Enhancement of Crystalline Quality of Strained Straind InAs／InP Quantum Well Structures by Rapid Thermal Annealing

The effect of rapid thermal annealing of the optical properties of a strained InAs/InP single quantum well structrure has investigated in this paper.The luminescence intensity of the quantum well at 8K was increased by a factor of 4 and 1.55meV blue shoft of the quantum well photoluminescence peak was observed af-ter annealing at the optimal condition of 700℃ for 5s.Furthermoer,we found that the luminescence efficiency of the deep radiative levels in the samples was also affected by rapid thermal annealing.Our experimental results have demonstrated that Rapid thermal annealing significantly improves the erystalline quality of strained quantum well struc-tures after growth and is an important way for enhancement of the performance of the laser device.     

Rapid Thermal Annealing Study of Anodic Oxide InGaAs Single Quantum Well Lasers

ＲａｐｉｄＴｈｅｒｍａｌＡｎｎｅａｌｉｎｇＳｔｕｄｙｏｆＡｎｏｄｉｃＯｘｉｄｅＩｎＧａＡｓＳｉｎｇｌｅＱｕａｎｔｕｍＷｅｌＬａｓｅｒｓＳ．ＹｕａｎＹｏｎｇＫｉｍ（ＤｅｐａｒｔｍｅｎｔｏｆＥｌｅｃｔｒｏｎｉｃＭａｔｅｒｉａｌｓＥｎｇｉｎｅｅｒｉｎｇ，...     

Solid-phase Crystallization of Amorphous Silicon Films by Rapid Thermal Annealing

The morphous silicon films prepared by PECVD at substrate temperatures of 30℃ have been crystallized by rapid thermal annealing method, the budget of time-temperature in the annealing process is 600℃ for 120s, 850℃ for 120s, and 950℃ for 120s. The results indicate the crystallization at 850℃ and 950℃ are better as shown in micro-Raman scattering and scanning electronic microscope.     

AlInGaAs/AlGaAs Strained Quantum Well Lasers Grown by Molecular Beam Epitaxy

Strained InGaAs/AIGaAs quantum well lasers have demonstrated improved performance compared with lattice--matched,unstrained GaAs/AIGaAsorAIGaAs/AIGaAs quantum well lasers,which has been attributed to modifications of the band tructure due to the strained natur...     

InGaAsP/InP Double Quantum Well Intermixing Induced by Phosphorus Ion Implantation

A quantum well intermixing(QWI) investigation on double quantum well(DQW) structure with two different emitting wavelength caused by phosphorus ion implantation and following rapid thermal annealing (RTA) was carried out by means of photoluminescence(PL). The ion implantation was performed at the energy of 120 kev with the dose ranging from 1 × 1011 cm-2 to 1× 1014 cm-2. The RTA was performed at the temperature of 700 ℃ for 30 s under pure nitrogen protection. The PL measurement implied that the band gap blue-shift from the upper well increases with the ion dose faster than that from lower well and the PL peaks from both QWs remained well separated under the lower dose implantation(～1×1011 cm-2 ) indicating that the implant vacancy distribution affects the QWI. When the ion dose is over ～ 1 × 1012 cm-2 , the band gap blue-shift from both wells increases with the ion dose and finally the two peaks merge together as one peak indicating the ion implantation caused a total intermixing of both quantum wells.     

InGaAs/GaAs/InGaP Strained Quantum Well Lasers Grown by Metalorganic Chemical Vapor Deposition

１ＩｎｔｒｏｄｕｃｔｉｏｎＳｔｒａｉｎｅｄＩｎＧａＡｓ／ＧａＡｓｑｕａｎｔｕｍｗｅｌ（ＱＷ）ｌａｓｅｒｓｗｉｔｈｅｍｉｓｉｏｎｗａｖｅｌｅｎｇｔｈｏｆ９８０ｎｍａｒｅｃｕｒｅｎｔｌｙｒｅｃｅｉｖｉｎｇｃｏｎｓｉｄｅｒａｂｌｅａｔｅｎｔｉｏｎｂｅｃａｕ...     

InGaAs/GaAs/InGaP Strained Quantum Well Lasers Grown by Metalorganic Chemical Vapor Deposition

ＳｔｒａｉｎｅｄＩｎＧａＡｓ／ＧａＡｓｑｕａｎｔｕｍｗｅｌ（ＱＷ）ｌａｓｅｒｓｗｉｔｈｅｍｉｓｉｏｎｗａｖｅｌｅｎｇｔｈｏｆ９８０ｎｍａｒｅｃｕｒｅｎｔｌｙｒｅｃｅｉｖｉｎｇｃｏｎｓｉｄｅｒａｂｌｅａｔｅｎｔｉｏｎｂｅｃａｕ...     

Photoluminescence Properties of Si1—xGex／Si Strained Layer Structures

The investigation on optical properties of Si1-xGex/Si strained layer structures has been carried out actively in recent years.The photoluminescence has be-come a brisker subject in the studies of its various optical properties.A research develop-ment to photoluminescence properties of some new Si1-xGex/Si strained layer struc-tures is introduced.     

Stable Temperature Characteristics of InAs／GaAs Quantum Dots at Long Wavelength Emission

The time-resolved photoluminescence and steady photoluminescence (TRPL and PL) spectra on self-assembled InAs/GaAs quantum dots (QDs) are investigated. By depositing GaAs/InAs short period superlattices (SLs), 1. 48μm emission is obtained at room temperature. Temperature dependent PL measurements show that the PL intensity of the emission is very steady. It decays only to half as the temperature increases from 15 K to room temperature, while at the same time, the intensity of the other emission decreases by a factor of 5 orders of magnitude. These two emissions are attributed to large-size QDs and short period superlattices (SLs), respectively. Large-size QDs are easier to capture and confine carriers, which benefits the lifetime of PL, and therefore makes the emission intensity insensitive to the temperature.     

