tested on a standard hardness tester.The tribological behavior of the coatings in dry wear condition was studied by means of ball-on-disc wear test.The experimental results show that addition of copper can restrict the columnar crystal growing to a certain degree.XRD and XPS analysis indicate that coatings are mainly composed of Cr and CrN phase.Cu is mainly existed in a free state in the coatings.Copper adding has no obvious effects on the hardness of the coatings.However,the coatings fracture toughness can be improved by doped copper.The coefficient of friction of the coatings against bearing steel is in the range of 0.25-0.6 changing with the copper content.The coating with 2.6 at%copper shows the lowest coefficient of friction about 0.25 and wear rate which is about one tenth of that of the coating with 6.8 at%copper.The higher coefficient of friction and wear rate of the coating with 6.8at%copper may be attributed to its lower bonding strength.     

镀铂栅极抑制电子发射性能研究

利用离子束辅助沉积（IBAD）方法在Mo栅极表面上沉积Pt膜，采用试验二极管方法测量和比较阴极活性物质Ba，BaO蒸发到镀铂栅极和纯钼栅极表面上后的电子发射性能。采用XRD，EDX，XPS等测试手段对其栅极表面进行对比分析和表征。实验结果表明：镀铂栅极具有明显的抑制电子发射性能，并初步探讨了离子束辅助沉积Pt膜抑制栅电子发射的机理。     

钛合金表面离子束增强沉积膜层的环境适应性和接触相容性

利用离子束增强沉积技术在钛合金表面制备CrN硬质抗磨层和CuNiln固体润滑膜层。通过电化学测试技术对比研究了膜层和钛合金基材在含Cl介质中的抗蚀性能和接触腐蚀敏感性，利用高温静态氧化方法评价了膜层的抗氧化性能。结果表明：(1)CuNiln膜层耐电化学腐蚀性能和抗氧化性能显著优于Cu，在含Cl介质中与钛合金接触相容。(2)在含Cl水溶液中，CrN膜层耐蚀性好，与钛合金接触相容；在HCl HF混合酸中，CrN膜耐蚀性能远优于钛合金；抗氧化性能优于Ti。     

Effect of Addition of Polytetrafluoroethylene (PTFE) and Silicon Carbide (SiC) on Properties of Electroless Nickel Alloy Coatings

IN RECENT YEARS,electroless deposition hasbecome an important technology to prepare compositematerials[1][2',especially the metallic matrix compositematerials with characteristics of Ni-P alloy andcomposite phases,and the prepared process which canbe used to design the functional materials131[41.Both theelectrolytic and electroless codeposited compositesdisplay the flexibility and potential advantagesThe ternary and even the polyalloys(such as Ni-Co-P,Ni-Mo-P,Ni-Cu-P,Ni-W-P-B)have mu…     

Preparation and Characterization of Amorphous Layer on Aluminum Alloy Formed by Plasma Electrolytic Deposition (PED)

PLASMA Electrolytic Deposition(PED)is a relativelynew technology to form ceramic layers on somenon-ferrous metal and their alloys such as aluminum,magnesium and titanium'1'21.By apply high electricalpotential between the work-piece and another counterelectrode in certain electrolysis,the breakdown of thepassive film or the gas envelope surrounding theworkpiece lead to electrical discharge in the interfacebetween the workpiece surface and the electrolysis.Ceramic layers and/or diffusion lay…     

Dependence of Microstructure and Hardness of Nanocomposite Coatings of nc-(Ti_(1-x)Al_xN)/a-Si_3N_4 on Aluminum Contents

HARD COATINGS are finding a widely applicationin machining industries as tools and moulds since1980s[1].Hard coatings consisting of a variety of thetransition metal nitrides,for instance,TiN,TiC,TiCN,TiBN,TiAlN,CrN etc,usually service as a protectioncoatings that requires some better properties ofwear-resistance,corrosion-resistance and also highfatigue-strength especially at elevated temperature(formore details see Ref.2-6).The generic concept for the design of novelsuper-hard(>40G…     

Effect of ball peening of substrate on microstructure,phase evolution and properties of electrophoretically deposited YSZ/(Ni,Al) composite coatings

YSZ/(Ni, Al) composite coatings were deposited on Inconel600 superalloy with ball peening (BP) and without (non BP) treatment using the electrophoretic deposition (EPD) technique, followed by vacuum sintering method. The structures and phase evolution of the coatings were studied with X-ray diffraction (XRD), scanning electron microscopy (SEM) and energy dispersive spectrometry (EDS). The relation between microstructures and properties of the BPs-coated samples was discussed. The results show that the adhesion strength and gain mass of the BPs-coated samples with isothermal oxidation at 1100 °C for 100 h are 3.3 N and 0.00817 mg/cm², respectively, while those of the non-BPs-coated sample are 2.6 N and 0.00559 mg/cm², respectively. The EDS mapping analysis indicates that an obvious outward diffusion of Cr from the substrate to BPs coated samples occurs after isothermal oxidation. The BPs-coated sample shows the superior adhesion and oxidation resistance compared with non-BPs-coated samples.     

电弧离子镀(Ti,Cr)N涂层的制备与性能研究

采用电弧离子镀膜机,通过调节Ti靶和Cr靶的阴极弧电流,在W6Mo5Cr4V2高速钢基体上制备了（Ti1-x Crx）N涂层,并对其组织结构和性能进行了研究。结果表明,该涂层具有较高的显微硬度,而且随Cr含量的增加,硬度值先增大后减小;涂层具有较高的膜基结合力;Cr的引入不仅有利于提高膜基结合力,对（Ti,Cr）N涂层的抗氧化性也有好处,在700℃时具有很好的抗氧化性。     

Al含量对电弧离子镀共沉积Ti_(1-x)Al_xN涂层性能的影响

利用扫描电镜、X射线衍射仪、显微硬度计、划痕仪、磨损实验仪等,研究了不同铝含量的Ti1-xAlxN涂层性能。结果表明:当铝含量约为52%时,经涂层处理试样的显微硬度、摩擦磨损性能都得到了很大的提高,能达到使用钛铝合金靶离子镀Ti1-xAlxN涂层的相应性能,而从经济性来说,利用独立钛、铝靶比钛铝合金靶制备Ti1-xAlxN涂层的成本要低得多,从而具有降低生产成本,提高生产效益的优势。     

铝合金上电弧离子镀(Ti,Al)N膜的腐蚀特性

研究铝合金上电弧离子镀(Ti,Al)N膜层的腐蚀性能。通过对3种N2气分压下沉积膜层的阳极极化曲线、电化学阻抗谱、盐雾腐蚀失重曲线以及表面形貌的分析表明:沉积过程氮分压较低时,膜层中含有富金属相,耐腐蚀性能较低;增加氮分压使膜层中金属与非金属呈理想配比时,膜层的耐腐蚀性明显增加;膜层在缺陷处产生点蚀、电偶腐蚀,并通过形成裂纹、碎屑脱落使质量显著减小。