Growth modes of solution-grown CdS thin films

The growth modes of CdS thin films on glass in a chemical bath were analysed using scanning electron microscopy and optical microscopy. The results of these studies show that the film growth occurs by ion-by-ion condensation and by colloidal particles of CdS adhering to the substrate. Both mechanisms are operative from the initial stages of film growth. The predominance of one or other of these two growth modes depends on the abundance of Cd and S ions present in the solution, which is determined by the amount of complexing and sulphurising agents and ammonia used for the controlled release of Cd and S ions into the solution. The growth mode influences the optical properties of the films.     

Recrystallization and sulfur diffusion in CdCl2-treated CdTe/CdS thin films

The role of CdCl₂ in prompting recrystallization, grain growth and interdiffusion between CdS and CdTe layers in physical vapor-deposited CdS/CdTe thin-film solar cells is presented. Several CdTe/CdS thin-film samples with different CdTe film thicknesses were treated in air at 415°C for different times with and without a surface coating of CdCl₂. The samples were characterized by scanning electron microscopy, transmission electron microscopy, energy dispersive x-ray spectroscopy, x-ray diffractometry and optical absorption. The results show that CdCl₂ treatment enhances the recrystallization and diffusion processes, leading to a compositional variation within the CdTe layer due to diffusion of sulfur from the CdS. The highest sulfur concentrations observed after 30 min treatments with CdCl₂ at 415°C are near the solubility limit for sulfur in CdTe. The compositional distributions indicated by x-ray diffraction measurements of samples with different CdTe thickness show that the S-rich CdTe_1−xS_x region lies near the CdTe/CdS interface. A multiple-step mixing process must be inferred to account for the diffraction profiles obtained. © 1997 John Wiley & Sons, Ltd.     

Modification of the dark and photoconductivity and the optical transmittance of solution-grown CdS thin films

Very interesting behaviour is shown by chemically deposited CdS thin films for optoelectronic applications after air and vacuum (10^?5 Torr) annealing. Vacuum annealing of samples at about 100°C caused the dark conductivity to improve by five orders of magnitude. The dark and photoconductivity of air-annealed (at around 200°C) samples increased by seven and two orders of magnitude respectively. Air-annealed (at 350°C for about 2 min) samples exhibited a very quick photoresponse (<2 s for two decades of photocurrent decay) with σ_p/σ_d ≈ 10⁵ for a bias of 10 V, which may be exploited for photodetector applications. Air or vacuum annealing of samples for a minimum of 10–15 min caused the optical transmittance above the band edge to increase by 10%–15% and annealing the sample at 200°C caused the absorption edge to shift towards the longer-wavelength region compared with the as-prepared and 100 and 350°C annealed films.     

CdS微晶掺杂TiO2—SiO2复合薄膜的非线性光学特性

采用溶胶－凝胶方法在普通的载玻片上制备了ＣｄＳ微晶掺杂的ＴｉＯ２－ＳｉＯ２复合薄膜。用正硅酸乙酯、钛酸丁酯、醋酸镉作原料，比较了硫脲和硫化乙氨的硫化作用。不同热处理温度、时间的吸收光谱表明，薄膜中存在着量子尺寸效应。采用Ｚ－Ｓｃａｎ技术测量了薄膜的非线性吸收及非线性折射率。     

Optical spectroscopy of thin C60:CdS composite films

The fabrication procedure, structure, and optical spectroscopy data for thin composite films based on a fullerene material with a 0.5–10% cadmium-sulfide impurity content are reported. The technology for producing structures with a composition gradient in a single vacuum cycle is developed. The samples are studied by atomic-force microscopy, Raman spectroscopy, and photoluminescence measurements. At the optimal CdS content, charge transfer to fullerene molecules is observed. This effect is apparently responsible for the zero-barrier polymerization of the films. In the photoluminescence spectra of the composite films, a 0.09–0.11 eV shift of the peak to shorter wavelengths and an increase in the photoluminescence intensity in comparison to the photoluminescence peak position and intensity in pure fullerene samples are detected. The composite structures with a CdS-content gradient through their thickness exhibit rectifying current-voltage characteristics.     

