Enhancement of the coercivity of electrodeposited nickel nanowire arrays

In the present study, the single-crystal Ni nanowire arrays with a preferred growth along the [110] direction have been prepared by the deposition of Ni into the alumina template with nanopores at a current density of 2.0 mA/cm². The single-crystal Ni nanowire arrays show a magnetic anisotropy with the easy axis parallel to the nanowires and an enhanced coercivity as compared with the polycrystalline Ni nanowire arrays. A large coercivity of 1110 Oe together with a high remanence M_r = 0.92M_s is observed for 15-nm diameter single-crystal Ni nanowire arrays. The preferred growth mechanism of the single-crystal nanowires is briefly discussed.     

Formation of epitaxial NiSi2 nanowires on Si(100) surface by atomic force microscope nanolithography

Ni nanowries were fabricated by atomic force microscope nanolithography, evaporation, lift-off and annealing processes. Epitaxial NiSi2 nanowires on a Si(100) surface along Si(110) and (100) directions were formed by the rapid thermal annealing treatment of the Ni nanowires at 400 degrees C. The silicide nanowires along the Si(110) direction had coherent type-A Si(111) and Si(100) interfaces, while those along the Si(100) direction had a type-A Si(110) interface. Silicide nanowires were agglomerated when the Ni nanowires were annealed at high temperature (> or = 500 degrees C). The mechanism of formation of a faceted nanowire was discussed based on the minimization of the total surface energy.     

Three-dimensional structure of helical and zigzagged nanowires using electron tomography

Electron tomography and high-resolution transmission electron microscopy were used to characterize the unique three-dimensional structures of helical or zigzagged GaN, ZnGa2O4, and Zn2SnO4 nanowires. The GaN nanowires adopt a helical structure that consists of six equivalent <011> growth directions with the axial [0001] direction. We also confirmed that the ZnGa2O4 nanosprings have four equivalent <011> growth directions with the [001] axial direction. The zigzagged Zn2SnO4 nanowires consisted of linked rhombohedrons having the side edges matched to the <110> direction and the [111] axial direction.     

Lateral, Ge, nanowire growth on SiO2

Vapor-liquid-solid (VLS) nanowires (NWs) typically grow in [111] directions. Previously, the authors have demonstrated guided Si NW growth, engineering the VLS NWs to grow in a [110] direction against a SiO(2) surface. In this work, the authors demonstrate guided high-quality Ge nanowire growth against a SiO(2) surface in the substrate plane to bridge between two Si mesas. The authors explore the interfaces between a Ge NW and the two Si device-layer mesas and report high-quality, epitaxial interfaces between the Ge NW and both Si mesas.     

Orientation and temperature dependence of the tensile behavior of GaN nanowires: an atomistic study

Gallium nitride (GaN) is a high-temperature semiconductor material of considerable interest. It emits brilliant light and has been considered as a key material for the next generation of high frequency and high power transistors that are capable of operating at high temperatures. Due to its anisotropic and polar nature, GaN exhibits direction-dependent properties. Growth directions along [001], [1?10] and [110] directions have all been synthesized experimentally. In this work, molecular dynamics simulations are carried out to characterize the mechanical properties of GaN nanowires with different orientations at different temperatures. The simulation results reveal that the nanowires with different growth orientations exhibit distinct deformation behavior under tensile loading. The nanowires exhibit ductility at high deformation temperatures and brittleness at lower temperature. The brittle to ductile transition (BDT) was observed in the nanowires grown along the [001] direction. The nanowires grown along the [110] direction slip in the {010} planes, whereas the nanowires grown along the [1?10] direction fracture in a cleavage manner under tensile loading.     

Patterned procedure for template-synthesis and microstructural characterization of copper nanowires

Highly ordered circular patterns of copper nanowire arrays were successfully deposited into designed anodic aluminum oxide templates. High-resolution transmission electron microscopy was used to study the microstructure of these Cu nanostructures. The results showed that the growth orientation of the copper nanowires was along [220] direction, and the broken orientation were along [2?02?] and [02?2] directions, respectively. Regular cones were formed at the broken end of nanowires. Bent nanowires were also observed, this means that the copper nanowires have good mechanical properties when applied external force. Chemical analysis has been performed on Cu nanowires using electron energy-loss spectroscopy.     

