Optimization of Al/a-SiC:H optical sensor device by means of thermal annealing

The optimization of optoelectronic properties of Al/a-SiC:H Schottky diodes grown as Al/a-SiC:H/c-Si(n) structures is studied by means of thermal annealing of a-SiC:H thin films. According to the spectral response of the Schottky diodes the measured quantum efficiency, η_measured, increases with increasing annealing temperature (400–600 °C), whereas η_measured decreases for T_a>600 °C. For T_a=600 °C, optimum material quality of a-SiC:H films is achieved and the spectral response of the Al/a-SiC:H/c-S(n) structures present very high and almost constant values (η_measured80%) for the whole range of wavelengths from 500 up to 850 nm. These results show that our Al/a-SiC:H/c-S(n) structures can be very attractive as optical sensors. Diffusion length calculations as well as the mobility by lifetime product (μτ)_p of the minority carriers (holes) of a-SiC:H films present a dependence on T_a similar to that of the measured quantum efficiency. Finally, the quantum efficiency of films processed with T_a=675 °C is found to increase when the Al/a-SiC:H/c-S(n) structures are exposed to hydrogen, a result that could be promising for the construction of a hydrogen detection sensor.     

Barrier characteristics of gold Schottky contacts on moderately doped n-InP based on temperature dependent I-V and C-V measurements

The temperature dependences of current-voltage (I-V) and capacitance-voltage (C-V) characteristics of the gold Schottky contacts on moderately doped n-InP (Au/MD n-InP) Schottky barrier diodes (SBDs) have been systematically investigated in the temperature range of 60-300 K. The main diode parameters, ideality factor (n) and zero-bias barrier height (apparent barrier height) were found to be strongly temperature dependent and while the decreases, the n and the increase with decreasing temperature. According to Thermionic Emission (TE) theory, the slope of the conventional Richardson plot [In(J₀/T²) vs. 1000/T] should give the barrier height. However, the experimental data obtained do not correlate well with a straight line below 160 K. This behaviour has been interpreted on the basis of standard TE theory and the assumption of a Gaussian distribution of the barrier heights due to barrier inhomogeneities that persist at the metal-semiconductor interface. The linearity of the apparent barrier height vs. 1/(2kT) plot that yields a mean barrier height of 0.526 eV and a standard deviation (σ_s0) of 0.06 eV, was interpreted as an evidence to apply the Gaussian distribution of the barrier height. Furthermore, modified Richardson plot [ vs. 1/T] has a good linearity over the investigated temperature range and gives the and the Richardson constant (A^∗) values as 0.532 eV and 15.90 AK⁻²cm⁻², respectively. The mean barrier heights obtained from both plots are appropriate with each other and the value of A^∗ obtained from the modified Richardson plot is close to the theoretical value of 9.4 AK⁻²cm⁻² for n-InP. From the C-V characteristics, measured at 1 MHz, the capacitance was determined to increase with increasing temperature. C-V measurements have resulted in higher barrier heights than those obtained from I-V measurements. The discrepancy between Schottky barrier heights(SBHs) obtained from I-V and C-V measurements was also interpreted. As a result, it can be concluded that the temperature dependent characteristic parameters for Au/MD n-InP SBDs can be successfully explained on the basis of TE mechanism with Gaussian distribution of the barrier heights.     

Barrier height inhomogeneities in a Ni/SiC-6H Schottky n-type diode

Two models have been used in order to explain the anomalies observed in a Ni/SiC-6H Schottky n-type diode I(V) characteristic. Both, parallel conduction and potential fluctuation models showed that the barrier's height is around a mean value of 1.86 V, corresponding to a factor of ideality of n=1. Another conclusion was that  V.It has been, also, explained why the Arrhénius or Richardson plot (ln(I_s/T²) versus 1/T) is not linear and why the area of the low barrier height A_l, representing a defective zone, is approximately about 0.12% of the total area contact.     

Self-aligned In0.49Ga0.51P/GaAs HBT DC and RF characteristics related with orientations

A self-aligned InGaP/GaAs HBT DC and RF characteristics related with orientations were studied. The DC current gain was greater for the [0 1 1] emitter orientation compared to orientation. However, it also showed slightly better RF performance for orientation with a cutoff frequency f_T 69 GHz compared to the f_T of 62 GHz for the [0 1 1] orientation. This experimental work has been proposed that the dependence of the characteristics could be attributed to both piezoelectric effect and the difference between lateral etched profiles in different directions.     

