X-ray conductivity of ZnSe single crystals

The experimental I–V and current–illuminance characteristics of the X-ray conductivity and X-ray luminescence of zinc-selenide single crystals feature a nonlinear shape. The performed theoretical analysis of the kinetics of the X-ray conductivity shows that even with the presence of shallow and deep traps for free charge carriers in a semiconductor sample, the integral characteristics of the X-ray conductivity (the current–illuminance and I–V dependences) should be linear. It is possible to assume that the nonlinearity experimentally obtained in the I–V and current–illuminance characteristics can be caused by features of the generation of free charge carriers upon X-ray irradiation, i.e., the generation of hundreds of thousands of free charge carriers of opposite sign in a local region with a diameter of <1 μm and Coulomb interaction between the free charge carriers of opposite signs.     

Electron transport in unipolar heterostructure transistors with quantum dots in strong electric fields

A model for the explaining specific features of the electron transport in strong electric fields in the quantum-dot unipolar heterostructure transistor (AlGaAs/GaAs/InAs/GaAs/InAs) is presented. It is shown that the two-step shape of the output current-voltage characteristic I _D (V _D ) and the anomalous dependence of the drain current I _D on the gate voltage V _G are caused by the ionization of quantum dots in the strong electric field at the drain gate edge. The ionization of quantum dots sets in at the drain voltage V _D that exceeds the V_D1 value, at which the I _D (V _D ) dependence is saturated (the first step of the I-V characteristic). With the subsequent increase in V _D , i.e., for V _D >V_D1, the I _D (V _D ) dependence has a second abrupt rise due to the ionization of quantum dots, and then, for V _D =V_D2>V_D1, the current I _D is saturated for the second time (the second step in the current-voltage characteristic). It is suggested to use this phenomenon for the determining the population of quantum dots with electrons. The model presented also describes the twice-repeated variation in the sign of transconductance g _m =dI _D /dV _G as a function of V _G .     

Heat- and radiation-resistant contacts to SiC made on the basis of quasi-amorphous ZrB<Subscript>2</Subscript> films

The radiation and thermal stability of the Schottky-barrier structures deposited by the magnetron sputtering of zirconium diboride onto the (0001) face of the Lely-grown n-6H(15R)SiC single crystals with the uncompensated-donor concentration of ～10¹⁸ cm^?3 was investigated by the methods of the I–V and C–V characteristics combined with the layer-by-layer Auger analysis. It is shown that the use of quasi-amorphous ZrB₂ films when manufacturing contacts on n-6H(15R)SiC leads to no changes in the Schottky-barrier characteristics during rapid thermal annealing to 800°C in the range of ⁶⁰Co γ-ray irradiation doses of 10³–10⁷ Gy.     

Modified Interface Properties of Au/<Emphasis Type="Italic">n</Emphasis>-type GaN Schottky Junction with a High-<Emphasis Type="Italic">k</Emphasis> Ba<Subscript>0.6</Subscript>Sr<Subscript>0.4</Subscript>TiO<Subscript>3</Subscript> Insulating Layer

The interface properties of a Au/n-GaN Schottky junction (SJ) were modified by placing a high-k barium strontium titanate (Ba_0.6Sr_0.4TiO₃) insulating layer between the Au and n-GaN semiconductor. The surface morphology, chemical composition, and electrical properties of Au/Ba_0.6Sr_0.4TiO₃ (BST)/n-GaN metal/insulator/semiconductor (MIS) junctions were explored by atomic force microscopy, energy-dispersive x-ray spectroscopy, current–voltage (I–V) and capacitance–voltage (C–V) techniques. The electrical results of the MIS junction are correlated with the SJ and discussed further. The MIS junction exhibited an exquisite rectifying nature compared to the SJ. An average barrier height (BH) and ideality factors were extracted to be 0.77 eV, 1.62 eV and 0.92 eV, 1.95 for the SJ and MIS junction, respectively. The barrier was raised by 150 meV for the MIS junction compared to the MS junction, implying that the BH was effectively altered by the BST insulating layer. The BH values extracted by I–V, Cheung’s and Norde functions were nearly equal to one another, indicating that the techniques applied here were dependable and suitable. The frequency-dependent properties of the SJ and MIS junction were explored and discussed. It was found that the interface state density of the MIS junction was smaller than the SJ. This implies that the BST layer plays an imperative role in the decreased N_SS. Poole–Frenkel emission was the prevailed current conduction mechanism in the reverse-bias of both the SJ and MIS junction.     