Pristine semiconducting [110] silicon nanowires

We report results of ab initio calculations on silicon nanowires oriented along the [110] direction and show for the first time that these pristine silicon nanowires are indirect band gap semiconductors. The nanowires have bulk Si core and are bounded by two (100) and two (110) planes in lateral directions. The (100) planes are atomically reconstructed with dimerization in a manner similar to the (100) surface of bulk Si but the dimer arrays are perpendicular to each other on the two (100) planes. An interesting consequence of surface reconstruction is the possibility of polytypism in thicker nanowires. We discuss its effects on the electronic structure. These findings could have important implications for the use of silicon nanowires in nanoscale devices as experimentally [110] nanowires have been found to grow preferentially in the small diameter range.     

Crystallographic alignment of high-density gallium nitride nanowire arrays

Single-crystalline, one-dimensional semiconductor nanostructures are considered to be one of the critical building blocks for nanoscale optoelectronics. Elucidation of the vapour-liquid-solid growth mechanism has already enabled precise control over nanowire position and size, yet to date, no reports have demonstrated the ability to choose from different crystallographic growth directions of a nanowire array. Control over the nanowire growth direction is extremely desirable, in that anisotropic parameters such as thermal and electrical conductivity, index of refraction, piezoelectric polarization, and bandgap may be used to tune the physical properties of nanowires made from a given material. Here we demonstrate the use of metal-organic chemical vapour deposition (MOCVD) and appropriate substrate selection to control the crystallographic growth directions of high-density arrays of gallium nitride nanowires with distinct geometric and physical properties. Epitaxial growth of wurtzite gallium nitride on (100) gamma-LiAlO(2) and (111) MgO single-crystal substrates resulted in the selective growth of nanowires in the orthogonal [1\[Evec]0] and [001] directions, exhibiting triangular and hexagonal cross-sections and drastically different optical emission. The MOCVD process is entirely compatible with the current GaN thin-film technology, which would lead to easy scale-up and device integration.     

Bidirectional growth of indium phosphide nanowires

We present a bidirectional growth mode of InP nanowires grown by selective-area metalorganic vapor-phase epitaxy (SA-MOVPE). We studied the effect of the supply ratio of DEZn ([DEZn]) on InP grown structure morphology and crystal structures during the SA-MOVPE. Two growth regimes were observed in the investigated range of the [DEZn] on an InP(111)B substrate. At low [DEZn], grown structures formed tripod structures featuring three nanowires branched toward the [111]A directions. At high [DEZn], we obtained hexagonal pillar-type structures vertically grown on the (111)B substrate. These results show that the growth direction changes from [111]A to [111]B as [DEZn] is increased. We propose a growth mechanism based on the correlation between the incident facet of rotational twins and the shapes of the grown structures. Our results bring us one step closer to controlling the direction of nanowires on a Si substrate that has a nonpolar nature. They can also be applied to the development of InP nanowire devices.     

Cover Picture: Influence of Plasma Stimulation on Si Nanowire Nucleation and Orientation Dependence (Adv. Mater. 18/2007)

On p. 2603, Tom Picraux and co‐workers report on the use of plasma excitation to strongly enhance the nucleation of Si nanowires by the vapor–liquid–solid growth method. This control allows the preferential formation of very small diameter [110] oriented nanowires, as well as significant enhancements in low temperature nanowire growth.     

The dependence of structural stability and tunable gap on the Si components of ZnSe/Si bi-coaxial nanowire heterostructures

The bare and hydrogen-passivated ZnSe/Si bi-coaxial nanowire heterostructures along [110] direction have been investigated by using the first-principle calculations within density functional theory. The structural stability and electronic property of ZnSe/Si bi-coaxial nanowire heterostructures have been shown by changing the Si components. It is found that the ZnSe/Si nanowires have zero gaps at lower Si components, and then they have the increasing gap at higher Si components. It is seen clearly that there is the transition of band gap form zero to nonzero. With increasing Si components, the ZnSe/Si nanowires can be also achieved as n-type or p-type, in agreement qualitatively with the experimental observations. In addition, the structural stabilities and the cohesive energies of ZnSe/Si bi-coaxial nanowires are changed obviously with the different Si components.     

