Investigations of Repetition Rate Stability of a Mode-Locked Quantum Dot Semiconductor Laser in an Auxiliary Optical Fiber Cavity

We have investigated experimentally the pulse train (mode beating) stability of a monolithic mode-locked multi-section quantum-dot laser with an added passive auxiliary optical fiber cavity. Addition of the weakly coupled (${approx}-24$ dB) cavity reduces the current-induced shift $dnu/dI$ of the principal peak in the RF spectrum (the effective pulse repetition frequency) by more than an order of magnitude, from ${-}39.5$ to ${-}2.3$ kHz/mA. The rms timing jitter of the pulse train is simultaneously reduced from 1.4 to 0.9 ps.      

Q-Band pHEMT and mHEMT Subharmonic Gilbert Upconversion Mixers

This letter makes a comparison between Q-band 0.15 $mu{rm m}$ pseudomorphic high electron mobility transistor (pHEMT) and metamorphic high electron mobility transistor (mHEMT) stacked-LO subharmonic upconversion mixers in terms of gain, isolation and linearity. In general, a 0.15 $mu{rm m}$ mHEMT device has a higher transconductance and cutoff frequency than a 0.15 $mu{rm m}$ pHEMT does. Thus, the conversion gain of the mHEMT is higher than that of the pHEMT in the active Gilbert mixer design. The Q-band stacked-LO subharmonic upconversion mixers using the pHEMT and mHEMT technologies have conversion gain of $-$7.1 dB and $-$0.2 dB, respectively. The pHEMT upconversion mixer has an ${rm OIP}_{3}$ of $-$12 dBm and an ${rm OP}_{1 {rm dB}}$ of $-$24 dBm, while the mHEMT one shows a 4 dB improvement on linearity for the difference between the ${rm OIP}_{3}$ and ${rm OP}_{1 {rm dB}}$. Both the chip sizes are the same at 1.3 mm $times$ 0.9 mm.      

2 MHz AO $Q$ -switched ${rm TEM}_{00}$ Grazing Incidence Laser With 3 at.% Neodymium Doped Nd:YVO$_{4}$

We present a detailed experimental and theoretical study of the ultrahigh repetition rate AO $Q$ -switched ${rm TEM}_{00}$ grazing incidence laser. Up to 2.1 MHz $Q$-switching with ${rm TEM}_{00}$ output of 8.6 W and 2.2 MHz $Q$ -switching with multimode output of 10 W were achieved by using an acousto-optics $Q$ -switched grazing-incidence laser with optimum grazing-incidence angle and cavity configuration. The crystal was 3 at.% neodymium doped Nd:YVO$_{4}$ slab. The pulse duration at 2 MHz repetition rate was about 31 ns. The instabilities of pulse energy at 2 MHz repetition rate were less than ${pm}6.7hbox{%}$ with ${rm TEM}_{00}$ operation and ${pm}3.3hbox{%}$ with multimode operation respectively. The modeling of high repetition rate $Q$-switched operation is presented based on the rate equation, and with the solution of the modeling, higher pump power, smaller section area of laser mode, and larger stimulated emission cross section of the gain medium are beneficial to the $Q$-switched operation with ultrahigh repetition rate, which is in consistent with the experimental results.      

Linear Systems, Sparse Solutions, and Sudoku

In this paper, we show that Sudoku puzzles can be formulated and solved as a sparse linear system of equations. We begin by showing that the Sudoku ruleset can be expressed as an underdetermined linear system: ${mmb{Ax}}={mmb b}$, where ${mmb A}$ is of size $mtimes n$ and $n>m$. We then prove that the Sudoku solution is the sparsest solution of ${mmb{Ax}}={mmb b}$, which can be obtained by $l_{0}$ norm minimization, i.e. $minlimits_{mmb x}Vert{mmb x}Vert_{0}$ s.t. ${mmb{Ax}}={mmb b}$. Instead of this minimization problem, inspired by the sparse representation literature, we solve the much simpler linear programming problem of minimizing the $l_{1}$ norm of ${mmb x}$, i.e. $minlimits_{mmb x}Vert{mmb x}Vert_{1}$ s.t. ${mmb{Ax}}={mmb b}$, and show numerically that this approach solves representative Sudoku puzzles.      