The influence of substrate temperature on RF sputtered CdS thin films and CdS/p-Si heterojunctions

Cadmium sulfide (CdS) thin films were deposited onto soda lime glasses and p-Si semiconductors at various substrate temperatures (40, 150 and 275 °C) by radio frequency (RF) sputtering technique. The effect of substrate temperature on morphological, structural and optical properties of CdS thin films were analyzed by means of atomic force microscopy (AFM), x-ray diffraction (XRD) and uv–vis spectrum data. The results showed that the average roughness (R_a) of thin films increased from 2.0 to 4.0 nm and all films had hexagonal wurtzite structure. The optical band gaps of CdS thin films varied between 2.46–2.43 eV. Characteristic parameters of CdS/p-Si heterojunctions including ideality factor, barrier height, series resistance and rectification ratio were measured. It was seen that both ideality factor and barrier height values of the heterojunctions increase with the increase substrate temperature. It was attributed to increase in inhomogenity of the thin films. Furthermore, the photoelectrical parameters of CdS/p-Si heterojunctions were studied.     

沉积温度对多元醇法制备硫化镉薄膜的影响

CdS thin films were successfully deposited onto glass substrates for the first time by the polyol method using cadmium acetate, thiourea and diethylene glycol as the raw materials. The effects of the deposition tempera- ture from 120 to 200 ℃ in steps of 20 ℃on the structure, morphology and optical properties of the resultant films were investigated. It was found that the crystallinity was improved and the value of the surface average roughness was decreased with increasing the deposition temperature. The average grain sizes of the CdS thin films were 77.16 and 76.61 nm at 140 and 180 ℃, respectively. All samples showed excellent transmittance and the band gaps were found to reduce from 2.55 to 2.45 eV with the increase of the deposition temperature, which was attributed to the improvement of crystallinity.     

A study of the physical properties of sprayed CdS thin films

CdS films have been prepared by spray pyrolysis and characterized by several methods. The spray solution is made of cadmium chloride or cadmium acetate and thiourea. Optical and compositional properties and structure of the CdS films have been investigated. An analysis of the film's structure, preferred cyrstallographic orientation and presence of impurity phases have been obtained using X-ray diffraction technique as well as infrared spectroscopy. The visible absorption measurements have been carried out for the study of the impurity phases. Quantitative Auger analysis shows the composition of the spray solution and a post-spray heat treatment have also been investigated.     

Identification of the impurity phase in chemically deposited CdS thin films

Identification of the impurity phase present in chemically deposited CdS thin films and in the precipitate used for screen printing CdS/CdTe solar cells is reported in this paper. X-ray diffraction (XRD) studies of the films and the precipitate showed that the impurity phase is a mixture of cadmium oxide sulphate (Cd₃O₂SO₄) and cadmium oxide (CdO). Analysis of the films and the powders obtained using thiourea (TU) and thioacetamide (TA) as sulphursing agents showed that the impurity phase is predominantly present when TU is used in the chemical bath. The high conductivity shown by chemically deposited CdS films (using TU) when annealed at higher temperatures in air is attributed to the predominance of the conducting CdO phase in the film.     

溶液PH值对CdS薄膜结构特性的影响

采用化学水浴沉积(CBD)工艺在玻璃衬底上制 备CdS薄膜,研究溶液PH值对CdS 薄膜结构特性的影响。薄膜的厚度、组份、晶相结构和表观形貌分别由台阶仪、X射线荧光 光谱(XRF)、X射线衍射(XRD)和场发射扫描电子显微镜(FESEM)来表征。溶液的 PH值为11.26、 11.37和11.48时,CdS薄膜的晶相以六方相为主,薄膜的厚度先增大后减小; PH值为11.62、11.66时,薄膜的晶相以立方相为主,薄 膜的厚度进一步减小。同时,随着溶液PH值 增大,CdS薄膜的晶格常数也逐渐增大。两种晶相的CdS薄膜缓冲层与CIGS薄膜分别构成异 质 对形成异质结时的晶格失配分别为32.297%和1.419%,界面态密度分别为2.792×10¹⁴和8.507×10¹²,因此高效CIGS薄 膜太阳电池更需要立方相的CdS薄膜。     

