All-metal high-isolation series and series/shunt MEMS switches

This paper presents a novel all-metal series switch with several different pull-down electrode geometries. The switch results in an up-state capacitance of 5-9 fF and an isolation of -25 to -30 d8 at 10 GHz. The fabrication process is completely compatible with the standard capacitive (or dc-contact) shunt switch, A dc-30 GHz series/shunt switch is also presented with an isolation of -60 dB at 5 GHz and -42 dB at 10 GHz. This is the highest isolation switch available to-date. The performance is limited by radiation in the CPW lines and not by the series/shunt switch characteristics. The application areas are in high-isolation switches for basestations and satellite systems     

High-isolation CPW MEMS shunt switches. 2. Design

For pt.1 see ibid., vol.48, no.6, p.1045-1052 (2000). In this paper, the second of two parts, the equivalent RLC model of the shunt switch is used in the design of tuned two- and four-bridge “cross” switches from 10 to 40 GHz. The cross switch attained an insertion loss of less than 0.3-0.6 dB, a return loss below -20 dB from 22 to 38 GHz in the up state, and a down-state isolation of 45-50 dB with only 1.5 pF of down-state capacitance (C_d). Also, an X-band microelectromechanical system (MEMS) switch with an insertion loss of less than 0.2 dB and an isolation of 35 dB is presented. This is done by inductively tuning the LC series resonance of the shunt switch. The MEMS bridge height is 1.5-2.5 μm, resulting in a pull-down voltage of 15-25 V. Application areas are in low-loss high-isolation communication and radar     

RF MEMS开关的设计分析

针对具有低损耗、高隔离度性能的微机电系统(Micro-Electro-Mechanical System,MEMS)开关,介绍了串联DC式和并联电容式的开关结构模型,并对并联电容式MEMS开关的工作原理、等效电路模型和制造工艺流程进行了描述,利用其模型研究了开关的微波传输性能,设计了一款电容耦合式开关并进行了仿真。由仿真结果可得,开关"开态"时的插入损耗在40 GHz以内优于-0.3 dB;开关"关态"时的隔离度在20～40 GHz相对较宽的频带内优于-20 dB。     

高隔离度宽频带MEMS双膜桥开关

利用一种新型双边加直流驱动电极的电容耦合式MEMS并联膜开关与直接接触式并联膜开关进行级联,形成MEMS双膜开关.通过对其尺寸和结构的优化,降低开关阈值电压,Coventor软件模拟表明,开关的阈值电压小于20V;通过对其匹配设计改善开关的高频性能,HFSS软件模拟的结果表明,在DC～20GHz整个频带内,开关的插入损耗优于-0.1dB,反射损耗低于-30dB,隔离度低于-20dB,在 谐振点处隔离度能达到-40dB.     

DCDC—20GHz射频MEMS开关

描述了 DC— 2 0 GHz射频 MEMS开关的设计和制造工艺 .开关为一薄金属膜桥组成的桥式结构 ,形成一个单刀单掷 (SPST)并联设置的金属 -绝缘体 -金属接触 .开关通过上下电极之间的静电力进行控制 ,其插入损耗及隔离性能取决于开态和关态的电容 .测试结果如下 :射频 MEMS开关驱动电压约为 2 0 V,在“开”态下 DC— 2 0 GHz带宽的插入损耗小于 0 .6 9d B;在“关”态下在 14— 18GHz时隔离大于 13d B,在 18— 2 0 GHz时隔离大于 16 d B.本器件为国内首只研制成功的宽带射频 MEMS开关     

Wideband DC-contact MEMS series switch

The demonstration of a wideband DC-contact MEMS series switch on an alumina substrate is reported. The switch is based on a cantilever beam design. The tip of the cantilever beam was formed into a fork tip design, and its RF performance was measured and compared with a regular rectangular tip. This design reduced up-state capacitance from 10 to 3.8 fF. The beam with fork tip exhibited high isolation: -39, -32 and -17.3 dB at 5, 10 and 77 GHz, respectively. The measured insertion loss was -0.142, -0.172 and 0.36 dB at 5, 10 and 77 GHz, respectively. The switch had low actuation voltage (⩽39 V) and a relatively fast switching time of 45 s. To our knowledge, this is the first demonstration of a high-performance cantilever beam design DC-contact MEMS series switch at W-band frequencies.     