Hydrogen-containing donors in silicon: Centers with negative effective correlation energy

The reconstruction of shallow-level hydrogen-containing donors in Si is studied. The donors are formed by implantation of low-energy (300 keV) hydrogen ions into the experimental samples and subsequent heat treatment at 450°C. The experiments are carried out for Ag-Mo-Si Schottky diodes and diodes with a shallow (～1 μm) p⁺-n junction. The concentration and distribution of the donors are determined by applying the method of C–V characteristics at a frequency of 1.2 MHz. An analysis of the temperature dependence of the equilibrium electron concentration shows that the reconstruction of the hydrogen-containing donors can be described under the assumption of recharging of a center with negative effective correlation energy (U < 0). The transformation between two equilibrium configurations of a double hydrogen donor (D _B ⁺⁺ ? D _A ⁰ ) proceeds with the Fermi level position E_F = E _c ? 0.30 eV. The reconstruction of the donors from a neutral to a doubly charged state (D _A ⁰ → D _B ⁺⁺ ) which is stimulated by the capture of minority carriers, is observed at room temperature.     

Diffusion of interstitial magnesium in dislocation-free silicon

The diffusion of magnesium impurity in the temperature range T = 600–800°C in dislocation-free single-crystal silicon wafers of p-type conductivity is studied. The surface layer of the wafer doped with magnesium by the ion implantation technique serves as the diffusion source. Implantation is carried out at an ion energy of 150 keV at doses of 5 × 10¹⁴ and 2 × 10¹⁵ cm^–2. The diffusion coefficient of interstitial magnesium donor centers (D _i ) is determined by measuring the depth of the p–n junction, which is formed in the sample due to annealing during the time t at a given T. As a result of the study, the dependence D _i (T) is found for the first time. The data show that the diffusion process occurs mainly by the interstitial mechanism.     

Diamond Diode Structures Based on Homoepitaxial Films

(m–i–p)-Structures with high-resistance epitaxial i-layers are fabricated on heavily doped p⁺-type substrates with platinum contacts. The structures are studied using several methods: optical and electron microscopy and luminescence, and electrophysical (C–V and I–V characteristics) methods and tested as detectors of ionizing radiation. It is shown that the (m–i–p)-structures are promising for development of several electronic devices (high-voltage diodes, detectors of ionizing radiation, and photovoltaic devices).     

Determination of the fractal dimension for the epitaxial <Emphasis Type="Italic">n</Emphasis>-GaAs surface in the local limit

Atomic-force microscopy studies of epitaxial n-GaAs surfaces prepared to deposit barrier contacts showed that major relief for such surfaces is characterized by a roughness within 3–15 nm, although “surges” up to 30–70 nm are observed. Using three independent methods for determining the spatial dimension of the surface, based on the fractal analysis for the surface (triangulation method), its section contours in the horizontal plane, and the vertical section (surface profile), it was shown that the active surface for epitaxial n-GaAs obeys all main features of behavior for fractal Brownian surfaces and, in the local approximation, can be characterized by the fractal dimension D _f slightly differing for various measuring scales. The most accurate triangulation method showed that the fractal dimensions for the studied surface of epitaxial n-GaAs for measurement scales from 0.692 to 0.0186 μm are in the range D _f = 2.490?2.664. The real surface area S _real for n-GaAs epitaxial layers was estimated using a graphical method in the approximation δ → 0 δ is the measurement scale parameter). It was shown that the real surface area for epitaxial n-GaAs can significantly (ten times and more) exceed the area of the visible contact window.     

Emission sensitization and mechanisms of electron-excitation migration in structures based on III-nitrides doped with rare-earth elements (Eu,Er, Sm)

The effect of doping with Eu, Er, and Sm rare-earth ions on the shape of the luminescence spectrum for heterostructures with GaN/In _x Ga_{1 ? x} N (0.1 < x < 0.4) quantum wells and from p-GaN〈Mg〉/n-GaN and p-AlGaN/n-GaN junctions is investigated. The results of measurements of the electroluminescence of these structures correlate with the previous data on photoluminescence and Mössbauer spectroscopy. It is shown that it is the GaN “yellow” (5000–6000 Å) band that plays the important role in the excitation of intracenter states in the structures with several GaN/InGaN quantum wells doped with Eu and Sm. In this case, Eu is most likely the sensitizer for Sm. Additional introduction of 3d metal (Fe⁵⁷) in p-GaN〈Mg〉/n-GaN:Eu results in the realization of intracenter transitions in Eu³⁺: ⁵ D ₀ → ⁷ F ₁ (6006 Å), ⁵ D ₀ → ⁷ F ₂ (6195 Å), ⁵ D ₀ → ⁷ F ₃ (6627 Å), and ⁵ D ₁ → ⁷ F ₄ (6327 Å) due to the occurrence of new, efficient channels of excitation transfer to intracenter states and in the effect of Fe on the local environment of rare-earth ions including due to the f–d hybridization enhancement.     

