Investigation of the homogeneity of a high-power ion beam formed by a diode with a closed electron drift

The results of an investigation of the energy-density distribution over the cross section of a pulsed ion beam formed with a passive-anode diode in the mode of magnetic insulation and a closed electron drift in the anode–cathode gap are presented. Diodes of two types are studied: with external magnetic insulation (B_r diode) on the BIPPAB-450 accelerator (400 kV, 80 ns) and self-magnetic insulation of electrons (spiral diode) on the TEMP-4M accelerator (250 kV, 120 ns). In the investigated diodes, various processes are used to form anode plasma: a breakdown over the surface of a dielectric coating on the anode and ionization of the anode surface with accelerated electrons (B_r diode), as well as explosive emission of electrons (spiral diode). To analyze the ion-beam energy density, thermal-imaging diagnostics is used with a spatial resolution of 1–2 mm. The energy-density is calculated from the one-dimensional Child–Langmuir relationship. It is shown that a continuous plasma layer is efficiently formed on the working anode surface for all the investigated diodes. The anode-plasma concentration is rather high, and the beam-energy density is limited by the space charge of ions, but not by the plasma concentration. It is found that, when the magnetic field in the Br-diode anode–cathode gap decreases or the electron current in the spiral diode increases, the energy density of the high-power ion beam rises significantly, but the beam homogeneity decreases.     

Measuring the mechanical recoil impulse of a polymeric target upon impact of a high power electron beam

A method for measuring the mechanical recoil impulse of a target produced by the relativistic electron beam of the Calamary accelerator is described. A detector based on a piezoelectric sensor is used in measurements. Results of measurements are presented for the mechanical recoil impulse produced by the relativistic electron beam with an energy as high as 300 keV, a current of up to 30 kA, and a duration of ~100 ns that is incident on an epoxy target. The energy flux density on the target surface is varied in the range of 1–10 GW/cm². The maximum measured impulse value is 0.32 N · s at an energy flux density of 10 GW/cm² (an energy fluence of 810 J/cm2).     

Shot-to-shot reproducibility of a self-magnetically insulated ion diode

In this paper we present the analysis of shot to shot reproducibility of the ion beam which is formed by a self-magnetically insulated ion diode with an explosive emission graphite cathode. The experiments were carried out with the TEMP-4M accelerator operating in double-pulse mode: the first pulse is of negative polarity (300-500 ns, 100-150 kV), and this is followed by a second pulse of positive polarity (150 ns, 250-300 kV). The ion current density was 10-70 A∕cm(2) depending on the diode geometry. The beam was composed from carbon ions (80%-85%) and protons. It was found that shot to shot variation in the ion current density was about 35%-40%, whilst the diode voltage and current were comparatively stable with the variation limited to no more than 10%. It was shown that focusing of the ion beam can improve the stability of the ion current generation and reduces the variation to 18%-20%. In order to find out the reason for the shot-to-shot variation in ion current density we examined the statistical correlation between the current density of the accelerated beam and other measured characteristics of the diode, such as the accelerating voltage, total current, and first pulse duration. The correlation between the ion current density measured simultaneously at different positions within the cross-section of the beam was also investigated. It was shown that the shot-to-shot variation in ion current density is mainly attributed to the variation in the density of electrons diffusing from the drift region into the A-K gap.     

A forevacuum pulse arc-discharge-based plasma electron source

An arc-discharge-based electron source is described, which is designed for forming a pulsed wideaperture electron beam in the forevacuum pressure range (4–15 Pa). At an accelerating voltage of 12 kV, a current of 80 A was extracted from the emitting surface with an area of 80 cm² in the submillisecond range of pulse durations. The current density distribution over the beam cross section is close to a Gaussian function, and the surface-averaged beam energy density in a pulse reached 10 J/cm².     

Features of focusing of a high-intensity pulsed ion beam formed by a diode with a passive anode

The results of investigating the focusing of a high-power ion beam, which is formed by a diode with a semicylindrical geometry and a passive anode, are presented. Two types of focusing diodes were investigated: with external magnetic insulation (one-pulse mode) and self-magnetic insulation of electrons (twopulse mode). Measurements of the energy-density distribution of the ion beam and the ion-current density were performed. It was found that when the diode operates in the two-pulse mode, the region of the maximum ion-beam energy density in the focal plane is displaced relative to the region of the maximum ion-current density by 5–10 mm. It is shown that the effect of a displacement of the focal spot with the maximum energy density is determined by the presence of a large number of accelerated neutral atoms in the ion beam. These atoms are produced as a result of the ion charge-exchange process in the anode–cathode gap of the ion diode during its operation in the two-pulse mode.     

