彩色显像管静会聚漂移问题的研究

在采用传统精密一字形电子枪的彩色显像管中，若聚焦电压发生变化，静会聚将产生漂移。如果聚焦电压变化７００Ｖ，那么２１英寸彩管将在朋约０．３ｍｍ的静会聚漂移。由于静会聚漂移值超过荧光粉节距的５０％，所以，静会聚漂移对彩色显像管的分辨率影响很大，在高质量彩管设计中必须克服静会聚漂移。     

25英寸700线彩色显像管偏转线圈的优化设计

在组合法计算彩色显像管偏转系统的基础上，对25英寸700线彩色显像管所用偏转线圈进行了优化设计。选取荧光屏光栅结点上的像差作为优化目标函数，选取线圈调制极上绕线密度的傅里叶展开系数作为优化参数，采用分步阻尼法优化设计出了25英寸700线彩色显像管用偏转线圈。根据实际的实验条件，绕制了25英寸700线彩色显像管用垂直偏转线圈，并与已有的25英寸同类彩色显像管所用偏转线圈进行了比较和分析。     

彩电屏幕标注尺寸为何与实际不符?

市场上销售的74厘米(29英寸)彩电对角线的实际屏幕尺寸只有68厘米(27英寸),64厘米(25英时)彩电对角线的实际屏幕尺寸只有59厘米(23英寸),54厘米(21英寸)彩电对角线的实际尺寸只有51厘米(20英寸)。彩电名义尺寸与屏幕有效画面尺寸不同的原因是彩色显像管型号的不同命名法造成的。我国彩色显像管尺寸按彩管对角线最大外形尺寸标注,包括了玻壳尺寸,而不是按有效屏幕对角线实际尺寸标定。现将国际彩管型号命名法和国内彩管型号命名法介绍给大家,供参考。国际统一命名法:①字母②数字③字母④数字⑤字母④数字。第①部分:用一个字母、表示彩管用途,如电视用彩管用A表示,监示器用彩管用M表示,宽屏幕彩管用W表示。第②部分:二个数字表示荧光屏最小有效屏幕画面对角线尺寸,以cm计量。四舍五入取整数。第③部分:用三个字母(不使用I和O)组成。表示种类特征。其中第一个字母表示国别,后面按拉丁文顺序排列。第④部分:由二个数字表示某个系列管中的特定顺序号,单色管由一个数字组成。第⑤部分:采用字母表示荧光膜用荧光粉特性。对彩色电视机用彩色管,荧光粉用单一字母X表示。对黑白管用荧光粉     

改进清晰度彩色显像管中平板荫罩的设计

为了提高清晰度 ,提出了改进彩色显像管平板荫罩的设计方法 ,对原有 2 5英寸彩色显像管的平板荫罩重新进行了计算。根据计算结果制作了新的平板荫罩 ,经装管测试 ,其分辨率从原来的 50 0多线提高到 70 0线 ,观察不到莫尔效应 ,图像品位良好。     

亚微米聚焦离子束的漂移现象

研究了亚微米聚焦离子束（FIB）系统的漂移现象，给出了测量漂移的方法，分析引起漂移的原因及降低漂移的措施。发现了偏转电极上钝化层及污染物充电电荷所引起的漂移现象；测出了各电极电压变化所引起漂移的大小；发现了由于外壳温度不均匀引起离子枪轴线相对样品变化所引起的漂移。提出了制作透镜电极时保持轴对称、特别是限制光栏必须位于透镜光轴上的必要性。所给出的漂移数据既包含早期曾研制的单级透镜FIB系统的数据，也包含近期研制的二级透镜可变束流FIB系统的数据。     

扫描式氩离子枪的电子光学系统研究

扫描式离子枪是样品表面清洁、表面刻蚀和深度分析的常用部件,加速电压在500V到3kV之间可调,具有效率高、性能可靠等优点。电子光学系统是离子枪的重要组成部分,是决定离子束流品质的重要因素。本文利用计算机模拟软件CST对离子枪整体结构进行建模,研究了离子枪聚焦系统不同结构和电压参数对离子束电流密度和束斑尺寸的影响,同时得到了离子枪偏转系统在不同电压分布下的离子分布情况,通过仿真分析确定了电子光学系统的设计方案,并进行了实验验证。结果表明：工作距离为25mm、氩气工作气压为6×10^-3Pa、加速电压为3kV时,氩离子束的束流大小为3μA;束斑大小在7mm到12mm之间可调;当偏转电压为300V时,偏转角度为4.6°。实验与仿真结果基本对应,同时该离子枪的性能指标可获得表面原子精度构造。     

故意过采样

假设你有一块8位的(分辨率为1/256)输出电压范围在0到10V之间的ADC,那么用它测量出的电压误差在0.0391V之内。如果测量一个无噪音干扰的输入信号,例如1.985V的输入信号,     

