Computer simulation of a-Si/c-Si heterojunction solar cell with high conversion efficiency

The p-type a-Si:H/n-type c-Si (P⁺ a-Si:H/N⁺ c-Si) heterojunction was simulated for developing solar cells with high conversion efficiency and low cost. The characteristic of such cells with different work function of transparent conductive oxide (TCO) were calculated. The energy band structure, quantum efficiency and electric field are analyzed in detail to understand the mechanism of the heterojunction cell. Our results show that the a-Si/c-Si heterojunction is hypersensitive to the TCO work function, and the TCO work function should be large enough in order to achieve high conversion efficiency of P⁺ a-Si:H/N⁺ c-Si solar cells. With the optimized parameters set, the P⁺ a-Si:H/N⁺ c-Si solar cell reaches a high efficiency (η) up to 21.849% (FF: 0.866, V_OC: 0.861 V, J_SC: 29.32 mA/cm²).     

Large area ZnO films optimized for graded band-gap Cu(InGa)Se2-based thin-film mini-modules

In this study, two deposition methods (i.e. MOCVD and sputtering methods) to prepare n-type ZnO window layers for CIGS-based thin-film solar cells are discussed. In order to make ZnO : Al transparent conductive oxide (TCO) films prepared by DC magnetron sputtering comparable to ZnO : B TCO prepared by MOCVD, a new ZnO sputtering process is proposed by introducing a multilayer structure. Using these films, CIGS thin-film solar cells with efficiencies of greater than 14% have been fabricated with an active area of 3.2 cm². This structure was adapted to fabricate CIGS thin-film mini-modules with efficiencies around 11% having aperture area of 50 cm².     

Design optimization of bifacial HIT solar cells on p-type silicon substrates by simulation

Heterojunction with intrinsic thin layer (HIT) solar cells fabricated on p-type silicon substrates usually demonstrate inferior performance than those formed on n-type substrates. The influence of various structure parameters on the performance of the c-Si(p)-based bifacial HIT solar cell, i.e., the TCO/a-Si:H(n)/a-Si:H(i)/c-Si(p)/a-Si:H(i)/a-Si:H(p⁺)/TCO solar cell, was investigated in detail by computer simulation using the AFORS-HET software. The work function of the transparent conductive oxide was found to be a key factor to affect the solar cell performance. Detailed influence mechanisms were analysed. Accordingly, the design optimization of the bifacial HIT solar cells on c-Si(p) substrates was provided.     

Optimization of interface structures in crystalline silicon heterojunction solar cells

In heterojunction solar cells consisting of hydrogenated amorphous silicon (a-Si:H) and crystalline silicon (c-Si), suppression of epitaxial growth at the heterointerface is found to be crucial to achieve high solar cell efficiencies. In order to avoid the epitaxial growth, wide-gap hydrogenated amorphous silicon oxide (a-SiO:H) has been applied to the heterojunction solar cells. We have fabricated a-SiO:H/c-Si solar cells using n-type and p-type c-Si substrates and demonstrated that incorporation of the a-SiO:H i layer prevents the harmful epitaxial growth at the heterointerface completely.     

High-efficiency μc-Si/c-Si heterojunction solar cells

P-type microcrystalline silicon (μc-Si (p)) on n-type crystalline silicon (c-Si(n)) heterojunction solar cells is investigated. Thin boron-doped μc-Si layers are deposited by plasma-enhanced chemical vapor deposition on CZ-Si and the V_oc of μc-Si/c-Si heterojunction solar cells is higher than that produced by a conventional thermal diffusion process. Under the appropriate conditions, the structure of thin μc-Si films on (1 0 0), (1 1 0), and (1 1 1) CZ-Si is ordered, so high V_oc of 0.579 V is achieved for 2×2 cm² μc-Si/multi-crystalline silicon (mc-Si) solar cells. The epitaxial-like growth is important in the fabrication of high-efficiency μc-Si/mc-Si heterojunction solar cells.     