Positive Bias Temperature Instability (PBTI) Characteristics of Contact-Etch-Stop-Layer-Induced Local-Tensile-Strained $hbox{HfO}_{2}$ nMOSFET

The positive bias temperature instability (PBTI) characteristics of contact-etch-stop-layer (CESL)-strained $hbox{HfO}_{2}$ nMOSFET are thoroughly investigated. For the first time, the effects of CESL on an $hbox{HfO}_{2}$ dielectric are investigated for PBTI characteristics. A roughly 50% reduction of $V_{rm TH}$ shift can be achieved for the 300-nm CESL $hbox{HfO}_{2}$ nMOSFET after 1000-s PBTI stressing without obvious $ hbox{HfO}_{2}/hbox{Si}$ interface degradation, as demonstrated by the negligible charge pumping current increase ($≪$ 4%). In addition, the $hbox{HfO}_{2}$ film of CESL devices has a deeper trapping level (0.83 eV), indicating that most of the shallow traps (0.75 eV) in as-deposited $ hbox{HfO}_{2}$ film can be eliminated for CESL devices.      

Improved Microwave Noise Performance by SiN Passivation in AlGaN/GaN HEMTs on Si

Effects of silicon nitride (SiN) surface passivation by plasma enhanced chemical vapor deposition (PECVD) on microwave noise characteristics of AlGaN/GaN HEMTs on high-resistivity silicon (HR-Si) substrate have been investigated. About 25% improvement in the minimum noise figure $(NF_{min})$ (0.52 dB, from 2.03 dB to 1.51 dB) and 10% in the associate gain $(G_{rm a})$ (1.0 dB, from 10.3 dB to 11.3 dB) were observed after passivation. The equivalent circuit parameters and noise source parameters (including channel noise coefficient $(P)$, gate noise coefficient $(R)$, and their correlation coefficient $(C)$ ) were extracted. $P$ , $R$ and $C$ all increased after passivation and the increase of C contributes to the decrease of the noise figure. It was found that the improved microwave small signal and noise performance is mainly due to the increase of the intrinsic transconductance $(g_{{rm m}0})$ and the decrease of the extrinsic source resistance $(R_{rm s})$.      

A Linearization Technique for RF Receiver Front-End Using Second-Order-Intermodulation Injection

A linearization technique is proposed in which low-frequency second-order-intermodulation $({rm IM}_{2})$ is generated and injected to suppress the third-order intermodulation $({rm IM}_{3})$. The proposed linearization technique is applied to both a low-noise amplifier (LNA) and a down-conversion mixer in an RF receiver front-end (RFE) working at 900 MHz. Fabricated in a 0.18$ mu{hbox{m}}$ CMOS process and operated at 1.5 V supply with a total current of 13.1 mA, the RFE delivers 22 dB gain with 5.3 dB noise figure (NF). The linearization technique achieves around 20 dB ${rm IM}_{3}$ suppression and improves the RFE's ${rm IIP}_{3}$ from $-$ 10.4 dBm to 0.2 dBm without gain reduction and noise penalty while requiring only an extra current of 0.1 mA.      

Zn$_{1 - x}$Mg$_{x}$ O Homojunction-Based Ultraviolet Photodetector

Zn$_{1 - {x}}$ Mg$_{x}$ O p-n photodiodes were fabricated on (0001) sapphire substrates using a pulsed laser deposition technique with different Mg contents. Ti–Au and Ni–Au metals deposited using vacuum evaporation were used as n-type and p-type contacts, respectively. The X-ray diffraction analysis showed the Zn$_{1 - {x}}$Mg$_{x}$O double layers have a single phase hexagonal wurtzite structure. The optical bandgap of Zn$_{1 - {x}}$Mg$_{x}$O films has been tuned from 3.27 to 4.26 eV by increasing the Mg content ${x} =0.0$ to ${x}=0.34$. Correspondingly, the cutoff wavelength of the resultant detectors varies from 380 to 284 nm. Zn$_{1 - {x}}$Mg$_{x}$O p-n photodiodes with different Mg contents exhibit very good performance, with a very low dark current (${≪}$ 20 pA) at the bias voltage of 10 V. The ultraviolet to visible rejection ratio is more than three orders of magnitude.      

