Electrodeposition and structural characteristics of intermetallic nickel-tin based coatings

Ni–Sn alloy intermetallic coatings with different Sn contents, were electrodeposited on Vanadis 23 steel substrates. Structural and chemical characterisation of these coatings was performed by x-ray diffraction, scanning electron microscopy and electron dispersive x-ray analysis. The as-plated Ni–Sn coatings were found to consist of a crystalline Ni solid solution with dispersed Ni–Sn intermetallic phases, whereas in certain cases bulk intermetallic coatings were obtained. The addition of Sn as an alloying element into electrolytic Ni coatings led to a significant increase of hardness and Young’s modulus of these coatings. In addition, the effect of a post-deposition heat treatment at 400°C for 1?h on the microstructure and mechanical characteristics of these electrolytic Ni–Sn alloy coatings was investigated.     

Electrodeposition of sol-enhanced nanostructured Ni-TiO2 composite coatings

A novel electroplating method has been developed to produce nanocrystalline metal-matrix nano-structured composite coatings. A small amount of transparent TiO₂ sol was added into the traditional electroplating Ni solution, leading to the formation of nanocrystalline Ni-TiO₂ composite coatings. These coatings have a smooth surface. The Ni nodules changed from traditional pyramid-like shape to spherical shape. The grain size of Ni was also significantly reduced to the level of 50 nm. It was found that the amorphous anatase TiO₂ nano-particles (∼ 10 nm) were highly dispersed in the coating matrix. The microhardness was significantly increased from 320 HV₁₀₀ of the traditional Ni coating to 430 HV₁₀₀ of the novel composite coating with 3.26 wt.% TiO₂. Correspondingly, the wear resistance of the composite coating was improved by ∼ 50%.     

Structure and mechanical properties of (TiVCr)N coatings prepared by energetic bombardment sputtering with different nitrogen flow ratios

The (TiVCr)N coatings were deposited on Si substrate via rf magnetron sputtering of a TiVCr alloy target under dc bias in a N₂/Ar atmosphere. The deposition rate of the coatings gradually decreased with increasing N₂-to-total (N₂ + Ar) flow ratio, R_N. The TiVCr alloy and its nitride coatings exhibited a body-centered cubic (BCC) and a face-centered cubic (FCC) crystal structure, respectively. The preferred orientation of the (TiVCr)N coatings changed from (1 1 1) to (2 0 0) with increasing R_N. In addition, the microstructure of the nitride coatings was also converted from a columnar structure with void boundaries and rough-faceted surface to a very dense structure with a smooth-domed surface. The grain size of the (TiVCr)N coatings decreased as the R_N was increased. Accordingly, the hardness of the (TiVCr)N coatings was enhanced from 4.06 to 18.74 GPa as the R_N was increased.     

Effect of heat treatment on the structure and in vitro bioactivity of microarc-oxidized (MAO) titania coatings containing Ca and P ions

Microarc oxidized (MAO) coating containing TiO₂ and amorphous calcium phosphate was formed on Ti6Al4V in an electrolyte containing EDTA-Ca and phosphate. Subsequent heat treatment has significant effects on the structure and in vitro bioactivity of the MAO coating. After heat treatment (400-800 °C), the crystallinity of TiO₂ increases, and micropore numbers of the MAO coating decline. Moreover, Ca₃(PO₄)₂ is formed on the surfaces of the MAO coatings after heat treatment at 700 and 800 °C. The SEM and ICP-OES results indicate that the abilities of apatite-forming and Ca and P releasing of the MAO coating decrease after heat treatment. The apatite-forming ability of the MAO coating is associated with the crystallinities of titanium oxide and calcium phosphate. The MAO coating containing TiO₂ with a low crystallinity and amorphous calcium phosphate facilitates the apatite formation in vitro. In addition, the induced biomimetic apatite by the MAO coating without heat treatment exhibits carbonated structure, controllable crystallinity and pore networks on the nanometer scale.     