Thermal Analysis of InAIAs／InGaAs／InP Mid——infrared QCLs Operating in CW Mode

A simulation method for the thermal analysis of InAlAs/InGaAs/InP mid--infrared quantum cascade lasers (QCLs) based on finite -- element method (FEM) is presented. The thermal distribution of the QCLs on substrate--side or epilayer--side mounting forms is simulated and the results are compared. Results show that the epilayer--side mounting form has much better heat dissipation capability than the substrate--side mounting.     

快速热退火对GaAs/AlGaAs量子阱红外探测器的修饰

应用快速热退火的方法将 Ga As/Al Ga As多量子阱红外探测器的峰值响应波长从7.7μm移动到 8～ 1 4μm大气窗口内 .通过测量单元器件的光电流谱、响应率和 I- V特性 ,分析了快速热退火对 Ga As/Al Ga As多量子阱红外探测器性能的影响     

快速热退火提高应变InAs／InP量子阱结构的晶体质量

研究了快速热退火对应变ＩｎＡｓ／ＩｎＰ单晶子阱结构光学性质的影响。样品经最佳条件７００℃，５ｓ的快速热退火，８Ｋ温度下量子阱的荧光强度地加了４倍，量子阱荧光峰仅蓝移１．５ｍｅＶ。     

In_xGa_(1-x)As/GaAs应变单量子阱结构的静压光致发光研究

在室温和液氮温度下,0-60kbar范围内对In_xGa(1-x)As/GaAs应变单量子阱结构进行了静压光致发光研究.在室温下,量子阱中发光峰随压力的变化是亚线性的,而在液氮温度下是线性的.阱中发光峰的压力系数比GaAs势垒的小约10％左右.发现对应于导带第二子带的发光峰的压力系数略大于第一子带的.此结果与GaAs/Al_xGa_(1-x)As量子阱的情况正好相反.     

快速热退火对高应变InGaAs/GaAs量子阱的影响

用固态分子束外延技术生长了高应变In045Ga0.55 As/GaAs量子阱材料.研究了快速热退火对高应变InGaAs/GaAs量子阱材料光学性质的影响.本文采用假设InGaAs/GaAs量子阱中的In-Ga原子扩散为误差函数扩散并解任意形状量子阱的薛定谔方程的方法,对不同退火温度下InGaAs/GaAs量子阱室温光致发光峰值波长拟合,得到了In原子在高应变InGaAs/GaAs量子阱中的扩散系数以及扩散激活能(0.88eV).     

快速热退火对高应变InGaAs/Ga As量子阱的影响

用固态分子束外延技术生长了高应变In0.45Ga0.55As/GaAs量子阱材料. 研究了快速热退火对高应变InGaAs/GaAs量子阱材料光学性质的影响. 本文采用假设InGaAs/GaAs量子阱中的In-Ga原子扩散为误差函数扩散并解任意形状量子阱的薛定谔方程的方法，对不同退火温度下InGaAs/GaAs量子阱室温光致发光峰值波长拟合，得到了In原子在高应变InGaAs/GaAs量子阱中的扩散系数以及扩散激活能（0.88eV) .     

Pt／Si快速热退火固相反应制备超薄PtSi薄膜

对Ｐｔ／Ｓｉ快速热退火固相反应形成超薄ＰｔＳｉ薄膜进行研究。溅射Ｐｔ薄膜的厚度在５～２０ｎｍ之间，用ＡＥＳ，ＸＲＤ，ＲＢＳ，ＳＥＭ等分析测试手段对固相反应Ｐｔｓｉ薄膜的结构特性进行观测，并对ＰｔＳｉ／ｎ－Ｓｉ肖特基结电学性能进行了测试。实验结果表明，５５０～６００℃快速返火有利于Ｐｔ／Ｓｉ反应形成性能优良的ＰｔＳｉ／Ｓｉ肖特基势垒接触。     

Al-Si接触的快速热退火

本文报道了用常规管式炉30秒钟快速热退火代替常规热合金化做Al-Si欧姆接触的简捷方法.通过俄歇电子能谱、扫描电子显微镜、接触电阻率和PN结反向电流的研究证实该法能有效地抑制导致浅结器件失效的Al-Si互扩散现象,从而达到保持良好结特性的欧姆接触.     

调制掺杂AlGaAs/InGaAs/GaAs应变量子阱结构的研究

报道调制掺杂AlGaAs/InGaAs/GaAs应变量子阱结构的分子束外延生长、变温霍尔效应和电化学c—v测量,并对输运性质进行了讨论。用这种材料研制的PM-HEMT(pseudomorphic high electron mobility transistors)器件,栅长0.4μm,在12GHz下噪声系数1.03dB,相关增益7.5dB。     

GaInAs/AlGaAs应变量子阱结构的荧光特性

本文报道了4—300K温度范围内量子阱宽度分别为20、40、90和130A的GaInAs/AlGaAs应变量子阱结构的光荧光特性。我们考虑量子尺寸对载流子子能带的影响和弹性应变引起带隙的移动,计算了量子阱中本征激子发光的能量位置,计算值与实验结果基本吻合。还研究了荧光峰强度随阱宽的变化以及不同温度下荧光峰的半高宽度。