溶液法制备AgBi2I7薄膜及其光电探测性能研究

AgBi₂I₇薄膜具有良好的光电特性和环境稳定性,是构筑异质结紫外光电探测器的有力候选材料之一。本研究采用溶液法制备AgBi₂I₇薄膜,通过优化前驱体溶液的浓度和溶剂类型(正丁胺和二甲基亚砜)等工艺参数,研究了其光电探测性能。采用最优方案在宽带隙的GaN上制备AgBi₂I₇薄膜,构建AgBi₂I₇/GaN异质结。该异质结对UVA射线具有良好的选择性探测(探测半峰宽约30nm)。在3V偏压和350nm紫外光照射下,器件开关比超过5个数量级,达到27.51 A/W的高响应度和1.53×10¹⁴ Jones的高探测率。研究表明溶液法制备的AgBi₂I₇薄膜有望应用于构建高性能的异质结紫外光电探测器。     

ZnO/In2O3纳米异质结的合成及其光催化性能的研究

通过热水解法成功制备出了形貌均一的ZnO/In₂O₃异质结光催化材料, 采用场发射扫描电子显微镜(FESEM)、X射线衍射仪(XRD)以及透射电子显微镜(TEM)对样品的形貌及结构进行表征。结果表明: ZnO/In₂O₃异质结是由直径约200~300 nm、厚度约40~60 nm的六边形纳米片镶嵌着In₂O₃纳米小颗粒组成。对比纯ZnO、纯In₂O₃和该光催化材料对罗丹明B(RhB)的可见光降解效率, 发现ZnO/In₂O₃异质结光催化材料对RhB具有较高的光催化效率, 其原因是窄带系半导体In₂O₃能够有效地吸收可见光, 当ZnO与In₂O₃ 形成异质结时, In₂O₃能带上被可见光激发的电子会迁移到ZnO的导带上, 而光激发的空穴仍保留在In₂O₃价带, 这样有助于光生电子和空穴的分离, 降低其复合几率, 从而有效地提高了ZnO的光催化效率。     

自供能ZnO/ZnS异质结紫外探测器的性能研究

用化学浴法在ZnO纳米棒表面沉积ZnS制备出ZnO/ZnS核壳纳米棒阵列,使用SEM、XRD和XPS等手段表征了样品的形貌、结构和成分。结果表明,ZnO/ZnS核壳纳米棒阵列表面粗糙,生长致密、分布均匀,其平均直径约为150 nm。以Pt为对电极组装的自供能ZnO/ZnS异质结紫外探测器,对紫外光具有很好的探测性能,能循环工作且性能稳定。这种探测器对微弱的紫外光也有较强的响应和较高的光敏性,且随着光强度的提高光电流密度线性增大。与自供能ZnO纳米棒紫外探测器相比,ZnO/ZnS异质结紫外探测器具有更高的响应速度,上升时间和下降时间分别提高到0.02 s和0.03 s。     

基于p-Se/Al2O3/n-ZnO纳米棒阵列异质结的自驱动紫外-可见光探测器

自驱动光探测器能够在无外加偏压的情况下将光信号转化为电信号, 在工业和军事领域有着广泛的应用。本研究报道了p型Se薄膜和n型ZnO纳米棒阵列异质结的可控合成以及它们作为自驱动紫外-可见光探测器的应用。由于在ZnO和Se的界面处形成的内建电场将光生电子-空穴对分离, 促使它们向相反方向传输, 最终被电极收集, 在0偏压下获得了较高的光电流(435 pA), 从而实现无线的自驱动光电探测。并且, 在Se和ZnO界面处沉积的Al₂O₃层有效降低了暗电流。最终, 此器件在500 nm的单色光下显示了高响应率55 μA·W ^-1和大比探测率5×10 ¹⁰Jones, 并表现出了极快的响应速度(上升时间0.9 ms, 衰减时间0.3 ms)。     