A novel loss compensation technique analysis and design for 60 GHz CMOS SPDT switch

A novel loss compensation technique for a series-shunt single-pole double-throw (SPDT) switch is presented operating in the 60 GHz. The feed-forward compensation network which is composed of an NMOS, a couple capacitance and a shunt inductance can reduce the impact of the feed forward capacitance to reduce the insertion loss and improve the isolation of the SPDT switch. The measured insertion loss and isolation characteristics of the switch somewhat deviating from the 60 GHz are analyzed revealing that the inaccuracy of the MOS model can greatly degrade the performance of the switch. The switch is implemented in TSMC 90-nm CMOS process and exhibits an isolation of above 27 dB at transmitter mode, and the insertion loss of 1.8-3 dB at 30-65 GHz by layout simulation. The measured insertion loss is 2.45 dB at 52 GHz and keeps<4 dB at 30-64 GHz. The measured isolation is better than 25 dB at 30-64 GHz and the measured return loss is better than 10 dB at 30-65 GHz. A measured input 1 dB gain compression point of the switch is 13 dBm at 52 GHz and 15 dBm at 60 GHz. The simulated switching speed with rise time and fall time are 720 and 520 ps, respectively. The active chip size of the proposed switch is 0.5×0.95 mm².     

一种DC～5GHz串联微波开关的温度特性和功率处理能力的测试与分析

描述了一种串联微波MEMS开关的设计、制造过程,它制作在玻璃衬底上,采用金铂触点,在DC～5GHz,插损小0.6dB,隔离度大于30dB,开关时间小于30μs.对这种微波开关的温度特性和功率处理能力进行了测试,在DC～4GHz,85℃下的插损增加了0.2dB,-55℃下的插损增加了0.4dB,而隔离度基本保持不变.在开关中流过的连续波功率从10dBm上升到35.1dBm,开关的插损下降了0.1～0.6dB,并且在35.1dBm(3.24W)下开关还能工作.和所报道的并联开关最大处理功率(420mW)相比,该结果说明串联开关具有较大的功率处理能力.     

$Ka$-Band Low-Loss and High-Isolation Switch Design in 0.13-$mu{hbox {m}}$ CMOS

This paper presents designs and measurements of Ka-band single-pole single-throw (SPST) and single-pole double-throw (SPDT) 0.13-CMOS switches. Designs based on series and shunt switches on low and high substrate resistance networks are presented. It is found that the shunt switch and the series switch with a high substrate resistance network have a lower insertion loss than a standard designs. The shunt SPST switch shows an insertion loss of 1.0 dB and an isolation of 26 dB at >35 GHz. The series SPDT switch with a high substrate resistance network shows excellent performance with 2.2-dB insertion loss and isolation at 35 GHz, and this is achieved using two parallel resonant networks. The series-shunt SPDT switch using deep n-well nMOS transistors for a high substrate resistance network results in an insertion loss and isolation of 2.6 and 27 dB, respectively, at 35 GHz. For series switches, the input 1-dB compression point (1P₁) can be significantly increased to with the use of a high substrate resistance design. In contrast, of shunt switches is limited by the self-biasing effect to 12 dBm independent of the substrate resistance network. The paper shows that, with good design, several 0.13- CMOS designs can be used for state-of-the-art switches at 26-40 GHz.     