Characterization of Double-Junction GaAsP Two-Color LED Structure

The structural, optical, electrical and electrical–optical properties of a double-junction GaAsP light-emitting diode (LED) structure grown on a GaP (100) substrate by using a molecular beam epitaxy technique were investigated. The p–n junction layers of GaAs_1?xP_x and GaAs_1?yP_y, which form the double-junction LED structure, were grown with two different P/As ratios. High-resolution x-ray diffraction (HRXRD), photoluminescence (PL), and current–voltage (I–V) measurements were used to investigate the structural, optical and electrical properties of the sample. Alloy composition values (x, y) and some crystal structure parameters were determined using HRXRD measurements. The phosphorus compositions of the first and second junctions were found to be 63.120% and 82.040%, respectively. Using PL emission peak positions at room temperature, the band gap energies (E_g) of the first and second junctions were found to be 1.867 eV and 2.098 eV, respectively. In addition, the alloy compositions were calculated by Vegard’s law using PL measurements. The turn-on voltage (V_on) and series resistance (R_s) of the device were obtained from the I–V measurements to be 4.548 V and 119 Ω, respectively. It was observed that the LED device emitted in the red (664.020 nm) and yellow (591.325 nm) color regions.     

Higher azimuthal electromagnetic oscillations of <Emphasis Type="Italic">HE</Emphasis>-and <Emphasis Type="Italic">EH</Emphasis>-types in disc dielectric resonator

Features of higher azimuthal electromagnetic oscillations of “whispering” mode of HE-and EH-types in dielectric resonator of millimeter waveband are researched. Comparison of resonance characteristics of HE-and EH-types oscillations in such resonator is carried out.     

Study of RF transistor with submicron T-shaped gate fabricated by nanoimprint lithography

The results devoted to the development of a method for creating an RF transistor, in which a T-shaped gate is formed by nanoimprint lithography, are presented. The characteristics of GaAs p-HEMT transistors have been studied. The developed transistor has a gate “foot” length of the order of 250 nm and a maximum transconductance of more than 350 mS/mm. The maximum frequency of current amplification f _t is 40 GHz at the drain-source voltage V _DS = 1.4 V and the maximum frequency of the power gain f _max is 50 GHz at V _DS = 3 V.     

Growth,structure, and properties of GaAs-based (GaAs)1–x–y (Ge2) x (ZnSe) y epitaxial films

The possibility of growing the (GaAs)_1–x–y (Ge₂) _x (ZnSe) _y alloy on GaAs substrates by the method of liquid-phase epitaxy from a tin solution–melt is shown. X-ray diffraction shows that the grown film is single-crystal with the (100) orientation and has the sphalerite structure. The crystal-lattice parameter of the film is a _f = 0.56697 nm. The features of the spectral dependence of the photosensitivity are caused by the formation of various complexes of charged components. It is established that the I–V characteristic of such structures is described by the exponential dependence I = I ₀exp(qV/ckT) at low voltages (no higher than 0.4 V) and by the power dependence J ~ V ^α, where the exponent α varies with increasing voltage at high voltages (V > 0.5 V). The results are treated within the framework of the theory of the drift mechanism of current transfer taking into account the possibility of the exchange of free carriers within the recombination complex.     

The influence of the energy of photoexcitation in the course of electron irradiation on defect formation in <Emphasis Type="Italic">n</Emphasis>-Si crystals

Effect of illumination of n-Si crystals in the course of irradiation with electrons on the nature of radiation defects is studied. The samples irradiated with 2-MeV electrons were subjected to isochronous annealing in the temperature range from 200 to 600°C. After each 20-min cycle of annealing, the electron concentration was measured by the Hall method in the temperature range 77–300 K. It is shown that, if the E centers are excited during irradiation with photons with the energy hν = 0.44 eV (the wavelength λ = 2.8 μm), divacancy phosphorus-containing defects of the PV ₂ type are formed in the n-Si crystals, which leads to an increase in the radiation resistance of the crystals under study. If negative vacancies V ^? are excited with photons with the energy hν = 0.28 eV (λ = 4.4 μm), the total number of radiation defects increases by a factor of 1.2.     

The following the perturbed leader algorithm and its application for constructing game strategies

A modification of Hannan’s Following the Perturbed Leaded (FPL) algorithm for the case of unlimited gains and losses is considered. Estimates of the prediction error are obtained in terms of the volume v _t and game fluctuation fluc(t) = Δv _t /v _t , where Δv _t = v _t –v _t–1. We prove the asymptotic consistency on the average of this variant of the algorithm for fluc(t) = o(t). Applications of this algorithm for constructing game strategies are considered. Game strategies employing the difference between the “micro” and “macro” volatility of the discrete time series (prices of the financial instrument) are determined for obtaining arbitrage. Mixing these expert strategies is performed on the basis of the variant of Hannan’s algorithm developed in this work.     

