Synthesis of hexagonal graphene on polycrystalline Cu foil from solid camphor by atmospheric pressure chemical vapor deposition

Understanding of graphene nucleation and growth on a metal substrate in chemical vapor deposition (CVD) process is critical to obtain high-quality single crystal graphene. Here, we report synthesis of individual hexagonal graphene and their large cluster on Cu foil using solid camphor as a carbon precursor in the atmospheric pressure CVD (AP-CVD) process. Optical and scanning electron microscopy studies show formation of hexagonal graphene crystals across the grain, grain boundaries and twin boundaries of polycrystalline Cu foil. Electron backscattered diffraction analysis is carried out before and after the growth to identify Cu grain orientation correlating with the graphene formation. The influence of growth conditions and Cu grain structure is explored on individual hexagonal graphene formation in the camphor-based AP-CVD process.     

Effect of copper foil annealing process on large graphene domain growth by solid source-based chemical vapor deposition

Controlling the metal catalyst surface structure is a critical factor to achieve growth of large graphene domains. In this prospect, we explored the annealing process to create an oxide layer and subsequent recrystallization of Cu foil for growth of large graphene domain by the atmospheric pressure chemical vapor deposition (AP-CVD) technique. We revealed the transformation of Cu surface crystallographic structures in every step of annealing process by electron back-scattered diffraction analysis. Initially, electroless polished Cu foils are annealed in Ar and then in H₂ atmosphere to obtain a smoother surface with reduced graphene nucleation sites. The transformation of Cu grain structures at various annealing steps was confirmed, where the gas atmosphere and annealing duration have significant influence. Graphene domains with the size more than 560 µm are obtained on the processed Cu surface using polystyrene as solid precursor. It is obtained that the oxidation and recrystallization process of Cu foil surface significantly influence the nucleation density, which enable growth of larger graphene domain in the developed CVD process.     

Adlayer‐Free Large‐Area Single Crystal Graphene Grown on a Cu(111) Foil

To date, thousands of publications have reported chemical vapor deposition growth of “single layer” graphene, but none of them has described truly single layer graphene over large area because a fraction of the area has adlayers. It is found that the amount of subsurface carbon (leading to additional nuclei) in Cu foils directly correlates with the extent of adlayer growth. Annealing in hydrogen gas atmosphere depletes the subsurface carbon in the Cu foil. Adlayer‐free single crystal and polycrystalline single layer graphene films are grown on Cu(111) and polycrystalline Cu foils containing no subsurface carbon, respectively. This single crystal graphene contains parallel, centimeter‐long ≈100 nm wide “folds,” separated by 20 to 50 µm, while folds (and wrinkles) are distributed quasi‐randomly in the polycrystalline graphene film. High‐performance field‐effect transistors are readily fabricated in the large regions between adjacent parallel folds in the adlayer‐free single crystal graphene film.     

Chemical Vapor Deposition of Bernal‐Stacked Graphene on a Cu Surface by Breaking the Carbon Solubility Symmetry in Cu Foils

The synthesis of Bernal‐stacked multilayer graphene over large areas is intensively investigated due to the value of this material's tunable electronic structure, which makes it promising for use in a wide range of optoelectronic applications. Multilayer graphene is typically formed via chemical vapor deposition onto a metal catalyst, such as Ni, a Cu–Ni alloy, or a Cu pocket. These methods, however, require sophisticated control over the process parameters, which limits the process reproducibility and reliability. Here, a new synthetic method for the facile growth of large‐area Bernal‐stacked multilayer graphene with precise layer control is proposed. A thin Ni film is deposited onto the back side of a Cu foil to induce controlled diffusion of carbon atoms through bulk Cu from the back to the front. The resulting multilayer graphene exhibits a 97% uniformity and a sheet resistance of 50 Ω sq^?1 with a 90% transmittance after doping. The growth mechanism is elucidated and a generalized kinetic model is developed to describe Bernal‐stacked multilayer graphene growth by the carbon atoms diffused through bulk Cu.     

