Improving the electrical properties of niobium-doped titania sputtering targets by sintering in oxygen-deficient atmospheres

Niobium-doped titania (TNO) film can be used as a transparent conductive oxide (TCO) film due to its excellent conductivity and visible transparency. The performances of TNO sputtering targets are thus critical issues in optimizing sputtered films. This study clarifies the influences of inert and reducing atmospheres on the microstructure, densification, crystal structure, and electrical properties of TNO sputtering targets. The results indicate that a sintering atmosphere of 90% Ar–10% H₂ can result in a lower sintered density, larger grain size, and lower resistivity than can an atmosphere of Ar, followed by one of air. Sintering in 90% Ar–10% H₂ or Ar obviously decreases the resistivity of TiO₂, from >10⁸ Ω cm to <10⁻¹ Ω cm, and the TNO target, from >10¹ Ω cm to <10⁻¹ Ω cm. The resistivity of TNO target sintered at 1200 °C in 90% Ar–10% H₂ is as low as 1.8×10⁻² Ω cm.     

TiO2/TNO homojunction introduced in a dye‐sensitized solar cell with a novel TNO transparent conductive oxide film

In this study, niobium‐doped titanium oxide (TNO) was employed for a novel transparent conductive oxide (TCO) film to construct a porous‐TiO₂/TNO homojunction in a dye‐sensitized solar cell (DSSC). However, considering a balance between the electrical and optical properties of the TCO film, the sheet resistance in TNO was tuned to be higher than that in a typical fluorine‐doped tin oxide (FTO). The photovoltaic performance of the cell with the TNO film (TNO cell) was optimized to be almost comparable to that with a conventional FTO film (FTO cell) by coating the surface of the porous‐TiO₂ layer with a thin alumina or magnesia film to block a back reaction within the cell. An electrochemical impedance measurement was conducted to determine the detailed photovoltaic performance from the viewpoint of electron transportation in the cell. R₁, the real part of ω₁, indicated that electron transportation at the porous‐TiO₂/TNO interface was more favorable than that at the porous‐TiO₂/FTO interface, which was supported by AC phase change in the cell at a high‐frequency range. We found that the homojunction newly introduced in the cell is one of the key concepts for developing a DSSC into a high‐performance photovoltaic device.     

Sintering densification behavior of ZnO–SnO2 binary ceramic targets

In this work, high-performance ZnO–SnO₂ binary ceramic targets for magnetron sputtering of transparent conductive oxide (TCO) films were prepared by pressureless oxygen atmosphere sintering. The sintering behavior and densification mechanism of the ZnO–SnO₂ binary targets were analyzed by systematically studying the oxide powder state, formation process of the solid reaction phase, and evolution of the target microstructure. The data revealed that the ZnO–SnO₂ powder treatment improved the sintering activity and the powder dispersion; furthermore, it promoted a mutual reaction between the different components during sintering and the homogeneity of the target composition. The densification of the pure SnO₂ ceramic target was difficult to achieve, and the addition of ZnO led to a continuous interaction between the ZnO and SnO₂ components. The Zn₂SnO₄ phase started to form, and a temporary shrinkage of the target occurred above 800°C. After formation of the stable Zn₂SnO₄ and SnO₂ phases, the target shrunk rapidly with increasing temperature, densification occurred during growth, and the two phases started to interact. The sintering temperature provided the driving force for the target densification, with the densification activation energy of the ZnO–SnO₂ binary ceramic target estimated to be 580 kJ/mol based on the master sintering curve. A binary ceramic target with a high density (99.78% relative density), a fine grain size, and a homogeneous phase structure was achieved at a temperature of 1600°C. These findings are promising for the further improvement and performance enhancement of SnO₂-based materials.     