MoS2/ZnO异质结及其在光电探测器中的研究进展

以MoS₂为代表的过渡金属硫族化合物(TMDCs)由于独特的电子结构、优异的半导体特性、可调节的带隙(1.3～1.8eV)、高迁移率和强光-物质相互作用成为发展下一代高性能光电器件的理想候选材料。然而二维材料独特的层间范德华间隙，使得扩散、注入等传统半导体的掺杂手段无法实现均匀稳定的掺杂，进而无法有效调控其相关电子器件的性能。传统的基于三维半导体的p-n结是现代电子器件的基本组成部分，将二维层状MoS₂集成到传统的半导体材料上成了提升器件性能和探索新功能的策略之一。宽禁带半导体ZnO以其优越的光电性能已广泛应用于高效率短波长探测、发光和激光器件以及智能设备上。近年来，MoS₂和ZnO组成异质结结构的研究成了热点，诸多研究报道MoS₂与ZnO组成的异质结结构可以提高光电探测器的光响应率、光谱范围和光响应速度等，展示了良好的性能。本文综述了MoS₂/ZnO异质结结构的多种制备方法，异质结特性和界面物理机制以及在光电探测器中的研究进展。     

氧化锌纳米棒形貌对ZnO/Cu2O异质结太阳能电池光伏性能的影响

采用电化学沉积法制备了ZnO纳米棒,首先讨论了电化学沉积参数对氧化锌(ZnO)纳米棒形貌的影响,并对不同长度ZnO纳米棒的光吸收和反射等性质进行了研究.实验发现沉积时间是影响纳米棒长度、直径的重要因素,ZnO纳米棒的微观形貌对其光学性质有重要影响.然后以氧化锌纳米棒为n型材料,以氧化亚铜为p型材料,通过电化学沉积法构筑了ZnO/Cu2O异质结太阳能电池,并测试了其光伏性能,研究表明增长纳米棒阵列的长度使得开路电压、短路电流密度及光电转换效率等性能得到提升.最后,综合分析了氧化锌纳米棒形貌与所组装电池的性能之间的关系,发现调控氧化锌纳米棒的形貌是提高ZnO/Cu2O异质结太阳能电池光伏性能的有效途径.     

S型异质结Bi4O5Br2/CeO2的制备及其光催化CO2还原性能

光催化CO₂还原技术的关键是开发高效光催化剂,而构建具有紧密界面结构的异质结是增强界面电荷转移,实现高效光催化活性的有效途径。本研究采用静电纺丝技术结合水热法,将Bi₄O₅Br₂纳米片镶嵌在CeO₂纳米纤维表面,制得Bi₄O₅Br₂/CeO₂纤维光催化材料(B@C-x,x对应反应物的加入量)。利用不同方法表征其微观结构、形貌和光电性能。结果表明,适当Bi₄O₅Br₂含量的Bi₄O₅Br₂/CeO₂异质结可以显著提高CeO₂纳米纤维的光催化性能。与纯Bi₄O₅Br₂和CeO₂相比,B@C-2在模拟太阳光下表现出最佳光催化活性,不使用任...     

异质复合结构纳米纤维SnO2/ZnO的制备及其气敏特性研究

采用静电纺丝法制备了多级中空结构的SnO₂纳米纤维, 然后将SnO₂纳米纤维置于90℃乙酸锌溶液中, 恒温水浴条件下, 在SnO₂纳米纤维上生长了ZnO纳米球, 形成了异质结构的SnO₂/ZnO复合纳米纤维。分别通过XRD、SEM、EDX和XPS等表征手段对异质复合纳米纤维SnO₂/ZnO材料的结构、形貌及元素含量进行了表征分析。异质结构的SnO₂/ZnO复合纳米纤维保持了SnO₂纳米纤维多级中空的纤维结构, SnO₂纳米纤维长度约为300 nm, 依附于SnO₂纤维表面的SnO₂纳米颗粒生长的ZnO纳米球直径为250~300 nm。采用静态气体测试系统对异质复合纳米纤维SnO₂/ZnO气敏元件的气敏性能进行了测试。测试结果表明: 异质复合纳米纤维SnO₂/ZnO气敏元件在最佳工作温度350℃下, 对(0.5~100)×10^-6丙酮具有优异的响应灵敏度、较好的选择性和长期稳定性。异质复合纳米纤维SnO₂/ZnO中存在于ZnO纳米球与SnO₂纳米颗粒间的N-N同型异质结导致复合材料晶界势垒高度的降低, 改善了电子与空穴的输运特性, 促使SnO₂/ZnO异质复合纳米纤维的吸附能力大大增强, 从而改善了SnO₂/ZnO元件的丙酮敏感特性。     

