A complete 400-Mb/s burst-mode data OEIC receiver

A fully integrated burst-mode GaAs MESFET optoelectronic integrated circuit (OEIC) receiver, 215 mil×109 mil, that has been designed and implemented for point-to-point data links for application as a phased-array antenna controller is described. The chip provides a low-cost means for passing 400-Mb/s antenna control information using fiber optics with a very low bit-error rate (BER). Approximately 350 source-coupled FET logic gates are present on the chip. A new data coding and timing recovery scheme that is highly tolerant to jitter over a wide bandwidth has been developed. The OEIC uses an on-chip metal-semiconductor-metal (MSM) photodiode with 0.12-A/W responsivity measured at 780 nm and was fabricated in a 1.0-mm GaAs MESFET manufacturing technology. The low capacitance semi-insulating GaAs substrate minimizes the coupling between analog and digital circuitry. The circuit operates from a single 5-V supply, consumes 1 W of power, and provides an 8-b CMOS output bus together with various utility flags. Optical sensitivity is estimated at -20 dBm for 10^-14 BER     

A 10 Gb/s hybrid-integrated receiver array module using a planarlightwave circuit (PLC) platform including a novel assembly regionstructure

A planar lightwave circuit (PLC) platform for optoelectronic hybrid integration shows potential for achieving 10 Gb/s operation. It uses AuSn bump-type bonding pads on a silica layer to decrease parasitic capacitance, which limited the CR time constant in the optical chip assembly region, and two-layer electrical wiring to reduce parasitic inductance, which caused resonance in the electrical circuit region. An arrayed receiver module fabricated by integrating a two-channel monolithic opto-electronic integrated circuit (OEIC) chip on the PLC platform demonstrated a 3 dB-bandwidth of 8 GHz in both channels, which is equal to the bandwidth of the OEIC chip. This shows the feasibility of using this PLC platform for multichannel 10 Gb/s operation. Furthermore, this PLC platform can combine the versatile optical circuit functions of a PLC, such as an arrayed-waveguide grating wavelength multiplexer, with the high-speed signal processing function of mature electronic IC circuits. Consequently, this platform is a key device that will lead to high-capacity optical signal processing systems using optical wavelength/frequency routing     

256-channel bidirectional optical interconnect using VCSELs andphotodiodes on CMOS

Two-dimensional parallel optical interconnects (2-D-POIs) are capable of providing large connectivity between elements in computing and switching systems. Using this technology we have demonstrated a bidirectional optical interconnect between two printed circuit boards containing optoelectronic (OE) very large scale integration (VLSI) circuits. The OE-VLSI circuits were constructed using vertical cavity surface emitting lasers (VCSELs) and photodiodes (PDs) flip-chip bump-bonded to a 0.35-μm complementary metal-oxide-semiconductor (CMOS) chip. The CMOS was comprised of 256 laser driver circuits, 256 receiver circuits, and the corresponding buffering and control circuits required to operate the large transceiver array. This is the first system, to our knowledge, to send bidirectional data optically between OE-VLSI chips that have both VCSELs and photodiodes cointegrated on the same substrate     

光收发器中光电集成接收芯片的实现

针对应用于850nm光通信中的10/100Mbit/s收发器,提出采用0.5μm标准CMOS工艺对其光接收芯片实现Si基单片集成。整体芯片面积为0.6mm2,共集成了一个双光电二极管的(DPD)光电探测器和一个跨阻前置放大电路,功耗为100mW,并给出了具体的测试性能结果。结果表明,在850nm光照下,光接收芯片带宽达到53MHz,工作速率为72Mbit/s。重点介绍了DPD光电探测器的原理和结构,并给出了相应的制造过程和电路等效模型,对整个光接收芯片进行了多种实用性测试,可以满足系统的性能要求。     

High-yield flip-chip bonding and packaging of low-threshold VCSEL arrays on sapphire substrates

Oxide-confined top-emitting 850 nm and bottom-emitting 980 nm vertical-cavity surface-emitting laser (VCSEL) 8/spl times/8 arrays were designed and fabricated for applications of optical interconnects. The arrays were flip-chip bonded onto sapphire substrates that contain complimentary metal-oxide-semiconductor (CMOS) driver and fan-out circuitries. The off-sited bonding contacts and minimized bonding force produced very high yield of the hybridization process without causing damage to the VCSEL mesas. The hybridized devices were further mounted either on printed circuit board (PCB) or in 68-pin pin-grid-array (PGA) packages. The transparent sapphire substrate allowed optical outputs from the top-emitting VCSEL arrays to transmit directly through without additional substrate removal procedure. Lasing thresholds below 250 /spl mu/A for 850 nm VCSELs and 800 /spl mu/A for 980 nm VCSEL were found at room temperature. The oxide confinement apertures of VCSELs were measured to be around 6 /spl mu/m in diameter. High-speed data transmission demonstrated a bandwidth of up to 1 Gbits/s per channel for these hybridized VCSEL transmitters.     

