Influence of La-Mn-AI Co-Doping on Dielectric Properties and Structure of BST Thick Film

A new sol-gel process is applied to fabricate the BST （BaxSr1-xTiO3） sol and nano-powder of La-Mn-Al co-doping with Ba/Sr ratio 65/35, and the BST thick film is prepared in the Pt/Ti/SiO2/Si substrate. The powder and thick film are characterized by X-ray diffraction and transmission electron microscope. The influence of La-Mn-Al co-doping on the dielectric properties and micro-structure of BST thick film is analyzed. The results show that the La, Mn, and Al ions can take an obvious restraint on the growth of BaSrTiO3 grains. The polycrystalline particles come into being during the crystallization of thick film, which may improve the uniformity and compactness of thick film. The influence of unequal-valence and doping amount on the leakage current, dielectric loss, and dielectric property are mainly discussed. The dielectric constant and dielectric loss of thick film are 1200 and 0.03, respectively, in the case of 1mol% La doping, 2mol% Mn doping, and 1mol% Al doping.     

掺杂对PZT铁电陶瓷介电铁电性能的影响

掺杂可以改变锆钛酸铅系铁电陶瓷的性能。着重对掺 La3+、Mn2+对 PZT 陶瓷结构与性能的影响作了一些研究和探讨,通过对掺两种添加物的样品的介电、铁电性能的比较发现:掺 La3+可以增大剩余极化值和损耗;掺杂 Mn2+可以降低损耗;同时加入 La3+、Mn2+可以调整 PZT 性能得到理想的效果:2Pr 为 80×10–6/cm2,tg? 为 0.6×10–2。     

不同含锰化合物掺杂对BST-MgO陶瓷介电性能的影响

采用普通固相反应法制备了0.45Ba0.55Sr0.45TiO3-0.55MgO-Mn(NO3)2/MnCO3(简称BST-MgO)陶瓷,通过XRD和SEM研究了不同形态含锰化合物(固态MnCO3及液态Mn(NO3)2)掺杂对所制BST-MgO陶瓷致密化及微波介电性能的影响。结果表明,液态Mn(NO3)2掺杂可以增加锰离子进入BST晶格的几率,同时抑制镁离子进入BST晶格,提高BST-MgO陶瓷的致密度,降低介质损耗,获得较高的综合性能:10 kHz下r=116,tan=0.003 8,可调率(Tu)为19.64%,优值K=51.68;3 GHz时Q.f值达788 GHz。     

Structural and Electrical Characters of Ba0.6Sr0.4TiO3/La0.5Sr0.5CoO3 Thin Films by Plus Laser Deposition

Epitaxial Ba0.6Sr0.4TiO3 (BST) thin films were deposited on LaAlO3 (LAO) substrates with the conductive metallic oxide La0.5Sr0.5CoO3 (LSCO) film as a bottom electrode by pulsed laser deposition (PLD). X-ray diffraction ~2 and Ф scan showed that the epitaxial relationship of BST/LSCO/LAO was [001] BST//[001] LSCO//[001] LAO. The atomic force microscope (AFM) revealed a smooth and crack-free surface of BST films on LSCO-coated LAO substrate with the average grain size of 120 nm and the RMS of 1.564 nm for BST films. Pt/BST/LSCO capacitor was fabricated to perform CapacitanceVoltage measurement indicating good insulating characteristics. For epitaxial BST film, the dielectric constant and dielectric loss were determined as 471 and 0.03, respectively. The tunabilty was 79.59% and the leakage current was 2.6310-7 A/cm2 under an applied filed of 200 kV/cm. Furthermore, it was found that epitaxial BST (60/40) films demonstrate well-behaved ferroelectric properties with the remnate polarization of 6.085 C/cm2 and the coercive field of 72 kV/cm. The different electric properties from bulk BST (60/40) materials with intrinsic paraelectric characteristic are attributed to the interface effects.     