Voltage and current loss in semiconductor solar cells from MCV and simultaneous IV measurements

We present a method for determining the voltage and current loss in solar cells using the modulation capacitance voltage measuring technique. Both losses can be investigated in the forward biased mode and the generator mode. The method is especially suitable for characterising particular loss components due to band offsets and interface recombination in heteroemitter solar cells. Nonlinear loss-versus-current characteristics were generally found for a-Si:H(p⁺), SIPOS(n⁺) and ZnO(n⁺) emitters on c-Si. The losses are strongly modified by the preparation which affects the heterojunction interface. These results can give insight into effects of recombination and band offsets in both bands.     

Impact of Zn1-xMgxO:Al transparent electrode for buffer-less Cu(In,Ga)Se2 solar cells

Buffer layers such as CdS and ZnS are used in high efficiency Cu(In,Ga)Se₂ (CIGS) thin film solar cells. Eliminating buffer layer is attractive to realize low-cost thin film solar cells by reducing fabrication process. However, the elimination of the buffer layers leads to shunting due to the interface recombination between transparent conductive oxide (TCO) and CIGS layers. To reduce the interface recombination, the control of conduction band offset (CBO) is effective. In this study, we fabricated Zn_1−xMg_xO:Al (ZMO:Al) as the TCO for the CBO control. ZMO:Al was prepared by co-sputtering of ZnO:Al₂O₃ (ZnO:Al) and MgO:Al₂O₃ targets. ZMO:Al shows high transmittance in visible region and the band gap energy widen with the addition of Mg to ZnO:Al. Buffer-less CIGS solar cells with an Al/NiCr/TCO/CIGS/Mo/soda-lime glass structure using ZMO:Al and ZnO:Al were fabricated. For comparison, ZnO/CdS buffered cell was also fabricated. Current density-voltage characteristics of the devices showed the cell with ZMO:Al film achieved higher efficiency compared to the buffer-less cell with ZnO:Al. This result suggested that the control of CBO is important to reduce interface recombination between TCO layer and CIGS absorber.     

Performance of spray-deposited ZnO:In layers as front electrodes in thin-film silicon solar cells

The surface morphology, optical and electrical properties of spray-deposited ZnO:In layers are characterized and compared to ASAHI U-type SnO₂:F. Both TCO layers were implemented as front electrodes in a-Si:H single-junction solar cells. The similar V_oc of the solar cells indicates a good electrical contact between the ZnO:In layer and the a-Si:H material. The difference in solar cell performance between cells on ASAHI U-type TCO (10%) and the spray-deposited ZnO:In (8.4%) is mainly due to a Jsc-loss, caused by the lower ZnO:In bandgap and insufficient surface texturing. Surface roughening experiments of ZnO:In layers have been carried out.     

TCO and light trapping in silicon thin film solar cells

For thin film silicon solar cells and modules incorporating amorphous (a-Si:H) or microcrystalline (μc-Si:H) silicon as absorber materials, light trapping, i.e. increasing the path length of incoming light, plays a decisive role for device performance. This paper discusses ways to realize efficient light trapping schemes by using textured transparent conductive oxides (TCOs) as light scattering, highly conductive and transparent front contact in silicon p–i–n (superstrate) solar cells. Focus is on the concept of applying aluminum-doped zinc oxide (ZnO:Al) films, which are prepared by magnetron sputtering and subsequently textured by a wet-chemical etching step. The influence of electrical, optical and light scattering properties of the ZnO:Al front contact and the role of the back reflector are studied in experimentally prepared a-Si:H and μc-Si:H solar cells. Furthermore, a model is presented which allows to analyze optical losses in the individual layers of a solar cell structure. The model is applied to develop a roadmap for achieving a stable cell efficiency up to 15% in an amorphous/microcrystalline tandem cell. To realize this, necessary prerequisites are the incorporation of an efficient intermediate reflector between a-Si:H top and μc-Si:H bottom cell, the use of a front TCO with very low absorbance and ideal light scattering properties and a low-loss highly reflective back contact. Finally, the mid-frequency reactive sputtering technique is presented as a promising and potentially cost-effective way to up-scale the ZnO front contact preparation to industrial size substrate areas.     