高性能电子枪的物理设计

为测量电导率较低材料的二次电子发射系数,设计了一种能量在0～2ke V之间可调、束斑直径可调、可偏转、可脉冲的高性能电子枪。根据电子枪的性能指标对其电子发射、电子光学系统和电位关系进行物理设计,通过对控制极施加脉冲电压,实现电子束的脉冲发射。利用CST软件对电子枪建模并进行仿真分析,得到不同聚焦极电压对束斑尺寸的影响。仿真结果表明,在阴极电压为-1000V、控制极为-1005V、第一阳极为-880V时,随着聚焦电压由-400V增加到1000V,束斑直径由0.2mm增加到10mm,两者几乎成正比例关系。通过对比两种偏转组件,得出四极静电偏转器更适合在同一空间内使用,在工作距离为30mm、偏转电压为200V时,偏转灵敏度可达到34mm/k V,对应的偏转角为12.8°。     

共沉淀法制备Y(P,V)O4:Eu3+荧光粉及其真空紫外光谱特性研究

采用氨水、双氧水和磷酸氢二铵溶液作沉淀剂,通过共沉淀法制备出Y(P,V)O4Eu3+荧光粉,利用XRD,SEM以及真空紫外激发下的发射光谱对其进行研究.结果表明与高温固相合成法相比,共沉淀法制备的YP0 5Vo 5O4Eu3+荧光粉的颗粒形貌好,在147nm的真空紫外光激发下的发光亮度提高了21%,荧光粉发射主峰位于619nm,与目前的商品红色荧光粉(Y,Gd)BO3Eu3+相比,发光亮度达95%以上,并且色纯度好,是一种很有前途的彩色PDP用红色荧光粉.     

厚膜工艺制备后栅极场发射显示板的研究

讨论了包括丝网印刷、厚膜光刻、荧光粉沉积成膜、喷涂等厚膜工艺以及后栅极结构场致发射显示屏的制备工艺。研究了老炼工艺对阴极发射特性的改善。采用全厚膜工艺制备了2英寸后栅极场发射显示板样屏,在阳极距为1mm的后栅极结构中,阳极工作电压为2kV时,通过对样屏的测试分析,阴极开关范围差小于100V,达到了行列低压寻址驱动的要求,验证了全厚膜制备后栅极场发射显示板的可行性。     

A new generation of power supplies for electron beam welding machines

Widely used electron beam welding machines are equipped with heavy power supplies, located in a special oil tank and connected with an electron gun to a high-voltage cable. A special system detects electric discharges in the electron gun space, which may arise during welding and then it tries to switch off the high voltage to interrupt an electric arc. Such disadvantages have been eliminated with the novel power supply described here. The Q of resonance circuit of this supply is stabilized and as a result circulating power appears. During an electric discharge in the gun, power is not sent to the electron gun but circulates between the electronic parts of the resonance circuit without losses and “waits” for the break in the short circuit. The power supply is much smaller and lighter than supplies of similar rating used nowadays. It is connected directly to the electron gun chamber without a high-voltage cable. The first construction of the supply was designed for electron beam welding machine of 5 kW power and 60 kV accelerating voltage. Tests of the new power supply in laboratory and industrial conditions have shown its usefulness for electron beam welding.     

Space charge effects and dynamic interactions in the case of a broad and intense ion beam bombarding an insulated substrate

A small single grid ion gun system, isolated by a quartz tube, was investigated. The dependence of the potential of the floating substrates was measured, and its dependence on grid voltage and pressure was determined. This potential could be controlled by changing the parameters of the ion gun. This seems to be a new possibility for controlled deposition of insulating materials with ion beams of low energy. And it explains results which were obtained in deposition of diamond-like carbon films on insulating substrates.     

新型高亮度、高分辨率双束电子光学系统

由三基色显示管投影来实现大屏幕显示仍是首选方案 ,为了提高投影质量 ,缓解亮度与分辨率间的矛盾 ,采取了三项主要措施 :1、采用双束扫描荧光屏 ;2、在发射系统采用层流枪的优点 ;3、采用电阻螺旋线形成的多极透镜与外磁透镜相配合作为主聚焦结构     

A 20 keV electron gun system for the electron irradiation experiments

An electron gun consisting of cathode, focusing electrode, control electrode and anode has been designed and fabricated for the electron irradiation experiments. This electron gun can provide electrons of any energy over the range 1–20 keV, with current upto 50 μA. This electron gun and a Faraday cup are mounted in the cylindrical chamber. The samples are fixed on the Faraday cup and irradiated with electrons at a pressure ∼10⁻⁷ mbar. The special features of this electron gun system are that, at any electron energy above 1 keV, the electron beam diameter can be varied from 5 to 120 mm on the Faraday cup mounted at a distance of 200 mm from the anode in the chamber. The variation in the electron current over the beam spot of 120 mm diameter is less than 15% and the beam current stability is better than 5%. This system is being used for studying the irradiation effects of 1–20 keV energy electrons on the space quality materials in which the irradiation time may vary from a few tens of seconds to hours.     