Current transport mechanisms and trap state investigations in (Ni/Au)-AlN/GaN Schottky barrier diodes

The current transport mechanisms in (Ni/Au)-AlN/GaN Schottky barrier diodes (SBDs) were investigated by the use of current-voltage characteristics in the temperature range of 80-380 K. In order to determine the true current transport mechanisms for (Ni/Au)-AlN/GaN SBDs, by taking the J_s(tunnel), E₀, and R_s as adjustable fit parameters, the experimental J-V data were fitted to the analytical expressions given for the current transport mechanisms in a wide range of applied biases and at different temperatures. Fitting results show the weak temperature dependent behavior in the saturation current and the temperature independent behavior of the tunneling parameters in this temperature range. Therefore, it has been concluded that the mechanism of charge transport in (Ni/Au)-AlN/GaN SBDs, along the dislocations intersecting the space charge region, is performed by tunneling.In addition, in order to analyze the trapping effects in (Ni/Au)-AlN/GaN SBDs, the capacitance-voltage (C-V) and conductance-voltage (G/ω-V) characteristics were measured in the frequency range 0.7-50 kHz. A detailed analysis of the frequency-dependent capacitance and conductance data was performed, assuming the models in which traps are located at the heterojunction interface. The density (D_t) and time constants (τ_t) of the trap states have been determined as a function of energy separation from the conduction-band edge (E_c − E_t) as D_t≅(5-8)×10¹², respectively.     

Field emission characteristics of an oxidized porous polysilicon field emitter using the electrochemical oxidation process

The field emission characteristics of an oxidized porous polysilicon (OPPS) were investigated with Pt/Ti multilayer electrode using the electrochemical oxidation (ECO) process. A Pt/Ti multilayer electrode, using ECO, showed highly efficient and stable electron emission characteristics; moreover, it can be applied to large area of a glass substrate with a low temperature process. Electron emission characteristics were improved with O₂ annealing at 600 °C after the ECO process. It was found that forming a high quality oxide layer from the ECO-formed SiO₂ was crucial in improving electron emission characteristics. The Pt/Ti OPPS field emitter, which was annealed at 600 °C for 5 h, showed an efficiency of 3.81% at      

YBCO superconducting tapes by melt-annealing method on metallic Ni%5W substrates

Superconducting tapes of YBCO-123 were produced by melt-annealing method on metallic Ni%5W substrates. YBCO thick films of about thick were deposited on Ni%5W tapes previously CeO₂ coated using different thermal treatments. A final architecture of the tapes like Ni%5W/CeO₂/YBCO/Au-Pd was achieved.Critical temperatures (T_c) of the superconducting tapes around 89 K and critical current densities (J_c) of at 77 K and were determined by resistive methods. All the samples displayed a granular character and the crystalline structure of the superconducting YBCO-123 with and preferential orientation along the c-axis as determined by SEM and XRD analysis, respectively. Both grain sizes and c-axis orientation are dependent of the thermal treatments.     

Gaussian distribution of inhomogeneous barrier height in tungsten/4H-SiC (000-1) Schottky diodes

The Gaussian distribution model have been used to analyze the anomalies observed in tungsten (W)/4H-SiC current voltage characteristics due to the barrier inhomogeneities that prevail at the metal-semiconductor interface. From the analysis of the forward I-V characteristics measured at elevated temperatures within the range of 303-448 K and by the assumption of a Gaussian distribution (GD) of barrier heights (BHs), a mean barrier height of 1.277 eV, a zero-bias standard deviation σ₀ = 0.092 V and a factor T₀ of 21.69 K have been obtained. Furthermore the modified Richardson plot according to the Gaussian distribution model resulted in a mean barrier height and a Richardson constant (A^∗) of 1.276 eV and 145 A/cm² K², respectively. The A^∗ value obtained from this plot is in very close agreement with the theoretical value of 146 A/cm² K² for n-type 4H-SiC. Therefore, it has been concluded that the temperature dependence of the forward I-V characteristics of the W/4H-SiC contacts can be successfully explained on the basis of a thermionic emission conduction mechanism with Gaussian distributed barriers. In addition, a comparison is made between the present results and those obtained previously assuming the pinch-off model.     

Ultra-low-power temperature compensated voltage reference generator

A CMOS voltage reference generator, based on the difference between the gate-source voltages of two NMOS transistors, has been implemented with AMS 0.35 μm CMOS technology (V_thn=0.45 and at 0 °C). The minimum and maximum supply voltages that ensure the correct operation of the reference voltage generator, are 1.5 and 4.3 V, respectively. The supply current at the maximum supply voltage and at 80 °C is 2.4 μA. A temperature coefficient of 25 ppm/°C and a line sensitivity of 1.6 mV/V are achieved. The power supply rejection ratios without any filtering capacitor at 100 Hz and 10 MHz are larger than −74 and −59 dB, respectively. The occupied chip area is 0.08 mm².     

