Chemical bath deposition for the fabrication of antireflective coating of spherical silicon solar cells

A CdS film as an antireflective (AR) coating has been successfully deposited on spherical silicon solar cells by chemical bath deposition, which is a novel deposition method of AR coatings for spherical silicon solar cells. The CBD method is a growth method in an aqueous solution and enables film formation for electronic devices with arbitrary shapes. The solar cell performance of the cell with the CdS film showed a 16% increase in short circuit current compared to that without an ARC. The result confirms that the CBD method is useful for the ARC fabrication of spherical silicon solar cells.     

PECVD grown silicon nitride AR coatings on polycrystalline silicon solar cells

Silicon nitride films produced by plasma enhanced chemical vapor deposition (PECVD) have been studied as antireflection (AR) coating on polycrystalline silicon solar cells. A substantial enhancement (28%) in the short circuit current (I_sc) has been obtained. The open circuit voltage (V_oc) of these cells has also been found to improve after silicon nitride deposition. The deposition conditions to optimise the improvement in the cell performance have been discussed.     

Novel deposition method of anti-reflective coating for spherical silicon solar cells

The liquid-phase deposition (LPD) as a novel deposition method of anti-reflective coating (ARC) for spherical silicon solar cells has been proposed. The LPD is a growth method in aqueous solution and can deposit thin films with uniform coverage over a spherical surface. The solar cell performance of the spherical silicon solar cell with an ARC shows more than 10% increase in short-circuit current density compared to that without an ARC. The result confirms that the LPD method is useful for ARC fabrications of spherical silicon solar cells.     

Synthesis of nanostructured Al-doped zinc oxide films on Si for solar cells applications

Al-doped ZnO thin films have been prepared by a novel successive chemical solution deposition technique. The variation in morphological, structural, electrical, and optical properties of nanostructured films with doping concentration is investigated in details. It was demonstrated that rapid photothermal processing (RPP) improves the quality of nanostructured ZnO films according to the enhancement of resonant Raman scattering efficiency, and the suppression of the visible luminescence with the increase of RPP temperature. It was found from the I-V characteristics of ZnO/Si heterojunction that the average short-circuit current density is about 8 mA/cm². For 1%Al-doped ZnO/SiO₂/Si structure, the short-circuit current density is about 28 mA/cm². The improvement shown in the characteristics may be assigned partially to the reduction of the defect density in the nanostructured Al-doped ZnO films after RPP. The correlations between the composition, microstructure of the films and the properties of the solar cell structures are discussed. The successive chemically deposited Al-doped ZnO thin film offers wider applications of low-cost solar cells in heterojunction structures.     

Polycrystalline silicon thin films and solar cells prepared by rapid thermal CVD

Polycrystalline silicon (poly-Si) films ( 10 μm) were grown from dichlorosilane by a rapid thermal chemical vapor deposition (RTCVD) technique, with a growth rate up to 100 Å/s at the substrate temperature (T_s) of 1030°C. The average grain size and carrier mobility of the films were found to be dependent on the substrate temperature and material. By using the poly-Si films, the first model pn⁺ junction solar cell without anti-reflecting (AR) coating has been prepared on an unpolished heavily phosphorus-doped Si wafer, with an energy conversion efficiency of 4.54% (AM 1.5, 100 mW/cm², 1 cm²).     

氮化硅薄膜的性能研究以及在多晶硅太阳电池上的应用

利用椭圆偏振仪、准稳态光电导衰减法(QSSPCD)、X射线光电子能谱(XPS)、红外吸收光谱(IR)、反射谱等手段，研究了不同硅烷和氨气配比条件以及沉积温度对在多晶硅太阳电池上所沉积的氮化硅薄膜性能的影响，优化了沉积条件。通过比较沉积前后电池的各项性能，确认经氮化硅钝化后电池效率提高了40％以上，电池的短路电流也提高了30％以上，对于电池的开路电压提高也很大.     

Properties of amorphous silicon solar cells fabricated from SiH2Cl2

Chlorinated intrinsic amorphous silicon films [a-Si:H(Cl)] and solar cell i-layers were fabricated using electron cyclotron resonance-assisted chemical vapor deposition (ECR-CVD) and SiH₂Cl₂ source gas. n–i–p solar cells deposited on ZnO–coated SnO₂ substrates had poor photovoltaic performances despite the good electronic properties measured on the a-Si:H(Cl) films. Improved open–circuit voltage (V_oc) of 0.84 V and fill factor (FF) of 54% were observed in n–i–p solar cells by providing an n/i buffer layer and by using Ga-doped ZnO coated glass substrates. However, the FF improvement was still rather poor, which is thought to originate from high interface recombination in the ECR deposited solar cells. The V_oc and the FF showed much stable feature against light soaking.     