Microstructure and physical properties of PVD TiN/（Ti, Al）N multilayer coatings

Magnetron sputtered （Ti, Al） N monolayer and TiN/（Ti, Al） N multilayer coatings grown on cemented carbide substrates were studied by using energy dispersive X-ray spectroscopy （EDX）, scanning electron microscopy （SEM）, nanoindentation, Rockwell A indentation test, strength measurements and cutting tests. The results show that the （Ti, Al）N monolayer and TiN/（Ti, Al）N multilayer coatings perform good affinity to substrate, and the TiN/（Ti, Al）N multilayer coating exhibits higher hardness, higher toughness and better cutting performance compared with the （Ti, Al）N monolayer coating. Moreover, the strength measurement indicates that the physical vapour deposition （PVD） coating has no effect on the substrate strength.     

Ti/Ni多层复合材料界面扩散行为的研究

本文针对累积叠轧5道次制备的Ti/Ni多层结构复合材料试样进行热处理,采用光学显微镜和扫描电镜分析方法,对复合材料的显微组织、界面结构和扩散反应层厚度等进行观察分析,结合动力学理论研究了Ti/Ni界面的扩散行为。研究结果表明：试样经过累积叠轧5道次轧制后,Ti/Ni界面未发生扩散;在(550 ℃-750 ℃)×(0.5 h-8 h)热处理后,Ti/Ni界面发生扩散,扩散层厚度与保温时间呈幂函数关系,与加热温度呈指数关系;随着热处理温度的升高,Ti-Ni扩散层的生长方式由650 ℃以下的体扩散控制逐渐转变为晶界扩散控制。通过计算和验证得到采用累积叠轧5道次制备的Ti/Ni多层复合材料的Ti/Ni界面固相反应层生长动力学方程为：y=1.7043*104*exp(-78202/RT) *t1.2009-0.0008T。     

Degradation characteristics of Ti/(IrO2+Ta2O5) coating anodes in H2SO4 solution

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In-situ thermal evolution of Ni/Ti multilayer thin films

Nickel and titanium alternated nanolayers were deposited from Ti and Ni targets. The multilayer thin films were designed in order to have equiatomic overall chemical composition with a period from 5 to 70 nm. The chemical composition, morphology, structure and phase transformation behaviour were studied. The surface and cross-section morphology of the as-deposited thin films was analysed by atomic force microscopy (AFM) and scanning electron microscopy (SEM). The Ni/Ti thin films present in their surface nanograins and for higher periods in cross section it was possible to distinguish the alternated layers and measure their thickness. The structural evolution with temperature was analysed by in-situ hot stage X-ray diffraction (XRD). The as-deposited multilayer thin films exhibit a tendency to a transitory disorder as the period decreases. For the smaller periods a disordered phase forms during the deposition process, while in Ni/Ti multilayers with higher periods this phase is only observed during annealing. By increasing the temperature an exothermic reaction occurs with the formation of the B2-NiTi austenitic phase. In spite of moderate enthalpy of mixing, the multilayers with intermediate modulation period of Ni/Ti films show potential to be used for joining purposes.     

热处理工艺对累积叠轧Ti/Ni多层复合材料界面结构的影响

本文研究了热处理对累积叠轧6道次Ti/Ni多层复合箔材界面结构演变的影响。利用扫描电镜(SEM)、能谱分析(EDS)、透射电镜(TEM)、X射线衍射(XRD)及差示扫描量热分析(DSC)对热处理后复合材料的界面结构、相组成、相结构及相变温度等进行测试分析。结果表明：随保温时间的增加,Ti/Ni界面扩散形成的不稳定化合物向稳定态转变,界面Ti、Ni两元素成分曲线由交叉陡变的阶梯状逐渐转为两条近平直的平行线。富Ti的Ti/Ni复合箔材在720℃经热处理后,随时间延长,材料组织从原始的层状结构最终转变为由稳态TiNi和Ti₂Ni两相组成的混合组织。保温时间小于10h时,材料中的TiNi是由具有复杂单斜结构的B19’和CsCl型结构的B2两种物相组成,大于10h时仅存在B19’相。在冷却/加热过程中,材料内部均发生马氏体(A→M/M→A)的可逆相变,并随保温时间的增加,其相变滞后(Ap-Mp)从1h的22.4℃增加到30h的31.9℃。     