Preparation and properties of AZO/PS/AZO tri-layer transparent conductive film with a light-trapping structure

The light-trapping structure is an effective method to increase solar light capture efficiency in the solar cells. In this study, Al-doped ZnO (AZO)/polystyrene (PS)/AZO tri-layer transparent conductive film with light-trapping structure was fabricated by magnetron sputtering and liquid phase methods. The structural, optical and electrical properties of the AZO films could be controlled by different growth conditions. When the sputtering pressure of the under-layer AZO film was 0.2 Pa, the discharge voltage was around 80 V, which was within the optimal process window for obtaining AZO film with high crystallinity. The optimal under-layer AZO film had a large surface roughness and a very low static water contact angle of 75.71°, promoting the relatively uniform distribution of PS spheres. Under this sputtering condition, the prepared AZO/PS/AZO tri-layer film had the highest crystallinity and least point defects. The highest carrier concentration and Hall mobility are 3.0 × 10²¹ cm^-3and 5.39 cm² V^-1 s^-1, respectively. Additionally, a transparent conductive film with the lowest resistivity value (3.88 × 10^-4 Ω cm) and the highest average haze value (26.5%) was obtained by optimizing the process parameters. These properties were comparable to or exceed the reported values of surface-textured SnO₂-based as well as ZnO-based TCOs films, making our films suitable for transparent electrode applications, especially in thin-film solar cells.     

Enhancing optical and electrical properties of Al-doped ZnO coated polyethylene terephthalate substrates by laser annealing using overlap rate controlling strategy

Aluminum-doped zinc oxide (AZO) layers were deposited on polyethylene terephthalate (PET) flexible substrates and optimized by laser annealing using a 532 nm nanosecond pulsed laser. Effects of overlap rates, i.e. laser spot overlap rate (SO_R) and laser scan line overlap rate (LO_R), on AZO/PET films were investigated by X-ray diffractometer (XRD), scanning electron microscope (SEM), UV–visible transmittance spectra and digital four-point probe instrument, respectively. Laser annealing could greatly enhance grain crystallinity, increase crystallite size and avoid damage to the PET flexible substrates, thus effectively enhance transmittance and conductivity of the films. The results showed that the AZO/PET film annealed by using 85% SO_R and 60% LO_R presented the highest average visible transmittance of 76.2% and the lowest resistivity of 1.95×10⁻³ Ω cm, which respectively improved by approximately 23% and 75% compared to those of the as-deposited AZO/PET film. This work may be of great importance from the viewpoint of performance optimization of transparent conductive oxide (TCO) flexible films.     

Al3+ doping induced changes of structural,morphology, photoluminescence,optical and electrical properties of SnO2 thin films as alternative TCO for optoelectronic applications

Highly transparent and conductive pure (SnO₂) and aluminum doped tin oxide (Al:SnO₂) thin films were deposited on glass substrates by the sol-gel spin-coating method. The structural, morphological, optical and electrical properties of the prepared thin films at different doping rates have been studied. X-ray diffraction results revealed that all the films were polycrystalline in nature with a tetragonal rutile structure. SEM images of the analyzed films showed a homogeneous surface morphology, composed of nanocrystalline grains. The EDS results confirmed the presence of Sn and O elements in pure SnO₂ and Sn, O, Al in doped SnO₂ thin films. The optical results revealed a high transmittance greater than 85% in the visible and near infrared and a band gap varying between 3.82 and 3.89 eV. PL spectra at room temperature showed that the most dominant defects correspond to oxygen vacancies. A low resistivity of order varying between 10^?3 and 10^?4 Ω cm and a high figure of merits ranging between 10^?3 and 10^?2 Ω^?1 in the visible range were obtained. The best performances were obtained for samples containing 2 at. % Al, which could be used as an alternative TCO layer for future optoelectronic devices.     

Room temperature preparation of high performance AZO films by MF sputtering

Aluminum-doped zinc oxide (AZO) thin films have been deposited by MF magnetron sputtering from a ceramic oxide target without heating the substrates. This study has investigated effects of sputtering power on the structural, electrical and optical properties of the AZO films. The films delivered a hexagonal wurtzite structure with (002) preferential orientation and uniform surface morphology with 27–33 nm grain size. The results indicate that residual stress and grain size of the AZO films are dependent on sputtering power. The minimum resistivity of 7.56×10^?4 Ω cm combined with high transmittance of 83% were obtained at deposited power of 1600 W. The films delivered the advantages of a high deposition rate at low substrate temperature and should be suitable for the fabrication of low-cost transparent conductive oxide layer.     