Few-layer graphene direct deposition on Ni and Cu foil by cold-wall chemical vapor deposition

We report an alternative synthesis process, cold-wall thermal chemical vapor deposition (CVD), is replied to directly deposit single-layer and few-layer graphene films on Ar plasma treated Ni and Cu foils using CH4 as carbon source. Through optimizing the process parameters, large scale single-layer graphene grown on Ni foil is comparable to that grown on Cu foil. The graphene films were able to be transferred to other substrates such as SiO2/Si, flexible transparent PET and verified by optical microscopy, Raman microscopy and scanning electron microscopy. The sheet resistance and transmission of the transferred graphene films on PET substrate were also discussed.     

Control of thickness uniformity and grain size in graphene films for transparent conductive electrodes

Large-scale and transferable graphene films grown on metal substrates by chemical vapor deposition (CVD) still hold great promise for future nanotechnology. To realize the promise, one of the key issues is to further improve the quality of graphene, e.g., uniform thickness, large grain size, and low defects. Here we grow graphene films on Cu foils by CVD at ambient pressure, and study the graphene nucleation and growth processes under different concentrations of carbon precursor. On the basis of the results, we develop a two-step ambient pressure CVD process to synthesize continuous single-layer graphene films with large grain size (up to hundreds of square micrometers). Scanning electron microscopy and Raman spectroscopy characterizations confirm the film thickness and uniformity. The transferred graphene films on cover glass slips show high electrical conductivity and high optical transmittance that make them suitable as transparent conductive electrodes. The growth mechanism of CVD graphene on Cu is also discussed, and a growth model has been proposed. Our results provide important guidance toward the synthesis of high quality uniform graphene films, and could offer a great driving force for graphene based applications.     

Controllable Growth of Graphene on Liquid Surfaces

Controllable fabrication of graphene is necessary for its practical application. Chemical vapor deposition (CVD) approaches based on solid metal substrates with morphology‐rich surfaces, such as copper (Cu) and nickel (Ni), suffer from the drawbacks of inhomogeneous nucleation and uncontrollable carbon precipitation. Liquid substrates offer a quasiatomically smooth surface, which enables the growth of uniform graphene layers. The fast surface diffusion rates also lead to unique growth and etching kinetics for achieving graphene grains with novel morphologies. The rheological surface endows the graphene grains with self‐adjusted rotation, alignment, and movement that are driven by specific interactions. The intermediary‐free transfer or the direct growth of graphene on insulated substrates is demonstrated using liquid metals. Here, the controllable growth process of graphene on a liquid surface to promote the development of attractive liquid CVD strategies is in focus. The exciting progress in controlled growth, etching, self‐assembly, and delivery of graphene on a liquid surface is presented and discussed in depth. In addition, prospects and further developments in these exciting fields of graphene growth on a liquid surface are discussed.     

Surface crystallographic structure insensitive growth of oriented graphene domains on Cu substrates

Cu-based chemical vapor deposition method can produce large-area graphene films, usually polycrystalline films with grain boundaries as the main defects. One way to reduce grain boundaries is to grow oriented graphene domains (OGDs), which can ultimately perfectly integrate. In contrast to previously reported methods of limiting OGD growth on Cu (1 1 1), we find that OGDs can grow on Cu substrates with a large surface crystallographic structure tolerance. Density functional theory calculations show that this is due to the single lowest energy state of graphene nucleation. The growth temperature is crucial. It must be high enough (1045 °C) to suppress mis-OGD nucleation, but not too high (1055 °C) to deteriorate OGD growth. Mis-OGD nucleation can also be caused by C impurity in Cu grains, which can be depleted by thermal pretreatment of the substrate in an oxidizing atmosphere. On the other hand, OGD growth is not sensitive to the atmosphere at growth stage within the range that we have tested.     