Corrosion study of Alumina/Yttria-Stabilized Zirconia (Al2O3/YSZ) nanostructured Thermal Barrier Coatings (TBC) exposed to high temperature treatment

Thermal Barrier Coatings (TBC) of 8% Yttria-Stabilized Zirconia (8YSZ) were deposited on AISI-304 substrates via r.f magnetron sputtering. A buffer layer of alumina, Al₂O₃, was deposited to improve the adhesion of the YSZ monolayer to the substrate. The influence of the Al₂O₃/8YSZ coating on the electrochemical conductance evolution, , was examined by Electrochemical Impedance Spectroscopy measurements when the steels are exposed to temperatures of 700 and 500 °C for 2, 4, and 6 h. Results indicated that diminished three orders of magnitude, in samples coated with Al₂O₃/8YSZ with respect to uncoated steel.     

Characterization and frictional behavior of nanostructured Ni–W–MoS2 composite coatings

Ni–W–MoS₂ composite coatings were obtained by pulse plating from a Ni–W electrolyte containing suspended MoS₂ particles. The coating composition, morphology, crystalline structure, microhardness and frictional behavior were studied as a function of MoS₂ concentration. The results obtained in this study indicate that co-deposited lubricant particles strongly influenced the composite Ni–W coating properties. It was found that increasing co-deposited MoS₂ diminished tungsten content in the coating and consequently increased the average grain size. Ni–W nanostructured coatings with high MoS₂ content have a porous sponge-like structure, high surface roughness and irregular frictional behavior. However, the friction coefficient of Ni–W coatings is reduced to half its value with low MoS₂ content.     

TiO2组元对RuO2+SnO2+TiO2/Ti阳极涂层微观结构的影响

通过溶胶凝胶(Sol-gel)过程制备了添加TiO2的RuO2 SnO2／Ti纳米涂层钛阳极，并通过X射线衍射(XRD)、差热分析(DTA)、透射电子显微镜(TEM)分析了TiO2组元对RuO2 TiO2 SnO2／Ti电极涂层的微观结构和晶粒尺寸的影响。结果表明：涂层组成物主要为(Ru，Sn，Ti)O2固溶体，在TiO2含量增加、退火温度升高时，该固溶体仍可稳定存在；添加TiO2细化晶粒的效果不显著，但随退火温度的升高，TiO2相对含量较高的涂层中晶粒长大速率较低，即TiO2具备稳定晶粒尺寸的作用；添加TiO2的涂层晶粒外观呈较理想的等轴状。     

颗粒补强Al2O3／SiC／（W,Ti）C复相陶瓷刀具材料的氧化行为与强度特性

研究了颗粒补强Al2O3/SiC/(W,Ti)C复相陶瓷刀具材料的纤为及其对材料抗弯强度的影响,结果表明：该材料在空气中静态氧化时的氧化增重符合抛物线规律,随弥散相SiC和（W,Ti)C的增加,其氧化活化能有不同程度的降低,由于SiC的添加,使得氧化膜在高温下能以粘性流动的方式缓解残余应力,降低氧化速度,从而使得材料的抗氧化性能有所提高,此外,适当的氧化处理可使Al2O3/SiC/(W,Ti)C陶瓷刀具材料的抗弯强度得到提高。     

原位合成(Al_2O_3+Al_3Ti)_P/Al复合材料的制备研究

通过对Al-TiO_2-SiO_2体系混合粉末固-液原位合成制备出了(Al_2O_3+Al_3Ti)_P/Al复合材料.利用X射线衍射仪、扫描电镜等方法观察分析了其物相和显微组织形貌.结果表明:原位反应制备的(Al_2O_3+Al_3Ti)_P/Al复合材料,金属间化合物增强相Al_3Ti均匀分布于基体,陶瓷相Al_2O_3颗粒非常细小,弥散分布于基体中,使材料的硬度等性能得到提高.     