Strain-driven electronic band structure modulation of si nanowires

One of the major challenges toward Si nanowire (SiNW) based photonic devices is controlling the electronic band structure of the Si nanowire to obtain a direct band gap. Here, we present a new strategy for controlling the electronic band structure of Si nanowires. Our method is attributed to the band structure modulation driven by uniaxial strain. We show that the band structure modulation with lattice strain is strongly dependent on the crystal orientation and diameter of SiNWs. In the case of [100] and [111] SiNWs, tensile strain enhances the direct band gap characteristic, whereas compressive strain attenuates it. [110] SiNWs have a different strain dependence in that both compressive and tensile strain make SiNWs exhibit an indirect band gap. We discuss the origin of this strain dependence based on the band features of bulk silicon and the wave functions of SiNWs. These results could be helpful for band structure engineering and analysis of SiNWs in nanoscale devices.     

Electrodeposited bismuth telluride nanowire arrays with uniform growth fronts

Bismuth telluride (Bi2Te3) nanowires were deposited into porous alumina templates with 35 nm diameter pores by a pulsed-potential electrodeposition method. For growth at temperatures between 1 and 4 degrees C, the nanowires filled 93% of the pores of the template, and the growth fronts were uniform with nanowire lengths of approximately 62-68 microm. There are over ten billion nanowires per square centimeter with aspect ratios approaching 2000:1. Samples were characterized by scanning and transmission electron microscopy, X-ray diffraction, and electron microprobe analysis. The crystalline nanowire arrays are highly oriented in the [110] direction, which is optimal for thermoelectric applications.     

Vertically standing Ge nanowires on GaAs(110) substrates

The growth of epitaxial Ge nanowires is investigated on (100), (111) B and (110) GaAs substrates in the growth temperature range from 300 to 380?°C. Unlike epitaxial Ge nanowires on Ge or Si substrates, Ge nanowires on GaAs substrates grow predominantly along the [Formula: see text] direction. Using this unique property, vertical [Formula: see text] Ge nanowires epitaxially grown on GaAs(110) surface are realized. In addition, these Ge nanowires exhibit minimal tapering and uniform diameters, regardless of growth temperatures, which is an advantageous property for device applications. Ge nanowires growing along the [Formula: see text] directions are particularly attractive candidates for forming nanobridge devices on conventional (100) surfaces.     

Single crystalline PtSi nanowires, PtSi/Si/PtSi nanowire heterostructures, and nanodevices

We report the formation of PtSi nanowires, PtSi/Si/PtSi nanowire heterostructures, and nanodevices from such heterostructures. Scanning electron microscopy studies show that silicon nanowires can be converted into PtSi nanowires through controlled reactions between lithographically defined platinum pads and silicon nanowires. High-resolution transmission electron microscopy studies show that PtSi/Si/PtSi heterostructure has an atomically sharp interface with epitaxial relationships of Si[110]//PtSi[010] and Si(111)//PtSi(101). Electrical measurements show that the pure PtSi nanowires have low resistivities approximately 28.6 microOmega.cm and high breakdown current densities>1x10(8) A/cm2. Furthermore, using single crystal PtSi/Si/PtSi nanowire heterostructures with atomically sharp interfaces, we have fabricated high-performance nanoscale field-effect transistors from intrinsic silicon nanowires, in which the source and drain contacts are defined by the metallic PtSi nanowire regions, and the gate length is defined by the Si nanowire region. Electrical measurements show nearly perfect p-channel enhancement mode transistor behavior with a normalized transconductance of 0.3 mS/microm, field-effect hole mobility of 168 cm2/V.s, and on/off ratio>10(7), demonstrating the best performing device from intrinsic silicon nanowires.     

Fabrication of highly-ordered nanopatterned copper nanowire arrays by photolithography

Two different patterns, one being circular and the other being QDU, of copper (Cu) nanowire arrays were successfully produced by electrochemical deposition and photolithography. The highly-ordered patterns of Cu nanowire arrays were observed to stand freely on the substrate using scanning electron microscopy (SEM). Chemical analyses have been performed on Cu nanowires using energy dispersive X-ray spectroscopy (EDS). The results confirmed that it is mainly composed of Cu. Selected-area electron diffraction (SAED) pattern indicated the nanowires are single crystalline and the growth direction of the nanowires is along the [220] direction. With the deposition time increasing, the length of Cu nanowires increaseed.     