VO2(B)/ZnO异质复合纳米棒结构的室温NH3敏感性能研究

以VO₂(B)纳米棒为内核, 利用液相生长法制备了VO₂(B)/ZnO异质复合纳米棒, 研究了ZnO生长溶液浓度对复合结构微观形貌和气敏性能的影响规律。采用扫描电子显微镜和X射线衍射仪对复合结构样品的微观形貌和结晶取向进行表征, 并测试了复合结构对NH₃的敏感性能。实验结果表明, 随着ZnO种子液浓度的增大, ZnO逐渐由纳米颗粒生长为纳米棒结构, 当ZnO种子液浓度为0.01 mol/L时, ZnO呈棒状沿径向发散生长在VO₂(B)纳米棒表面, 形成树枝状VO₂(B)/ZnO异质复合纳米棒结构, 这一结构在室温下表现出对NH₃的高灵敏度和突出的选择性, 其灵敏度最大可达5.6, 对NH₃的响应时间最短仅为2 s。在室温下表现出的优良NH₃敏感性能, 主要与高密度的VO₂(B)/ZnO异质结和树枝状结构有关。研究结果为低功耗高灵敏度NH₃气敏传感器的研制提供了重要依据。     

Si基ZnO纳米结构太阳能电池光伏性能研究

在洁净的p型Si片上通过旋涂法组装了单层有序排列的聚苯乙烯微球(Polystyrene spheres,PS)阵列模板,然后在PS模板上旋涂1层ZnO先驱薄膜,清洗掉PS模板,制得周期性ZnO先驱薄膜点阵,再通过水热法生长ZnO纳米棒。采用X射线衍射(XRD)、扫描电镜(SEM)对样品进行表征,结果显示ZnO薄膜为柱状ZnO阵列,基于Si衬底沿c轴择优生长。以150W氙灯为模拟光源,照射Si/ZnO异质结太阳能电池器件,通过万用电表测试其伏安特性。性能最好的样品的光电转换效率为1.23%,填充因子为62%。     

带状γ-Fe2O3/ZnO异质结光催化剂光催化降解四环素

针对传统ZnO光催化活性不高的问题,采用Zn(CH₃COO)₂和FeCl₃作为ZnO和Fe₂O₃的前驱体,水热条件下采用“一锅法”制备带状γ-Fe₂O₃/ZnO异质结光催化剂,采用XRD、BET比表面积测量仪、TEM、紫外-可见漫反射、电子顺磁共振(EPR)等对其晶体化学结构进行表征。在可见光光源下,探究了不同γ-Fe₂O₃负载量时γ-Fe₂O₃/ZnO异质结光催化剂对四环素的光催化降解的效果。研究表明,ZnO负载γ-Fe₂O₃后比表面积和光照吸收显著改善,禁带宽度有所减小,可见光光照120 min,n(Zn)∶n(Fe) (原子比)为20∶1的γ-Fe₂O₃/ZnO异质结光催化剂对四环素的降解率高达97.2%,多次重复使用后四环素的降解率保持在95%以上。      

Structural and optical properties of vanadium pentoxide sol–gel films

The V₂O₅ films were obtained using sol–gel procedure. The composition and mesostructure of the layers were investigated with the UV and Raman spectroscopy, as well as with electron microscopy. We showed that the changes in the properties of thin layers accompanying the variation of film thickness are connected with the changes in the microstructure of the film rather than with changes in its composition. The thin V₂O₅ layers obtained in the present study are composed of disordered clusters; their mean size is 4–13 nm.     