Flexible amorphous and microcrystalline silicon tandem solar modules in the temporary superstrate concept

Encapsulated and series-connected amorphous silicon (a-Si:H) and microcrystalline silicon (μc-Si:H) based thin film silicon solar modules were developed in the superstrate configuration using an aluminum foil as temporary substrate during processing and a commodity polymer as permanent substrate in the finished module. For the development of μc-Si:H single junction modules, aspects regarding TCO conductivity, TCO reduction, deposition uniformity, substrate temperature stability and surface morphology were addressed. It was established that on sharp TCO morphologies where single junction μc-Si:H solar cells fail, tandem structures consisting of an a-Si:H top cell and a μc-Si:H bottom cell can still show a good performance. Initial aperture area efficiencies of 8.2%, 3.9% and 9.4% were obtained for fully encapsulated amorphous silicon (a-Si:H) single junction, microcrystalline silicon (μc-Si:H) single junction and a-Si:H/μc-Si:H tandem junction modules, respectively.     

a-Si:H(p)/c-Si(n)异质结太阳电池的模拟优化

通过AFORS-HET软件模拟了TCO/a-Si:H(p)/a-Si:H(i)/c-Si(n)/a-Si:H(i)/a-Si:H(n)/Ag结构的硅异质结电池中硅衬底电阻率、本征非晶硅薄膜厚度、发射极材料特性以及TCO功函数对电池性能的影响。结果表明:在其它参数不变的条件下,硅衬底电阻率越低,转换效率越高;发射极非晶硅薄膜厚度对短路电流有较大影响,发射极掺杂浓度低于7.0×10¹⁹cm^-3时,电池各项性能参数都极差;TCO薄膜功函数应大于5.2 eV,以保证载流子的输运收集。     

Wet-etch texturing of ZnO:Ga back layer on superstrate-type microcrystalline silicon solar cells

Surface wet etching is applied to the ZnO:Ga (GZO) back contact in μc-Si thin film solar cells. GZO transparency increases with increasing deposition substrate temperature. Texturing enhances reflective scattering, with etching around 5-6 s producing the best scattering, whereas etching around 5 s produces the best fabricated solar cells. Etching beyond these times produces suboptimal performance related to excessive erosion of the GZO. The best μc-Si solar cell achieves FF=68%, V_OC=471 mV and J_SC=21.48 mA/cm² (η=6.88%). Improvement is attributed to enhanced texture-induced scattering of light reflected back into the solar cell, increasing the efficiency of our lab-made single μc-Si solar cells from 6.54% to 6.88%. Improved external quantum efficiency is seen primarily in the longer wavelengths, i.e. 600-1100 nm. However, variation of the fabrication conditions offers opportunity for significant tuning of the optical absorption spectrum.     

Development of thin film amorphous silicon oxide/microcrystalline silicon double-junction solar cells and their temperature dependence

We have developed thin film silicon double-junction solar cells by using micromorph structure. Wide bandgap hydrogenated amorphous silicon oxide (a-SiO:H) film was used as an absorber layer of top cell in order to obtain solar cells with high open circuit voltage (V_oc), which are attractive for the use in high temperature environment. All p, i and n layers were deposited on transparent conductive oxide (TCO) coated glass substrate by a 60 MHz-very-high-frequency plasma enhanced chemical vapor deposition (VHF-PECVD) technique. The p-i-n-p-i-n double-junction solar cells were fabricated by varying the CO₂ and H₂ flow rate of i top layer in order to obtain the wide bandgap with good quality material, which deposited near the phase boundary between a-SiO:H and hydrogenated microcrystalline silicon oxide (μc-SiO:H), where the high V_oc can be expected. The typical a-SiO:H/μc-Si:H solar cell showed the highest initial cell efficiency of 10.5%. The temperature coefficient (TC) of solar cells indicated that the values of TC for conversion efficiency (η) of the double-junction solar cells were inversely proportional to the initial V_oc, which corresponds to the bandgap of the top cells. The TC for η of typical a-SiO:H/μc-Si:H was −0.32%/ °C, lower than the value of conventional a-Si:H/μc-Si:H solar cell. Both the a-SiO:H/μc-Si:H solar cell and the conventional solar cell showed the same light induced degradation ratio of about 20%. We concluded that the solar cells using wide bandgap a-SiO:H film in the top cells are promising for the use in high temperature regions.     