磁控溅射法可控制备有序碲纳米线阵列

采用磁控溅射法在较低基底温度下(200 ℃)制备了有序碲纳米线阵列, 并利用X射线衍射、扫描电镜和透射电镜对所制备薄膜进行了相、形貌和微观结构分析。结果表明, 所制备的纳米线阵列由单晶碲纳米线组成, 单根碲纳米线具有针状形貌, 并沿[101]晶向生长, 平均直径和长度分别为100 nm和1 μm。氩气压力和基底温度均对碲纳米线阵列的形成具有重要影响, 以平衡碲原子沿[101]晶向和(101)晶面方向的扩散和生长。提出了碲纳米线阵列的生长机制, 包括吸附、结合、成核和生长等过程。     

Vertically aligned cadmium chalcogenide nanowire arrays on muscovite mica: a demonstration of epitaxial growth strategy

We report a strategy for achieving epitaxial, vertically aligned cadmium chalcogenide (CdS, CdSe, and CdTe) nanowire arrays utilizing van der Waals epitaxy with (001) muscovite mica substrate. The nanowires, grown from a vapor transport process, exhibited diameter uniformity throughout their length, sharp interface to the substrate, and positive correlation between diameter and length with preferential growth direction of [0001] for the monocrystalline wurtzite CdS and CdSe nanowires, but of [111] for zinc blende CdTe nanowires, which also featured abundant twinning boundaries. Self-catalytic vapor-liquid-solid mechanism with hydrogen-assisted thermal evaporation is proposed to intepret the observations. Optical absorption from the as-grown CdSe nanowire arrays on mica at 10 K revealed intense first-order exciton absorption and its longitudinal optical phonon replica. A small Stokes shift (～1.3 meV) was identified, suggesting the high quality of the nanowires. This study demonstrated the generality of van der Waals epitaxy for the growth of nanowire arrays and their potential applications in optical and energy related devices.     

SmB6单晶纳米结构的可控制备及场发射特性研究

作为一种典型的近藤拓扑绝缘体, 近年来六硼化钐(SmB₆)材料受到了凝聚态物理和材料科学领域研究者的广泛关注。与块体材料相比, SmB₆纳米材料由于具有更大的比表面积而拥有更为丰富的表面电子态, 因此被认为是一个研究表面量子效应和物理机制的理想平台。由于场发射电流主要来源于纳米材料的表面态, 所以研究SmB₆纳米材料的场发射特性可以为研究其表面量子特性提供有益的参考。本研究利用化学气相沉积法, 通过控制实验条件在硅衬底上分别实现了SmB₆纳米带和纳米线薄膜的生长。研究结果表明: 所制备的SmB₆纳米线和纳米带分别为沿着[100]和[110]方向生长的立方单晶结构。场发射特性的测试结果发现: SmB₆纳米带薄膜的开启电场为3.24 V/μm, 最大电流密度达到了466.16 μA/cm ², 其场发射性能要优于纳米线薄膜。同时考虑到SmB₆拥有很低的电子亲和势、高电导率和丰富的表面电子态, 所以若可以进一步提高其场发射特性, 那么很可能在冷阴极电子源领域有潜在应用。     

Significant enhancement of hole mobility in [110] silicon nanowires compared to electrons and bulk silicon

Utilizing sp3d5s* tight-binding band structure and wave functions for electrons and holes we show that acoustic phonon limited hole mobility in [110] grown silicon nanowires (SiNWs) is greater than electron mobility. The room temperature acoustically limited hole mobility for the SiNWs considered can be as high as 2500 cm2/V s, which is nearly three times larger than the bulk acoustically limited silicon hole mobility. It is also shown that the electron and hole mobility for [110] grown SiNWs exceed those of similar diameter [100] SiNWs, with nearly 2 orders of magnitude difference for hole mobility. Since small diameter SiNWs have been seen to grow primarily along the [110] direction, results strongly suggest that these SiNWs may be useful in future electronics. Our results are also relevant to recent experiments measuring SiNW mobility.