Inline capacitive and DC-contact MEMS shunt switches

This paper presents inline capacitive MEMS shunt switches suitable for X/K-band and Ka/V-band applications. The inline switch allows for a low- or high-inductance connection to the ground plane without changing the mechanical characteristics of the MEMS bridge. Excellent isolation and loss are achieved with this design, and the performance is very similar to the standard capacitive MEMS shunt switch. Also, a new metal-to-metal contact MEMS shunt switch is presented. A novel pull-down electrode is used which applies the electrostatic force at the same location as the metal-to-metal contact area. A contact resistance of 0.15-0.35 Ω is repeatable, and results in an isolation of -40 dB at 0.1-3 GHz. The measured isolation is still better than -20 dB at 40 GHz. The application areas are in high-isolation/low-loss switches for telecommunication and radar systems     

A high-performance 40-85 GHz MMIC SPDT switch using FET-integrated transmission line structure

A compact ultra-broadband distributed SPDT switch has been developed using GaAs PHEMTs. An FET-integrated transmission line structure, where the source pad of the shunt FET has been integrated into the signal line while the drain has been grounded to a via-hole with minimum parasitic inductance, has been proposed to extend the operating bandwidth of the distributed switches. SPDT and SPST switches using this structure have been fabricated using a commercial GaAs PHEMT foundry. The SPDT switch showed low insertion loss (<2 dB) and good isolation (>30 dB) over an octave bandwidth from 40 to 85 GHz. At 77 GHz, the SPDT switch showed extremely low insertion loss of 1.4 dB and high isolation of 38 dB. The chip size was as small as 1.45/spl times/1.0 mm/sup 2/. To the best of our knowledge, this is among the best performance ever reported for an octave-band SPDT switch at this frequency range. SPST switch also showed the excellent performance with the insertion loss of 0.4 dB and isolation of 34 dB at 60 GHz.     

高隔离度X波段RF MEMS电容式并联开关

研究了一种新型的、应用于X波段的高隔离度RF MEMS电容式并联开关结构。相比于普通的并联结构,该开关通过共面波导(CPW)传输线与地平面之间的衬底刻槽结构将隔离度提高了7dB,关态时在13.5GHz谐振频率处的隔离度为-54.6dB,执行电压为26V。弹簧梁结构开关的执行电压下降为14V,在11GHz处其隔离度为-42.8dB。通过两个并联开关级联与开关间的高阻传输线构成的π型调谐开关电路,在11.5GHz处的隔离度为-81.6dB。     

High-isolation W-band MEMS switches

This paper presents the design, fabrication and measurement of single, T-match and π-match W-band high-isolation MEMS shunt switches on silicon substrates. The single and T-match design result in -20 dB isolation over the 80-110 GHz range with an insertion loss of 0.25±0.1 dB. The π-match design results in a reflection coefficient lower than -20 dB up to 100 GHz, and an isolation of -30 to -40 dB from 75 to 110 GHz (limited by leakage through the substrate). The associated insertion loss Is 0.4±0.1 dB at 90 GHz. To our knowledge, this is the first demonstration of high-performance MEMS switches at W-band frequencies     

DC－40GHzMMIC开关

ＤＣ－４０ＧＨｚＭＭＩＣ开关叶禹康，俞土法，伍祥冰（南京电子器件研究所，２１００１６）提要＊用微波单片集成电路（ＭＭＩＣ）技术设计制作了高隔离度、超快速ＤＣ－４０ＧＨｚＭＭＩＣ开关（ＳＰＳＴ）。开关采用串联、并联单元ＭＥＳＦＥＴ兼用的电路结构。芯片尺...     

DC－40GHzMMIC开关

ＤＣ－４０ＧＨｚＭＭＩＣ开关叶禹康，俞土法，伍祥冰（南京电子器件研究所，２１００１６）提要＊用微波单片集成电路（ＭＭＩＣ）技术设计制作了高隔离度、超快速ＤＣ－４０ＧＨｚＭＭＩＣ开关（ＳＰＳＴ）。开关采用串联、并联单元ＭＥＳＦＥＴ兼用的电路结构。芯片尺...     