不同柔性衬底上CdS薄膜退火前后的性能比较

采用磁控溅射法分别在柔性PI衬底、柔性AZO衬底和柔性ITO衬底上制备CdS薄膜,并在干燥空气中以CdCl2为源380℃退火,分别研究了不同柔性衬底及退火工艺对CdS薄膜形貌、结构和光学性能的影响。研究结果表明:退火前在不同柔性衬底上的CdS薄膜形貌依赖于衬底类型,退火后CdS薄膜的晶粒再结晶,晶粒度增大明显,且不再依赖于衬底类型。不同柔性衬底上CdS薄膜均为立方相和六角相的混相结构,退火后,六角相比例增大,薄膜的结晶质量提高。透过率退火后改善明显,其中,在柔性AZO衬底上的CdS薄膜透过率超过80%。     

低温磁控溅射制备CdS薄膜的结构和光学特性

用磁控溅射的方法在透明导电氧化物衬底上制备了CdS薄膜,制备时的衬底温度为30~200℃.X射线衍射测试结果表明在这一条件下制备的CdS薄膜是六角纤锌矿的多晶结构.扫描电子显微镜结果显示薄膜具有较好的晶体质量,这一结论也和拉曼光谱、紫外-可见吸收光谱、光致发光光谱的结果一致.拉曼光谱显示CdS薄膜内部的压应力随着制备温度的提高而增大.     

氧化热处理对VO2薄膜特性的影响研究

采用直流磁控溅射法,结合氧化法热处理在硅基底上制备VO2薄膜,通过SEM、XRD、XPS、FTIR红外透射率等测试,从多角度分析了氧化热处理对VO2薄膜截面结构、晶相成分、成分价态、红外透射率相变特性的影响。实验分析表明,采用直流磁控溅射与氧化热处理相结合的方法,可获得主要成分为具有明显择优取向单斜金红石结构VO2(011)晶体的氧化钒薄膜,氧化热处理有利于VO2晶粒生长并增加薄膜致密性,同时其红外透射率具有明显相变特性,相变温度为60.5 ℃,3~5 m、8~12 m波段的红外透射率对比值达到99.5%,实现了对红外波段辐射的开关功能,适合应用于红外探测器的激光防护研究,同时可为深入研究对薄膜的氧化热处理提供参考依据。     

Preparation of thin-film transistors with chemical bath depositedCdSe and CdS thin films

The authors have fabricated the thin-film transistor (TFT) with CdSe and CdS semiconductor thin films, prepared by a low temperature chemical bath deposition (CBD) method, as an active layer. The ON-current values of the CdSe-TFTs and CdS-TFTs at a gate bias of 10 V and a source-drain voltage of 10 V are about 100 μA and 5 μA, respectively. The OFF-current values of the CdSe-TFTs and CdS-TFTs at the source-drain voltage of 10 V are less than 10 pA. The fabricated CdSe-TFTs exhibited a field effect mobility of 15 cm²/V-s, threshold voltage of 3.5 V, subthreshold slope of 0.5 V/dec., and ON/OFF current ratios exceed 10⁷. A field effect mobility of I cm ²/V-s, a threshold voltage of 2.6 V, a subthreshold slope of 0.6 V/dec., and an ON/OFF current ratios exceed 10⁶ were observed for CdS TFTs     

Effects of chemical and electrochemical etching on polycrystalline thin films of CuGaSe2

Electrochemical and, especially, chemical oxidative etching drastically improves the photoresponse of liquid electrolyte/CuGaSe₂-on-Mo junctions. This is expressed in decreased effective doping levels and increased effective minority carrier diffusion lengths. It is accounted for by removal of highly defective surface layers, which also leads to an increase in the barrier height, as judged from a positive shift of the flat band potential (on the electrochemical scale). The etching effects are seen clearly in Zn/CuGaSe₂ devices, by electron beam-induced current. This last method also reveals a supra-grain structure, which is tentatively explained by thermal stress-induced strain at the Mo-CuGaSe₂ interface.     