B2O3-Li2O掺杂对丝网印刷Bao.6Sr0.4TiO3厚膜微观结构及介电特性的影响

采用丝网印刷工艺并通过有效掺杂B2O3-Li2O制备出了一致性和可重复性良好的Ba0.6Sr0.4TiO3(BST)厚膜.系统研究了B2O3-Li2O掺杂对BST厚膜的低温烧结特性、微观结构、相构成及介电性能的影响.结果表明:随着B2O3-Li2CO3含量的增加,BST厚膜的烧结温度逐渐降低,晶粒尺寸和介电常数显著变小...     

稀土氧化物掺杂对BST陶瓷热释电性能的影响

采用轧膜成型工艺制备了掺杂有稀土氧化物的钛酸锶钡(BST)陶瓷,研究了不同稀土(Sc,Y,La,Ce,Pr,Nd和Sm)氧化物掺杂对其微观形貌、介电性能和热释电性能的影响。结果表明,Sc掺杂大幅降低了BST陶瓷的εr,严重劣化了BST陶瓷的热释电性能,并引起了长条状晶粒在BST陶瓷中的出现;Y掺杂则显著提高了BST陶瓷的热释电性能,并最终获得了εr为7111、tanδ为0.65×10–2、热释电系数p为5.5×10–7C·cm–2·℃–1、探测率优值Fd为8.49×10–5Pa–1/2的热释电BST陶瓷材料,有望在红外探测领域得到应用。     

Structural and Electrical Characters of Ba0.6Sro.4TiO3/La0.5Sr0.5CoO3 Thin Films by Plus Laser Deposition

Epitaxial Ba0.6Sr0.4TiO3 (BST) thin films were deposited on LaAlO3 (LAO) substrates with the conductive metallic oxide La0.5Sr0.5CoO3 (LSCO) film as a bottom electrode by pulsed laser deposition (PLD). Xray relationship of BST/LSCO/LAO was [001] BST//[001]LSCO//[001] LAO. The atomic force microscope (AFM)revealed a smooth and crackfree surface of BST films on LSCOcoated LAO substrate with the average grain size of 120 nm and the RMS of 1.564 nm for BST films.Pt/BST/LSCO capacitor was fabricated to perform CapacitanceVoltage measurement indicating good insulating characteristics. For epitaxial BST film, the dielectric constant and dielectric loss were determined as 471 and 0.03, respectively. The tunabilty was 79.59% and the leakage current was 2.63×107 A/crm2 under an applied filed of 200 kV/cm. Furthermore, it was found that epitaxial BST (60/40) films demonstrate wellbehaved ferroelectric properties with the remnate polarization of 6.085 μC/cm2 and the coercive field of 72 kV/cm. The different electric properties from bulk BST (60/40)materials with intrinsic paraelectric characteristic are attributed to the interface effects.     

Electrical properties of sputtered (Ba, Sr)TiO3 thin films prepared by two-step deposition method

The influence of two-step deposition on the electrical properties of sputtered (Ba,Sr)TiO₃ thin films was investigated. BST thin films with thickness 40 nm were deposited by a simple two-step radio frequency-magnetron sputtering technique, where the BST thin film consisted of a seed layer and a main layer. The dielectric constant was strongly dependent on the thickness of seed layer, but there was no dependence on deposition temperature of the seed layer. For a 2 nm seed layer, the dielectric constants were higher by about 29% than those of single-step BST thin films due to higher crystallinity and the leakage current was nearly the same as that of a single-step sample in bias voltage from −2 to 2.5 V. However, an improvement of the dielectric constant was not observed for samples having above 4 nm thick seed layers. A 40 nm thick BST film with 2 nm thick seed layer deposited by a two-step method exhibited a SiO₂ equivalent thickness of 0.385 nm and a leakage current density of 2.74 × 10⁻⁸A/cm²at+1.5V after post-annealing under an atmosphere of flowing N₂ for 30 min at 750°C.     

