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研究了基片温度、溅射功率对采用射频溅射沉积在(1102)蓝宝石基片上的CeO2薄膜生长的影响.过低的沉积温度、溅射功率都会导致CeO2薄膜呈[111]取向生长.在基片温度为700~750 ℃,溅射功率为100~150 W,溅射气压为14 Pa下沉积了高质量[00l]取向的CeO2缓冲层.通过X射线衍射和原子力显微镜表征CeO2薄膜的结构和表面形貌.在最优化条件下制备的CeO2薄膜具有优良的面内面外取向性和平整的表面.在CeO2缓冲层上制得的YBa2Cu3O7-δ(YBCO)超导薄膜为完全[00l]取向,面内取向性良好,并具有优越的电学性能,其临界转变温度(Tc)为89.5 K,临界电流密度Jc(77 K,0T)约为1.8×106 A/cm2,微波表面电阻Rs(77 K,10 GHz)大约为 0.30 mΩ. 相似文献
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在采用直流磁控溅射制备AZO(Aluminum Doped Zinc Oxide,掺铝氧化锌)薄膜的过程中,AZO薄膜的光电性能取决于镀膜过程中的各种工艺参数,包括溅射气压、沉积温度、溅射功率和靶基距等。本文主要研究在固定其它工艺参数不变的情况下,通过改变沉积温度在不同的温度下分别制备AZO薄膜,利用SEM、X射线衍射仪等测试不同AZO薄膜的微观结构,并分析研究不同沉积温度下制备AZO薄膜光电性能及结构的变化特性,以筛选出制备高质量AZO膜的最佳沉积温度。 相似文献
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以AlCrNbSiTiV为靶材,用反应式磁控溅镀系统分别在住友BNX20刀具和硅晶片上沉积高熵合金氮化物(AlCrNbSiTiV)N薄膜。采用田口方法的L9(34)正交表考察了沉积时间、基材偏压、溅射功率和基材温度对沉积速率、薄膜硬度和刀具寿命的影响,通过方差分析(ANOVA)确定了影响各性能的主要因素。对信噪比(S/N)进行灰关联分析以实现多目标优化,得出最佳工艺参数为:沉积时间20min,基材偏压-100V,溅射功率250W,基材温度400°C。在该条件下,沉积速率为17.28nm/min,薄膜硬度达到2814HV,刀具寿命2.50m。 相似文献
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为解决石墨表面制备的不粘涂层结合力低的问题,可采用钛薄膜作为过渡层以提高结合力。本文采用磁控溅射技术在石墨基片表面制备钛薄膜,通过优化溅射工艺参数,提高钛薄膜的附着力。通过正交试验设计研究溅射功率、溅射气压和沉积时间对钛薄膜组织结构、表面粗糙度以及附着力的影响。利用扫描电镜(SEM)等分析了钛薄膜的微观形貌、物相结构及表面粗糙度,进行划格试验评估了薄膜的附着力。研究得到优化工艺参数为:溅射功率200 W,溅射气压1.2 Pa,沉积时间50 min。薄膜微观呈现岛状结构,颗粒尺寸约150 nm。钛薄膜为密排六方α-Ti结构,沿(002)晶面择优生长,这可能与石墨基体的片层状结构有关。溅射工艺参数的优化可以有效提高钛薄膜与石墨基体的附着力。 相似文献
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在采用磁控溅射制备AZO薄膜的过程中,AZO薄膜的光电性能取决于镀膜过程中的各种工艺参数,包括:溅射气压、沉积温度、溅射功率、靶基距等。本文主要研究在固定其它工艺参数不变的情况下,通过改变玻璃基板沉积温度在200℃、250℃、300℃、350℃、400℃、450℃、500℃的情况下分别制备AZO薄膜,通过分析研究玻璃基板沉积温度变化对制备AZO薄膜光电性能及结构的影响,筛选出制备高质量AZO膜的最佳沉积温度。 相似文献
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Katalin Balázsi Csaba Balázsi 《International Journal of Applied Ceramic Technology》2022,19(2):753-761
Titanium carbide-based thin films have been produced by DC magnetron sputtering. It was demonstrated that the same technology with changing of the deposition parameters, such as deposition temperature or power of Ti target, resulted in the preparation of TiC/a:C thin films with various structures. The structure of thin films and volume fraction of amorphous and crystal phases were precisely tailored by the control of deposition parameters. These ceramic nanocomposite TiC/a:C thin films according to their various structures, hence, their different mechanical, tribological, or wetting parameters can be used in wide range of applications. 相似文献
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Aluminum Nitride Thin Films on an LTCC Substrate 总被引:1,自引:0,他引:1
Jung W. Lee Jerome J. Cuomo Yong S. Cho Roupen L. Keusseyan 《Journal of the American Ceramic Society》2005,88(7):1977-1980
Aluminum nitride thin films deposited on a low-temperature co-fired ceramics substrate by reactive magnetron sputtering were investigated with regard to their crystal orientation and microstructural characteristics. Strong c -axis orientations of AlN thin films were observed when either a higher deposition temperature or an RF bias was adopted. This orientation was believed to be responsible for the high thermal conductivity of 26 W/mK for the AlN films deposited at 700°C under 25-W bias. Photoluminescence spectrum in the wavelength range of 350–650 nm was analyzed to prove the involvement of potential oxygen-related defects in the thin films. 相似文献