Effects of the Cd:Zn:S molar ratio and heat treatment on the optical and photoluminescence properties of nanocrystalline CdZnS thin films

Nanocrystalline cadmium zinc sulfide thin films with different molar ratios were prepared by sol–gel dip-coating in a polyethyleneglycol matrix. After heat treatment in air at 250, 350 and 450 °C, the thin films were characterized by studying their structural, morphological, compositional, optical (linear and nonlinear) and photoluminescence (PL) properties. According to X-ray diffraction (XRD) results, the samples are polycrystalline with a hexagonal crystal structure and an average grain size of 12–18 nm. The surface morphology of the films was examined by scanning electron microscopy (SEM). The results show that the films consist of nanocrystalline grains included in clusters with uniform coverage over the substrate surface. To determine their chemical composition, X-ray photoelectron spectra (XPS) of composite films were measured. The transmittance and bandgap of the films increased with the Zn concentration and decreased with increasing annealing temperature. The refractive index of the films was measured and the related dispersion is discussed in terms of the Wemple–DiDomenico single oscillator model. The third-order nonlinear polarizability of the films was estimated using a semi-empirical relation based on the single oscillator model. The results show that the films are suitable as optical switches. PL spectra were recorded for an excitation wavelength of 210 nm. The emission intensity for the films varied with the Zn ratio and the annealing temperature and the behavior of different peaks is discussed.     

Effects of Sb,Zn doping on structural,electrical and optical properties of SnO2 thin films

Highly transparent, low resistive pure and Sb, Zn doped nanostructured SnO₂ thin films have been successfully prepared on glass substrates at 400° C by spray pyrolysis method. Structural, electrical and optical properties of pure and Sb, Zn doped SnO₂ thin films are studied in detail. Powder X-ray diffraction confirms the phase purity, increase in crystallinity, size of the grains (90–45 nm), polycrystalline nature and tetragonal rutile structure of thin films. The scanning electron microscopy reveals the continuous change in surface morphology of thin films and size of the grains decrease due to Sb, Zn doping in to SnO₂. The optical transmission spectra of SnO₂ films as a function of wavelength confirm that the optical transmission increases with Sb, Zn doping remarkably. The optical band gap of undoped film is found to be 4.27 eV and decreases with Sb, Zn doping to 4.19 eV, 4.07 eV respectively. The results of electrical measurements indicate that the sheet resistance of the deposited films improves with Sb, Zn doping. The Hall measurements confirm that the films are degenerate n-type semiconductors.     

The influence of bath composition on the photocurrent response and morphology of chemically deposited CdS thin films

The influence of the chemical bath composition on the photocurrent response, film morphology and optical transmittance of chemically deposited CdS thin films is reported. The bath parameters such as concentrations of triethanolamine, thiourea, ammonia and cadmium acetate and the bath temperature controlled the photosensitivity, photocurrent decay, morphology and optical transmittance of the films. The optimum concentration of the bath for getting good-quality photosensitive films with good optical transmittance was identified in this investigation.     

热处理对TaN薄膜电性能的影响

采用直流磁控溅射法在Al2O3陶瓷基片上制备了TaN薄膜,研究了热处理温度和时间对TaN薄膜的方阻(R□)及电阻温度系数(TCR)的影响。研究发现,在热处理时间为2h的条件下,热处理温度在200℃到600℃变化时,R□从12?/□增加到24?/□,TCR从15×10-6/℃下降到-80×10-6/℃;在热处理温度为300℃的条件下,热处理时间对R□及TCR影响较小,随着热处理时间的增长,R□及TCR略有变化。     

电子束蒸发法制备CdS多晶薄膜及其结构和光学性质

采用电子束蒸发法在玻璃衬底上制备了具有较高结晶度和优异透光性能的CdS多晶薄膜,对制备样品的结构和光学性质进行了表征。结果表明,制备薄膜属于六方相多晶结构,沿（002）晶向择优取向生长。此外,随着衬底温度的升高,样品结晶质量先提高后降低,与薄膜厚度变化有关。紫外-可见透过谱显示,随着衬底温度的升高,薄膜的光吸收边趋于陡直,但光学带隙呈现波动变化,分布在2.389-2.448 eV之间。对样品进行光致发光谱测试表明,CdS薄膜发光锋展宽严重,仅在1.60 eV附近有一个微弱的红光发射。论文对上述实验结果进行了分析和讨论。