微波烧结法制备Ba0.65Sr0.35TiO3热释电陶瓷

采用溶胶－凝胶工艺制备了（Ba,Sr)TiO3凝胶，并利用微波烧结技术对粉体进行了合成和烧结，获得了晶粒尺寸在1μm以内的Ba0.65Sr0.35TiO3热释电陶瓷。对样品的介电特性和热释电特性进行了测试，分析了微波烧结工艺对材料电性能的影响。实验结果表明：该工艺可将钙钛矿相的合成温度由1100℃降低至900℃，并在1310℃烧结25min获得细晶粒的Ba0.65Sr0.35TiO3，其热释电系数和介电常数与传统陶瓷相差不大，从而材料的热释电响应优值因子要比传统方法获得的样品提高了近1倍。     

利用Ba0.65Ru0.35TiO3缓冲层制备高热释电系数的Ba0.65Sr0.35TiO3薄膜

采用射频溅射,在Ba0.65Sr0.35TiO3(BST)薄膜和Pt/Ti/SiO2/Si衬底之间制备10 nm的Ba0.65Ru0.35RUO3 (BSR)缓冲层,研究了BSR缓冲层对BST薄膜结构和性能的影响.与没有BSR缓冲层的BST薄膜相比,BSR缓冲层可使BST薄膜呈高度a轴择优取向生长,改善了薄膜的介电常数,降低了薄膜的漏电流密度,使其热释电系数达到7.45×10-1 C cm-2 K-1.表明利用BSR缓冲层可以制备高热释电性能的BST薄膜.     

Ba0.7Sr0.3TiO3热释电陶瓷材料研究

采用Pechini法制备了100 nm的Ba0.7Sr0.3TiO3纳米粉体,并用凝胶注模成型工艺制备不同Mn含量的BST陶瓷。研究表明,在Mn掺杂量为0.5%(摩尔分数),烧结温度为1 280℃时制备的样品,其热释电性能较好,在居里温度附近,30～40℃时,其平均热释电系数为450μC.m–2.K–1,对应平均探测率优值为5.6μC.m–3.K–1,1kHz频率条件下tanδ低于0.5%,εr为3 500左右(室温20℃,外加偏压200 V/mm)。     

射频磁控溅射参数对 Ba0.7Sr0.3TiO3薄膜结构和性能的影响

采用射频磁控溅射法在 Pt/TiO2/SiO2/Si(100) 衬底上制备了Ba0.7Sr0.3TiO3薄膜,研究了工作气压、衬底温度等溅射参数对Ba0.7Sr0.3TiO3薄膜结构和电学性质的影响.使用 XRD 分析了工作气压为 2Pa、衬底温度分别为 200 ℃、400 ℃、600℃(组a),以及衬底温度为600℃、工作气压分别为 1.5Pa、2.0Pa、2.5Pa、3.0Pa 和 5.0Pa (组b)两组薄膜的微结构,结果表明工作气压在 2.5Pa 以下、衬底温度为 600℃时沉积的薄膜具有较好的钙钛矿结构.在 1.5Pa 条件下溅射的薄膜具有明显的(111)择优取向.在2.5Pa时,Pt/Ba0.7Sr0.3TiO3/Pt电容有最优铁电性能,在外加4 V电压(电场为 80 kV/cm)下,剩余极化 (Pr) 和矫顽场(Ec)分别为 2.32 μC/cm2、21.1 kV/cm.     