Thermally annealed Ni/n-GaAs(Si)/In Schottky barrier diodes

We have identically prepared as many as eight Ni/n-GaAs/In Schottky barrier diodes (SBDs) using an n-type GaAs substrate with a doping density of about 7.3 × 10¹⁵ cm⁻³. The thermal stability of the Ni/n-GaAs/In Schottky diodes has been investigated by means of current-voltage (I-V) techniques after annealed for 1 min in N₂ atmosphere from 200 to 700 °C. For Ni/n-GaAs/In SBDs, the Schottky barrier height Φ_b and ideality factor n values range from 0.853 ± 0.012 eV and 1.061 ± 0.007 (for as-deposited sample) to 0.785 ± 0.002 eV and 1.209 ± 0.005 (for 600 °C annealing). The ideality factor values remained about unchanged up to 400 °C annealing. The I-V characteristics of the devices deteriorated at 700 °C annealing.     

Properties of wurtzite GaN MESFETs studied by two-dimensional full band Monte Carlo approach

The properties of a GaN Metal-Semiconductor Field Effect Transistor were studied based on two-dimensional full band Monte Carlo simulations. The dependences of the distributions of the electric potential, electron concentration, electric field, drift velocity, and average electron energy on the gate-source voltage (V_GS) and drain-source voltage (V_DS) were obtained, then the characteristics of the drain current (I_DS) versus the drain-source voltage (V_DS) and the transconductance (G_m) versus V_GS characteristics were determined. At and I_DS is 5.03 A/cm, which is higher value. The G_m−V_GS curve shows bell shaped and the maximum G_m is 112 ms/mm at and The current gain cutoff frequency (f_T) is 98 GHz at and      

Electrical analysis of organic dye-based MIS Schottky contacts

In this work, we prepared metal/interlayer/semiconductor (MIS) diodes by coating of an organic film on p-Si substrate. Metal(Al)/interlayer(Orange GOG)/semiconductor(p-Si) MIS structure had a good rectifying behavior. By using the forward-bias I-V characteristics, the values of ideality factor (n) and barrier height (BH) for the Al/OG/p-Si MIS diode were obtained as 1.73 and 0.77 eV, respectively. It was seen that the BH value of 0.77 eV calculated for the Al/OG/p-Si MIS diode was significantly larger than the value of 0.50 eV of conventional Al/p-Si Schottky diodes. Modification of the potential barrier of Al/p-Si diode was achieved by using thin interlayer of the OG organic material. This was attributed to the fact that the OG organic interlayer increased the effective barrier height by influencing the space charge region of Si. The interface-state density of the MIS diode was found to vary from 2.79 × 10¹³ to 5.80 × 10¹² eV⁻¹ cm⁻².     

Ionic outgassing from photoacid generators upon irradiation at 13.5 nm

Photoresist outgassing is considered a possible source of contamination of optics in extreme ultraviolet (EUV) lithography at 13.5 nm. We measured the relative proportions of ionic outgassing from 18 commercially available photoacid generators (PAG), which is a key component of chemically amplified photoresists, upon irradiation at 13.5 nm. These PAG include 17 triarylsulfonium or diaryliodonium salts, which contain or as the anion, and one PAG of molecular type. The overall outgassed ions in the range 10-200 u were counted in relative proportions. Outgassing of F⁺ is found to be dominant, and for most PAG the extent of F⁺ outgassing shows a satisfactory correlation with the ratio of F atomic photoabsorption to the overall PAG photoabsorption. Outgassed ions F⁺, CF⁺, and from PAG containing the anion and additional such as , and from those containing are identified. Triphenylsulfonium perfluoro-1-butanesulfonate is one PAG to emit the most abundant F⁺ and total ionic fragments, and a PAG of molecular type (N-hydroxy-5-norbornene-2,3-dicarboximide perfluoro-1-butanesulfonate) also emits abundantly both hydrocarbon ions and F⁺. Ionic outgassing of PAG cations includes (C₆H₅)₂S⁺ from R(C₆H₅)₂S⁺ salts and I⁺ from diaryliodonium salts. For PAG containing t-C₄H₉, significantly less F⁺ outgassing is observed; additional outgassing pathways are proposed. The pressure rise caused by PAG shows no dependence on the anion identity, but is correlated with cation photoabsorption, and ascribed to neutral aryl outgassing. Other minor outgassing species include from sulfonates; and ‘photostable’ PAH cations are identified for the first time and provide evidence of concurrent outgassing from, and polymerization of, PAG upon irradiation at 13.5 nm.