Controllable electrodeposition of ordered carbon nanowalls on Cu(111) substrates

We report the growth of amorphous carbon nanowalls with molten salt electrolytes and a carbonate carbon source at 600 °C on home-made Cu(111) foil as the growth substrate (and cathode). The nanometer thick nanowalls grow preferentially along symmetric slip lines on the Cu(111) surface and their ordered arrangement appears to also be dictated by the electrosynthesis parameters. Computational chemistry suggests that nucleation of carbon growth is favored at the slip lines (atomic steps) of the Cu(111) surface. The electrodeposited carbon structures can be varied by tuning the potential on the electrodes and temperature of the molten salt. The macro, micro, and nanoscale structure of the nanowalls was studied and is reported.     

PMMA在石墨烯转移过程中对其表面准周期褶皱的影响

利用CVD方法在铜基底上制备了大面积石墨烯,将其转移到PMMA表面,利用AFM和STM对转移前后的石墨烯表面进行了研究,结果表明,利用CVD方法制备的石墨烯表面存在由Cu基底表面台阶引起的大面积准周期性条纹状褶皱;当石墨烯转移到PMMA表面后,褶皱数量显著减少,表面杂质颗粒和裂痕减少,表明PMMA与石墨烯间的相互作用能够提高石墨烯的平整度,改善石墨烯的质量。     

Dynamic Failure Behavior of Nanocrystalline Cu at Atomic Scales

Large-scale molecular dynamics (MD) simulations are used to investigate the effects of microstructure and loading conditions on the dynamic failure behavior of nanocrystalline Cu. The nucleation, growth, and coalescence of voids is investigated for the nanocrystalline metal with average grain sizes ranging from 6 nm to 12 nm (inverse Hall-Petch regime) for conditions of uniaxial expansion at constant strain rates ranging from 4x107 s - 1 to 1010 s - 1. MD simulations suggest that the evolution of voids can be described in two stages: The first stage corresponds to the nucleation of voids and the fast linear initial growth of all the individual voids. The second stage of void growth corresponds to the steady (slower) growth and coalescence of the void aggregates/clusters. The evolution of void fraction is found to be strongly dependent on the loading strain rates, but is less dependent on the grain size of the nanocrystalline metal. Higher strain rates require larger plastic strains to nucleate voids, whereas the larger grain sizes require lower plastic strains to nucleate voids in the inverse Hall-Petch regime. The spall strength of the nanocrystalline metal is less affected by the grain size, but is strongly affected by the loading strain rates.     

石墨烯/Cu复合材料力学性能的分子动力学模拟

结合嵌入原子方法（EAM）、反应经验键序（REBO）作用势和Morse势函数,采用分子动力学方法研究了石墨烯/Cu复合材料的弹性性能和变形机制。分子动力学计算得到复合材料的弹性模量随石墨烯体积分数的增加而线性增加,这与Halpin-Tsai模型的预测趋势吻合。此外,石墨烯的加入同时也提供了复合材料的屈服强度。通过比较预制裂纹在单晶铜和石墨烯/Cu复合材料中的动态扩展,发现石墨烯的加入显著抑制了裂纹的扩展,材料的变形主要表现为沿石墨表面的滑移。石墨烯很大程度上提高了复合材料的塑性变形能力。     

Weak mismatch epitaxy and structural Feedback in graphene growth on copper foil

Graphene growth by low-pressure chemical vapor deposition on low cost copper foils shows great promise for large scale applications. It is known that the local crystallography of the foil influences the graphene growth rate. Here we find an epitaxial relationship between graphene and copper foil. Interfacial restructuring between graphene and copper drives the formation of (n10) facets on what is otherwise a mostly Cu(100) surface, and the facets in turn influence the graphene orientations from the onset of growth. Angle resolved photoemission shows that the electronic structure of the graphene is decoupled from the copper indicating a weak interaction between them. Despite this, two preferred orientations of graphene are found, ±8° from the Cu[010] direction, creating a non-uniform distribution of graphene grain boundary misorientation angles. Comparison with the model system of graphene growth on single crystal Cu(110) indicates that this orientational alignment is due to mismatch epitaxy. Despite the differences in symmetry the orientation of the graphene is defined by that of the copper. We expect these observations to not only have importance for controlling and understanding the growth process for graphene on copper, but also to have wider implications for the growth of two-dimensional materials on low cost metal substrates.      

