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1.
We fabricated an (InAs)1/(GaAs)2 short-period superlattice (SPS) strained quantum-well laser at 1.07 μm by MOVPE. The SPS active layer has 10 periods of (InAs)1/(GaAs)2 and an average mismatch of over 2.2%. In highly strained conditions the device showed a lasing wavelength of 1.07 μm, a threshold of 130 A/cm2, and a characteristic temperature T0 of 175 K. We measured the gain characteristic by the Hakki and Paoli method at LED conditions and obtained a high differential gain of 2.0×10-15 cm2 at the threshold current  相似文献   

2.
We report the characteristics of large area (3.3 × 3.3 mm 2) high-voltage 4H-SiC DiMOSFETs. The MOSFETs show a peak MOS channel mobility of 22 cm2/V·s and a threshold voltage of 8.5 V at room temperature. The DiMOSFETs exhibit an on-resistance of 4.2 mΩ·cm2 at room temperature and 85 mΩ·cm2 at 200°C. Stable avalanche characteristics at approximately 2.4 kV are observed. An on-current of 10 A is measured on a 0.103 cm2 device. High switching speed is also demonstrated. This suggests that the devices are capable of high-voltage, high-frequency, low-loss switching applications  相似文献   

3.
A fully planarized 4H-SiC trench MOS barrier Schottky (TMBS) rectifier has been designed, fabricated and characterized for the first time. The use of a TMBS structure helps improve the reverse leakage current by more than three orders of magnitude compared to that of a planar Schottky rectifier. We have achieved a low reverse leakage current density of 6×10-6 A/cm2 and a low forward voltage drop of 1.75 V at 60 A/cm2 for the TMBS rectifier. The static current-voltage (I-V) and switching characteristics of the TMBS rectifier have been measured at various temperatures. A barrier height of 1.0 eV and an ideality factor of 1.8 were extracted from the forward characteristics. The switching characteristics do not change with temperature indicating the essential absence of stored charge  相似文献   

4.
Highly strained (Δa/a ~ 2.5%) In0.4Ga0.6 As and In0.4Ga0.6As0.995N0.005 -quantum-well (QW) active lasers utilizing strain-compensating InGaP-GaAsP buffer layers and GaAs0.85P0.15 barrier layers, grown by metal-organic chemical vapor deposition (MOCVD), are demonstrated with lasing emission wavelength of 1.185 and 1.307 μm, respectively. Threshold and transparency current density for the strain compensated InGaAsN QW lasers, with emission wavelength of 1.295 μm, are measured to be as low as 290 A/cm2 (L = 1500 μm) and 110 A/cm2, respectively, with characteristic temperature of T0 and T1 of 130 K and 400 K  相似文献   

5.
GaInP-AlGaInP multiple quantum wire-like layers were fabricated by the in situ strain induced lateral layer ordering process during MBE growth. According to TEM images, the quantum wire size was around 10 nm and quantum wire axis was along [011¯] direction. When we made laser diodes with stripes along [011] direction, the low threshold current density, of 315 A/cm2 was obtained. Anisotropic lasing characteristics between [011] and [011¯] directions, in threshold current density, lasing mode, and lasing wavelength were observed  相似文献   

6.
The first self-assembled InAs quantum dash lasers grown by molecular beam epitaxy on InP (001) substrates are reported. Pulsed room-temperature operation demonstrates wavelengths from 1.60 to 1.66 μm for one-, three-, and five-stack designs, a threshold current density as low as 410 A/cm2 for single-stack uncoated lasers, and a distinctly quantum-wire-like dependence of the threshold current on the laser cavity orientation. The maximal modal gains for lasing in the ground-state with the cavity perpendicular to the dash direction are determined to be 15 cm-1 for single-stack and 22 cm-1 for five-stack lasers  相似文献   

7.
A report is presented on the regenerative switching characteristics of a novel AlGaAs/GaAs quantum-well heterojunction bipolar transistor (QWHBT) with an electrically or optically controlled base grown by molecular beam epitaxy (MBE). This double-barrier QWHBT exhibits excellent electrical switching characteristics of 7 V and 0.03 A/cm2 at the switching condition and 4.5 V and 3.2 A/cm2 at the holding condition. When the device is operating as an optical switch, the optical base-controlled sensitivity is 6×10 -3 V/μW. The effects of temperature on the device performance were evaluated at 77 and 300 K. The results show that it may be used as an all-optical switch (flip-flop) for optical parallel image processing  相似文献   