Synthesis of high-quality AZO polycrystalline films via target bias radio frequency magnetron sputtering

The deposition rate, transmittance and resistivity of aluminium-doped zinc oxide (AZO) films deposited via radio frequency (r.f.) sputtering change with target thickness. An effective method to control and maintain AZO film properties was developed. The strategy only involved the regulation of target bias voltage of r.f. magnetron sputtering system. The target bias voltage considerably influenced AZO film resistivity. The resistivity of the as-deposited AZO film was 9.82×10⁻⁴ Ω cm with power density of 2.19 W/cm² at target self-bias of −72 V. However, it decreased to 5.98×10⁻⁴ Ω cm when the target bias voltage was increased to −112 V by applying d.c. voltage. Both growth rate and optical band gap of AZO film increased with the absolute value of target bias voltage – growth rate increased from 10.54 nm/min to 25.14 nm/min, and band gap increased from 3.57eV to 3.71 eV when target bias voltage increased from −72 V to −112 V at r.f. power density of 2.19 W/cm². The morphology of AZO films was slightly affected by the target bias voltage. Regulating target bias voltage is an effective method to obtain high-quality AZO thin films deposited via r.f. magnetron sputtering. It is also a good choice to maintain the quality of AZO film in uptime manufacturing deposition.     

Fabrication of highly efficient TiO2/Ag/TiO2 multilayer transparent conducting electrode with N ion implantation for optoelectronic applications

Fabrication of highly conductive and transparent TiO₂/Ag/TiO₂ (referred hereafter as TAT) multilayer films with nitrogen implantation is reported. In the present work, TAT films were fabricated with a total thickness of 100 nm by sputtering on glass substrates at room temperature. The as-deposited films were implanted with 40 keV N ions for different fluences (1×10¹⁴, 5×10¹⁴, 1×10¹⁵, 5×10¹⁵ and 1×10¹⁶ ions/cm²). The objective of this study was to investigate the effect of N⁺ implantation on the optical and electrical properties of TAT multilayer films. X-ray diffraction of TAT films shows an amorphous TiO₂ film with a crystalline peak assigned to Ag (111) diffraction plane. The surface morphology studied by atomic force microscopy (AFM) and field emission scanning electron microscope (FESEM) revealed smooth and uniform top layer of the sandwich structure. The surface roughness of pristine film was 1.7 nm which increases to 2.34 nm on implantation for 1×10¹⁴ ions/cm² fluence. Beyond this fluence, the roughness decreases. The oxide/metal/oxide structure exhibits an average transmittance ~80% for pristine and ~70% for the implanted film at fluence of 1×10¹⁶ ions/cm² in the visible region. The electrical resistivity of the pristine sample was obtained as 2.04×10⁻⁴ Ω cm which is minimized to 9.62×10⁻⁵ Ω cm at highest fluence. Sheet resistance of TAT films decreased from 20.4 to 9.62 Ω/□ with an increase in fluence. Electrical and optical parameters such as carrier concentration, carrier mobility, absorption coefficient, band gap, refractive index and extinction coefficient have been calculated for the pristine and implanted films to assess the performance of films. The TAT multilayer film with fluence of 1×10¹⁶ ions/cm² showed maximum Haacke figure of merit (FOM) of 5.7×10⁻³ Ω⁻¹. X-ray photoelectron spectroscopy (XPS) analysis of N 1s and Ti 2p spectra revealed that substitutional implantation of nitrogen into the TiO₂ lattice added new electronic states just above the valence band which is responsible for the narrowing of band gap resulting in the enhancement in electrical conductivity. This study reports that fabrication of multilayer transparent conducting electrode with nitrogen implantation that exhibits superior electrical and optical properties and hence can be an alternative to indium tin oxide (ITO) for futuristic TCE applications in optoelectronic devices.     