A ZnO/p-CuInSe2 thin film solar cell prepared entirely by spray pyrolysis

The feasibility of preparing a thin film ZnO/CuInSe₂ heterojunction solar cell using the spray pyrolysis technique is demonstrated. The electrical and optical properties of ZnO were varied by changing the substrate temperature. It was found that films deposited at a substrate temperature of about 400 °C showed suitable characteristics for their use as the window material of the heterojunction. Both ZnO and CuInSe₂ were prepared by spray deposition. The junction obtained was rectifying and under the illumination characteristic of back-wall configuration (under 88mW cm^-2) showed an open-circuit voltage of 0.3 V, a short-circuit current of 23 mA cm^-2, a fill factor of 0.29 and an electrical conversion efficiency exceeding 2%. Thus we showed that a heterojunction ZnO/CuInSe₂ solar cell can be fabricated with spray-deposited films but the quality of the films requires improvement for a high efficiency cell.     

New transparent conducting MgIn2O4---Zn2In2O5 thin films prepared by magnetron sputtering

New materials for a transparent conducting oxide film are demonstrated. Highly transparent Zn₂In₂O₅ films with a resistivity of 3.9 × 10⁻⁴ Ω cm were prepared on substrates at room temperature using a pseudobinary compound powder target composed of ZnO (50 mol.%) and In₂O₃ (50 mol.%) by r.f. magnetron sputtering. MgIn₂O₄---Zn₂In₂O₅ films were prepared using MgIn₂O₄ targets with a ZnO content of 0–100 wt.%. The resistivity of the deposited films gradually decreased from 2 × 10⁻³ to 3.9 × 10⁻⁴ Ω cm as the Zn/(Mg + Zn) atomic ratio introduced into the films was increased. The greatest transparency was obtained in a MgIn₂O₄ film. The optical absorption edge of the films decreased as the Zn/(Mg + Zn) atomic ratio was increased, corresponding to the bandgap energy of their materials. It was found that the resistance of the undoped Zn₂In₂O₅ films was more stable than either the undoped MgIn₂O₄, ZnO or In₂O₃ films in oxidizing environments at high temperatures.     

Deposition of Sm2O3 doped CeO2 thin films from Ce(DPM)4 and Sm(DPM)3 (DPM=2,2,6,6-tetramethyl-3,5-heptanedionato) by aerosol-assisted metal–organic chemical vapor deposition

Samarium-doped ceria (SDC) thin films were prepared from Sm(DPM)₃ (DPM = 2,2,6,6-tetramethyl-3,5-heptanedionato) and Ce(DPM)₄ using the aerosol-assisted metal–organic chemical vapor deposition method. -Al₂O₃ and NiO-YSZ (YSZ = Y₂O₃-stabilized ZrO₂) disks were chosen as substrates in order to investigate the difference in the growth process on the two substrates. Single cubic structure could be obtained on either -Al₂O₃ or NiO-YSZ substrates at deposition temperatures above 450 °C; the similar structure between YSZ and SDC results in matching growth compared with the deposition on -Al₂O₃ substrate. A typical columnar structure could be obtained at 650 °C on -Al₂O₃ substrate and a more uniform surface was produced on NiO-YSZ substrate at 500 °C. The composition of SDC film deposited at 450 °C is close to that of precursor solution (Sm : Ce = 1 : 4), higher or lower deposition temperature will both lead to sharp deviation from this elemental ratio. The different thermal properties of Sm(DPM)₃ and Ce(DPM)₄ may be the key reason for the variation in composition with the increase of deposition temperature.     

Analysis of SAW properties of epitaxial ZnO films grown on R-Al2O3 substrates

ZnO thin films with a high piezoelectric coupling coefficient are widely used for high frequency and low loss surface acoustic wave (SAW) devices when the film is deposited on top of a high acoustic velocity substrate, such as diamond or sapphire. The performance of these devices is critically dependent on the quality of the ZnO films as well as of the interface between ZnO and the substrate. In this paper, we report the studies on piezoelectric properties of epitaxial (112¯0) ZnO thin films grown on R-plane sapphire substrates using metal organic chemical vapor deposition (MOCVD) technique. The c-axis of the ZnO film is in-plane. The ZnO/R-Al₂O₃ interface is atomically sharp. SAW delay lines, aligned parallel to the c-axis, were used to characterize the surface wave velocity, coupling coefficient, and temperature coefficient of frequency as functions of film thickness to wavelength ratio (h/λ). The acoustic wave properties of the material system were calculated using Adler's matrix method, and the devices were simulated using the quasi-static approximation based on Green's function analysis     

