共查询到17条相似文献,搜索用时 156 毫秒
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<正> LTC1773是美国凌特公司研制的电流型同步调流降压控制芯片,通过驱动使外接的一对互补功率 MOS 管工作。内部工作频率为550kHz,可以使用表面贴装电感,在对开关噪声敏感的应用中可同步至750kHz。输入电压范围2.65~8.5V,使其适合于以1或2节锂离子电池供电的应用。输出电压从0.8V 到输入电压。具有很低的静态电流、关断电流和高达±1.5%的精度,并有软启动功能。可通过外接高精度电阻对峰值电流进行控制。LTC1773可广泛应用于由单或双锂离子电池供电的装置、移动设备、分布电源系统、笔记本电脑和掌上电脑及 PDA 中。引脚功能LTC1773采用10脚的 MSOP 塑料封装,其引脚排列如图1所示,管脚功能如附表所示。 相似文献
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针对航空光纤总线传输系统设计中接收机三种状态识别难这一关键问题,首次引入了双脉宽曼彻斯特编码调制机制,经过误码率与灵敏度估算,仿真结果表明,双脉宽曼彻斯特调制机制接收机比SAE-A2K光纤工作组推荐的光调制机制的灵敏度高.FPGA仿真设计实现表明,该调制机制具有实现难度低,而且能有效解决接收机三种状态识别的问题. 相似文献
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本文是对“光纤化的飞机内部时分制指令/响应式多路传输数据总线”标准的建议,是根据MIL-STD-1553B及1773文本拟订的。 相似文献
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Michael Reilly 《半导体技术》2004,29(12)
DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system. 相似文献
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Thomas M.Trexler 《半导体技术》2004,29(5)
From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test. 相似文献
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The relation between the power of the Brillouin signal and the strain is one of the bases of the distributed fiber sensors of temperature and strain. The coefficient of the Bfillouin gain can be changed by the temperature and the strain that will affect the power of the Brillouin scattering. The relation between the change of the Brillouin gain coefficient and the strain is thought to be linear by many researchers. However, it is not always linear based on the theoretical analysis and numerical simulation. Therefore, errors will be caused if the relation between the change of the Brillouin gain coefficient and the strain is regarded as to be linear approximately for measuring the temperature and the strain. For this reason, the influence of the parameters on the Brillouin gain coefficient is proposed through theoretical analysis and numerical simulation. 相似文献
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The parallel thinning algorithm with two subiterations is improved in this paper. By analyzing the notions of connected components and passes, a conclusion is drawn that the number of passes and the number of eight-connected components are equal. Then the expression of the number of eight-connected components is obtained which replaces the old one in the algorithm. And a reserving condition is proposed by experiments, which alleviates the excess deletion where a diagonal line and a beeline intersect. The experimental results demonstrate that the thinned curve is almost located in the middle of the original curve connectivelv with single pixel width and the processing speed is high. 相似文献