Bottom-up grown ZnO nanorods for an antireflective moth-eye structure on CuInGaSe2 solar cells

A bottom-up technique using an aqueous solution method was adopted to fabricate a bio-mimicked antireflection (AR) coating for a CuInGaSe₂ (CIGS) solar cell. On controlling the morphology of the solution-grown zinc oxide (ZnO) nanostructure the average reflectance of the CIGS solar cell employing the bio-mimicked AR coating decreased from 6.14% to 1.46%, and the efficiency of the solar cell increased from 10% to 11.5%. The mechanism by which the solar cell′s efficiency was enhanced is thought to be the effect of the gradual increase in the refractive index between air and the top electrode due to the insertion of the ZnO nanostructure.     

Surface texturing of sputtered ZnO:Al/Ag back reflectors for flexible silicon thin-film solar cells

Al-doped zinc oxide/silver (ZnO:Al/Ag) back reflectors for silicon thin-film solar cells with an n-i-p configuration were prepared on flexible stainless steel substrates by dc magnetron sputtering. The surface morphologies of the back reflectors were modified by changing the deposition temperature of the Ag films to improve the light-scattering properties on the back reflectors, resulting in the enhancement of the light-trapping effect in the solar cells. By elevating the deposition temperature from room temperature to 500 °C, the surface roughness of the Ag films increased from 6.62 to 46.64 nm. The films at 500 °C had coarse surface features with irregular grain size distributions between 200 and 900 nm, whereas the films produced at low temperatures below 100 °C had smooth surfaces consisting of small grains between 100 and 200 nm. Even after the 100-nm thick ZnO:Al films were deposited on the modified Ag surfaces, the surface microstructure of the ZnO:Al/Ag bilayers was similar to that of the Ag films. The surface roughness of bilayers increased from 7.12 to 39.30 nm with coarsening the Ag surfaces. Haze factor (a ratio of diffuse reflectance to total reflectance) of Ag films was enhanced remarkably from 59% to 74% in a wide wavelength range from 350 to 1100 nm with increasing the surface roughness of the Ag films from 6.62 nm to 46.64 nm. Enhancement in the haze factor was due to the increase of diffuse reflectance on the Ag films, because the total reflectance did not change much with increasing surface roughness of the Ag films. This increasing roughness indicated that the light scattering from the rough surface of the back reflectors improved. The enhanced light scattering from the back reflectors influenced the performance of the solar cells mainly in terms of the short-circuit current density (J_sc). Compared to the back reflectors with smooth surface features, leading to a J_sc value of 9.94 mA/cm², the back reflectors with large surface roughness improved the J_sc value of the solar cells to 13.36 mA/cm² without detrimental changes in the fill factor (FF) and open circuit voltage (V_oc); they eventually increased the conversion efficiency of the solar cells from 5.59% to 7.60%.     

Growth of Zn1−xMgxO films with single wurtzite structure by MOCVD process and their application to Cu(InGa)(SSe)2 solar cells

The effect of the growth temperature and Mg/(Mg+Zn) molar flow rate ratio of metal organic sources on the crystalline structure of Zn_1−xMg_xO (ZMO) films is investigated in thin films prepared by metal organic chemical vapor deposition (MOCVD) process on fused silica in order to obtain the wide-bandgap ZMO films with single wurtzite structure, which is very important to achieve high-efficiency chalcopyrite solar cells. Based on the measurements and analysis of the fabricated samples, the ZMO films with the controllable bandgap from 3.3 to 3.72 eV can exhibit a single wurtzite phase depending on the growth temperature and Mg content. Furthermore, the resistivity of ZMO films is comparable to that of ZnO film. It is a good indication that ZMO film is superior to CdS or ZnO films as buffer and window layers mainly due to its controllable bandgap energy and safety. As a result, the solar cells with ZMO buffer were fabricated without any surface treatment of Cu(InGa)(SSe)₂ (CIGSSe) absorber or antireflection coating, and the efficiency of 10.24% was obtained.     