A capacitive storage for a tabletop X-ray laser for dense-plasma diagnostics

The results of investigation of a pulsed capacitive energy storage for a tabletop-type X-ray laser for dense-plasma (up to 3 × 10²² cm^?3) diagnostics are presented. It is assumed that plasma of Ne-like argon is the active medium of the X-ray laser and an electric discharge occurs inside a 150-mm-long ceramic capillary 3–4 mm in diameter. In previous experiments on the SIGNAL accelerator, the main initial conditions for generation of laser X rays were determined and X rays at a wavelength of 46.9 nm were obtained. The pulsed capacitive-energy storage unit is built in the form of a flat capacitor filled with deionized water. It has been revealed that deionized water as the dielectric filling the flat capacitor is not broken down in a 10-mm-wide gap at a pulsed voltage <130 kV and a charging-pulse duration of ～300 ns. In this case, the parameters of the pulsed capacitive-energy storage correspond to those required for generation of laser X rays: a current amplitude in the load of 50 ± 1 kA and a period of the current in the load of 196 ± 2 ns. The small jitter of the duration of the charging pulse (288 ± 6 ns) of the flat capacitor offers a hope for satisfactory synchronization of a laser X-ray pulse with a diagnosed plasma object.     

Angular dose variations from 320 kV rod pinch diode flash X-ray experiments on the modified Kali-1000 Pulsed Power System

This paper highlights the angular distribution of radiation dose emitted from a rod-pinch diode. The typical RP diode employed used a small diameter (1–2 mm) anode rod extended through a cathode aperture (5–8 mm). The diode chamber is maintained at 2 × 10^–5 Torr vacuum by a rotary backed diffusion pump. Experiments performed on a modified Kali-1000 Pulsed Power System (300 kV, 30 kA, 100 ns) were aimed at optimizing the source by maximizing the figure of merit (dose at 1 m in rad/spot diameter² in mm²) with minimizing of the diode impedance. The typical electron beam parameters used in the experiments are 240–320 kV, 6.5–27.5 kA, 100 ns, with a few hundreds of kA/cm² current density. The radiation emitted from a rod-pinch diode is measured using thermoluminescence dosimeters at an angular interval of 15° on either side of the rod in horizontal and vertical plane with different aspects ratio ranging from 2.5 to 10.0. Experimentally found that the radiation dose produced from the rod pinch diode configuration is maximum in the axial direction and decreases with angular variation on either side of the axis in horizontal and vertical planes, which indicates the directivity of the source. Maximum radiation dose at 1 m distance on the axial line is ranging from 42 to 307 mR.     

An experimental setup for exciting semiconductors and dielectrics with picosecond electron-beam and electric-field pulses

An experimental facility for forming high-voltage pulses with amplitudes of 30–250 kV and durations of 100–500 ps and electron beams with a current density of up to 1000 A/cm² is described. The facility was built using the principle of energy compression of a pulse from a nanosecond high-voltage generator accompanied by the subsequent pulse sharpening and cutting. The setup is equipped with two test coaxial chambers for exciting radiation in semiconductor crystals by an electron beam or an electric field in air at atmospheric pressure and T = 300 K. Generation of laser radiation in the visible range under field and electron pumping was attained in ZnSSe, ZnSe, ZnCdS, and CdS (462, 480, 515, and 525 nm, respectively). Under the exposure to an electric field (up to 10⁶ V cm^?1), the lasing region was as large as 300–500μm. The radiation divergence was within 5°. The maximum integral radiation power (6 kW at λ = 480 nm) was obtained under field pumping of a zinc selenide sample with a single dielectric mirror.     

A high-voltage pulse generator for electric-discharge technologies

The electric circuit and design of a high-volta ge pulse generator with an output voltage of ≥3 50 kV is described. The generator operates in the nanosecond range of pulse durations (~300 ns) at a repetition rate of up to 10 pulses/s in a continuous mode and is intended for electric-discharge technologies. The energy stored in the generator is ~600 J, and the energy released in a pulse is ≥300 J. A discharge of a capacitive storage through a toroidal pulsed transformer and a discharge gap is used in the generator.     