An optically clocked transistor array with dual serial-to-parallel and parallel-to-serial conversion capability for optical label swapping

We propose an optically clocked transistor array optoelectronic integrated circuit (OEIC) for both serial-to-parallel and parallel-to-serial conversion (demux/mux), enabling an interface between high-speed asynchronous burst optical labels and CMOS circuitry for optical label swapping. Dual functionality of the OEIC reduces size, power, and cost of the optical label swapper. The capability for greater than 20-Gb/s conversion operation is demonstrated.     

一种硅光电接收处理集成电路的技术研究

介绍了一种在硅衬底上集成光电二极管探测器和双极接收放大处理电路的单芯片光电集成电路OEIC。从理论上阐述了光电器件实现的原理;为实现光电探测二极管与单片双极集成电路的兼容,设计了光电探测器的专用结构,并研制了光电探测器的专用模型。对接收处理电路进行了模拟仿真和优化设计。建立了与双极工艺兼容的制作光电二极管探测器的专用工艺;采用该工艺,对光电器件进行了版图设计、工艺制作和测试研究,给出了初步试验的方法和结果。     

A monolithically integrated 1-Gb/s optical receiver in 1-μm CMOStechnology

Results of a monolithically integrated Si optical receiver for applications in optical data transmission and in optical interconnects with wavelengths of 638 and 850 nm are presented. The optoelectronic integrated circuit (OEIC) implementing a vertical p-type-intrinsic-n-type photodiode achieves a data rate of 1 Gb/s for 638 nm with a sensitivity of -15.4 dBm at a bit-error rate of 10^-9 . The sensitivity of this OEIC in a 1.0-μm CMOS technology is improved by at least a factor of four compared to that of published submicrometer OEICs. A 25-THz.Ω effective transimpedance bandwidth product of the implemented amplifier is achieved     

High-sensitivity BiCMOS OEIC for optical storage systems

A new BiCMOS optoelectronic integrated circuit (OEIC) for applications in advanced optical storage systems is presented. It is optimized with respect to high sensitivity and high speed. The photodiode and the amplifier are monolithically integrated on the same substrate in a commercial 0.8-/spl mu/m BiCMOS process. Analytical expressions for the compensation capacitors and for the bandwidth of the OEIC are derived. Neglecting antireflection coating, no process modifications are necessary to produce the integrated photodiodes. A new offset compensation scheme is implemented in the amplifiers to allow for a small chip area and low power consumption. The OEIC shows a sensitivity of 43.3 mV//spl mu/W in combination with a -3-dB bandwidth of 60.2 MHz.     

A fault-tolerant 30 ns/375 mW 16K/spl times/1 NMOS static RAM

A fault-tolerant 30950 mil/SUP 2/ (19.9 mm/SUP 2/) 16K/spl times/1 static MOS RAM has been fabricated with a single polysilicon E/D NMOS process. Using circuit techniques normally restricted to dynamic RAMs, but adapted for asynchronous operation, the device achieves a typical access time of 30 ns while dissipating only 375 mW. Among the topics discussed in a new single-polysilicon memory cell configuration, the first truly asynchronous bootstrap circuit, an active bit-line equilibration and precharge scheme, and a new power-efficient substrate bias generator. Also described is an on-chip redundancy scheme which consumes approximately 2 percent of the total chip area, does not compromise access time and can be programmed using standard test equipment.     

高速12路并行CMOS单片光电集成接收机设计与实现

设计并实现了一个高速12路并行CMOS单片光电集成接收机.其每一路都包括一个光探测器、一个跨阻放大器以及后续放大电路.双光电二极管(DPD)结构可以提高接收机速度,但同时降低了响应度.在跨阻放大器电路中采用有源电感来展宽-3dB带宽.通过无锡上华(CSMC)0.6μm CMOS工艺流片并对芯片进行了测试.测试结果显示该接收机单路传输比特率可达0.8～1.4 Gb/s,总的12路可传输15Gb/s数据.     