Advances in a-Si:H/c-Si heterojunction solar cell fabrication and characterization

Our progress in amorphous/crystalline silicon (a-Si:H/c-Si) heterojunction solar cell technology and current understanding of fundamental device physics are presented. In a-Si:H/c-Si cells, device performance is strongly dependent on the quality of the a-Si:H/c-Si heterojunction. Four topics are crucial to minimize recombination at the junction and thereby maximize cell efficiency: wet-chemical pre-treatment of the c-Si surface prior to a-Si:H deposition; optimum a-Si:H doping; thermal and plasma post-treatments of the a-Si:H/c-Si structure. By optimizing these aspects using specifically developed characterization methods, we were able to realize (n)a-Si:H/(p)c-Si and (p)a-Si:H/(n)c-Si cells with up to 18.5% and 19.8% efficiency, respectively.     

Fabrication of flexible CdTe solar modules with monolithic cell interconnection

CdTe solar cells and modules have been manufactured on polyimide (PI) substrates. Aluminum doped zinc oxide (ZnO:Al) was used as a transparent conductive oxide (TCO) front contact, while a thin high resistive transparent layer of intrinsic zinc oxide (i-ZnO) was used between the front contact and the CdS layer. The CdS and CdTe layers were evaporated onto the ZnO:Al/i-ZnO coated PI films in a high vacuum evaporation system followed by a CdCl₂ activation treatment and a Cu–Au electrical back contact deposition. In some cases prior to the cell deposition, the PI film was coated with MgF₂ on the light facing side and the effects on the optical and electrical properties of TCO and solar cells were investigated. The limitations on current density of solar cells due to optical losses in the PI substrate were estimated and compared to the experimentally achieved values. Flexible CdTe solar cells of highest efficiencies of 12.4% and 12.7% were achieved with and without anti-reflection MgF₂ coating, respectively.Laser scribing was used for patterning of layers and monolithically interconnected flexible solar modules exhibiting 8.0% total area efficiency on 31.9 cm² were developed by interconnection of 11 solar cells in series.     

Development of high efficiency p-i-n amorphous silicon solar cells with the p-μc-Si:H/p-a-SiC:H double window layer

A structure is developed to help improve the TCO/p contact and efficiency of the solar cell. A p-i-n amorphous silicon (a-Si:H) solar cell with high-conversion efficiency is presented via use of a double p-type window layer composed of microcrystalline silicon and amorphous silicon carbide. The best efficiency is obtained for a glass/textured TCO/p-μc-Si:H/p-a-SiC:H/buffer/i-a-Si:H/n-μc-Si:H/GZO/Ag structure. Using a SnO₂/GZO bi-layer and a p-type hydrogenated microcrystalline silicon (p-μc-Si:H) layer between the TCO/p-a-SiC:H interface improves the photovoltaic performance due to reduction of the surface potential barrier. Layer thickness, B₂H₆/SiH₄ ratio and hydrogen dilution ratio of the p-μc-Si:H layer are studied experimentally. It is clearly shown that the double window layer can improve solar cell efficiency. An initial conversion efficiency of 10.63% is achieved for the a-Si:H solar cell.     

New materials and deposition techniques for highly efficient silicon thin film solar cells

This paper reviews recent efforts to provide the scientific and technological basis for cost-effective and highly efficient thin film solar modules based on amorphous (a-Si:H) and microcrystalline (μc-Si:H) silicon. Textured ZnO:Al films prepared by sputtering and wet chemical etching were applied to design optimised light-trapping schemes. Necessary prerequisite was the detailed knowledge of the relationship between film growth, structural properties and surface morphology obtained after etching. High rate deposition using plasma enhanced chemical vapour deposition at 13.56 MHz plasma excitation frequency was developed for μc-Si:H solar cells yielding efficiencies of 8.1% and 7.5% at deposition rates of 5 and 9 Å/s, respectively. These μc-Si:H solar cells were successfully up-scaled to a substrate area of 30×30 cm² and applied in a-Si:H/μc-Si:H tandem cells showing initial test cell efficiencies up to 11.9%.     