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《Ceramics International》2016,42(13):14543-14547
Cu(In1−xGax)Se2 (CIGS) thin films were prepared by RF magnetron sputtering from a single quaternary target at multiple processing parameters. The structural, compositional, and electrical properties of the as-deposited films were systematically investigated by XRD, Raman, SEM, and Hall effects analysis. The results demonstrate that by adjusting the processing parameters, the CIGS thin films with a preferential orientation along the (112) direction which exhibited single chalcopyrite phase were obtained. The films deposited at relatively higher substrate temperature, sputtering power, and Ar pressure exhibited favorable stoichiometric ratio (Cu/(In+Ga):0.8–0.9 and Ga/(In+Ga):0.25–0.36) with grain size of about 1–1.5 µm, and desirable electrical properties with p-type carrier concentration of 1016−1017 cm−3 and carrier mobility of 10–60 cm2/Vs. The CIGS layers are expected to fabricate high efficiency thin film solar cells. 相似文献
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《国际聚合物材料杂志》2012,61(3-4):249-252
Abstract Preparation of ultra thin organic and polymer films could be divided into two methods. One is the wet process such as Langmuir-Blodgett (LB), spreading, dipping and casting methods. The other is dry processing, such as vapor deposition, sputtering, chemical vapor deposition, plasma polymerization and vapor deposition polymerization methods. Of these methods, the LB method has been attractive for the last decade to prepare a monolayer film, however, the vapor deposition method has also attracted attention for the preparation of well organized ultra thin films. It is important to investigate a molecular assembly in terms of the extent of aggregation, the crystalline regularity and their orientation in the thin film, since they are closely related to the physical, electrical and functional properties. This review focuses on an evaluation of the structure, molecular assembly and orientation in the thin films prepared by the LB and vapor deposition methods. 相似文献
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Indium tin oxide (ITO) films were deposited onto acrylic substrates by rf magnetron sputtering. Low substrate temperature (<80°C) and low rf power (<28 W) were maintained during sputtering to prevent acrylic substrate deformation. The influence of sputtering parameters, such as rf power, target-to-substrate distance, and chamber pressure, on the film deposition rate, the electrical properties, as well as the optical properties of the deposited films was investigated. Both the refractive index and the extinction coefficient were derived. The high reflection at wavelengths greater than 3 μ made these sputtered ITO films applicable to infrared mirrors. 相似文献
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Morito Akiyama Chao-Nan Xu Masaya Kodama Ichiro Usui Kazuhiro Nonaka Tadahiko Watanabe 《Journal of the American Ceramic Society》2001,84(9):1917-1920