A Biphase Modulator Circuit for Impulse Radio-UWB Applications

This letter presents a circuit to provide binary phase shift keying to ultra-wideband (UWB) impulse transmitters. The circuit is based on a Gilbert-cell multiplier and uses active on-chip balun and unbalanced-to-balanced converters for single-ended to single-ended operation. Detailed measurements of the circuit show a gain ripple of $pm 1~{rm dB}$ at an overall gain of $-2~{rm dB}$, an input reflection below $-12~{rm dB}$, an output reflection below $-18~{rm dB}$, a group delay variation below 6 ps and a $-1~{rm dB}$ input compression point of more than 1 dBm in both switching states over the full 3.1–10.6 GHz UWB frequency range. A time domain measurement verifies the switching operation using an FCC-compliant impulse generator. The circuit is fabricated in a $0.8~mu {rm m}$ Si/SiGe HBT technology, consumes 31.4 mA at a 3.2 V supply and has a size of $510 times 490~mu{rm m}^{2}$ , including pads. It can be used in UWB systems using pulse correlation reception or spectral spreading.      

1580-V–40-$hbox{m}Omegacdot hbox{cm}^{2}$ Double-RESURF MOSFETs on 4H-SiC $(hbox{000}bar{hbox{1}})$

Double-reduced-surface-field (RESURF) MOSFETs with $hbox{N}_{2}hbox{O}$ -grown oxides have been fabricated on the 4H-SiC $(hbox{000} bar{hbox{1}})$ face. The double-RESURF structure is effective in reducing the drift resistance, as well as in increasing the breakdown voltage. In addition, by utilizing the 4H-SiC $(hbox{000}bar{hbox{1}})$ face, the channel mobility can be increased to over 30 $hbox{cm}^{2}/hbox{V}cdothbox{s}$, and hence, the channel resistance is decreased. As a result, the fabricated MOSFETs on 4H-SiC $( hbox{000}bar{hbox{1}})$ have demonstrated a high breakdown voltage $(V_{B})$ of 1580 V and a low on-resistance $(R_{rm ON})$ of 40 $hbox{m}Omega cdothbox{cm}^{2}$. The figure-of-merit $(V_{B}^{2}/R_{rm ON})$ of the fabricated device has reached 62 $hbox{MW/cm}^{2}$, which is the highest value among any lateral MOSFETs and is more than ten times higher than the “Si limit.”      

A 3–10 GHz CMOS UWB Low-Noise Amplifier With ESD Protection Circuits

A low-power fully integrated low-noise amplifier (LNA) with an on-chip electrostatic-static discharge (ESD) protection circuit for ultra-wide band (UWB) applications is presented. With the use of a common-gate scheme with a ${rm g}_{rm m}$ -boosted technique, a simple input matching network, low noise figure (NF), and low power consumption can be achieved. Through the combination of an input matching network, an ESD clamp circuit has been designed for the proposed LNA circuit to enhance system robustness. The measured results show that the fabricated LNA can be operated over the full UWB bandwidth of 3.0 to 10.35 GHz. The input return loss $({rm S}_{11})$ and output return loss $({rm S}_{22})$ are less than ${-}8.3$ dB and ${-}9$ dB, respectively. The measured power gain $({rm S}_{21})$ is $11 pm 1.5$ dB, and the measured minimum NF is 3.3 dB at 4 GHz. The dc power dissipation is 7.2 mW from a 1.2 V supply. The chip area, including testing pads, is 1.05 mm$,times,$ 0.73 mm.      

A 36–80 GHz High Gain Millimeter-Wave Double-Balanced Active Frequency Doubler in SiGe BiCMOS

This letter presents a high conversion gain double-balanced active frequency doubler operating from 36 to 80 GHz. The circuit was fabricated in a 200 GHz ${rm f}_{rm T}$ and ${rm f}_{max}$ 0.18 $mu$m SiGe BiCMOS process. The frequency doubler achieves a peak conversion gain of 10.2 dB at 66 GHz. The maximum output power is 1.7 dBm at 66 GHz and ${-}3.9$ dBm at 80 GHz. The maximum fundamental suppression of 36 dB is observed at 60 GHz and is better than 20 dB from 36 to 80 GHz. The frequency doubler draws 41.6 mA from a nominal 3.3 V supply. The chip area of the active frequency doubler is 640 $mu$m $,times,$424 $mu$m (0.272 mm $^{2}$) including the pads. To the best of authors' knowledge, this active frequency doubler has demonstrated the highest operating frequency with highest conversion gain and output power among all other silicon-based active frequency doublers reported to date.      