Improvement of a-Si solar cell properties by using SnO2:F TCO films coated with an ultra-thin TiO2 layer prepared by APCVD

TiO₂-overcoated SnO₂:F transparent conductive oxide films were prepared by atmospheric pressure chemical vapor deposition (APCVD) and an effect of TiO₂ layer thickness on a-Si solar cell properties was investigated. The optical properties and the structure of the TiO₂ films were evaluated by spectroscopic ellipsometry and X-ray difractometry. a-Si thin film solar cells were fabricated on the SnO₂:F films over-coated with TiO₂ films of various thicknesses (1.0, 1.5 and 2.0 nm) and I–V characteristics of these cells were measured under 1 sun (100 mW/cm² AM-1.5) illumination. It was found that the TiO₂ film deposited by APCVD has a refractive index of 2.4 at 550 nm and anatase crystal structure. The conversion efficiency of the a-Si solar cell fabricated on the 2.0 nm TiO₂-overcoated SnO₂:F film increased by 3%, which is mainly attributed to an increase in open circuit voltage (V_oc) of 30 mV.     

Thin film silicon solar cells on glass by substrate thinning

We report on the fabrication of thin film Si solar cells on glass by substrate thinning. We use thin Si films grown on thick Si substrates by either liquid phase epitaxy or chemical vapour deposition. A novel solar cell device fabrication process is then applied to the structure, in which the Si is thinned down to 20–30 μm leaving the grown Si film as the majority of the active material of the structure. We obtain a conversion efficiency of 14.4% for such a thin film Si solar cell on glass.     

Silicon solar cells with antireflection diamond-like carbon and silicon carbide films

Optical properties of diamond-like carbon and silicon carbide (SiC) films in dependence on deposition conditions were investigated. It was established that the films having refractive index from 1.6 to 2.3 may be obtained. The film optical bandgap and hardness may be changed from 1.5 to 4 eV and from 1 to 20 GPa, correspondingly. The films were deposited onto the front side of silicon solar cells (SCs). It has been shown that deposition of single- or two-layer diamond-like carbon antireflection (AR) coatings enables the SCs efficiency to be improved 1.35–1.5 times. The improvement is connected with decreasing of reflection losses and passivation of recombination active centers. SiC AR coatings improve the solar cell efficiency up to 1.3 times.     

Optimization of ZnO for front and rear contacts in a-Si solar cells

The enhancement of the reflection from the rear contact of p-i-n a-Si solar cells using ZnO combined with metals (Ag/Al) as a back reflector was demonstrated theoretically and experimentally. Futhermore, the incorporation of unreacted H₂O as source gas in the ZnO films was clearly observed through the thermal evolution measurement, suggesting the need for employing the pre-annealing technique for ZnO films before using them as a front contact in p-i-n a-Si solar cells. By using these approaches, the a-Si solar cells with glass/annealed-ZnO/delta-doped p/buffer/i/n/ZnO/metals(Ag/Al) structure were successfully fabricated and a conversion efficiency of 12.1% (AM-1.5, area 3×3 mm²) was obtained. Moreover, the solar cells with a structure of AR coated glass/SnO₂/delta-doped/p/buffer/i/n/ZnO/metals(Ag/Al) were also fabricated and by optimizing the use of the ZnO layer at the rear contact, a conversion efficiency of 12.6% was obtained. To make the ZnO films more appropriate for solar cells application, the growth rate of the ZnO films was increased by increasing the flow rate of diethylzinc used as a source gas.     

Thin film silicon photovoltaics: Architectural perspectives and technological issues

Thin film photovoltaics is a particularly attractive technology for building integration. In this paper, we present our analysis on architectural issues and technological developments of thin film silicon photovoltaics. In particular, we focus on our activities related to transparent and conductive oxide (TCO) and thin film amorphous and microcrystalline silicon solar cells. The research on TCO films is mainly dedicated to large-area deposition of zinc oxide (ZnO) by low pressure-metallorganic chemical vapor deposition. ZnO material, with a low sheet resistance (<8 Ω/sq) and with an excellent transmittance (>82%) in the whole wavelength range of photovoltaic interest, has been obtained. “Micromorph” tandem devices, consisting of an amorphous silicon top cell and a microcrystalline silicon bottom cell, are fabricated by using the very high frequency plasma enhanced chemical vapor deposition technique. An initial efficiency of 11.1% (>10% stabilized) has been obtained.     