复合热释电薄膜红外探测器的研究

热绝缘结构是热释电红外探测器的关键技术之一."复合热释电薄膜红外探测器"是用多孔SiO2薄膜来绝热的,这种无空气隙的新型结构被认为具有更高的机械强度和可靠性.采用溶胶-凝胶技术制备了热导率极低的多孔SiO2薄膜,用金属有机物热分解法制备了优质的铁电薄膜,实现了"复合热释电薄膜"热绝缘结构,获得的星探测率最大值达9.3×107cm.Hz1/2/W.通过快速热处理工艺的采用,提高薄膜一次成膜厚度的研究,改善了薄膜制备与微电路工艺的兼容性.研究了多孔膜厚度、孔径分布与探测率的关系,探讨了镍酸镧(LNO)薄膜作为缓冲层、红外吸收层和上电极的多功能作用.结果表明:孔径分布小的多孔膜有利于探测器性能的提高.在此结构中,存在热性能和电性能的折中问题,多孔膜厚度有一个临界值.LNO薄膜的引入,可以改善性能、简化结构和工艺.讨论了低温铁电薄膜的制备和性能,以及与微电路实现单片集成等问题.     

MgO掺杂对Ba0.6Sr0.4TiO3陶瓷性能的影响

采用常规陶瓷加工成型及烧结工艺,研究了在Ba0.6Sr0.4TiO3(BST)陶瓷中掺杂1.0%,20.0%,40.0%,60.0%(质量分数)的MgO后介电性能的变化规律。又通过对微波介质性能的测量,绘制出Ba0.6Sr0.4TiO3(BST)陶瓷随温度变化的相变图及其介电常数和可调谐率随MgO掺杂量变化的曲线。     

稀土氧化物掺杂对Ba0.6Sr0.4TiO3-MgO复合物结构及微波介电性能的影响

研究了不同质量分数(0~1.5%)的各种稀土氧化物对Ba0.6Sr0.4TiO3(40%)-MgO(60%)陶瓷微观结构和介电性能的影响.研究表明,大半径的稀土离子掺杂能有效降低材料的介电常数并提高品质因数;而小半径的稀土离子掺杂则会提高材料的微波介电损耗.当掺杂量超过0.2%时,所有样品的调谐率都随着添加量的增加而下降.与未掺杂的BST-MgO相比,0.2%稀土掺杂样品的调谐率变化规律及机理随掺杂物的不同而不同:Nd2O3和Yb2O3 掺杂样品中调谐率的大幅度升高归因于结电容的贡献,Sm2O3 掺杂样品调谐率的下降主要由MgO晶粒的聚集所致,而Y3+同时占据A位和B位引起了样品调谐率的下降.研究发现在BST-MgO中添加具有大离子半径的稀土氧化物(如La2O3、CeO2、Nd2O3、Sm2O3)并优化其添加量,能满足铁电移相器等微波调谐器件的要求.     

化学溶液法制备的Ba0.9Sr0.1TiO3薄膜的结构及光学特性研究

采用高度稀释的前驱体溶液在LaNiO3(LNO)薄膜上沉积了Ba0.9Sr0.1TiO3(BST)薄膜。X-射线衍射分析表明BST薄膜呈高度的（100）择优取向。原子力显微镜测量发现制备的BST薄膜具有大的晶粒尺寸80-200nm。用椭偏光谱仪测量了光子能量为0.7-3.4eV范围内BST薄膜的椭偏光谱，用Cauchy模型描述BST薄膜的光学性质，获得了BST薄膜的光学常数谱和禁带宽度Eg=3.36eV。     

烧结温度对BaxSr1-xTiO3薄膜性能的影响

Ba、Sr0.3TiO3具有优良的介电和热释电性质，特别是可以通过改变组分来调节居里点，使其在动态随机存储器（DRAM）和红外探测器方面有着广泛的应用前景。制备薄膜的方法很多，如射频磁控贱射法、激光沉积法、化学气相沉积法、溶胶-凝胶（Sol-Gel）法等。本文用溶胶-凝胶法以乙二醇甲醚为溶剂制备出BST薄膜，并用SPM对BST薄膜进行表征，得出对薄膜进行热处理的最佳条件及掺杂对薄膜表面形象的影响。     