Low‐Temperature and Rapid Growth of Large Single‐Crystalline Graphene with Ethane

Future applications of graphene rely highly on the production of large‐area high‐quality graphene, especially large single‐crystalline graphene, due to the reduction of defects caused by grain boundaries. However, current large single‐crystalline graphene growing methodologies are suffering from low growth rate and as a result, industrial graphene production is always confronted by high energy consumption, which is primarily caused by high growth temperature and long growth time. Herein, a new growth condition achieved via ethane being the carbon feedstock to achieve low‐temperature yet rapid growth of large single‐crystalline graphene is reported. Ethane condition gives a growth rate about four times faster than methane, achieving about 420 µm min^?1 for the growth of sub‐centimeter graphene single crystals at temperature about 1000 °C. In addition, the temperature threshold to obtain graphene using ethane can be reduced to 750 °C, lower than the general growth temperature threshold (about 1000 °C) with methane on copper foil. Meanwhile ethane always keeps higher graphene growth rate than methane under the same growth temperature. This study demonstrates that ethane is indeed a potential carbon source for efficient growth of large single‐crystalline graphene, thus paves the way for graphene in high‐end electronical and optoelectronical applications.     

Fast and simultaneous growth of graphene,intermetallic compounds,and silicate on Cu–Ni alloy foils

A graphene bilayer was grown on copper–nickel alloy foils (30 at-% Ni: 70 at-% Cu designated as a 30Ni–70Cu) via an inductively coupled plasma–chemical vapor deposition chamber, and was characterized. The first layer fully covered the foil, while there was partial coverage of the second layer. At the same time, the alloy catalyst produced a compound of magnesium silicate in some regions and of copper sulfide in other regions on which a graphene monolayer simultaneously grew without any discontinuity or boundaries of the 1st graphene monolayer between simultaneous growth and graphene-only growth regions. Compared with Cu foils, the alloy foils led to faster growth of the graphene film in graphene-only growth regions, while maintaining the same quality, homogeneity, and thickness uniformity as a monolayer graphene grown on Cu. Raman spectroscopy and scattering demonstrated that the 2D and D bands of the Raman spectra were in the same position for the monolayer graphene on 30Ni–70Cu regardless of the grown regions and for the graphene on the Cu with a full width at half maximum of ∼38 cm⁻¹ ranging from 30 to 55 cm⁻¹ of 2D, and without a D band in the spectra of the graphene monolayer and bilayer. Thus the resulting graphene growth is affected primarily by the Cu catalyst, partly by the compounds grown simultaneously with the graphene monolayer on the foil surface via thermal reactions of the impurities dissolved in the alloy matrix, and partly by the Ni. The quality of the graphene is dependent on the major composition of Cu catalyst in the alloy foils. On the other hands, the alloying element of Ni governs the growth kinetics unless the alloy foils is covered with the intermetallic compounds and silicate.     

Hexagonal single crystal domains of few-layer graphene on copper foils

Hexagonal-shaped single crystal domains of few layer graphene (FLG) are synthesized on copper foils using atmospheric pressure chemical vapor deposition with a high methane flow. Scanning electron microscopy reveals that the graphene domains have a hexagonal shape and are randomly orientated on the copper foil. However, the sites of graphene nucleation exhibit some correlation by forming linear rows. Transmission electron microscopy is used to examine the folded edges of individual domains and reveals they are few-layer graphene consisting of approximately 5-10 layers in the central region and thinning out toward the edges of the domain. Selected area electron diffraction of individual isolated domains reveals they are single crystals with AB Bernal stacking and free from the intrinsic rotational stacking faults that are associated with turbostratic graphite. We study the time-dependent growth dynamics of the domains and show that the final continuous FLG film is polycrystalline, consisting of randomly connected single crystal domains.     