Porous silicon in solar cells: A review and a description of its application as an AR coating

In this paper, we first review the potential applications of porous Si in solar cell structures. Then we describe the fabrication of this material by both electrochemical and chemical etching methods, providing some guidelines for a better comprehension of the influence of each process parameter. After that, the properties of porous Si in terms of morphology, structure, photoluminescence, and electroluminescence emissions are summarized together with their actual photovoltaic applications.The results of our study specifically address the creation of an antireflection (AR) coating for polycrystalline Si based solar cells. We have demonstrated the feasibility of a very efficient porous Si AR layer, prepared by a simple, cost effective, chemical etching method. The formation of a porous Si layer about 0.5 μm thick on the polycrystalline wafer results in an effective reflectance coefficient R_eff lower than 5% in the wavelength region from 350 to 1150 nm. The drastic reduction of the optical losses is controllable by the process parameters and is almost independent of the starting substrate.     

微晶硅材料和电池特性的相关研究

主要采用甚高频等离子体增强化学气相沉积技术制备了系列微晶硅材料和电池。通过对材料电学特性、结构特性和电池间性能关系的研究,获得了高效率微晶硅薄膜太阳电池所对应材料的基本特性:暗电导在10~(-8)s/cm量级上,光敏性大于1000,晶化率约50%。进行了制备电池的开路电压和表观带隙之间关系的研究。     

Effect of electron beam irradiation on polydopamine and its application in polymer solar cells

Polydopamine (PDA) films were irradiated by an electron beam linear accelerator at different irradiation doses ranging from 10 to 150 kGy. The irradiated samples were characterized by Fourier transform infrared spectrometry, UV‐Vis, scanning electron microscopy, atomic force microscope, X‐ray diffraction, cyclic voltammetry, electrochemical impedance spectroscopy, and thermogravimetric analysis. Changes in surface morphology, chemical structure, contact angle, frontier orbitals, and bandgap were analyzed. PDA films modified by electron beam irradiation were used in the interface design and control of polymer solar cells. Devices with the structures of ITO/ZnO/PTB7:PC₇₁BM/MoO₃/Al and ITO/PDA‐ZnO/PTB7:PC₇₁BM/MoO₃/Al were fabricated. The solar cells with a 100‐kGy electron beam‐irradiated PDA film‐modified ZnO electron transport layer had a significantly improved short circuit current density, and its efficiency reached a maximum value. The short circuit current density and power conversion efficiency reached 13.70 mA/cm² and 3.82%, respectively. Electron beam irradiation is an effective method to modify PDA, which can be used as an interface modifier in polymer solar cells.     

A new route for fabricating CdO/c-Si heterojunction solar cells

CdO/c-Si solar cells have been made by depositing CdO thin films on p-type monocrystalline silicon substrate by means of the rapid thermal oxidation (RTO) technique using a halogen lamp at 350 °C/45 s in static air. Results on structural, optical, and electrical properties of grown CdO films are reported. The electrical and photovoltaic properties of CdO/Si solar cells are examined. Under AM1 illumination condition, the cell shows an open circuit voltage (V_OC) of 500 mV, a short circuit current density (J_SC) of 27.5 mA/cm², a fill factor (FF) of 60%, and a conversion efficiency (η) of 8.84% without using frontal grid contacts and/or post-deposition annealing. Furthermore, the stability of solar cells characteristics is tested.     

Enhanced photovoltaic performance of inverted organic solar cells with In-doped ZnO as an electron extraction layer

In the present work, a systematic study has been carried out to understand the effect of In doping on the various properties of the ZnO nanocrystalline thin films. In-doped ZnO nanocrystalline thin films with different indium concentrations (1.98%, 4.03%, 6.74%, 8.62% and 10.48% In) have been synthesized by sol–gel method. The grain size and surface roughness of the In-doped ZnO thin films are observed to be smaller than those of the ZnO thin films. 6.74% In-doped ZnO films with a low resistivity of 1.95 × 10⁻³ Ω cm and a high mobility of 2.19 cm² V⁻¹ S⁻¹ have been prepared under optimal deposition conditions. Inverted organic solar cells containing In-doped ZnO as an electron extraction layer with the structure indium tin oxide (ITO)/In-doped ZnO/poly[N-9′-heptadecanyl-2,7-carbazole-alt-5,5-(4′,7′-di-2-thienyl-2′,1′,3′-benzothiadiazole)] (PCDTBT): [6,6]-phenyl C₇₁-butyric acid methyl ester (PC₇₁BM)/MoO₃/Al have been fabricated. The inverted organic solar cell with 6.74% In-doped ZnO exhibited a power conversion efficiency of 5.58%, which is the best efficiency reported so far for these type of solar cells. The device performance has been optimized by varying the indium doping concentration. The results clearly demonstrate that significant improvement in power conversion efficiency can be obtained by incorporating In into the ZnO films.