Point cathode electron gun using electron bombardment for cathode tip heating: numerical study of heating condition for high brightness operation

The cathode tip heating in a point cathode electron gun has been studied with numerical methods. In this gun, a straightened tungsten wire of 0.1 mm diameter is used as the cathode, and the tip part of it is locally heated by electron bombardment. The heating improves the cathode life and the gun is operated at higher cathode temperature. The gun operation requires heating conditions that confines the cathode evaporation to the tip part and keeps the temperature variation of the cathode during the evaporation small. The time variations of the temperature distribution and the cathode shape were calculated for different heating conditions. The methods and results are described, and the heating condition that is suitable for the high brightness operation of this type of gun is discussed.     

Ka波段空间行波管双阳极电子枪设计与优化

利用EGUN软件设计了一把导流系数为0.07μP的Ka波段空间行波管双阳极电子枪。该枪为皮尔斯型电子枪,双阳极分别为控制阳极(2.58 kV)和离子拒止阳极(9 kV)。该设计应用综合迭代法的计算结果进行初步设计,通过调整设计第一阳极,建立考虑导流系数、注腰半径和层流性的电子注性能优化目标函数,应用量子粒子群算法结合MATLAB与EGUN软件对电子枪阳极头位置进行了优化,优化结果满足了空间行波管对电子注的注腰半径和层流性的设计要求。     

Low perveance confined-flow Pierce gun for a 0.14 THz broadband folded waveguide traveling wave tube

An approach for designing an electron gun for a high efficiency, high linearity 0.14 THz traveling wave tube (TWT), has been presented. A Pierce electron gun of beam perveance 0.0047 μP has been designed for a high gain, high linearity and high efficiency 0.14 THz TWT using CST STUDIO SUITE Charged Particle Simulation soft and electronic optical software TAU. The initial gun geometry, as obtained from the Vaughan iterative synthesis method, has been used as input for simulation of the electron gun. An M-type dispenser cathode of diameter 0.8 mm has been used for cathode loading of 2.75 A/cm². The magnetic focusing with integral-pole-piece barrel assembly and periodic-permanent magnets (PPM) have been designed using CST and TAU. The practical problem of linking requisite cathode flux to the cathode for confined flow of the electron beam with low convergence factor has been sorted out by gradually increasing the PPM magnetic field. The magnetic field has been increased in steps from the gun and over the first five magnets varying from Brillouin field (B_B) value to twice B_B for achieving the electron beam with scalloping less than 10%. Simulation results show that the design method is reasonable for obtaining a 0.14 THz TWT electron gun and periodic-permanent magnets (PPM).     

有限元法在42英寸多枪彩色显像管玻壳设计中的应用

由于多电子枪显象管玻壳是一个变厚度组合壳体 ,很难用板壳经典理论进行求解 ,所以在设计九电子枪彩管玻壳时用有限元方法预先知道该玻壳的应力分布。通过修改设计参数 ,使九电子枪彩管玻壳能满足强度要求。在设计玻屏时采用非均匀有理B样条的曲面分析方法 ,锥体采用四条组合的非均匀有理B样条曲线旋转一周得到。本设计实现了玻屏表面外形和曲率变化及玻壳结构设计的全参数化 ,提高了玻壳的设计效率。本文还给出了计算玻壳外型的公式和一些技术参数。计算机仿真结果表明 :4 2英寸九电子枪彩色无支撑CRT的玻壳既能满足强度要求 ,又具有好的视觉效果     

Low perveance confined-flow Pierce gun for a 0.14 THz broadband folded waveguide traveling wave tube

An approach for designing an electron gun for a high efficiency, high linearity 0.14 THz traveling wave tube (TWT), has been presented. A Pierce electron gun of beam perveance 0.0047 μP has been designed for a high gain, high linearity and high efficiency 0.14 THz TWT using CST STUDIO SUITE Charged Particle Simulation soft and electronic optical software TAU. The initial gun geometry, as obtained from the Vaughan iterative synthesis method, has been used as input for simulation of the electron gun. An M-type dispenser cathode of diameter 0.8 mm has been used for cathode loading of 2.75 A/cm². The magnetic focusing with integral-pole-piece barrel assembly and periodic-permanent magnets (PPM) have been designed using CST and TAU. The practical problem of linking requisite cathode flux to the cathode for confined flow of the electron beam with low convergence factor has been sorted out by gradually increasing the PPM magnetic field. The magnetic field has been increased in steps from the gun and over the first five magnets varying from Brillouin field (B_B) value to twice B_B for achieving the electron beam with scalloping less than 10%. Simulation results show that the design method is reasonable for obtaining a 0.14 THz TWT electron gun and periodic-permanent magnets (PPM).