不同退火工艺Pt电极上沉积溶胶凝胶Pb(Zr,Ti)O_3薄膜的织构演化(英文)

利用溶胶凝胶工艺在Pt电极上沉积了PZT薄膜,选用传统退火及其快速退火工艺制备两种Pt基底(CTA-Pt和RTA-Pt),并采用X射线衍射广角及其ù扫描技术分别研究了Pt电极退火工艺对溶胶凝胶PZT结构及其织构演化的影响.研究结果显示:在传统退火工艺制备Pt电极上沉积的薄膜为(111)择优取向,而在快速退火工艺制备Pt电极上沉积的薄膜表现为(100)织构;分析表明PZT薄膜的织构演化可能与Pt电极在不同退火工艺下的内应力差异有关.     

晶化处理对HA/(HA+TiO2)涂层组织结构的影响

用X射线衍射仪（XRD）、电子探针（EPMA）等检测手段，以晶化处理对大气等离子喷涂法在纯钛表面制备的HA／（HA＋TiO2）复合涂层为研究对象，探讨了晶化处理对HA／（HA＋TiO2）涂层组织结构和成分分布的影响。结果表明：晶化处理后HA／（HA＋TiO2）涂层结晶度明显提高；（HA＋TiO2）过渡层中交替分布的HA和TiO2结合致密；涂层表面裂纹比对应纯HA涂层细小，涂层内部结合致密，证实TiO2的加入具有缓和应力的作用。     

Growth of epitaxial pyrite (FeS2) thin films using sequential evaporation

Pyrite (FeS₂), a semiconductor composed of inexpensive, non-toxic elements, has a band gap of ～0.95 eV and an absorption coefficient higher than conventional direct band gap semiconductors, including GaAs. These facts have inspired the use of pyrite as a potential candidate for terawatt-scale photovoltaic systems. However, there has been limited progress synthesizing thin films of sufficient quality to produce efficient solar cells. Here we describe the layer-by-layer growth of stoichiometric, single-phase pyrite thin films on heated substrates using sequential evaporation of Fe under high vacuum followed by sulfidation at pressures ranging from 1 mTorr to 1 Torr. High-resolution transmission electron microscopy reveals high-quality, defect-free pyrite grains. We demonstrate that epitaxial pyrite layers can be deposited with this method on natural pyrite substrates.     

Oxidation resistance of decorative (Ti,Mg)N coatings deposited by hybrid cathodic arc evaporation-magnetron sputtering process

Titanium-magnesium nitride coatings (Ti,Mg)N were deposited on steels and silicon substrates by hybrid reactive arc evaporation-magnetron sputtering process from cathodic Ti and sputter Mg targets in an argon/nitrogen gas mixture. X-ray diffraction analyses (XRD) of as-deposited coatings with various Mg/Ti atomic ratios gave evidence of a fcc TiN-like structure strongly oriented in the [111] direction. The TiN lattice parameter increases with the addition of Mg resulting from the substitution of Ti atoms by Mg ones. Optical investigations by spectrophotometry revealed that Mg addition to TiN leads to a change in colour from golden through coppery and violet to grey. Nanoindentation measurements showed that increasing Mg content does not alter the hardness of coatings. As-deposited films were annealed in air from 450 to 750 °C with a 100 °C step. XRD and Raman analyses revealed the formation of rutile TiO₂ and MgTiO₃ phases. Secondary neutral mass spectrometry measurements were performed to study the elemental depth profiles after air annealing. A diffusion of Mg atoms towards the film surface was evidenced above 650 °C, leading to the formation of the MgTiO₃ phase. However, thermogravimetric measurements showed that this oxide phase did not protect the films against high temperature oxidation. On the contrary, below 650 °C Mg affords to TiN a beneficial protective effect, able to reduce the oxidation kinetics by half.     

表面内氧化Al2O3/Cu-(Ce+Y)弥散铜薄板带的组织和性能

采用内氧化工艺,在950℃以工业N2中的余氧为内氧化介质对试样进行表面内氧化,成功制备了Al2O3/Cu复合材料,并对其组织和性能进行了分析.结果表明:Cu-Al-RE合金经950℃×2 h内氧化后,表面内氧化层厚度随着混合稀土含量的增加而增加,当超过0.1%(Ce+Y)时,表面内氧化层厚度略有降低;内氧化法制备的Al2O3/Cu-(Ce+Y)复合材料中弥散分布着大量纳米级的Al2O3颗粒;添加适量的混合稀土能改善Cu-Al合金的导电性,提高合金的硬度.