Chemical and morphological changes in human dentin after Er:YAGlaser irradiation: EDS and SEM analysis

Sixty samples of human dentin were divided into six groups (n = 10) and were irradiated with Er:YAG laser at 100 mJ–19.9 J/cm², 150 mJ–29.8 J/cm², 100 mJ–35.3 J/cm², 150 mJ–53.0 J/cm², 200 mJ–70.7 J/cm², and 250 mJ–88.5 J/cm², respectively, at 7 Hz under a water spray. The atomic percentages of carbon, oxygen, magnesium, calcium, and phosphorus and the Ca‐to‐P molar ratio on the dentin were determined by energy dispersive X‐ray spectroscopy. The morphological changes were observed using scanning electron microscopy. A paired t‐test was used in statistical analysis before and after irradiation, and a one‐way ANOVA was performed (P ≤ 0.05). The atomic percent of C tended to decrease in all of the groups after irradiation with statistically significant differences, O and Mg increased with significant differences in all of the groups, and the Ca‐to‐P molar ratio increased in groups IV, V, and VI, with statistically significant differences between groups II and VI. All the irradiated samples showed morphological changes. Major changes in the chemical composition of dentin were observed in trace elements. A significant increase in the Ca‐to‐P ratio was observed in the higher energy density groups. Morphological changes included loss of smear layer with exposed dentinal tubules. The changes produced by the different energy densities employed could have clinical implications, additional studies are required to clarify them. Microsc. Res. Tech. 78:1019–1025, 2015. © 2015 Wiley Periodicals, Inc.     

Scanning MeV-ion microprobe for light and heavy ions

The University of Oregon scanning ion microprobe uses a 65 cm focal length plasma lens to form 8.65 × demagnified image of an object aperture. The plasma lens focuses a positive ion beam using the self-electric field of a trapped cylindrical column of electrons of density 3−9 × 10⁹cm⁻³ and length 13–18 cm. Since the focusing field is electric, the focal length depends only on ion accelerating voltage and not on ion mass or charge state. Our 5 MV Van de Graaff accelerator illuminates the object aperture with a current density of ∼ 0.5 pA/mu;m². The lens aperture is defined by a set of slits 3.35 m beyond the object aperture slits and 2.79 m from the lens. Four pairs of deflection plates are located between the intermediate aperture and the lens. Two pairs of plates are used for each scanning direction so the beam always passes through the lens center during rastering. The 1 kV operational amplifiers that drive these plates combine three sets of signals. Computer generated voltages raster the beam. Individual dc offset voltages align the beam with the lens axis. A small 60 Hz signal cancels the effects of background 60 Hz magnetic fields along the beam line. With 1 kV rastering voltage the rastered field at the focal plane is 3 mm square for 3 MeV ions. Focal spot size is now 10 μm with a 2 mm diameter lens aperture and 5 μm with a 0.5 mm lens aperture.     

An Ion Diode with External Magnetic Insulation

An ion diode with an orificed anode and an external radial magnetic field created by a pair of concentric windings is described. It is distinguished by the absence of devices for preliminary plasma production. The diode is powered from a high-current nanosecond-pulse accelerator with a matching output autotransformer. The use of ballistic focusing in a converging ion beam makes it possible to reach an ion-current density of 600 A/cm² at an efficiency of 60%, relative to the energy stored in the accelerator's forming line, and at an anode potential of 350 kV for a half-height voltage-pulse duration of 50 ns.     

Investigation of high-voltage integral pulse thyristors in single-pulse and pulse-train modes

The results of studying the switching capabilities of recently developed high-voltage integral pulse thyristors (HIPTs) with a working area of 0.45 cm² and an operating voltage of 3 kV are presented. A silicon chip of a thyristor consists of a large number of microthyristor cells that are enabled strictly synchronously with a control-current pulse, thus providing low switching energy losses and allowing a current of up to 8 kA at a pulse duration of 1.5 μs to be switched within 500 ns in a single-pulse mode. The HIPT switching-off time is several microseconds when, after a power-current pulse terminates, a field-effect transistor with a low (tens of milliohms) channel resistance closes the emitter–base circuit. The low switching energy loss and the short switching-off time made it possible to use HIPTs in the mode of switching current pulses with an amplitude of 500 А at a frequency of 50 kHz.     

