Tunneling-based SRAM

This paper describes a new high-density low-power circuit approach for implementing static random access memory (SRAM) using low current density resonant tunneling diodes (RTDs). After an overview of semiconductor random access memory architecture and technology, the concept of tunneling-based SRAM (TSRAM) is introduced. Experimental results for a compound semiconductor 1-bit 50-nW TSRAM gain cell using low current density (~1 A/cm²) RTDs and low-leakage heterostructure field effect transistors are presented. We describe a one-transistor TSRAM cell which could convert silicon dynamic RAM (DRAM) to ultradense SRAM if an ultralow current density (~1 μA/cm² ) silicon bistable device is developed. Finally, we present experimental and simulation results for a TSRAM cell using multipeaked I-V curve devices and a multivalued word line. This approach aims at increasing storage density through vertical integration of bistable devices such as RTD's     

A ferroelectric DRAM cell for high-density NVRAMs

The operation of a ferroelectric DRAM (dynamic random access memory) cell for nonvolatile RAM (NVRAM) applications is described. Because polarization reversal only occurs during nonvolatile store/recall operations and not during read/write operations, ferroelectric fatigue is not a serious endurance problem. For a 3-V power supply, the worst-case effective silicon dioxide thickness of the unoptimized lead zirconate titanate film studied is less than 17 Å. The resistivity and endurance properties of ferroelectric films can be optimized by modifying the composition of the film. This cell can be the basis of a very-high-density NVRAM with practically no read/write cycle limit and at least 10¹⁰ nonvolatile store/recall cycles     

High Performance Process Variations Aware Technique for Sub-threshold 8T-SRAM Cell

The demand of low power high density integrated circuits is increasing in modern battery operated portable systems. Sub-threshold region of MOS transistors is the most desirable region for energy efficient circuit design. The operating ultra-low power supply voltage is the key design constraint with accurate output performance in sub-threshold region. Degrading of the performance metrics in Static random access memory (SRAM) cell with process variation effects are of major concern in sub-threshold region. In this paper, a bootstrapped driver circuit and a bootstrapped driver dynamic body biasing technique is proposed to assist write operation which improves the write-ability of sub-threshold 8T-SRAM cell under process variations. The bootstrapped driver circuit minimizes the write delay of SRAM cell. The bootstrapped driver dynamic body bias increases the output voltage levels by boosting factor therefore increasing in switching threshold voltage of MOS devices during hold and read operation of SRAM latch. The increment in threshold voltage improves the static noise margin and minimizing the process variation effects. Monte-Carlo simulation results with 3 \(\sigma \) Gaussian distributions show the improvements in write delay by 11.25 %, read SNM by 12.20 % and write SNM by 12.57 % in 8T-SRAM cell under process variations at 32 nm bulk CMOS process technology node.     

A capacitor-less 1T-DRAM cell

A simple true 1 transistor dynamic random access memory (DRAM) cell concept is proposed for the first time, using the body charging of partially-depleted SOI devices to store the logic "1" or "0" binary states. This cell is two times smaller in area than the conventional 8F ² 1T/1C DRAM cell and the process of its manufacturing does not require the storage capacitor fabrication steps. This concept will allow the manufacture of simple low cost DRAM and embedded DRAM chips for 100 and sub-100 nm generations     

Power-Aware Data Management Based on Hybrid RAM-NVM Memory for Smart Bracelet

Wearable devices become popular because they can help people observe health condition. The battery life is the critical problem for wearable devices. The non-volatile memory (NVM) attracts attention in recent years because of its fast reading and writing speed, high density, persistence, and especially low idle power. With its low idle power consumption, NVM can be applied in wearable devices to prolong the battery lifetime such as smart bracelet. However, NVM has higher write power consumption than dynamic random access memory (DRAM). In this paper, we assume to use hybrid random access memory (RAM) and NVM architecture for the smart bracelet system. This paper presents a data management algorithm named bracelet power-aware data management (BPADM) based on the architecture. The BPADM can estimate the power consumption according to the memory access, such as sampling rate of data, and then determine the data should be stored in NVM or DRAM in order to satisfy low power. The experimental results show BPADM can reduce power consumption effectively for bracelet in normal and sleeping modes.     

A high-speed 128-kb MRAM core for future universal memory applications

A 128-kb magnetic random access memory (MRAM) test chip has been fabricated utilizing, for the first time, a 0.18-/spl mu/m V/sub DD/=1.8 V logic process technology with Cu metallization. The presented design uses a 1.4-/spl mu/m/sup 2/ one-transistor/one-magnetic tunnel junction (1T1MTJ) cell and features a symmetrical high-speed sensing architecture using complementary reference cells and configurable load devices. Extrapolations from test chip measurements and circuit assessments predict a 5-ns random array read access time and random write operations with <5-ns write pulse width.     

