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Seungwoo Lee Hong Suk Kang Jung‐Ki Park 《Advanced materials (Deerfield Beach, Fla.)》2012,24(16):2069-2103
This review demonstrates directional photofluidization lithography (DPL), which makes it possible to fabricate a generic and sophisticated micro/nanoarchitecture that would be difficult or impossible to attain with other methods. In particular, DPL differs from many of the existing micro/nanofabrication methods in that the post‐treatment (i.e., photofluidization), after the preliminary fabrication process of the original micro/nanostructures, plays a pivotal role in the various micro/nanostructural evolutions including the deterministic reshaping of architectures, the reduction of structural roughness, and the dramatic enhancement of pattern resolution. Also, DPL techniques are directly compatible with a parallel and scalable micro/nanofabrication. Thus, DPL with such extraordinary advantages in micro/nanofabrication could provide compelling opportunities for basic micro/nanoscale science as well as for general technology applications. 相似文献
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《Advanced materials (Deerfield Beach, Fla.)》2004,16(13):1035-1041
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《Advanced materials (Deerfield Beach, Fla.)》2007,19(23):4091-4101
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《Advanced materials (Deerfield Beach, Fla.)》2004,16(22):1975-1982
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《Advanced materials (Deerfield Beach, Fla.)》2005,17(13):1571-1579
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《Advanced materials (Deerfield Beach, Fla.)》2003,15(20):1665-1669
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