A forevacuum plasma source of pulsed electron beams

A plasma electron source designed for generation of a pulsed wide-aperture electron beam in the forevacuum pressure range (5–20 Pa) is described. The source is based on the use of a hollow-cathode glow discharge. At an accelerating voltage of 20 kV, a current pulse length of 100 μs, and a pulse repetition rate of 10 Hz, the electron beam current is 100 A, and the maximum density of the beam pulse power is 10 J/cm². The obtained parameters of the electron beam and the features of the source functioning in the forevacuum pressure range show that this source can be used to good effect to modify the surface properties of nonconducting materials.     

A source of broad homogeneous beams of low-energy (∼0.5 keV) gas ions

A source of gas ions (argon, oxygen, nitrogen, etc.), the operating principle of which is based on the use of a glow discharge in an electrode system of a wide-aperture hollow cathode and anode in a magnetic field, is described. The exit aperture diameter of the hollow cathode, increased up to a size close to the ion beam diameter (10 cm), ensures the uniform ion emission of the plasma generated in the discharge region near the anode. A decreased angular divergence or increased ultimate ion-beam current density is achieved by a change in the potential drop in the space charge sheath between the plasma and the ion optics. The source generates broad (50 cm²) slightly diverging (ω/2∼3°–5°) ion beams with energies of 300–1000 eV at a beam current density of ∼0.5 mA/cm².     

A source of gas, vapor, metal, and carbon ions based on a low-pressure hollow-cathode discharge

A compact source of gas, vapor, metal, and carbon ions based on a cold-hollow-cathode reflective discharge has been developed, in which a 6-mm-diameter flat target (Cu, Mo, W, C) is installed on the bottom of the cold cathode insulated from it. The density of the ion flow from cathode plasma reaches 100 mA/cm² at an accelerating voltage of up to 10 kV and a discharge current of 0.2-0.5 A. Vapors produced during ion sputtering of the target are ionized in the cathode and anode cavities. A beam containing ions of the plasma-producing gas and vapor is extracted throug h the channel in the reflector cathode. A fraction of the vapor of the sputtered target, the flow of which is sufficient for growing layers at a rate of ∼0.03 nm/s at a distance of 10 cm from the emission channel under the action of an ion beam, is extracted together with ions. The fraction of metal ions in the extracted beam is 0.05-0.10. The total current of the ion beam is 20-30 mA.     

Applications of focused ion beams

A finely focused ion beam system is described. Beams of Ga, In, and Au ions emitted from a liquid metal ion source are routinely focused to spot diameters of ∼0.1 to 3.0 μm at a current density of ∼0.5 A/cm² and a beam energy of 20 keV. Focused beams with energies of 1 to 30 keV have also been produced. Three applications are discussed: (1) scanning ion microscopy, (2) mask repair, and (3) ion beam lithography. Scanning ion images illustrating topographic and chemical contrast are presented. The repair of opaque and clear defects in optical masks, and opaque defects in X-ray masks is shown.Defects are imaged with the ion beam and removed by sputter erosion. Edge reconstruction of 0.5 μm features is demonstrated. Most repairs take less than 10 s/μm². The advantages and limitations of ion beams for lithography are discussed.     

A source of broad electron beams with a self-heated hollow cathode for plasma nitriding of stainless steel

The principle of operation and characteristics of a broad electron beam source based on the discharge with a self-heated hollow cathode and widened anode part are described. The source is intended for the ion nitriding of metals in the electron beam plasma. The influence of the current density (1–7 mA/cm²) and ion energy (0.1–0.3 keV) on the nitriding rate of the 12X18H10T austenitic stainless steel is studied. It is shown that the maximal nitriding rate is reached by the combining of the minimal bias voltage across the samples (100 V) and maximal ion current density, which ensures the dynamic oxide layer sputtering on the sample surface. The electron source, in which electrons are extracted through a stabilizing grid in the direction normal to the axis of the hollow cathode, ensures the radially divergent electron beam formation with a 700-cm² initial cross section, a current of up to 30 A, and initial electron energy of 0.1–0.5 keV. The source stably operates at nitrogen-argon mixture pressures of up to 3 Pa.