Multi-valued static random access memory (SRAM) cell with single-electron and MOSFET hybrid circuit

A new multi-valued static random access memory (MVSRAM) cell with a hybrid circuit consisting of a single-electron (SE) and MOSFETs is proposed. The previously reported MVSRAM with an SE-MOSFET hybrid circuit needs two data lines, one bit line for write operations and one sense line for read operations, to improve the speed of the read-out operation, but the proposed cell has only one data line for read/write operations, resulting in a memory area that is much smaller than that of the previous cell, without any reduction of read-out speed.     

Three-Dimensional Packaging Technology for Stacked DRAM With 3-Gb/s Data Transfer

A 3-D packaging technology is developed for stacked dynamic random access memory (DRAM) with through-silicon vias (TSVs). Eight different dry etchers were evaluated for deep Si etching. Highly doped poly-Si TSVs were used for vertical traces inside silicon and interconnection between DRAM chips to realize a DRAM-compatible process. Through optimization of process conditions and layout design, a fast poly-Si filling has been obtained. The entire packaging was carried out at the wafer level by using smart chip connection with feedthrough interposer (FTI) technology. A new bump and wiring structure for the FTI has also been developed for fine-pitch and low-cost bonding. Normal operation during DRAM read/write was confirmed on a 512-Mb DRAM with TSVs, with an I/F chip as a memory controller. Simulation and measurement of the transfer function of the FTI wiring showed a 3-Gb/s/pin data transfer capability.     

Optical Static RAM Cell

We demonstrate an optical static random access memory cell that provides read and write functionality at 5 Gb/s. The circuit comprises a hybridly integrated semiconductor optical amplifier-Mach-Zehnder interferometer (SOA-MZI) flip-flop serving as the memory unit and two additional SOA-based cross-gain modulation switches for controlling access to the memory cell.     

硫系化合物随机存储器研究进展

系统地介绍了硫系化合物随机存储器(C-RAM)的原理、相关材料、研究现状、特点及今后的发展趋势以及中科院上海微系统与信息技术研究所在C-RAM方面的研究进展。C-RAM由于具有高速读取、高可擦写次数、非易失性、元件尺寸小、功耗低和成本低等优点,被认为是最有可能取代目前的FLASH、DRAM和SRAM而成为未来半导体存储器的主流产品。     

An embedded DRAM with a 143-MHz SRAM interface using a sense-synchronized read/write

This paper describes a 4-Mb embedded DRAM macro using novel fast random cycle architecture with sense-synchronized read/write (SSR/SSW). The test chip has been fabricated with a 0.15-/spl mu/m logic-based embedded DRAM process and the 1.5-V 143-MHz no-wait row random access operation has been confirmed. Data retention power is suppressed to 92 /spl mu/W owing to the hierarchical power supply and SSR. The macro size is 4.59 mm/sup 2/. The cell occupation ratio of the macro is 46%, which is the same as that of a conventional embedded DRAM macro. The macro size and the data retention power are 30% and 4.6%, respectively, of a 4-Mb embedded SRAM macro fabricated by an identical process.     

Hidden double data transfer scheme for MDL design [merged DRAMlogic]

A high-speed DRAM data transfer scheme between DRAM and logic parts in merged DRAM logic (MDL) designs is proposed with logically divided DRAM row address mapping. The proposed scheme results in a 20% faster write access and 40% faster read access. It can be used as a general design framework to maximise DRAM access speed in various MDL designs. A test chip has been fabricated by 0.16 μm DRAM technology, and the scheme has been verified in the design of a DRAM L2 cache memory     

A 5-GByte/s data-transfer scheme with bit-to-bit skew control forsynchronous DRAM

This paper describes a 5-GByte/s data-transfer scheme suitable for synchronous DRAM memory. To achieve a higher data-transfer frequency, the properties were improved based on the frequency analysis of the memory system. Then, a bit-to-bit skew compensation technique that eliminates incongruent skew between the signals is described with a new, multioutput controlled delay circuit to accomplish bit-to-bit skew compensation by controlling transmission timing of every data bit. Simulated maximum data-transfer rate of the proposed memory system resulted in 5.1/5.8 GByte/s (321/365 MHz, ×64 bit, double data rate) for data write/read operation, respectively     

Variation resilient subthreshold SRAM cell design technique

This article presents a circuit technique for designing a variability resilient subthreshold static random access memory (SRAM) cell. The architecture of the proposed cell is similar to the conventional 10T SRAM cell with the exception that dynamic threshold MOS is used for the read/write access FETs and cell content body bias scheme is used for bitline droppers (FETs used to drop bitlines). Moreover, the proposed bitcell utilises single differential port unlike conventional 10T bitcell which utilises dual differential ports. The proposed design offers 2.1× improvement in T _RA (read access time) and 3.2× improvement in T _WA (write access time) compared to CON10T at iso-device-area and 200?mV. It exhibits three roots in its read voltage transfer characteristic (VTC) even at 150?mV showing its ability to function as a bistable circuit. The combination of write and read VTCs for write static noise margin of the proposed design also shows single root signifying its write-ability even at 150?mV. It proves its robustness against process variations by featuring narrower spread in T _RA distribution (by 1.3×) and in T _WA distribution (by 1.2×) at 200?mV.     