(Ba0.5Sr0.5)TiO3/LaNiO3异质薄膜的介电调谐特性

用脉冲激光沉积工艺制备Ba0.5Sr0.5TiO3(简称BST)薄膜和Ba0.5Sr0.5TiO3/LaNiO3(简称BST/LNO)薄膜。在650℃原位退火10 min,获得了(100)和(110)择优取向生长的BST和BST/LNO薄膜,薄膜晶粒呈柱状结构,BST薄膜和BST/LNO异质结构薄膜的晶粒尺寸分别为150~200 nm和50~80 nm。在室温和1 MHz条件下,BST薄膜和BST/LNO异质结构薄膜的相对介电常数和介电调谐率分别达811和58.9%、986和60.1%;用LNO作底电极,可增益介电常数和介电调谐率。     

磁控溅射法制备BST铁电薄膜的实验研究

采用射频磁控溅射法在Si和Pt/TiOx/SiO2/Si衬底上沉积了(Ba0.65Sr0.35)TiO3铁电薄膜,研究了BST铁电薄膜微观结构和介电性能。实验结果表明:衬底温度在550℃,工作气压为2.0 Pa的溅射条件下沉积的BST薄膜,经750℃退火处理30 min后,形成了完整的钙钛矿相;与Si衬底相比,在Pt衬底上制备的BST薄膜晶粒更均匀、表面平整无裂纹。在室温、频率为100 kHz条件下薄膜的介电常数ε=353.8,介电损耗tanδ=0.012 8。介电温谱结果表明制备的(Ba0.65Sr0.35)TiO3铁电薄膜居里温度在5.0℃左右。     

Dielectric Characteristics of Ba0.65Sr0.35TiO3 Thin Films Sol-Gel Method

Ferroelectric Ba0.65Sr0.35TiO3 （BST） thin films on the Pt/Ti/SiO2/Si substrate have been successfully prepared by sol-gel. Such films have approximately 300 nm thicknesses with a remnant polarization of about 2.95 μ℃/cm^2 and a coercive field of about 21.5 kV/cm. The investigations of X-ray diffraction and atomic force microscopy show that the BST films annealed at 650 ℃ exhibit a tetragonal structure and that the films dominantly consist of large column or grains of about 89 nm in diameter. The curves of the temperature dependence of dielectric coefficient in different frequencies display the curie transition at the temperature around 23 ℃. The dielectric loss tangent of BST thin fdms at 100 kHz is less than 0.04. As a result, the BST thin films are more applicable for fabrication of infrared detector compared with the BST thin films reported previously.     

Dielectric Characteristics of Ba_(0.65)Sr_(0.35)TiO_3 Thin Films by Sol-Gel Method

Ferroelectric Ba0.65Sr0.35TiO3(BST) thin films on the Pt/Ti/SiO2/Si substrate have been successfully prepared by sol-gel. Such films have approximately 300 nm thicknesses with a remnant polarization of about 2.95 μC/cm2 and a coercive field of about 21.5 kV/cm. The investigations of X-ray diffraction and atomic force microscopy show that the BST films annealed at 650 °C exhibit a tetragonal structure and that the films dominantly consist of large column or grains of about 89 nm in diameter. The curves of the temperature dependence of dielectric coefficient in different frequencies display the curie transition at the temperature around 23 °C. The dielectric loss tangent of BST thin films at 100 kHz is less than 0.04. As a result,the BST thin films are more applicable for fabrication of infrared detector compared with the BST thin films reported previously.     

溶胶–凝胶法制备BST薄膜的结晶特性研究

采用改进的溶胶–凝胶(sol-gel)工艺配制了(Ba0.65,Sr0.35)TiO3(BST)溶胶。利用旋转涂覆工艺将BST溶胶涂覆在SiO2/Si衬底上,在不同的热处理条件下制备出BST薄膜。XRD分析结果表明:制得的BST薄膜形成了单一钙钛矿结构;AFM测试结果表明,BST薄膜表面平整致密,无裂纹。表面均方根粗糙度为3~6nm,晶粒大小分布均匀,直径约为40~100nm。随着热处理温度的提高,BST薄膜的晶粒变大,表面粗糙度变大。     