Structural,electrical and optical properties of molybdenum-doped TiO2 thin films

Molybdenum doped TiO₂ (MTO) thin films were prepared by radio frequency (RF) magnetron sputtering at room temperature and followed by a heat treatment in a reductive atmosphere containing 90% N₂ and 10% H₂. XRD and FESEM were employed to evaluate the microstructure of the MTO films, revealing that the addition of molybdenum enhances the crystallization and increases the grain size of TiO₂ films. The optimal electrical properties of the MTO films were obtained with 3 wt% Mo doping, producing a resistivity of 1.1×10^?3 Ω cm, a carrier density of 9.7×10²⁰ cm^?3 and a mobility of 5.9 cm²/Vs. The refractive index and extinction coefficient of MTO films were also measured as a function of film porosity. The optical band gap of the MTO films ranged from 3.28 to 3.36 eV, which is greater than that of the un-doped TiO₂ film. This blue shift of approximately 0.14 eV was attributed to the Burstein–Moss effect.     

High-performance indium-free flexible transparent ATO/Au/ATO tri-layer films by magnetron sputtering

Due to the scarcity of indium (In) in the earth and its potential harm to individuals, the development of In-free transparent conductive film is considered crucial. In this work, In-free SnO₂:Sb/Au/SnO₂:Sb (ATO/Au/ATO, SAS) tri-layer films with high transparency and conductivity were successfully prepared on polycarbonate (PC) substrates by RF and DC magnetron sputtering at room temperature. The influence of the Au layer thickness on microstructure, electrical and optical performances was systematically studied after fixing the ATO thickness to 50 nm. It was indicated by X-ray diffraction patterns that ATO is amorphous and Au is oriented along (111). The trend of increasing and then decreasing light transmission with Au layer thickness was observed in both experimental and simulation results. The improved figure of merit (FoM, 1.89 × 10^?2 Ω^?1) was achieved in SAS tri-layer film, the resistivity and average transmittance of which was lowered to 7.50 × 10^?5 Ω cm and 81.4%, respectively, when Au layer thickness is 11 nm. Moreover, the mechanism of the variation of optical and electrical properties at different Au layer thickness was proposed. Particularly, the SAS tri-layer films also exhibit superior flexibility, durability and adhesion. These results demonstrate SAS tri-layer films are promising alternative to ITO in flexible electronics applications.     

Structural,electrical, and optical properties of Sb-doped SnO2 transparent conductive oxides fabricated using an electrospray technique

Sb-doped SnO₂ (ATO) thin films, for use as transparent conductive oxides (TCOs), were synthesized using an electrospray technique, and their structural, electrical, and optical properties were investigated. To elucidate the optimum fabrication conditions for the best electrical and optical properties, ATO thin films were calcined using four different temperatures, 450 °C, 550 °C, 650 °C, and 750 °C. When calcined at 650 °C, ATO thin films exhibit excellent resistivity (~8.14×10⁻³ Ω cm), superior transmittance (~91.4% at 550 nm), and good figure of merit (~11.4×10⁻⁴ Ω⁻¹) compared to the other samples. The enhanced properties of ATO thin films are attributed to high densification without formation of cracks, and the increased grain size of ATO nanoparticles.     

Effect of CaO doping on densification and microstructure control of highly transparent La0.4Gd1.6Zr2O7 ceramics

Calcium oxide (CaO) as sintering additive was first used to fabricate La_0.4Gd_1.6Zr₂O₇ transparent ceramics by a simple solid-state reaction and one-step vacuum sintering method. The effects of CaO dopant amount on the densification, as well as sintering behaviors and microstructure evolution of the as-fabricated La_0.4Gd_1.6Zr₂O₇ ceramics, were systematically investigated. Under the different sintering temperatures, the relationships during the sintering process between grain growth and zpore elimination were analyzed as well. It was found that 0.1 wt% CaO doping can effectively control the rate of grain growth and promote densification dominated by surface diffusion. Furthermore, Ca²⁺ entered the lattice of La_0.4Gd_1.6Zr₂O₇ ceramics to accelerate ion diffusion and suppress grain boundary migration. With the introduction of 0.1 wt% CaO doping, the highly transparent La_0.4Gd_1.6Zr₂O₇ ceramics (T = 80.4% at 1100 nm) were successfully fabricated at the traditional sintering temperature (1850°C).     