Sojourn times in different modes in the queueing system with batch Poisson arrivals,general service times,and hysteretic policy

Consideration is given to the model of the SIP server modelled as a single-server queueing system with finite capacity R and two batch Poisson flows (priority and non-priority), general service times, and bi-level hysteretic control of arrival rates, which is defined by two numbers: L and H (0 < L < H < R). The hysteretic policy under consideration implies that, at each instant, the system can be in one of the three operation modes: normal, overload, and blocking. The system accepts customers from both flows when it is in normal mode, accepts only priority flow when is it overloaded, and rejects all new customers in the discard modes. It is assumed that the switching between operation modes can occur only at the instant of service completion. The analytical method for computing the distributions (in terms of Laplace–Stieltjes transforms) of system’s sojourn times in each operation mode and return times to the normal mode is proposed. Illustative examples are presented.     

Electrical Characteristics of GaN-Based Light-Emitting Diodes on Patterned Sapphire Substrates

Patterned sapphire substrate light-emitting diodes display obvious negative capacitance (NC) at large forward biases. This is measured using a method based on a small signal alternating current together with direct I–V plots. The NC in patterned sapphire substrate LEDs grows exponentially with the forward applied voltage. This observation is unexpected and in contrast with Shockley’s p–n junction theory, which only includes an increasing diffusion capacitance and not a NC. However, this result is in good agreement with conventional sapphire substrate LEDs. Furthermore, the negative terminal capacitance confirmed the prediction of Laux and Hess’ theory. The ideal factor of a patterned sapphire substrate LED is about 5, greatly exceeding the traditional theoretical value. The capacitance increased to a maximum and then gradually decreased, which was similar to the results for a p–n junction. Patterned sapphire substrate LEDs can withstand higher voltages than conventional sapphire substrate LEDs. This work could further confirm the existence of NC.     

Anderson–Darling statistic and its “inverse”

For more than 60 years, the Anderson–Darling test is most frequently used among all Cramér–von Mises (omega-square) tests. This statistic modifies a classical empirical process defined within the [0, 1] interval by multiplying it by weighting function ψ(t) = (t(1–t))^–1/2. The weighting function redistributes the test sensitivity to deviations of the distribution function of the observed stochastic quantity from a hypothetical distribution function in different its segments. However, the tests with other weighting functions may also be of interest in practice. New formulas for the eigenvalues of the Anderson–Darling statistic are proposed. The statistic “inverse” to the Anderson–Darling statistic with weighting function ψ(t) = (t(1–t))^1/2 is considered. Tests with other weighting functions may also be of interest when weighted Cramér–von Mises statistics are used. The table of quantiles of statistics with weighting functions ψ(t) = t^α(1–t)^β, α >–1, β >–1 is presented. The quantiles are given for 36 different combinations of parameters α >–1 and β >–1. The table was calculated using accurate numerical methods and without application of modeling techniques.     

Effect of proton irradiation on the breakdown voltage of a high-voltage <Emphasis Type="Italic">p–n</Emphasis> junction

The effect of hydrogen-related shallow thermal donors and acceptor-like defects arising under proton irradiation of silicon on the breakdown voltage of a high-voltage p–n junction is considered. The relations making it possible to compute the breakdown voltage of the irradiated p–n junction taking into account the increase in critical field intensity during the ingress of hydrogen-related shallow thermal donors into the region of collisional ionization of the p–n junction are obtained. A technique for determination of the layer position and the minimum dose of hydrogen-related shallow thermal donors making it possible to decrease the breakdown voltage by a specified amount is proposed.     

A Fast Algorithm for Wave Propagation from a Plane or a Cylindrical Surface

The newly developed Taylor-Interpolation-FFT (TI-FFT) algorithm dramatically increases the computational speeds for millimeter wave propagation from a planar (cylindrical) surface onto a “quasi-planar” (“quasi-cylindrical”) surface. Two different scenarios are considered in this article: the planar TI-FFT is for the computation of the wave propagation from a plane onto a “quasi-planar” surface and the cylindrical TI-FFT is for the computation of wave propagation from a cylindrical surface onto a “quasi-cylindrical” surface. Due to the use of the FFT, the TI-FFT algorithm has a computational complexity of O(N ²?log₂? N ²) for an N?×?N computational grid, instead of N ⁴ for the direct integration method. The TI-FFT algorithm has a low sampling rate according to the Nyquist sampling theorem. The algorithm has accuracy down to ?80 dB and it works particularly well for narrow-band fields and “quasi-planar” (“quasi-cylindrical”) surfaces.