Highly c -axis-oriented aluminum nitride (AlN) thin films were prepared on polycrystalline Si3 N4 and SiC substrates by helicon plasma sputtering. The difference in the substrate materials scarcely influenced the crystal structures of the films. The full width at half-maximum (FWHM) of the X-ray rocking curves of the films was 3.2°, which is the smallest value for AlN thin films deposited on polycrystalline substrates to our knowledge. Annealing at 800°C in vacuum decreased the FWHM from 3.2° to 2.8°. The structure of the films was densely packed and consisted of many fibrous grains. The films developed c -axis orientation on the polycrystalline substrates, because the interaction between the films and substrate surfaces was small, and (100) and (110) AlN planes grew preferentially. The films were piezoelectric and generated electrical signals in response to mechanical stress. 相似文献
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非晶硅太阳能电池背反ZnO:Al薄膜制备 总被引:1,自引:0,他引:1
以ZnO:Al(2%Al2O3,质量分数)为靶材,用射频磁控溅射在玻璃衬底上制备ZnO:Al薄膜,分析了各沉积参数对薄膜光电性能的影响。结果表明:溅射功率对ZnO:Al的透过率影响最大,其次是反应腔室压力,而衬底温度对透过率几乎没有影响。ZnO:Al的电阻率主要取决于衬底温度和溅射功率。综合考虑透过率和电阻率,确定了背反ZnO:Al的最佳沉积参数(衬底温度为200℃,溅射功率为200W,反应腔室压力为0.6Pa),得到了透过率大于85%,电阻率最小为7.6×10-4Ωcm的ZnO:Al薄膜。制备了ZnO:Al/Ag/ss(stainless steel)背反电极,并将其用于非晶硅太阳能电池。与无背反的不锈钢衬底上的电池相比,非晶硅太阳能电池短路电流密度增加了16%。 相似文献
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Transparent and conductive indium tin oxide/polyimide films prepared by high‐temperature radio‐frequency magnetron sputtering
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A highly transparent and thermally stable polyimide (PI) substrate was prepared and used for the fabrication of indium tin oxide (ITO)/PI films via radio‐frequency magnetron sputtering at an elevated substrate temperature. The effect of the deposition conditions, that is, the oxygen flow rate, substrate temperature, sputtering power, and working pressure, on the optical and electrical properties of the ITO/PI films were investigated from the microstructural aspects. The results indicate that the optical and electrical properties of ITO were sensitive to the oxygen. Moreover, it was beneficial to the improvement of the ITO conductivity through the adoption of a high substrate temperature and sputtering power and a low working pressure in the deposition process. A two‐step deposition method was developed in which a thick bulk ITO layer was overlapped by deposition on a thin seed ITO layer with a dense surface to prepare the highly transparent and conductive ITO/PI films. The ITO/PI film after annealing at 240°C gave a transmittance of 83% and a sheet resistance of 19.7 Ω/square. © 2015 Wiley Periodicals, Inc. J. Appl. Polym. Sci. 2015 , 132, 42753. 相似文献
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Yttrium‐doped barium zirconate (BZY) thin films were deposited on MgO and sapphire substrates using a pulsed‐laser deposition (PLD) method with varying deposition rates. The films deposited with a low deposition rate exhibited highly oriented microstructures with little grain boundaries. The electrical conductivities of these films were higher than those of the films, deposited with high deposition rates, which showed little‐oriented polycrystalline microstructure. While the films deposited on the MgO substrates had a stoichiometric composition, those deposited on the sapphire substrates had a high barium deficiency, which was possibly due to the differences in the crystal structure and large lattice mismatch between the sapphire substrate and the BZY film. The electrical conductivity of the highly oriented BZY film, grown on MgO substrate with a low deposition rate, showed little barium deficiency and the highest conductivity value that is higher than the typical conductivity of sintered pellets. 相似文献