Performance Improvement of N-Type $hbox{TiO}_{x}$ Active-Channel TFTs Grown by Low-Temperature Plasma-Enhanced ALD

We report on performance improvement of $n$-type oxide–semiconductor thin-film transistors (TFTs) based on $hbox{TiO}_{x}$ active channels grown at 250 $^{circ}hbox{C}$ by plasma-enhanced atomic layer deposition. TFTs with as-grown $hbox{TiO}_{x}$ films exhibited the saturation mobility $(mu_{rm sat})$ as high as 3.2 $hbox{cm}^{2}/hbox{V}cdothbox{s}$ but suffered from the low on–off ratio $(I_{rm ON}/I_{rm OFF})$ of $hbox{2.0} times hbox{10}^{2}$. $hbox{N}_{2}hbox{O}$ plasma treatment was then attempted to improve $I_{rm ON}/I_{rm OFF}$. Upon treatment, the $hbox{TiO}_{x}$ TFTs exhibited $I_{rm ON}/I_{rm OFF}$ of $hbox{4.7} times hbox{10}^{5}$ and $mu_{rm sat}$ of 1.64 $hbox{cm}^{2}/hbox{V}cdothbox{s}$, showing a much improved performance balance and, thus, demonstrating their potentials for a wide variety of applications such as backplane technology in active-matrix displays and radio-frequency identification tags.      

Temperature-Insensitive Dual-Comb Filter Based on Multimode Interference Ti : LiNbO $_{3}$ Waveguide

A temperature-insensitive dual-comb filter has been demonstrated for the first time by multimode interference based on a Ti : LiNbO$_{3}$ channel waveguide. The phase difference between comb filters was about 180 $^{circ}$. We only observed less than ${pm}$0.125-nm variation of the center wavelength of the filter during temperature change from 20 $^{circ}$C to 50 $^{circ}$C. The measured extinction ratio and channel spacing of the comb filter were about ${-}$25 dB and 3.2 THz, respectively.      

Low-Threshold Strained Quantum-Well GaSb-Based Lasers Emitting in the 2.5- to 2.7-$mu$ m Wavelength Range

GaInAsSb–GaSb strained quantum-well (QW) ridge waveguide diode lasers emitting in the wavelength range from 2.51 to 2.72 $ mu{hbox {m}}$ have been grown by molecular beam epitaxy. The devices show ultralow threshold current densities of 44 $hbox{A}/{hbox {cm}}^{2}$ (${L}rightarrow infty $) for a single QW device at 2.51 $ mu{hbox {m}}$, which is the lowest reported value in continuous-wave operation near room temperature (15 $^{circ}hbox{C}$) at this wavelength. The devices have an internal loss of 3 ${hbox {cm}}^{-1}$ and a characteristic temperature of 42 K. By using broader QWs, wavelengths up to 2.72 $mu{hbox {m}}$ could be achieved.      

A Fully Integrated 0.13- $mu$m CMOS 40-Gb/s Serial Link Transceiver

A fully integrated 40-Gb/s transceiver fabricated in a 0.13-$mu$m CMOS technology is presented. The receiver operates at a 20-GHz clock performing half-rate clock and data recovery. Despite the low ${rm f}_{rm T}$ of 70 GHz, the input sampler achieves 10-mV sensitivity using pulsed latches and inductive-peaking techniques. In order to minimize the feedback latency in the bang-bang controlled CDR loop, the proportional control is directly applied to the VCO, bypassing the charge pump and the loop filter. In addition, the phase detection logic operates at 20 GHz, eliminating the need for the deserializers for the early/late timing signals. The four clock phases for the half-rate CDR are generated by a quadrature LC-VCO with microstrip resonators. A linear equalizer that tunes the resistive loading of an inductively-peaked CML buffer can improve the eye opening by 20% while operating at 39 Gb/s. The prototype transceiver occupies 3.4$, times ,$2.9 mm$^{2}$ with power dissipation of 3.6 W from a 1.45-V supply. With the equalizer on, the transmit jitter of the 39-Gb/s 2$^{15}-1$ PRBS data is 1.85 ${rm ps}_{rm rms}$ over a WB-PBGA package, an 8-mm PCB trace, an on-board 2.4-mm connector, and a 1 m-long 2.4-mm coaxial cable. The recovered divided-by-16 clock jitter is 1.77 ${rm ps}_{rm rms}$ and the measured BER of the transceiver is less than $10^{- 14}$ .      