BST薄膜对GaN衬底的传输特性影响

钛酸锶钡(BST)薄膜是一种重要的铁电薄膜,应用广泛,是高新技术研究的前沿和热点之一。文章重点讨论了不同结构的BST薄膜对GaN传输线的传输特性影响,分析了不同的BST薄膜材料参数对传输性能的影响。实验证明,未电镀的传输线空洞较多,直流电阻变大,生长了BST薄膜的传输线插损约为0.32dB/mm,不同的薄膜材料参数对传输特性的影响也很明显,随着介电常数、膜厚以及损耗角的增大,传输线有效介电常数变大,特性阻抗减小。为基于磁电效应的GaN功率放大器设计提供了一定的借鉴。     

BST/LSCO异质结构的研究

利用脉冲激光沉积法在STO(001)基片上外延生长了La0.5Sr0.5CoO3(LSCO)导电氧化物薄膜,研究了基片温度对LSCO薄膜结构和电性能的影响,并制备了Ni-Cr/BST/LSCO多层膜结构。XRD谱发现,沉积温度在450~700℃均能得到高度(00 l)取向的LSCO薄膜,LSCO(002)峰的半高峰宽FWHM=0.1°~0.2°;在LSCO薄膜上制备的BST介质膜具有良好的c轴取向和较高的表面平整度,其εr约为470,tgδ为0.036~0.060。     

陶瓷厚膜和薄膜混合电致发光器件

使用PbMg1/ 3Nb2 / 3O3 PbTiO3 PbCd1/ 2 W1/ 2 O3三元系电容器瓷料 ,采用流延工艺成膜 ,丝网印刷内电极 ,在 930～ 950℃下低温烧结的方法制备了陶瓷衬底。陶瓷厚膜在室温下的相对介电常数εr>1.4× 10 4 ,损耗tanδ≈ 1% ,具有极高的品质因素 (大于等于 80 μC/cm2 )。理论分析了电致发光器件的阈值电压与绝缘介质特性的关系。直接在陶瓷厚膜上制备了MIS结构和MISIM结构的以陶瓷厚膜为绝缘层的ZnS :Mn低压驱动电致发光器件     

Characterization of pulsed laser deposited Ba0.6Sr0.4TiO3 on Pt-coated silicon substrates

The high dielectric constant (Ba,Sr)TiO₃ (BST) films have been widely used to realize capacitors integrated on silicon with a high value of capacitance. The multilayer Pt/Ti/SiO₂/Si is one of the most currently used bottom electrodes for the integration of BST on silicon. However, the crystal orientation and the dielectric properties of ferroelectric thin films are greatly influenced by the underlying Pt/Ti metallization, and particularly by the out-diffusion of titanium towards the platinum surface during thermal treatments. In this study, we show that the heating stage of the Pt/Ti/SiO₂/Si substrate before the BST pulsed laser deposition is of primary importance in both favoring the (1 1 1) growth of the BST material within a wide range of oxygen deposition pressure and in reducing drastically the loss tangent values of Al/BST/Pt capacitors because of the oxygen saturation of platinum. Electrical measurements indicate the existence of an interfacial layer degrading the capacitance. They support the presence of an interfacial depleted layer. The dramatic increase of the loss tangent under positive polarities applied on the platinum electrode is attributed to the ohmic contact of the BST/Al interface. Except this increase, all of the electrical properties are very promising in view to realize capacitors with high capacitance value and low dispersion.     

钛酸锶钡/铋锌铌多层复合薄膜的制备及性能

采用溶胶一凝胶法在Pt/Ti/SiO2/Si衬底上制备了钛酸锶钡/铋锌铌多层复合薄膜样品.研究了不同退火温度下多层复合薄膜的结构、微观形貌及介电性能.结果表明:在退火温度高于700℃时,所得复合薄膜中会出现立方焦绿石结构的铋锌铌和钙钛矿结构的钛酸锶钡.750℃退火处理得到的多层复合薄膜,表面致密,无裂纹,其相对介电常数...     

ITO衬底上LiTaO3薄膜的制备与介电特性

用溶胶凝胶法在ITO衬底上制备了钽酸锂(LiTaO3)薄膜,利用XRD、SEM和AFM对薄膜的晶向、表面形态等作了表征;研究了不同溶剂对LiTaO3溶胶稳定性的影响和不同退火条件对LiTaO3薄膜结晶的影响;利用Al/LiTaO3/ITO结构,测试了薄膜的介电系数和介电损耗.结果表明:每层薄膜都晶化退火比交替使用焦化、结晶退火能生长出质量更好的LiTaO3薄膜;频率1KHz时,介电损耗约0.4,相对介电系数约53.并讨论了介电损耗增大的原因.     