Effects of polycrystalline cu substrate on graphene growth by chemical vapor deposition

Chemical vapor deposition of graphene on Cu often employs polycrystalline Cu substrates with diverse facets, grain boundaries (GBs), annealing twins, and rough sites. Using scanning electron microscopy (SEM), electron-backscatter diffraction (EBSD), and Raman spectroscopy on graphene and Cu, we find that Cu substrate crystallography affects graphene growth more than facet roughness. We determine that (111) containing facets produce pristine monolayer graphene with higher growth rate than (100) containing facets, especially Cu(100). The number of graphene defects and nucleation sites appears Cu facet invariant at growth temperatures above 900 °C. Engineering Cu to have (111) surfaces will cause monolayer, uniform graphene growth.     

Directing Highly Ordered and Dense Li Deposition to Achieve Stable Li Metal Batteries

Li metal anode is promising to achieve high-energy-density battery. However, it has rapid capacity fading due to the generation of inactive Li (dead Li), especially at high current density. This study reveals that the random distribution of Li nuclei leads to large uncertainty for the further growth behavior on Cu foil. Here, periodical regulation of Li nucleation sites on Cu foil by ordered lithiophilic micro-grooves is proposed to precisely manipulate the Li deposition morphology. The management of Li deposits in the lithiophilic grooves can induce high pressure on the Li particles, leading to the formation of dense Li structure and smooth surface without dendrite growth. Li deposits comprising tightly packed large Li particles largely reduce the side reaction and the generation of isolated metallic Li at high current density. Less dead Li accumulating on the substrate significantly prolongs the cycling life of full cells with limited Li inventory. The precise manipulation of the Li deposition on Cu is promising for high-energy and stable Li metal batteries.     

Graphene induced surface reconstruction of cu

An atomic-scale study utilizing scanning tunneling microscopy (STM) in ultrahigh vacuum (UHV) is performed on large single crystalline graphene grains synthesized on Cu foil by a chemical vapor deposition (CVD) method. After thermal annealing, we observe the presence of periodic surface depressions (stripe patterns) that exhibit long-range order formed in the area of Cu covered by graphene. We suggest that the observed stripe pattern is a Cu surface reconstruction formed by partial dislocations (which appeared to be stair-rod-like) resulting from the strain induced by the graphene overlayer. In addition, these graphene grains are shown to be more decoupled from the Cu substrate compared to previously studied grains that exhibited Moiré patterns.     

Anisotropic Strain Relaxation of Graphene by Corrugation on Copper Crystal Surfaces

Corrugation is a ubiquitous phenomenon for graphene grown on metal substrates by chemical vapor deposition, which greatly affects the electrical, mechanical, and chemical properties. Recent years have witnessed great progress in controlled growth of large graphene single crystals; however, the issue of surface roughness is far from being addressed. Here, the corrugation at the interface of copper (Cu) and graphene, including Cu step bunches (CuSB) and graphene wrinkles, are investigated and ascribed to the anisotropic strain relaxation. It is found that the corrugation is strongly dependent on Cu crystallographic orientations, specifically, the packed density and anisotropic atomic configuration. Dense Cu step bunches are prone to form on loose packed faces due to the instability of surface dynamics. On an anisotropic Cu crystal surface, Cu step bunches and graphene wrinkles are formed in two perpendicular directions to release the anisotropic interfacial stress, as revealed by morphology imaging and vibrational analysis. Cu(111) is a suitable crystal face for growth of ultraflat graphene with roughness as low as 0.20 nm. It is believed the findings will contribute to clarifying the interplay between graphene and Cu crystal faces, and reducing surface roughness of graphene by engineering the crystallographic orientation of Cu substrates.