Electrically conductive SiC–(Nb,Ti)ss–(Nb,Ti)Css cermet

The present paper deals with the processing method of SiC–(Nb,Ti)_(ss)–(Ti,Nb)C_(ss) composites. The electrically conductive phases were formed by in situ reaction: NbC_(s) + Ti_(s) → (Nb,Ti)_(ss) + (Ti,Nb)C_(ss) that takes place during the reaction sintering by hot pressing. Prepared composites exhibit good compromise between electrical and mechanical properties and the present approach allows preparing a wide variety of compositions. For example composites containing 80 wt.% SiC and 20 wt.% {(Nb,Ti)_(ss)–(Ti,Nb)C_(ss)} have an electrical resistivity 2.6 × 10⁻⁴ Ω m, hardness 21.6 GPa and fracture toughness 6.3 MPa m^1/2.     

The sintering behavior,microstructure, and electrical properties of gallium-doped zinc oxide ceramic targets

The properties of sputtering targets have recently been found to affect the performances of sputtered films and the sputtering process. To develop high-quality GZO ceramic targets, the influences of Ga₂O₃ content and sintering temperature on the sintering behavior, microstructure, and electrical properties of GZO ceramic targets were studied.The results showed that the increase in Ga₂O₃ content from 3 wt% (GZO-3Ga) and 5 wt% (GZO-5Ga) not only inhibited the densification but retarded grain growth. During sintering, ZnGa₂O₄ phase formed before 800 °C, and Zn₉Ga₂O₁₂ phase was found after sintering at 1000 °C. Moreover, after sintering at 1200 °C, the number of Zn₉Ga₂O₁₂ precipitates increased at the expense of ZnGa₂O₄ and ZnGa₂O₄ disappearing completely. The relative density, grain size, and resistivity of GZO-3Ga sintered at 1400 °C in air were 99.3%, 3.3 μm, and 2.8 × 10⁻³ Ω cm, respectively. These properties of GZO ceramics are comparable to properties reported in the literature for AZO sintered in air.     

Essential Macleod Program (EMP) simulated fabrication of high quality Zn:SnO2/Ag/Zn:SnO2 multilayer transparent conducting electrode on flexible substrates

In the quest of promising Indium free amorphous transparent conducting oxide (TCO), Zn-doped SnO₂/Ag/Zn-doped SnO₂ (OMO) multilayer films were prepared on flexible polyethylene terephthalate (PET) substrates by RF sputtering at room temperature (RT). Growth parameters were optimized by varying sputtering power and working pressure, to have high electrical conductivity and optical transmittance. Optimization of the thickness of each layer was done by Essential Macleod Program (EMP) simulation to get the higher transmission through OMO multilayer. The sheet resistance and transmittance of 3 at% Zn-doped SnO₂ thin film (30 nm) were 2.23 kΩ/□, (ρ ~ 8.92×10⁻³ Ω∙cm) and 81.3% (at λ ~ 550 nm), respectively. By using optimized thicknesses of Zn-doped SnO₂ (30 nm) and Ag (12 nm) and optimized growth condition Zn-doped SnO₂/Ag/Zn-doped SnO₂ multilayer thin films were deposited. The low sheet resistance of 7.2 Ω/□ and high optical transmittance of 85.1% in the 550 nm wavelength region was achieved with 72 nm multilayer film.     

Microstructural,electrical, and mechanical properties of conductive SiC ceramics fabricated by spark plasma sintering

Nitrogen (N)-doped conductive silicon carbide (SiC) of various electrical resistivity grades can satisfy diverse requirements in engineering applications. To understand the mechanisms that determine the electrical resistivity of N-doped conductive SiC ceramics during the fast spark plasma sintering (SPS) process, SiC ceramics were synthesized using SPS in an N₂ atmosphere with SiC powder and traditional Al₂O₃–Y₂O₃ additive as raw materials at a sintering temperature of 1850–2000°C for 1–10 min. The electrical resistivity was successfully varied over a wide range of 10⁻³–10¹ Ω cm by modifying the sintering conditions. The SPS-SiC ceramics consisted of mainly Y–Al–Si–O–C–N glass phase and N-doped SiC. The Y–Al–Si–O–C–N glass phase decomposed to an Si-rich phase and N-doped Y_xSi_yC_z at 2000°C. The Vickers hardness, elastic modulus, and fracture toughness of the SPS-SiC ceramics varied within the ranges of 14.35–25.12 GPa, 310.97–400.12 GPa, and 2.46–5.39 MPa m^1/2, respectively. The electrical resistivity of the obtained SPS-SiC ceramics was primarily determined by their carrier mobility.     