8.
The linewidth enhancement factor of an InGaAs/InGaAsP strained multiquantum well optical amplifier was measured interferometrically. It varied from 3 to 18 over the wavelength range from 1500 to 1600 nm with injection currents varying from one to four times the lasing threshold of the uncoated device. A rate equation model gave differential gain and refractive index change per carrier, respectively, in the range 0.3 to 2.5×10-15 cm2 and -5 to -8×10-20 cm3  相似文献   

9.
Long-wavelength (λ=13.3 μm) unipolar lasing at 283 K from self-organised In0.4Ga0.6As/GaAs quantum dots, due to intersubband transitions in the conduction band, is demonstrated for the first time. The threshold current density under continuous wave operation is 1.1 kA/cm2 for a 60 μm×1.2 mm broad-area plasmon-enhanced waveguide device and the maximum power output is ≈ μW. The long intersubband relaxation time in quantum dots, together with the short lifetime in the ground state, due to interband stimulated emission, help to achieve the necessary population inversion and gain  相似文献   

10.
The frequency response of a 1.55-μm distributed feedback (DFB) laser is measured by injecting light which has an orthogonal polarization to the laser's lasing mode. The injected light, termed as orthogonal polarization light, is carefully selected to not couple to the lasing mode by adjusting its polarization to be orthogonal to that of the lasing mode and by setting its wavelength slightly different from that of the lasing mode. The wavelength of the orthogonal polarization light, however, is set within the range where the laser's active layer has a gain. The gain saturation coefficients for the lasing light are estimated to be 4.7×10-23 cm2 and that by the injected orthogonal polarization light (almost the same wavelength as the lasing mode) are 3.7×10-23 cm2, respectively  相似文献   

11.
The lasing operation of three-quantum-well GaInNAs stripe geometry lasers grown by MOCVD on 0° and 6° misoriented (100) GaAs substrates, respectively, have been demonstrated and their performance is compared for the first time. Both devices achieved room temperature, pulsed lasing operation at an emission wavelength of 1.17 μm, with a threshold current density of 667 A/cm2 for lasers grown on 6° misoriented substrates, and 1 kA/cm2 for lasers grown on 0° misoriented substrates. The threshold for the lasers grown on 6° misoriented substrates compares favorably with the best results for GaInNAs lasers. Lasers with narrower stripe width and a planar geometry have also been demonstrated by the use of lateral selective wet oxidation for current confinement, with a threshold current density of 800 A/cm2 for 25-μm-wide devices  相似文献   

12.
Data are presented on continuous wave operation of two-stack quantum dot lasers designed with reduced temperature sensitivity in their threshold. The InAs quantum dots are designed to have a wide energy spacing (~102 meV) between the ground and first excited radiative transitions. Selectively oxidized stripe lasers have continuous wave threshold currents as low as 1.2 mA for 2 μm wide stripes and minimum threshold current densities of 26 A/cm2 for 13-μ-m wide stripes. Broad area lasers have continuous wave threshold current densities as low as 40 A/cm2, even for p-up mounting. Ground state lasing is obtained up to the highest temperature measured of 326 K  相似文献   

13.
A vertical p-i-n diode is made for the first time in InP:Fe using megaelectronvolt energy ion implantation, A 20-MeV Si implantation and kiloelectronvolt energy Be/P coimplantation are used to obtain a buried n+ layer and a shallow p+ layer, respectively. The junction area of the device is 2.3×10-5 cm2 and the intrinsic region thickness is ≈3 μm. The device has a high breakdown voltage of 110 V, reverse leakage current of 0.1 mA/cm2 at -80 V, off-state capacitance of 2.2 nF/cm2 at -20 V, and a DC incremental forward resistance of 4 Ω at 40 mA  相似文献   

14.
Continuous-wave operation of etched-facet InGaN/GaN multiquantum-well ridge-waveguide laser diodes grown by low pressure MOVPE on a sapphire substrate has been achieved on-wafer for >2 min at 15% above threshold. The threshold current density and voltage were 9.1 kA/cm2 and 7.6 V, respectively, at 15°C, and the lasing wavelength was 400.6 nm  相似文献   