快速退火对Pt/BST/Pt电容器结构和性能的影响

采用脉冲激光沉积(PLD)法在Pt/Ti/SiO2/Si(001)基片上制备了Ba0.6Sr0.4TiO3(BST)薄膜,对Pt/BST/Pt电容器在空气中进行400℃快速退火(RTA)处理,研究了快速退火对Pt/BST/Pt电容器的结构和性能的影响。结果表明:快速退火虽然对BST薄膜的结晶质量影响较小,但却极大改善了Pt/BST/Pt电容器的电学性能。当测试频率为100kHz、直流偏压为0V时,介电损耗从快速退火前的0.07减小到0.03,介电常数和调谐率略有增加。快速退火后负向漏电流过大现象得到了明显抑制,正负向漏电流趋于对称,在300×103V/cm电场强度下,漏电流密度为4.83×10–5A/cm2。     

Zn掺杂对BST薄膜介电调谐性能的影响

用sol-gel法在Pt/SiO2/Si基片上制备了未掺杂和掺杂Zn的钛酸锶钡(BST)薄膜。用XRD对BST薄膜进行了物相分析,研究了Zn掺杂对薄膜的表面形貌和介电调谐性能的影响。结果表明:室温下,随着Zn加入量的增加,BST薄膜的介电常数减小,介质损耗降低,介电调谐量增加。x(Zn)为0.025的BST薄膜具有最大的优越因子(FOM),其值为29.28。     

新型sol-gel技术制备BST 0-3型厚膜

采用传统高温固相烧结法合成了Ba0.6Sr0.4TiO3(BST)陶瓷粉,并用高能球磨法将其细化为纳米粉,均匀分散于组分相同的BST溶胶中,形成稳定的厚膜先体溶液,而后用匀胶法制备出厚度约为6.5μm的BST厚膜。XRD测试结果表明,650℃热处理后的厚膜为单一钙钛矿相。SEM观测显示厚膜表面均匀一致,无裂纹出现。800℃热处理后的厚膜在室温、频率1kHz下相对介电常数εr和介质损耗tgδ分别为455、0.036。     

Co掺杂对BST薄膜介电性能的影响

用sol-gel法在Pt/Ti/SiO2/Si(100)衬底上制备了掺Co的钛酸锶钡(BST)薄膜,研究了Co的掺杂量x(Co)对BST薄膜的晶相结构和电学性能的影响。结果表明:随着x(Co)的增加,BST薄膜的介电常数εr,介质损耗tgδ和漏电流密度JL均降低;当x(Co)为5%时,BST薄膜的εr、tgδ、JL、可调性和品质因子分别为:228.3、0.013、3.69×10–7 A/cm2、15.4%、12.03。     

高度(100)取向的BST薄膜及其高介电调谐率

用脉冲激光沉积法制备(Ba1-xSrx)TiO3(x=0.35,0.50简称BST35和BST50)介电薄膜。在650℃原位退火10min,获得高度(100)取向柱状生长的晶粒。BST35薄膜的平均晶粒尺寸为50nm,BST50薄膜的晶粒尺寸为150~200nm。在室温和1MHz条件下,BST35的最大εr和调谐率分别达到810和76%,其介电调谐率高于国内外同类文献报道的数据;BST50的εr和调谐率最大分别达到875和63%。薄膜为(100)取向生长,因为薄膜沿平面c轴极化而产生应力,在电场作用下,而获得高介电调谐率。     

钇锰离子共掺杂对Ni内电极MLCC介电性能的影响

对具有Y5V特性的BCTZ系抗还原介质材料进行了施主离子(Y3+)和受主离子(Mn2+)共掺杂。以该电介质制备出多层陶瓷电容器,并测试了其介电性能。讨论了Y3+和Mn2+离子共掺杂对Y5V特性的BCTZ系介质材料介电性能的影响。通过施主-受主掺杂,电容器的耐压升高,损耗降低,介电常数减小。并且,容量温度系数满足Z5U特性。