钛酸锶钡薄膜的电子显微研究

传统的硅工业一直按照摩尔定律的预测在向高集成度发展。动态随机存储器的存储密度也需要不断的提高 ,也就是要求同样的信息存储在更小的面积内。传统的方法是通过不断地减小介电层 (非晶ＳｉＯ2 )的厚度来满足动态随机存储器向高集成度发展的要求的。然而 ,当电介质的厚度小到一定程度后 ,电子的隧道穿透效应将会使该器件无法工作 ,这个厚度就是它的极限厚度。约 80年代末期 ,人们开始普遍的关注到这个极限的到来 ,并开始寻找解决的途径。其中最有希望的途径就是利用高介电系数的电介质替换低介电系数的ＳｉＯ2 ,也就是通过提高电介质的介…     

Electrical properties of sputtered (Ba, Sr)TiO3 thin films prepared by two-step deposition method

The influence of two-step deposition on the electrical properties of sputtered (Ba,Sr)TiO₃ thin films was investigated. BST thin films with thickness 40 nm were deposited by a simple two-step radio frequency-magnetron sputtering technique, where the BST thin film consisted of a seed layer and a main layer. The dielectric constant was strongly dependent on the thickness of seed layer, but there was no dependence on deposition temperature of the seed layer. For a 2 nm seed layer, the dielectric constants were higher by about 29% than those of single-step BST thin films due to higher crystallinity and the leakage current was nearly the same as that of a single-step sample in bias voltage from −2 to 2.5 V. However, an improvement of the dielectric constant was not observed for samples having above 4 nm thick seed layers. A 40 nm thick BST film with 2 nm thick seed layer deposited by a two-step method exhibited a SiO₂ equivalent thickness of 0.385 nm and a leakage current density of 2.74 × 10⁻⁸A/cm²at+1.5V after post-annealing under an atmosphere of flowing N₂ for 30 min at 750°C.     

LaAlO3单晶基片上制备Ba0．5Sr0．5TiO3薄膜的透射电镜研究

铁电钛酸锶钡(Ba1-xSrx)TiO3(BSTO)薄膜材料具有很好的可调性，在微电子工业有广阔的应用前景。本文采用脉冲激光沉积(PLD)技术在(001)LaAlO3单晶基片上外延生长了Ba0.5Sr0.5TiO3薄膜。利用透射电子显微镜对薄膜的截面样品进行了微结构和界面行为的研究。     

退火处理对磁控溅射制备Ga掺杂ZnO薄膜性能的影响

采用磁控溅射法在普通玻璃上制备了Ga掺杂ZnO(GZO)薄膜,研究了退火处理对GZO薄膜组织结构、表面形貌及光电性能的影响,并利用扫描电子显微镜、X射线衍射仪、紫外分光光度计、四探针测试仪等对GZO薄膜的表面形貌、晶体结构、透光率及电阻率等进行测量与表征。结果表明:400~800℃退火对GZO薄膜的生长方式影响较小,所制薄膜均在(002)晶向沿c轴择优取向,退火温度对薄膜表面形貌影响较大,退火温度为600℃时,薄膜表面致密、平整,结晶质量最好,薄膜的透光率超过95%,电阻率最低为4.9×10~(-4)?·cm。     

Study on the structural, electrical and optical properties of Al-F co-doped ZnO thin films prepared by RF magnetron sputtering

Al and F co-doped ZnO(ZnO:(Al,F)) thin films on glass substrates are prepared by the RF magnetron sputtering with different F doping contents.The structural,electrical and optical properties of the deposited films are sensitive to the F doping content.The X-ray analysis shows that the films are c-axis orientated along the(002) plane with the grain size ranging from 9 nm to 13 nm.Micrographs obtained by the scanning electron microscope(SEM) show a uniform surface.The best films obtained have a resistivity of 2.16×10-3Ω·cm,while the high optical transmission is 92.0% at the F content of 2.46 wt.%.