RF MEMS开关工艺技术研究

RFMEMS开关是用MEMS技术形成的新型电路元件,与传统的半导体开关器件相比具有插入损耗低、隔离度大等优点,将对现有雷达和通信中RF结构产生重大影响。文章介绍了RFMEMS开关的基本工艺流程设计,工艺制作技术的研究。实验解决了种子层技术、聚酰亚胺牺牲层技术、微电镀技术的工艺难题,制作出了RFMEMS开关样品,基本掌握了RFMEMS器件的制作工艺技术。RFMEMS开关样品测试的技术指标为:膜桥高度2μm～3μm、驱动电压<30V、频率范围0～40GHz、插入损耗≤1dB、隔离度≥20dB,样品参数性能达到了设计要求。     

Fabrication, assembly, and testing of RF MEMS capacitive switches using flexible printed circuit technology

A novel approach for cost effective fabrication, assembly, and packaging of radio-frequency microelectromechanical systems (RF MEMS) capacitive switches using flexible circuit processing techniques is reported. The key feature of this approach is the use of most commonly used flexible circuit film, Kapton-E polyimide film, as the movable switch membrane. The physical dimensions of these switches are in the mesoscale range. For example, electrode area and gap height of a capacitive shunt switch on coplanar waveguide are 2 /spl times/ 1 mm/sup 2/ and 43 /spl mu/m, respectively. Pull-down voltage is in the range of 90-100 V. In the ON state (up-position), the insertion loss is less than 0.3-0.4 dB up to 30 GHz. In OFF state (down-position), the isolation value is about 15 dB at 12 GHz and increases to 36 dB at 30 GHz. These switches are uniquely suitable for batch integration with printed circuits and antennas on laminate substrates.     

高隔离度S波段MEMS膜桥开关

常规的 MEMS膜桥开关在 1 0 GHz以上频段才具有低插损、高隔离度 (>2 0 d B)的优点。文中介绍了一种应用于微波低频段—— S波段的高隔离 MEMS膜桥开关 ,给出了开关的设计与优化方法 ,建立了开关的等效电路模型。通过双膜桥结构、选择高介电常数的介质膜、微电感结构膜桥这些措施 ,达到提高开关隔离度的目的。利用 HFSS软件仿真的结果表明 ,该开关在微波低频段 (3～ 6GHz)有着很好的隔离性能。开关样品在片测试的电性能指标 :插损 <0 .3 d B,隔离度 >40 d B,驱动电压 <2 0 V     

A low-loss single-pole six-throw switch based on compact RF MEMS switches

A low-loss single-pole six-throw (SP6T) switch using very compact metal-contact RF microelectromechanical system (MEMS) series switches is presented. The metal-contact MEMS switch has an extremely compact active area of 0.4 mm /spl times/ 0.3 mm, thus permitting the formation of an SP6T MEMS switch into the RF switch with a total area of 1 mm/sup 2/. The MEMS switch shows an effective spring constant of 746 N/m and an actuation time of 8.0 /spl mu/s. It has an isolation loss from -64.4 to -30.6dB and an insertion loss of 0.08-0.19 dB at 0.5-20 GHz. Furthermore, in order to evaluate RF performances of the SP6T MEMS switch, as well as those of the single-pole single-throw RF MEMS series switch, we have performed small-signal modeling based on a parameter-extraction method. Accurate agreement between the measured and modeled RF performances demonstrates the validity of the small-signal model. The SP6T switch performed well with an isolation loss from -62.4 to -39.1dB and an insertion loss of 0.19-0.70 dB from dc to 6 GHz between the input port and each output port.     

X-波段MEMS单刀双掷开关的研究

利用X-波段MEMS单刀单掷膜开关和成熟的微带线技术设计了一种X-波段MEMS单刀双掷膜开关,其模拟结果为;阈值电压为19V左右,工作频率为8～12GHz,在中心频率（10GHz）处,导通开关的插入损耗为-0．2dB,截止开关的隔离度为-21dB,开关的回波损耗为-43dB。