15.
Very low threshold current density InGaAs/GaAs quantum well laser diodes grown by molecular beam epitaxy on InGaAs metamorphic buffers are reported. The lasing wavelength of the ridge waveguide laser diode with cavity length of 1200 mum is centered at 1337.2 nm; the threshold current density is 205 A/cm2 at room temperature under continuous-wave operation.  相似文献   

16.
Continuous-wave (CW) lasing operation with a very low threshold current density (Jth=32.5 A/cm2) has been achieved at room temperature by a ridge waveguide quantum-dot (QD) laser containing a single InAs QD layer embedded within a strained InGaAs quantum well (dot-in-well, or DWELL structure). Lasing proceeds via the QD ground state with an emission wavelength of 1.25 μm when the cavity length is longer than 4.2 mm. For a 5-mm long QD laser, CW lasing has been achieved at temperatures as high as 40°C, with a characteristic temperature T0 of 41 K near room temperature. Lasers with a 20 μm stripe width have a differential slope efficiency of 32% and peak output power of >10 mW per facet (uncoated)  相似文献   

17.
4H-SiC gate turn-off thyristors (GTOs) were fabricated using the recently developed inductively-coupled plasma (ICP) dry etching technique. DC and ac characterisation have been done to evaluate forward blocking voltage, leakage current, on-state voltage drop and switching performance. GTOs over 800 V dc blocking capability has been demonstrated with a blocking layer thickness of 7 μm. The dc on-state voltage drops of a typical device at 25 and 300°C were 4.5 and 3.6 V, respectively, for a current density of 1000 A/cm2. The devices can be reliably turned on and turned off under an anode current density of 5000 A/cm2 without observable degradation  相似文献   

18.
The maximum available CW optical power from the AlGaAs window stripe laser was investigated both theoretically and experimentally. It is found that a thin third AlGaAs layer thickness and high-quality pulsed lasing characteristics, such as low threshold current density and high external differential quantum efficiency, which are obtained from refractive index guiding and short window-region length, are necessary to increase CW optical power. Stable fundamental lateral transverse mode CW operation was achieved at 55 mW (∼4.7 MW/cm2) in a window stripe (WS) laser with 3 μm stripewidth, which is about five times higher than the typical catastrophic optical damage (COD) threshold in conventional structure lasers. It was also found that a high-quality window stripe laser with 3 μm stripewidth operated at 30 mW (∼2.6 MW/cm2) for more than 3500 h.  相似文献   

19.
The lasing mode behavior of a multiple quantum well (MQW) distributed feedback (DFB) laser was measured when intensity-modulated orthogonally polarized transverse magnetic (TM) mode light was injected. The 3-dB bandwidth of the frequency response shows a trend different from that observed with conventional bias current modulation: at high bias currents, it decreases with increasing bias current. The maximum bandwidth of 3 dB was observed when the normalized bias current was 4, and it reached 16 GHz at this bias current. The gain saturation coefficients for the transverse electric (TE) and TM modes estimated from these results were ∈pE; 2.5×10-17 cm3 and ∈qE 5.7×10-18 cm3 for the TE mode, and ∈pM: 6.0×10-17 cm3 and ∈qM: 2.0×10-14 cm3 for the TM mode  相似文献   

20.
We demonstrate high-performance InGaAsPN quantum well based long-wavelength lasers grown on GaAs substrates, nitrogen containing lasers emitting in the λ=1.2- to 1.3-μm wavelength range were grown by gas source molecular beam epitaxy using a RF plasma nitrogen source. Under pulsed excitation, lasers emitting at λ=1.295 μm exhibited a record low threshold current density (JTH) of 2. 5 kA/cm2. Lasers grown with less nitrogen in the quantum well exhibited significantly lower threshold current densities of JTH =1.9 kA/cm2 at λ=1.27 μm and JTH=1.27 kA/cm2 at λ=1.2 μm. We also report a slope efficiency of 0.4 W/A and an output power of 450 mW under pulsed operation for nitrogen containing lasers emitting at 1.2 μm  相似文献   

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