A new extension method of retention time for memory cell on dynamic random access memory

Demands have been placed on dynamic random access memory (DRAM) to not only increase memory capacity and data transfer speed but also to reduce operating and standby currents. When a system uses DRAM, the restricted data retention time necessitates a refresh operation because each bit of the DRAM is stored as an amount of electrical charge in a storage capacitor. Power consumption for the refresh operation increases in proportion to memory capacity. A new method is proposed to reduce the refresh power consumption dynamically, when full memory capacity is not required, by effectively extending the memory cell retention time. Conversion from 1 cell/bit to 2^N cells/bit reduces the variation of retention times among memory cells. The proposed method reduces the frequency of disturbance and power consumption by two orders of magnitude. Furthermore, the conversion itself can be realized very simply from the structure of the DRAM array circuit, while maintaining all conventional functions and operations in the full array access mode.     

A 55-ns 16-Mb DRAM with built-in self-test function usingmicroprogram ROM

A single 5-V power supply 16-Mb dynamic random-access memory (DRAM) has been developed using high-speed latched sensing and a built-in self-test (BIST) function with a microprogrammed ROM, in which automatic test pattern generation procedures were stored by microcoded programs. The chip was designed using a double-level Al wiring, 0.55-μm CMOS technology. As a result, a 16-Mb CMOS DRAM with 55-ns typical access time and 130-mm² chip area was attained by implementing 4.05-μm² storage cells. The installed ROM was composed of 18 words×10 b, where the marching test and checkerboard scan write/read test procedures were stored, resulting in successful self-test operation. As the BIST circuit occupies 1 mm² and the area overhead is about 1%, it proves to be promising for large-scale DRAMs     

Trends in megabit DRAM circuit design

The state of the art in megabit dynamic random access memory (DRAM) circuit and chip design is reviewed in terms of essential design parameters such as signal-to-noise ratio, power dissipation, and speed. The memory cell signal charge has decreased gradually with an increase in memory cell size, despite the vertically structured cell designs. To offset this decrease, multidivided data-line structures, low-power design, and transposition of folded data lines are essential. To reduce power dissipation, an increase in the maximum refresh cycle and multidivided data lines combined with shared I/O in addition to a reduced operating voltage are efficient. A BiCMOS circuit provides a high-speed access time with low cost due to the high drivability of the driver and high sensitivity of the amplifier. It is predicted that the current DRAM technology might be diversified in the future so that a large-memory-capacity-oriented technology would coexist with a high-speed-oriented technology, posing power-supply standardization as a continuing serious concern     

Shared word line DRAM cell

A novel memory cell which has a 2-to-1 cell packaging density advantage relative to a conventional one-device (1D) dynamic RAM cell is described. In the shared word line (SWL) DRAM cell, a pair of cells is connected to the same bit sense line and word line. Unique read and write operations are accomplished by controlling the plate of the storage capacitor. The arrangement of cell pairs also provides a sense amplifier pitch of about six times the average feature size; this greatly relaxes the bit line pitch limitation on sense amplifier layout. The cell layout is fully self-aligned using a process very similar and not significantly more complex than conventional double-polysilicon processes. The cell requires neither contact holes nor metal lines. While the access time of the SWL cell is similar to a 1D cell, the cycle time is somewhat longer due to a more complex write operation.     

基于FPGA技术的DRAM分时存取方法

介绍了一种基于现场可编程技术对DRAM进行读写和刷新操作的方法，根据现场可编程器件设计的特点，结合DRAM读写和刷新时序的要求，提出了同步化操作DRAM的思想，给出了具体同步化操作DRAM的实现方法，针对现场可编程器件设计中经常有多模块同时存取DRAM芯片的需求，提出了对DRAM芯片进行分时存取的方法，讨论了该方法的实现机制，结合具体的项目设计，给出了分时存取方法的关键时序，避开了复杂的DRAM控制器，节省了设计资源，简单方便地解决了DRAM操作的仲裁问题。     

Magnetoresistive random access memory using magnetic tunnel junctions

Magnetoresistive random access memory (MRAM) technology combines a spintronic device with standard silicon-based microelectronics to obtain a combination of attributes not found in any other memory technology. Key attributes of MRAM technology are nonvolatility and unlimited read and write endurance. Magnetic tunnel junction (MTJ) devices have several advantages over other magnetoresistive devices for use in MRAM cells, such as a large signal for the read operation and a resistance that can be tailored to the circuit. Due to these attributes, MTJ MRAM can operate at high speed and is expected to have competitive densities when commercialized. In this paper, we review our recent progress in the development of MTJ-MRAM technology. We describe how the memory operates, including significant aspects of reading, writing, and integration of the magnetic material with CMOS, which enabled our recent demonstration of a 1-Mbit memory chip. Important memory attributes are compared between MRAM and other memory technologies.