Preparation of nanocrystalline SnO2 thin film coated Al2O3 ultrafine particles by fluidized chemical vapor deposition

Fluidized chemical vapor deposition (FCVD) technology was developed for coating SnO₂ thin film on Al₂O₃ ultrafine particles. TEM and HREM analysis found that SnO₂ films with different structures were deposited by controlling the coating temperature, reactant concentration, etc. Nanocrystalline SnO₂ film was coated at 573.15 K by gas phase reaction of SnCl₄ with H₂O. EPMA and EDS studies indicated that the distribution of SnO₂ inner and outer of the agglomerates was uniform. Nucleation and film deposition were coexisted mechanism during the FCVD coating process. The fraction of SnO₂ in the composite particles increased with increasing coating temperature, SnCl₄ concentration, and coating time. The mass fraction of SnO₂ in the composite particles increased strongly with the ratio of P_H2O and P_SnCl4 at low mole ratio of H₂O with SnCl₄, but increased little under the conditions of excess H₂O with respect to SnCl₄.     

Indium doped zinc oxide thin films obtained by electrodeposition

Indium doped ZnO thin films were obtained by co-electrodeposition (precursor and dopant) from aqueous solution. XRD analysis showed typical patterns of the hexagonal ZnO structure for both doped and undoped films. No diffraction peaks of any other structure such as In₂O₃ or In(OH)₃ were found. The incorporation of In into the ZnO film was verified by both EDS and XPS measurements. The bandgap energy of the films varied from 3.27 eV to 3.42 eV, increasing with the In concentration in the solution. This dependence was stronger for the less cathodic potentials. The incorporation of In into the film occurs as both, an In donor state in the ZnO grains and as an amorphous In₂O₃ at the grain boundaries.     

Long lasting phosphorescence of Sr4Al14O25:Eu,Dy thin films by magnetron sputtering

This paper reports the preparation process and the long lasting phosphorescence of the Sr₄Al₁₄O₂₅:Eu²⁺,Dy³⁺ thin films obtained by magnetron sputtering. Phosphorescence was achieved by annealing the films in reducing atmosphere. Sr₄Al₁₄O₂₅ thin film was obtained when the films were treated at 1200 °C, while SrAl₂O₄ was generated as the intermediate phase during the annealing process. Sr₄Al₁₄O₂₅:Eu²⁺,Dy³⁺ film generated an emission at 485 nm, and SrAl₂O₄:Eu²⁺,Dy³⁺ film showed an emission peaking at 515 nm. Afterglow characteristics were observed for both films, and Sr₄Al₁₄O₂₅:Eu²⁺,Dy³⁺ film showed a better afterglow property than the SrAl₂O₄:Eu²⁺,Dy³⁺ film due to a deeper trap level and a higher trap concentration formed in the thin films.     

无催化β-Ga2O3纳米棒的可控制备

由于氧化镓(Ga₂O₃)纳米棒具有独特的物理和化学性质,在纳米光电子器件等领域具有广泛的应用前景,因此氧化镓纳米棒的可控制备具有十分重要的意义。本文采用化学气相沉积(CVD)的方法,在无催化条件下,在硅Si(100)衬底上成功生长出β-Ga₂O₃纳米棒。通过X射线衍射仪、场发射扫描电子显微镜等表征,发现氧化镓纳米棒按照气-固(V-S)机制生长,当生长温度从850℃升高到950℃时,纳米棒的密度、直径和长度增加,纳米棒的形貌从杂乱无序的随机生长转变为沿衬底垂直且具有不同夹角方向生长。结果表明,反应温度和氧气浓度决定了氧化镓纳米棒的形貌和尺寸,通过控制温度和氧气浓度能够有效调控氧化镓纳米棒的形貌和光学性能。