10 Gb/s OEIC optical receiver front-end and 3.125 Gb/s PHEMT limiting amplifier

A 10 Gb/s OEIC (optoelectronic integrated circuit) optical receiver front-end has been studied and fab ricated based on the φ-76 mm GaAs PHEMT process; this is the first time that a limiting amplifier (LA) has been designed and realized using depletion mode PHEMT. An OEIC optical receiver front-end mode composed of an MSM photodiode and a current mode transimpedance amplifier (TIA) has been established and optimized by simu lation software ATLAS. The photodiode has a bandwidth of 10 GHz, a capacitance of 3 fF/μm and a photosensitive area of 50×50 μm~2. The whole chip has an area of 1511×666 μm~2. The LA bandwidth is expanded by spiral inductance which has been simulated by software HFSS. The chip area is 1950×1910μm~2 and the measured results demonstrate an input dynamic range of 34 dB (10-500 mVpp) with constant output swing of 500 tnVpp.     

高低压兼容单片CMOS驱动器的设计

采用标准n阱硅栅等平面CMOS工艺,将耐压大于200V、吸收电流大于200mA的高压功率VMOS器件与工作在5V电源电压的CMOS控制电路兼容在同一个硅芯片上。分析了电路设计及工艺措施,证明这种技术可以低成本地制作各种低高压兼容电路。     

1.0-/spl mu/m n-Well CMOS/Bipolar Technology

High-performance 1.0-/spl mu/m n-well CMOS/bipolar on-chip technology was developed. For process simplicity, an n-well and a collector of bipolar transistors were formed simultaneously, and base and NMOS channel regions were also made simultaneously resulting in collector-isolated vertical n-p-n bipolar transistor fabrication without any additional process step to CMOS process. On the other hand, 1.0-/spl mu/m CMOS with a new "hot carrier resistant" seIf-defined Polysilicon sidewall spacer (SEPOS) LDD NMOS was developed. It can operate safely under supply voltage over 5 V without performance degradation of CMOS circuits. By evaluating ring oscillators and differential amplifiers constructed by both CMOS and bipolar transistors. it can be concluded that in a digital and in an analog combined system, CMOS has sufficiently high-speed performance for digital parts, while bipolar is superior for analog parts. In addition, bipolar transistors with an n/sup +/-buried layer were also fabricated to reduce collector resistance. Concerning the bipolar input/output buffers, the patterned n/sup +/-buried layer improves the drivability and high-frequency response. As a result, the applications of n-well CMOS/bipolar technology become clear. This technology was successfully applied to a high-speed 64-kbit CMOS static RAM, and improvement in access time was observed.     

Investigation and Design of On-Chip Power-Rail ESD Clamp Circuits Without Suffering Latchup-Like Failure During System-Level ESD Test

On-chip power-rail electrostatic discharge (ESD) protection circuit designed with active ESD detection function is the key role to significantly improve ESD robustness of CMOS integrated circuits (ICs). Four power-rail ESD clamp circuits with different ESD-transient detection circuits were fabricated in a 0.18-$mu{hbox{m}}$ CMOS process and tested to compare their system-level ESD susceptibility, which are named as power-rail ESD clamp circuits with typical RC-based detection, PMOS feedback, NMOS+PMOS feedback, and cascaded PMOS feedback in this work. During the system-level ESD test, where the ICs in a system have been powered up, the feedback loop used in the power-rail ESD clamp circuits provides the lock function to keep the ESD-clamping NMOS in a “latch-on” state. The latch-on ESD-clamping NMOS, which is often drawn with a larger device dimension to sustain high ESD level, conducts a huge current between the power lines to perform a latchup-like failure after the system-level ESD test. A modified power-rail ESD clamp circuit is proposed to solve this problem. The proposed power-rail ESD clamp circuit can provide high enough chip-level ESD robustness, and without suffering the latchup-like failure during the system-level ESD test.      