Characterization and simulation of a-Si:H/μc-Si:H tandem solar cells

We simulated device characteristics of a-Si:H single junction, μc-Si:H single junction and a-Si:H/μc-Si:H tandem solar cells with the numerical device simulator Advanced Semiconductor Analysis (ASA). For this purpose we measured and adjusted electrical and optical input parameters by comparing measured and simulated external quantum efficiency, current−voltage characteristic and reflectivity spectra. Consistent reproducibility of experimental data by numerical simulation was achieved for all types of cells investigated in this work. We also show good correspondence between the experimental and simulated characteristics for a-Si:H/μc-Si:H tandem solar cells with various absorber thicknesses on both Asahi U-type SnO₂:F and sputtered/etched (Jülich) ZnO:Al substrates. Based on this good correlation between experiment and theory, we provide insight into device properties that are not directly measurable like the spatially resolved absorptance and the voltage-dependent carrier collection. These data reveal that the difference between tandem solar cells grown on Asahi U-type and Jülich ZnO substrates primarily arises from their optical properties. In addition, we find out that the doped layers do not contribute to the photocurrent except for the front p-layer. We also calculated the initial efficiencies of a-Si:H/μc-Si:H tandem solar cells with different combinations of a-Si:H and μc-Si:H absorber layer thicknesses. The maximum efficiency is found at 260 nm/1500 nm for tandem solar cells on Asahi U-type substrates and at 360 nm/850 nm for tandem solar cells on Jülich ZnO substrates.     

Silicon-based thin-film solar cells fabricated near the phase boundary by VHF PECVD technique

The light-soaked and annealing behaviors for silicon (Si)-based thin-film single-junction solar cells fabricated near the phase boundary using a very-high-frequency plasma-enhanced chemical vapor deposition (VHF PECVD) technique are investigated. The hydrogen dilution ratio is changed in order to achieve wide band gap hydrogenated amorphous Si (a-Si:H) and narrow band gap hydrogenated microcrystalline Si (μc-Si:H) absorbers. Just below the a-Si:H-to-μc-Si:H transition, highly hydrogen-diluted a-Si:H solar cells with a good stability against light-soaking and fast annealing behavior are obtained. In contrast, the solar cell fabricated at the onset of the μc-Si:H growth is very unstable and its annealing behavior is slow. In the case of μc-Si:H solar cells with the crystal volume fraction of 43–53%, they show the lowest light-induced degradation among the fabricated solar cells. However, it is very difficult to recover the degraded μc-Si:H solar cells via thermal annealing.     

A new light trapping TCO for nc-Si:H solar cells

A new transparent conducting light trapping structure with no free carrier absorption for solar cells is described. Indium oxide doped with molybdenum (IMO), prepared by the hollow cathode sputtering technique, exhibits high charge-carrier mobility up to 80 cm²/V s. No free-carrier absorption in the near infrared region has been found in the IMO. The superior long-wavelength transparency, however, is not sufficient for thin film Si solar cell applications. To obtain the highest possible short circuit current, the TCO needs to possess additional light trapping structure. Anisotropic etching of fiber texture oriented ZnO has been shown to result in an effective light trapping structure. Here we propose a bilayer structure that consists of light trapping-intrinsic ZnO and IMO (the ZnO/IMO bilayer). Both layers show low free-carrier absorption up to the wavelength of 1200 nm. We demonstrate the use of such a transparent conducting light trapping oxide (TCLO) in nanocrystalline (nc-Si:H) solar cells fabricated by a single chamber, batch-type PECVD process. Incorporation of such a transparent conducting light trapping bilayer can increase solar cell short-circuit current density (J_sc) by >30% compared to flat bilayers.