Injection Locking and Switching Operations of a Novel Retro-Reflector-Cavity-Based Semiconductor Micro-Ring Laser

Injection locking and switching characteristics are investigated in the novel retro-reflector-cavitiy-based semiconductor ring laser with equivalent circular radius of 26 $mu$ m. The allowed detuning range is up to ${sim}$3 GHz wide and the highest side mode suppression ratio of ${sim}$ 43.7 dB can be achieved. A fast response speed of ${sim}$70 ps to the cavity is achieved, which indicates that this device can be utilized as an all optical switch at a data rate of 10 Gb/s or higher.      

A Low-Voltage Mobility-Based Frequency Reference for Crystal-Less ULP Radios

The design of a 100 kHz frequency reference based on the electron mobility in a MOS transistor is presented. The proposed low-voltage low-power circuit requires no off-chip components, making it suitable for application in wireless sensor networks (WSN). After a single-point calibration, the spread of its output frequency is less than 1.1% (3$sigma $) over the temperature range from $-{hbox{22}},^{circ}{hbox{C}}$ to 85$,^{circ}{hbox{C}}$ . Fabricated in a baseline 65$~$nm CMOS technology, the frequency reference circuit occupies 0.11$ hbox{mm}^{2}$ and draws 34 $ muhbox{A}$ from a 1.2 V supply at room temperature.      

A 0.13 $mu$ m CMOS Quad-Band GSM/GPRS/EDGE RF Transceiver Using a Low-Noise Fractional-N Frequency Synthesizer and Direct-Conversion Architecture

This paper presents a single-chip CMOS quad-band (850/900/1800/1900 MHz) RF transceiver for GSM/GPRS/EDGE applications which adopts a direct-conversion receiver, a direct-conversion transmitter and a fractional-N frequency synthesizer with a built-in DCXO. In the GSM mode, the transmitter delivers 4 dBm of output power with 1$^{circ}$ RMS phase error and the measured phase noise is ${-}$164.5 dBc/Hz at 20 MHz offset from a 914.8$~$MHz carrier. In the EDGE mode, the TX RMS EVM is 2.4% with a 0.5 $~$dB gain step for the overall 36 dB dynamic range. The RX NF and IIP3 are 2.7 dB/ ${-}$12 dBm for the low bands (850/900 MHz) and 3 dB/${-}$ 11 dBm for the high bands (1800/1900 MHz). This transceiver is implemented in 0.13 $mu$m CMOS technology and occupies 10.5 mm$^{2}$ . The device consumes 118 mA and 84 mA in TX and RX modes from 2.8 V, respectively and is housed in a 5$,times,$ 5 mm$^{2}$ 40-pin QFN package.      

Multi-Channel Field-Effect Transistor (MCFET)—Part I: Electrical Performance and Current Gain Analysis

Multi-Channel Field-Effect Transistor (MCFET) structures with ultralow $I_{ rm OFF}$ (16 $hbox{pA}/muhbox{m}$) and high $I_{rm ON}$ (N: 2.27 $ hbox{mA}/muhbox{m}$ and P: 1.32 $hbox{mA}/muhbox{m}$ ) currents are obtained on silicon on insulator (SOI) with a high-$ kappa$/metal gate stack, satisfying both low-standby-power and high-performance requirements. The experimental current gain of the MCFET structure is compared with that of an optimized planar FD-SOI reference with the same high-$kappa$/metal gate stack and is quantitatively explained by an analytical model. Transport properties are investigated, and the specific MCFET electrostatic properties are evidenced, in particular a higher $V_{rm Dsat}$ for MCFETs compared with the planar reference. Finally, through 3-D numerical simulations correlated with specific characterizations, the influence of the channel width on the electrical performance is analyzed. For narrow devices, the parasitic bottom channel increases the total drain current of the MCFET structure without degrading the electrostatic integrity.