CMOS RF amplifier and mixer circuits utilizing complementary Characteristics of parallel combined NMOS and PMOS devices

Design and chip fabrication results for complementary RF circuit topologies that utilize the complementary RF characteristics of both NMOS and PMOS field-effect-transistor devices combined in parallel way are reported, which can inherently provide single-ended differential signal-processing capability, requiring neither baluns, nor differential signal generating/combining circuits. The proposed complementary CMOS parallel push-pull (CCPP) amplifier gives an order of magnitude improvement in IP/sub 2/ than an NMOS common-source amplifier and single-balanced CCPP resistive mixer, which functions effectively as a double-balanced one, provides more than an order of magnitude better linearity in IP/sub 2/, and similar order of magnitude better local oscillator (LO)-IF and LO-RF isolations than NMOS counterparts.     

A New CMOS Analog Front End for RFID Tags

This paper presents a new CMOS integrated analog front-end circuit for 13.56-MHz radio-frequency identification tags. The proposed analog front end consists of a novel CMOS rectified voltage multiplier, a voltage regulator, and a new frequency-shift keying (FSK) demodulator. The proposed single-stage rectifier employing only a PMOS/NMOS pass transistor, an inverter, and one capacitor gets minimal active area and enhances the power conversion efficiency. Moreover, a new technique is used in the proposed FSK demodulator, which includes the data recovery circuit, the multiplexer, the shift register, the phase frequency detector, and the charge-pump circuit. The analog front end has been fabricated in a CMOS 0.35-$muhbox{m}$ 2P4M technology. The demodulator circuit supports a data rate of 10 kb/s to 1 Mb/s. The power consumption is as low as 0.96 mW, and the chip area without pads is only 0.74 mm $times$ 0.43 mm. Experimental results show that the proposed analog front end works well and confirms the theoretical analysis.      

A proposed OEIC receiver using MESFET photodetector

An optical receiver configuration based on the concept of using a single optically gated metal-semiconductor-fieid-effect transistor (MESFET) to perform the function of a photodetector and preamplifier has been introduced. The proposed optoelectronic integrated circuit (OEIC) receiver has been analyzed theoretically. A simplified noise model of the receiver has also been developed. Results have been presented for an OEIC receiver based on InGaAs MESFET supposed to be fabricated with matured InGaAs-InP MMIC technology. Theoretical results based on a simplistic noise model reveal that the proposed OEIC receiver has superior performance characteristics over the existing optical receivers     

Design, modeling, and characterization of monolithically integratedInP-based (1.55 μm) high-speed (24 Gb/s) p-i-n/HBT front-endphotoreceivers

High-speed, long-wavelength InAlAs/InGaAs OEIC photoreceivers based on a p-i-n/HBT shared layer integration scheme have been designed, fabricated and characterized. The p-i-n photodiodes, formed with the 6000 Å-thick InGaAs precollector layer of the HBT as the absorbing layer, exhibited a responsivity of ~0.4 A/W and a -3 dB optical bandwidth larger than 20 GHz at λ=1.55 μm. The fabricated three-stage transimpedance amplifier with a feedback resistor of 550 Ω demonstrated a transimpedance gain of 46 dBΩ and a -3 dB bandwidth of 20 GHz. The monolithically integrated photoreceiver with a 83 μm p-i-n photodiode consumed a small dc power of 35 mW and demonstrated a measured -3 dB optical bandwidth of 19.5 GHz, which is the highest reported to date for an InAlAs/InGaAs integrated front-end photoreceiver. The OEIC photoreceiver also has a measured input optical dynamic range of 20 dB. The performance of individual devices and integrated circuits was also investigated through detailed CAD-based analysis and characterization. Transient simulations, based on a HSPICE circuit model and previous measurements of eye diagrams for a NRZ 2³¹-1 pseudorandom binary sequence (PRBS), show that the OEIC photoreceiver is capable of operation up to 24 Gb/s     

A single-chip CMOS APS camera with direct frame difference output

A complementary metal-oxide-semiconductor (CMOS) active pixel sensor (APS) camera chip with direct frame difference output is reported in this paper. The proposed APS cell circuit has in-pixel storage for previous frame image data so that the current frame image and the previous frame image can be read out simultaneously in differential mode. The signal swing of the pixel circuit is maximized for low supply voltage operation. The pixel circuit occupies 32.2×32.2 μm² of chip area with a fill factor of 33%. A 128×98 element prototype camera chip with an on-chip 8-bit analog-to-digital converter has been fabricated in a 0.5-μm double-poly double-metal CMOS process and successfully tested. The camera chip consumes 56 mW at 30 frames/s with 3.3 V power supply