Sol‐gel derived TiNb2O7 dielectric thin films for transparent electronic applications

To reduce power consumption of transparent oxide‐semiconductor thin film transistors, a gate dielectric material with high dielectric constant and low leakage current density is favorable. According to previous study, the bulk TiNb₂O₇ with outstanding dielectric properties may have an interest in its thin‐film form. The optical, chemical states and surface morphology of sol‐gel derived TiNb₂O₇ (TNO) thin films are investigated the effect of postannealing temperature lower than 500°C, which is crucial to the glass transition temperature. All films possess a transmittance near 80% in the visible region. The existence of non‐lattice oxygen in the TNO film is proposed. The peak area ratio of non‐lattice oxygen plays an important role in the control of leakage current density of MIM capacitors. Also, the capacitance density and dissipation factor were affected by the indium tin oxide (ITO) sheet resistance at high frequencies. The sample after postannealing at 300°C and electrode‐annealing at 150°C possesses a high dielectric constant (>30 at 1 MHz) and a low leakage current density (<1 × 10^?6 A/cm² at 1 V), which makes it a very promising gate dielectric material for transparent oxide‐semiconductor thin film transistors.     

Effect of Ni content and its particle size on electrical resistivity and flexural strength of porous SiC ceramic sintered at low-temperature using clay additive

A low-temperature sintered porous SiC-based clay-Ni system with controlled electrical resistivity (2.54 × 10¹⁰ Ω cm to 2 Ω cm), and thermal conductivity (3.5 W/m. K to 12.6 W/m. K) was successfully designed. Clay (20 wt% kaolin) was used as a sintering additive in all the compositions. The electrical resistivity, and thermal conductivity was controlled by varying the Ni content (0–25 wt%) in the samples. The electrical resistivity was recorded as low as 2 Ω cm with 25 wt% Ni that was sintered at 1400 °C in argon. The interface reaction between Ni and SiC formed conductive nickel silicide (Ni₂Si), while the transformation of kaolin to mullite strengthened the mechanical properties. Submicron-sized Ni (0.3 μm) was more effective than micron-sized Ni (3.5 μm) in reducing the electrical resistivity, and increasing the thermal conductivity along with flexural strength. A comparative study of sintering temperatures showed that 1400 °C resulted in the lowest electrical resistivity (2 Ω cm) and the highest thermal conductivity of 12.6 W/m. K with flexural strength of 54 MPa at 32% porosity in the SiC-kaolin-Ni system.     

Improved Crystal Quality of Transparent Conductive Ga‐doped ZnO Films by Magnesium Doping Through Radio‐Frequency Magnetron Sputtering Preparation

This study investigates the enhanced structural, and optoelectronic properties of transparent conductive Ga‐doped Mg_xZn_{1 ? x}O (GMZO) thin films with a varied magnesium (Mg) composition of 2% and 8%, respectively. The X‐ray diffraction (XRD) measurements revealed that GMZO with an 8% Mg composition shows a stronger (002) diffraction intensity and narrower linewidth than that with a 2% Mg composition. Improved crystallinity and enlarged grain size in the postgrowth thermal annealed GMZO thin films were also observed in XRD and morphological measurements by atomic force microscopy. Photoluminescence measurements were conducted to investigate the improved GMZO thin‐film quality, and the oxygen vacancy signal was found to decrease with increased Mg content, consistent with X‐ray photoelectron spectroscopy measurements. This study also shows high optical transmittance over 98%, and a low resistivity of 5.7 × 10^?4 Ω·cm in Ga‐doped Mg_xZn_{1 ? x}O (x = 0.02) thin film, which indicates the highly promising candidate for use in optoelectronic devices.